JP2019504810A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019504810A5 JP2019504810A5 JP2018531170A JP2018531170A JP2019504810A5 JP 2019504810 A5 JP2019504810 A5 JP 2019504810A5 JP 2018531170 A JP2018531170 A JP 2018531170A JP 2018531170 A JP2018531170 A JP 2018531170A JP 2019504810 A5 JP2019504810 A5 JP 2019504810A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- melting
- furnace
- treatment
- octamethylcyclotetrasiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201139.1 | 2015-12-18 | ||
| EP15201139 | 2015-12-18 | ||
| PCT/EP2016/081464 WO2017103133A1 (de) | 2015-12-18 | 2016-12-16 | Herstellen und nachbehandeln eines quarzglaskörpers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019504810A JP2019504810A (ja) | 2019-02-21 |
| JP2019504810A5 true JP2019504810A5 (enExample) | 2020-01-16 |
Family
ID=54850398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018531170A Pending JP2019504810A (ja) | 2015-12-18 | 2016-12-16 | 石英ガラス体の調製および後処理 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20190071342A1 (enExample) |
| EP (1) | EP3390298A1 (enExample) |
| JP (1) | JP2019504810A (enExample) |
| KR (1) | KR20180095623A (enExample) |
| CN (1) | CN108698896A (enExample) |
| TW (1) | TW201736290A (enExample) |
| WO (1) | WO2017103133A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| DE112018008204T5 (de) * | 2018-12-14 | 2021-09-09 | Tosoh Quartz Corporation | Verfahren zum Herstellen eines opaken Quarzglases |
| KR102789380B1 (ko) * | 2021-01-21 | 2025-03-31 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 석영 유리체 |
| CN113200669B (zh) * | 2021-06-04 | 2022-09-16 | 齐鲁工业大学 | 一种将难熔或不熔材料制成玻璃的方法 |
| US12366831B2 (en) | 2022-05-20 | 2025-07-22 | Mb-Microtec Ag | Fabrication of glass cells for hermetic gas enclosures |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5767031A (en) * | 1980-10-06 | 1982-04-23 | Shin Etsu Chem Co Ltd | Formation of quartz glass |
| JPS60260434A (ja) * | 1984-06-04 | 1985-12-23 | Shin Etsu Chem Co Ltd | 光伝送用無水ガラス素材の製造方法 |
| US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
| DK0598349T3 (da) * | 1992-11-19 | 1999-04-26 | Shinetsu Quartz Prod | Fremgangsmåde til fremstilling af et stort kvartsglasrør, samt en præform og en optisk fiber |
| JP3529149B2 (ja) * | 1992-11-19 | 2004-05-24 | 信越石英株式会社 | 大型石英ガラス管、大型石英ガラスプリフォ−ム及びそれらの製造方法 |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| JP2001220126A (ja) * | 2000-02-01 | 2001-08-14 | Tosoh Corp | 結晶質合成シリカ粉体及びこれを用いたガラス成形体 |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| US7637126B2 (en) * | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| US7166963B2 (en) * | 2004-09-10 | 2007-01-23 | Axcelis Technologies, Inc. | Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
| WO2008032698A1 (en) * | 2006-09-11 | 2008-03-20 | Tosoh Corporation | Fused quartz glass and process for producing the same |
| JPWO2009096557A1 (ja) * | 2008-01-30 | 2011-05-26 | 旭硝子株式会社 | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
| DE102008033945B4 (de) * | 2008-07-19 | 2012-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von mit Stickstoff dotiertem Quarzglas sowie zur Durchführung des Verfahrens geeignete Quarzglaskörnung, Verfahren zur Herstellung eines Quarzglasstrangs und Verfahren zur Herstellung eines Quarzglastiegels |
| CN104185613B (zh) * | 2012-04-05 | 2017-05-03 | 赫罗伊斯石英玻璃股份有限两合公司 | 用于由电熔化的合成的石英玻璃制造成形体的方法 |
-
2016
- 2016-12-16 EP EP16810409.9A patent/EP3390298A1/de not_active Withdrawn
- 2016-12-16 JP JP2018531170A patent/JP2019504810A/ja active Pending
- 2016-12-16 KR KR1020187020273A patent/KR20180095623A/ko not_active Withdrawn
- 2016-12-16 US US16/062,685 patent/US20190071342A1/en not_active Abandoned
- 2016-12-16 CN CN201680082183.3A patent/CN108698896A/zh active Pending
- 2016-12-16 WO PCT/EP2016/081464 patent/WO2017103133A1/de not_active Ceased
- 2016-12-16 TW TW105141752A patent/TW201736290A/zh unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2019502642A5 (enExample) | ||
| JP2019504810A5 (enExample) | ||
| JP2019503962A5 (enExample) | ||
| JP2019502631A5 (enExample) | ||
| JP2019502638A5 (enExample) | ||
| JP2019502632A5 (enExample) | ||
| JP2019502630A5 (enExample) | ||
| JP2019502636A5 (enExample) | ||
| JP2019502641A5 (enExample) | ||
| JP2019502635A5 (enExample) | ||
| JP2019502644A5 (enExample) | ||
| JP2019502634A5 (enExample) | ||
| JP2019503961A5 (enExample) | ||
| JP2019506352A5 (enExample) | ||
| JP2019506349A5 (enExample) | ||
| CN105271655B (zh) | 用于热处理由硼硅酸盐玻璃管制备的玻璃容器的内表面的环形区域的设备和方法 | |
| ATE487716T1 (de) | Indole, 1h-indazole, 1,2-benzisoxazole, 1,2- benzoisothiazole, deren herstellung und verwendungen | |
| NO20063392L (no) | Indoler, 1H-indazoler, 1,2-benzisoksazoler og 1,2-benzisotiazoler, og fremstilling og anvendelser derav | |
| UA67105U (ru) | Система для сухого обеспыливания и сухой очистки загрязненного пылью и вредными веществами газа, образованного в агрегатах для получения чугуна в процессе получения чугуна или в агрегатах для получения железа в процессе получения железа | |
| EA201792375A1 (ru) | 1-гетероарил-индолин-4-карбоксамиды в качестве модуляторов gpr52, применяемые для лечения или предотвращения расстройств, связанных с gpr52 | |
| JP2015192148A5 (enExample) | ||
| TW201228730A (en) | Device and method for supplying zinc gas | |
| US20140308621A1 (en) | Sintering apparatus | |
| JPS6016378B2 (ja) | ガラス表面処理方法 | |
| CN205223004U (zh) | 一种光纤拉丝炉 |