JP2019500652A5 - - Google Patents

Download PDF

Info

Publication number
JP2019500652A5
JP2019500652A5 JP2018531591A JP2018531591A JP2019500652A5 JP 2019500652 A5 JP2019500652 A5 JP 2019500652A5 JP 2018531591 A JP2018531591 A JP 2018531591A JP 2018531591 A JP2018531591 A JP 2018531591A JP 2019500652 A5 JP2019500652 A5 JP 2019500652A5
Authority
JP
Japan
Prior art keywords
optical element
reflective
layer
reflective optical
effective surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018531591A
Other languages
English (en)
Japanese (ja)
Other versions
JP6814216B2 (ja
JP2019500652A (ja
Filing date
Publication date
Priority claimed from DE102015225509.3A external-priority patent/DE102015225509A1/de
Application filed filed Critical
Publication of JP2019500652A publication Critical patent/JP2019500652A/ja
Publication of JP2019500652A5 publication Critical patent/JP2019500652A5/ja
Application granted granted Critical
Publication of JP6814216B2 publication Critical patent/JP6814216B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018531591A 2015-12-16 2016-11-21 反射光学素子 Active JP6814216B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015225509.3A DE102015225509A1 (de) 2015-12-16 2015-12-16 Reflektives optisches Element
DE102015225509.3 2015-12-16
PCT/EP2016/078343 WO2017102256A1 (de) 2015-12-16 2016-11-21 Reflektives optisches element

Publications (3)

Publication Number Publication Date
JP2019500652A JP2019500652A (ja) 2019-01-10
JP2019500652A5 true JP2019500652A5 (enExample) 2020-01-09
JP6814216B2 JP6814216B2 (ja) 2021-01-13

Family

ID=57389426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018531591A Active JP6814216B2 (ja) 2015-12-16 2016-11-21 反射光学素子

Country Status (4)

Country Link
US (1) US10338476B2 (enExample)
JP (1) JP6814216B2 (enExample)
DE (1) DE102015225509A1 (enExample)
WO (1) WO2017102256A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112713499A (zh) * 2020-12-30 2021-04-27 武汉光谷航天三江激光产业技术研究院有限公司 光学元件散热装置及方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7424729B2 (en) * 2000-04-17 2008-09-09 Lg Electronics Inc. Differentiated PSIP table update interval technology
DE10040998A1 (de) * 2000-08-22 2002-03-14 Zeiss Carl Projektionsbelichtungsanlage
US6806006B2 (en) * 2002-07-15 2004-10-19 International Business Machines Corporation Integrated cooling substrate for extreme ultraviolet reticle
EP1624467A3 (en) * 2003-10-20 2007-05-30 ASML Netherlands BV Lithographic apparatus and device manufacturing method
DE102004060184A1 (de) * 2004-12-14 2006-07-06 Carl Zeiss Smt Ag EUV-Spiegelanordnung
US7332416B2 (en) * 2005-03-28 2008-02-19 Intel Corporation Methods to manufacture contaminant-gettering materials in the surface of EUV optics
US7736820B2 (en) * 2006-05-05 2010-06-15 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
WO2009152959A1 (en) * 2008-06-17 2009-12-23 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element
JP5511818B2 (ja) * 2008-08-06 2014-06-04 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置用の光学素子、かかる光学素子を含むリソグラフィ装置、およびかかる光学素子を製造する方法
DE102009054869B4 (de) * 2009-04-09 2022-02-17 Carl Zeiss Smt Gmbh Spiegel zur Führung eines Strahlungsbündels, Vorrichtungen mit einem derartigen Spiegel sowie Verfahren zur Herstellung mikro- oder nanostrukturierter Bauelemente
DE102009044462A1 (de) * 2009-11-06 2011-01-05 Carl Zeiss Smt Ag Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
JP2011222958A (ja) * 2010-03-25 2011-11-04 Komatsu Ltd ミラーおよび極端紫外光生成装置
TWI475330B (zh) * 2010-07-30 2015-03-01 卡爾蔡司Ｓｍｔ有限公司 超紫外線曝光裝置
DE102010039930A1 (de) 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage
DE102011080052A1 (de) 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
DE102012212898A1 (de) * 2012-07-24 2014-01-30 Carl Zeiss Smt Gmbh Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage
US20150219874A1 (en) * 2012-11-29 2015-08-06 Carl Zeiss Smt Gmbh Cooling system for at least one system component of an optical system for euv applications and system component of this type and optical system of this type
DE102013204427A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102013102670A1 (de) 2013-03-15 2014-10-02 Asml Netherlands B.V. Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements
DE102014219755A1 (de) 2013-10-30 2015-04-30 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102014204171A1 (de) * 2014-03-06 2015-09-24 Carl Zeiss Smt Gmbh Optisches Element und optische Anordnung damit
DE102014206765A1 (de) * 2014-04-08 2015-10-08 Carl Zeiss Smt Gmbh Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage
DE102014216240A1 (de) 2014-08-15 2016-02-18 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102014222534A1 (de) * 2014-11-05 2015-11-12 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines reflektiven optischen Elements, sowie reflektives optisches Element

Similar Documents

Publication Publication Date Title
JP6858817B2 (ja) リソグラフィ装置内で用いられる膜及びそのような膜を含むリソグラフィ装置
JP2012500481A5 (enExample)
TWI434132B (zh) 具有高熱傳導性之極紫外線主光罩基板
WO2011152422A1 (ja) 偏光板及び偏光板の製造方法
JP2015122480A5 (enExample)
JP2011524076A (ja) 光エレメント、当該光エレメントを含むリソグラフィ装置、デバイス製造方法、およびそれによって製造されたデバイス
JP2006523953A5 (enExample)
CN104854511B (zh) 光刻设备和方法
JP2016517028A5 (enExample)
TWI501045B (zh) 光學系統中之光學架構，特別是微影投射曝光裝置中之光學架構
JP2005532680A5 (enExample)
JP2015180975A (ja) 偏光板の製造方法
JP5359128B2 (ja) 偏光素子及びその製造方法
JP2016531319A5 (enExample)
JP2019500652A5 (enExample)
JP2005340459A5 (enExample)
JP2008027992A (ja) Ｅｕｖｌマスク用基板の製造方法及びその基板を用いたｅｕｖｌマスクの製造方法
JP2006177740A (ja) 多層膜反射鏡及びｅｕｖ露光装置
JP2015521368A5 (enExample)
KR20130012348A (ko) Ｅｕｖ 빔 생성 장치
TW202243882A (zh) 極紫外光表膜
JP2016541023A (ja) 偏光系
Mizoguchi et al. High-power LPP-EUV source for semiconductor HVM: lithography and other applications
JP6814216B2 (ja) 反射光学素子
JP2007503723A5 (enExample)