JP2019504810A5 - - Google Patents
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- Publication number
- JP2019504810A5 JP2019504810A5 JP2018531170A JP2018531170A JP2019504810A5 JP 2019504810 A5 JP2019504810 A5 JP 2019504810A5 JP 2018531170 A JP2018531170 A JP 2018531170A JP 2018531170 A JP2018531170 A JP 2018531170A JP 2019504810 A5 JP2019504810 A5 JP 2019504810A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- melting
- furnace
- treatment
- octamethylcyclotetrasiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201139.1 | 2015-12-18 | ||
| EP15201139 | 2015-12-18 | ||
| PCT/EP2016/081464 WO2017103133A1 (de) | 2015-12-18 | 2016-12-16 | Herstellen und nachbehandeln eines quarzglaskörpers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019504810A JP2019504810A (ja) | 2019-02-21 |
| JP2019504810A5 true JP2019504810A5 (enExample) | 2020-01-16 |
Family
ID=54850398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018531170A Pending JP2019504810A (ja) | 2015-12-18 | 2016-12-16 | 石英ガラス体の調製および後処理 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20190071342A1 (enExample) |
| EP (1) | EP3390298A1 (enExample) |
| JP (1) | JP2019504810A (enExample) |
| KR (1) | KR20180095623A (enExample) |
| CN (1) | CN108698896A (enExample) |
| TW (1) | TW201736290A (enExample) |
| WO (1) | WO2017103133A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017103115A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
| TWI813534B (zh) | 2015-12-18 | 2023-09-01 | 德商何瑞斯廓格拉斯公司 | 利用露點監測在熔融烘箱中製備石英玻璃體 |
| CN108698887B (zh) | 2015-12-18 | 2022-01-21 | 贺利氏石英玻璃有限两合公司 | 由均质石英玻璃制得的玻璃纤维和预成形品 |
| TWI794149B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃粉粒、不透明成型體及彼等之製備方法 |
| WO2017103125A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| TWI720090B (zh) | 2015-12-18 | 2021-03-01 | 德商何瑞斯廓格拉斯公司 | 於石英玻璃之製備中作為中間物之經碳摻雜二氧化矽顆粒的製備 |
| TWI794150B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 自二氧化矽顆粒製備石英玻璃體 |
| JP6881776B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラス体の調製 |
| WO2017103166A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem mehrkammerofen |
| WO2017103124A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
| CN113165938A (zh) * | 2018-12-14 | 2021-07-23 | 东曹石英股份有限公司 | 不透明石英玻璃的制造方法 |
| JP7591661B2 (ja) * | 2021-01-21 | 2024-11-28 | ヘレーウス クヴァルツグラース ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | 石英ガラス体 |
| CN113200669B (zh) * | 2021-06-04 | 2022-09-16 | 齐鲁工业大学 | 一种将难熔或不熔材料制成玻璃的方法 |
| US12366831B2 (en) | 2022-05-20 | 2025-07-22 | Mb-Microtec Ag | Fabrication of glass cells for hermetic gas enclosures |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5767031A (en) * | 1980-10-06 | 1982-04-23 | Shin Etsu Chem Co Ltd | Formation of quartz glass |
| JPS60260434A (ja) * | 1984-06-04 | 1985-12-23 | Shin Etsu Chem Co Ltd | 光伝送用無水ガラス素材の製造方法 |
| US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
| DK0598349T3 (da) * | 1992-11-19 | 1999-04-26 | Shinetsu Quartz Prod | Fremgangsmåde til fremstilling af et stort kvartsglasrør, samt en præform og en optisk fiber |
| JP3529149B2 (ja) * | 1992-11-19 | 2004-05-24 | 信越石英株式会社 | 大型石英ガラス管、大型石英ガラスプリフォ−ム及びそれらの製造方法 |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| JP2001220126A (ja) * | 2000-02-01 | 2001-08-14 | Tosoh Corp | 結晶質合成シリカ粉体及びこれを用いたガラス成形体 |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| US7637126B2 (en) * | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| US7166963B2 (en) * | 2004-09-10 | 2007-01-23 | Axcelis Technologies, Inc. | Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
| JP5529369B2 (ja) * | 2006-09-11 | 2014-06-25 | 東ソー株式会社 | 熔融石英ガラスおよびその製造方法 |
| WO2009096557A1 (ja) * | 2008-01-30 | 2009-08-06 | Asahi Glass Co., Ltd. | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
| DE102008033945B4 (de) * | 2008-07-19 | 2012-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von mit Stickstoff dotiertem Quarzglas sowie zur Durchführung des Verfahrens geeignete Quarzglaskörnung, Verfahren zur Herstellung eines Quarzglasstrangs und Verfahren zur Herstellung eines Quarzglastiegels |
| JP6129293B2 (ja) * | 2012-04-05 | 2017-05-17 | ヘレーウス クヴァルツグラース ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | 電気溶融された合成石英ガラスから成形体を製造する方法 |
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2016
- 2016-12-16 JP JP2018531170A patent/JP2019504810A/ja active Pending
- 2016-12-16 EP EP16810409.9A patent/EP3390298A1/de not_active Withdrawn
- 2016-12-16 US US16/062,685 patent/US20190071342A1/en not_active Abandoned
- 2016-12-16 KR KR1020187020273A patent/KR20180095623A/ko not_active Withdrawn
- 2016-12-16 WO PCT/EP2016/081464 patent/WO2017103133A1/de not_active Ceased
- 2016-12-16 TW TW105141752A patent/TW201736290A/zh unknown
- 2016-12-16 CN CN201680082183.3A patent/CN108698896A/zh active Pending