JP2019183198A - ロジウムリンめっき被膜および積層体材料 - Google Patents
ロジウムリンめっき被膜および積層体材料 Download PDFInfo
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- JP2019183198A JP2019183198A JP2018071811A JP2018071811A JP2019183198A JP 2019183198 A JP2019183198 A JP 2019183198A JP 2018071811 A JP2018071811 A JP 2018071811A JP 2018071811 A JP2018071811 A JP 2018071811A JP 2019183198 A JP2019183198 A JP 2019183198A
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- Prior art keywords
- rhodium
- layer
- film
- plating
- plating film
- Prior art date
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- 238000007747 plating Methods 0.000 title claims abstract description 133
- 239000002648 laminated material Substances 0.000 title claims abstract description 13
- FSHNFAOXXJLGJE-UHFFFAOYSA-N [Rh].[P] Chemical compound [Rh].[P] FSHNFAOXXJLGJE-UHFFFAOYSA-N 0.000 title description 50
- 239000010948 rhodium Substances 0.000 claims abstract description 180
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 170
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims abstract description 166
- 239000010410 layer Substances 0.000 claims abstract description 117
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 40
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 38
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000011574 phosphorus Substances 0.000 claims abstract description 38
- 239000002344 surface layer Substances 0.000 claims abstract description 38
- 239000013078 crystal Substances 0.000 claims abstract description 34
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 32
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 20
- 239000000956 alloy Substances 0.000 claims abstract description 20
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 229910000990 Ni alloy Inorganic materials 0.000 claims abstract description 7
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims description 35
- 239000000463 material Substances 0.000 claims description 32
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- 229910052763 palladium Inorganic materials 0.000 claims description 15
- 229910000629 Rh alloy Inorganic materials 0.000 claims description 7
- 239000002659 electrodeposit Substances 0.000 claims description 5
- 229910001252 Pd alloy Inorganic materials 0.000 claims description 3
- 238000005299 abrasion Methods 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 117
- 238000012360 testing method Methods 0.000 description 84
- 238000009713 electroplating Methods 0.000 description 67
- 229910052751 metal Inorganic materials 0.000 description 30
- 239000002184 metal Substances 0.000 description 30
- 239000000047 product Substances 0.000 description 29
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 28
- RYZCLUQMCYZBJQ-UHFFFAOYSA-H lead(2+);dicarbonate;dihydroxide Chemical compound [OH-].[OH-].[Pb+2].[Pb+2].[Pb+2].[O-]C([O-])=O.[O-]C([O-])=O RYZCLUQMCYZBJQ-UHFFFAOYSA-H 0.000 description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 20
- 230000000694 effects Effects 0.000 description 17
- 239000012298 atmosphere Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 229910000881 Cu alloy Inorganic materials 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- 238000007772 electroless plating Methods 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 9
- 238000001000 micrograph Methods 0.000 description 9
- 229910052697 platinum Inorganic materials 0.000 description 9
- YWFDDXXMOPZFFM-UHFFFAOYSA-H rhodium(3+);trisulfate Chemical compound [Rh+3].[Rh+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O YWFDDXXMOPZFFM-UHFFFAOYSA-H 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000001556 precipitation Methods 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 229910052741 iridium Inorganic materials 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- -1 high hardness Chemical compound 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910001096 P alloy Inorganic materials 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- YPPQDPIIWDQYRY-UHFFFAOYSA-N [Ru].[Rh] Chemical compound [Ru].[Rh] YPPQDPIIWDQYRY-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000002079 cooperative effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 150000003283 rhodium Chemical class 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 235000014676 Phragmites communis Nutrition 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical compound [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- WMFZVLIHQVUVGO-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanol Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(O)C1=CC=CC=C1 WMFZVLIHQVUVGO-UHFFFAOYSA-N 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T10/00—Road transport of goods or passengers
