JP2019502631A5 - - Google Patents

Download PDF

Info

Publication number
JP2019502631A5
JP2019502631A5 JP2018530493A JP2018530493A JP2019502631A5 JP 2019502631 A5 JP2019502631 A5 JP 2019502631A5 JP 2018530493 A JP2018530493 A JP 2018530493A JP 2018530493 A JP2018530493 A JP 2018530493A JP 2019502631 A5 JP2019502631 A5 JP 2019502631A5
Authority
JP
Japan
Prior art keywords
chamber
melting
furnace
treatment
octamethylcyclotetrasiloxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018530493A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019502631A (ja
JP6912098B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2016/081520 external-priority patent/WO2017103167A2/de
Publication of JP2019502631A publication Critical patent/JP2019502631A/ja
Publication of JP2019502631A5 publication Critical patent/JP2019502631A5/ja
Application granted granted Critical
Publication of JP6912098B2 publication Critical patent/JP6912098B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018530493A 2015-12-18 2016-12-16 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製 Active JP6912098B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15201098 2015-12-18
EP15201098.9 2015-12-18
PCT/EP2016/081520 WO2017103167A2 (de) 2015-12-18 2016-12-16 Verringern des kohlenstoffgehalts von siliziumdioxidgranulat und herstellung eines quarzglaskörpers

Publications (3)

Publication Number Publication Date
JP2019502631A JP2019502631A (ja) 2019-01-31
JP2019502631A5 true JP2019502631A5 (enExample) 2020-01-16
JP6912098B2 JP6912098B2 (ja) 2021-07-28

Family

ID=54850382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018530493A Active JP6912098B2 (ja) 2015-12-18 2016-12-16 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製

Country Status (6)

Country Link
US (1) US20190077672A1 (enExample)
EP (1) EP3390307A2 (enExample)
JP (1) JP6912098B2 (enExample)
CN (1) CN108698886A (enExample)
TW (1) TWI764879B (enExample)
WO (1) WO2017103167A2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
CN108698890A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 利用在熔融烘箱中的露点监测制备石英玻璃体
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
KR20180095880A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 합성 석영 유리 결정립의 제조
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
ES2930541T3 (es) * 2019-03-22 2022-12-19 Wacker Chemie Ag Procedimiento para la producción de silicio técnico
CN112390261A (zh) * 2019-08-13 2021-02-23 斯特里特技术有限公司 气相二氧化硅颗粒分离脱氢的系统和方法
EP4030204B1 (de) * 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Mikrostrukturierte optische faser und vorform dafür
CN121605090A (zh) * 2023-09-15 2026-03-03 日本板硝子株式会社 玻璃粉体

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60260434A (ja) * 1984-06-04 1985-12-23 Shin Etsu Chem Co Ltd 光伝送用無水ガラス素材の製造方法
JP2925797B2 (ja) * 1991-07-30 1999-07-28 古河電気工業株式会社 光ファイバ用多孔質母材の精製方法
US6136736A (en) * 1993-06-01 2000-10-24 General Electric Company Doped silica glass
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
PT725037E (pt) * 1995-02-04 2001-07-31 Degussa Granulados a base de dioxido de silicio preparado pirogenicamente processo para a sua preparacao e sua utilizacao
DE19729505A1 (de) * 1997-07-10 1999-01-14 Heraeus Quarzglas Verfahren zur Herstellung von Si0¶2¶-Granulat
EP1088789A3 (en) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Porous silica granule, its method of production and its use in a method for producing quartz glass
DE10019693B4 (de) * 2000-04-20 2006-01-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben
US6826927B2 (en) * 2000-06-28 2004-12-07 Mitsubishi Materials Quartz Corporation Synthetic quartz powder, its production process, and synthetic quartz crucible
DE10163938A1 (de) * 2001-12-22 2003-07-10 Degussa Flammenhydrolytisch hergestelltes Silicium-Titan-Mischoxidpulver mit an der Oberfläche angereichertem Siliciumdioxid, dessen Herstellung und Verwendung
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
US7452518B2 (en) * 2004-12-28 2008-11-18 Momentive Performance Materials Inc. Process for treating synthetic silica powder and synthetic silica powder treated thereof
CN100463851C (zh) * 2005-10-26 2009-02-25 太原理工大学 一种超细疏水性二氧化硅的制取方法
WO2009096557A1 (ja) * 2008-01-30 2009-08-06 Asahi Glass Co., Ltd. エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法
US8925354B2 (en) * 2009-11-04 2015-01-06 Corning Incorporated Methods for forming an overclad portion of an optical fiber from pelletized glass soot
CN103717531A (zh) * 2011-07-29 2014-04-09 莫门蒂夫性能材料股份有限公司 制造高质量金属氧化物颗粒的方法和制造其的材料
DE102011121153B3 (de) * 2011-12-15 2013-03-21 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser
DE102012008437B3 (de) * 2012-04-30 2013-03-28 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung synthetischer Quarzglaskörnung
KR20160113573A (ko) * 2014-01-29 2016-09-30 미쓰비시 마테리알 가부시키가이샤 합성 비정질 실리카 분말 및 그 제조 방법
EP3000790B2 (de) * 2014-09-29 2023-07-26 Heraeus Quarzglas GmbH & Co. KG Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat

Similar Documents

Publication Publication Date Title
JP2019502642A5 (enExample)
JP2019504810A5 (enExample)
JP2019503962A5 (enExample)
JP2019502632A5 (enExample)
JP2019502638A5 (enExample)
JP2019502630A5 (enExample)
JP2019502636A5 (enExample)
JP2019502641A5 (enExample)
JP2019502635A5 (enExample)
JP2019502644A5 (enExample)
JP2019503961A5 (enExample)
JP2019502634A5 (enExample)
JP2019506352A5 (enExample)
JP2019506349A5 (enExample)
ATE487716T1 (de) Indole, 1h-indazole, 1,2-benzisoxazole, 1,2- benzoisothiazole, deren herstellung und verwendungen
NO20063392L (no) Indoler, 1H-indazoler, 1,2-benzisoksazoler og 1,2-benzisotiazoler, og fremstilling og anvendelser derav
JP2019503966A5 (enExample)
ATE505470T1 (de) 1h-indazole, benzothiazole, 1,2-benzisoxazole, 1, 2-benzisothiazole und chromone und deren herstellung und verwendungen
JP2015192148A5 (enExample)
TW201228730A (en) Device and method for supplying zinc gas
EA202190692A1 (ru) Способ подготовки сыпучей огнеупорной композиции для применения в производстве литейных форм и стержней, соответствующие применение и переработанная смесь для термообработки
TWI576307B (zh) Asphalt transfer method
JP2015524792A5 (enExample)
EA201070753A1 (ru) Альфа-аминоамидные производные, применяемые в лечении психиатрических расстройств
KR20140100429A (ko) 관다발 반응기 내에서의 오르가노클로로실란의 가수분해 방법