- Y02T10/10—Internal combustion engine [ICE] based vehicles
- Y02T10/12—Improving ICE efficiencies
Landscapes
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
(実施例1)
(実施例2)
(実施例3)
(実施例4)
(実施例5)
(実施例6)
(実施例7)
(実施例8)
(従来例1)
(従来例2)
さらに、このテストピースのロジウムリン非晶質構造の平均結晶粒を走査電子顕微鏡で1万倍に拡大して観察したところ、所どころ黒色の濃い部分と薄い部分の不規則な模様が見られた。結晶粒の区画は観察できなかった。
(比較例1)
(比較例2)
Claims (7)
- ロジウム共析層のめっき被膜であって、当該ロジウム共析層はリンの含有量が7〜10質量%であり、当該被膜は走査型電子顕微鏡で観察した時のロジウムの平均結晶粒径が0.01μm未満の非晶質構造であることを特徴とする工業製品用のロジウムリンめっき被膜。
- 上記めっき被膜がストライクめっき被膜である場合の層厚が0.005〜0.3μmである請求項1に記載のロジウムリンめっき被膜。
- 上記めっき被膜が電析物である場合の層厚が0.5〜10μmである請求項1に記載のロジウムリンめっき被膜。
- 導電性基材と、貴金属または貴金属合金を含む表層と、前記基材と表層との間に設けられる中間層とを有する複層体材料において、当該中間層がロジウム共析層の電気めっき被膜であって、当該ロジウム共析層はリンの含有量が7〜10質量%であり、当該被膜は走査型電子顕微鏡で観察した時のロジウムの平均結晶粒が0.01μm未満の非晶質構造であることを特徴とする電気部品用の複層体材料。
- 導電性基材と、貴金属または貴金属合金を含む表層と、前記基材と表層との間に設けられる中間層と、ニッケルまたはニッケル合金を含む下層を有する積層体材料において、当該中間層がロジウム共析層の電気めっき被膜であって、当該ロジウム共析層はリンの含有量が7〜10質量%であり、当該被膜は走査型電子顕微鏡で観察した時のロジウムの平均結晶粒が0.01μm未満の非晶質構造であることを特徴とする電気部品用の積層体材料。
- 上記表層がロジウムまたはロジウム合金を含むことを特徴とする請求項5または請求項6に記載の電気部品用の複層体材料または積層体材料。
- 上記中間層と下層との間にパラジウムまたはパラジウム合金を含む補助層を有することを特徴とする請求項6に記載の電気部品用の積層体材料。
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JP2018071811A JP7068899B2 (ja) | 2018-04-03 | 2018-04-03 | ロジウムリンめっき被膜および積層体材料 |
Publications (2)
Publication Number | Publication Date |
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JP2019183198A true JP2019183198A (ja) | 2019-10-24 |
JP7068899B2 JP7068899B2 (ja) | 2022-05-17 |
Family
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Family Applications (1)
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JP2018071811A Active JP7068899B2 (ja) | 2018-04-03 | 2018-04-03 | ロジウムリンめっき被膜および積層体材料 |
Country Status (1)
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5214537A (en) * | 1975-07-25 | 1977-02-03 | Tanaka Precious Metal Ind | Rhodium plating bath |
JPS5214538A (en) * | 1975-07-25 | 1977-02-03 | Tanaka Precious Metal Ind | Rhodium plating bath |
JPS5848688A (ja) * | 1981-09-17 | 1983-03-22 | Nippon Mining Co Ltd | 電気黒色ロジウムメッキ浴 |
JPS6254094A (ja) * | 1985-06-24 | 1987-03-09 | ザ スタンダ−ド オイル カンパニ− | ロジウムを基剤とした新規なアモルフアス金属合金及びハロゲン電極としてのその使用法 |
JPH01290788A (ja) * | 1988-05-16 | 1989-11-22 | Nippon Mining Co Ltd | 低応カロジウムめっき液及びその製造方法 |
JPH06264281A (ja) * | 1993-03-11 | 1994-09-20 | Bikutoria:Kk | パラジウムメッキ液及び該メッキ液を用いたパラジウムメッキ方法 |
JP2015137421A (ja) * | 2014-01-24 | 2015-07-30 | 古河電気工業株式会社 | 電気接点用貴金属被覆材およびその製造方法 |
JP2017179558A (ja) * | 2016-03-31 | 2017-10-05 | 古河電気工業株式会社 | 薄膜めっき用金属材料およびその製造方法 |
WO2017209279A1 (ja) * | 2016-06-03 | 2017-12-07 | 古河電気工業株式会社 | 表面処理材およびその製造方法ならびに表面処理材を用いて形成した部品 |
-
2018
- 2018-04-03 JP JP2018071811A patent/JP7068899B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5214537A (en) * | 1975-07-25 | 1977-02-03 | Tanaka Precious Metal Ind | Rhodium plating bath |
JPS5214538A (en) * | 1975-07-25 | 1977-02-03 | Tanaka Precious Metal Ind | Rhodium plating bath |
JPS5848688A (ja) * | 1981-09-17 | 1983-03-22 | Nippon Mining Co Ltd | 電気黒色ロジウムメッキ浴 |
JPS6254094A (ja) * | 1985-06-24 | 1987-03-09 | ザ スタンダ−ド オイル カンパニ− | ロジウムを基剤とした新規なアモルフアス金属合金及びハロゲン電極としてのその使用法 |
JPH01290788A (ja) * | 1988-05-16 | 1989-11-22 | Nippon Mining Co Ltd | 低応カロジウムめっき液及びその製造方法 |
JPH06264281A (ja) * | 1993-03-11 | 1994-09-20 | Bikutoria:Kk | パラジウムメッキ液及び該メッキ液を用いたパラジウムメッキ方法 |
JP2015137421A (ja) * | 2014-01-24 | 2015-07-30 | 古河電気工業株式会社 | 電気接点用貴金属被覆材およびその製造方法 |
JP2017179558A (ja) * | 2016-03-31 | 2017-10-05 | 古河電気工業株式会社 | 薄膜めっき用金属材料およびその製造方法 |
WO2017209279A1 (ja) * | 2016-06-03 | 2017-12-07 | 古河電気工業株式会社 | 表面処理材およびその製造方法ならびに表面処理材を用いて形成した部品 |
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