JP2019131372A - Substrate inverting device - Google Patents

Abstract

To provide a substrate inverting device capable of simplifying a constitution of the device and saving the space and further capable of efficiently inverting a substrate.SOLUTION: A substrate inverting device 1 for inverting a substrate F comprises: a first suction part 110; a second suction part 160; an inverting mechanism 200 which integrally half-rotates the first suction part 110 and the second suction part 160 while a suction surface of the first suction part 110 and a suction surface of the second suction part 160 face each other; and a conveyance mechanism 300 which selectively transfers a suction part 100, positioned at a transfer position 200a by the inverting mechanism 200, out of the first suction part 110 and the second suction part 160.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a substrate reversing device for reversing a substrate.

  In general, a mother substrate made of a brittle material such as a glass substrate is divided into a substrate of a predetermined size through a scribe process and a break process. When subjected to these steps, the mother substrate is turned upside down as appropriate. For example, when a mother substrate is formed by bonding two glass substrates, scribe lines are formed on both sides of the mother substrate. In this case, after the scribe line is formed on one surface, the mother substrate is turned upside down, and the scribe line is formed on the other surface. In addition, the mother substrate on which the scribe lines are formed may be reversed and used for the breaking process.

  Patent Document 1 below discloses an apparatus for reversing the mother substrate when the mother substrate is transported between two tables arranged in the horizontal direction. This apparatus includes a transport mechanism that transports the mother substrate in the horizontal direction and a rotation mechanism that reverses the mother substrate. Each of the transport mechanism and the rotation mechanism is provided with a suction plate. The mother board placed on one table is sucked by the suction plate of the rotating mechanism and turned upside down. The mother substrate that is turned upside down is transferred from the suction plate of the rotation mechanism to the suction plate of the transport mechanism. Thereafter, the mother board is sent to the other table by the transport mechanism and placed on the other table.

JP 2014-080336 A

  In the configuration of Patent Document 1, when the mother substrate is reversed, the rotation mechanism moves the mother substrate to a predetermined position and then rotates the mother substrate by 180 degrees. The rotated mother substrate is transferred to another table by the transfer mechanism and placed. In this way, the rotation mechanism and the transport mechanism move individually. Therefore, it is necessary to provide a moving mechanism for moving the substrate in each of the rotating mechanism and the transport mechanism. Therefore, the configuration of the apparatus for transporting the mother substrate becomes complicated, and two moving mechanisms are provided, so that there is a problem that the apparatus is increased in size as a whole. Furthermore, since the rotation mechanism and the transport mechanism move, it is difficult to say that the substrate is moved and reversed efficiently.

  In view of such a problem, an object of the present invention is to provide a substrate reversing apparatus that can simplify the configuration of the apparatus and save space, and can efficiently perform reversal of the substrate.

  A main aspect of the present invention relates to a substrate transfer device that reverses a substrate. In the substrate reversing device according to this aspect, the first suction unit, the second suction unit, the suction surface of the first suction unit, and the suction surface of the second suction unit face each other. A reversing mechanism for integrally rotating the first adsorbing unit and the second adsorbing unit by half rotation, and an adsorbing unit positioned at a transfer position in the reversing mechanism among the first adsorbing unit and the second adsorbing unit And a transport mechanism for selectively transferring.

  According to this configuration, since the first suction unit and the second suction unit are used for both the substrate transfer operation and the substrate transfer operation when the substrate is reversed, the configuration of the substrate reversing device can be simplified.

  In the substrate reversing device according to this aspect, the reversing mechanism is guided by the guide rail that integrally rotates the first suction portion and the second suction portion half-rotated, and the first suction portion. And a guide plate connected to each of the second suction part. The guide rail is connected to each of the first suction portion and the second suction portion via the guide plate. When the suction surface of the first suction portion and the suction surface of the second suction portion face each other, the guide rail is circular, and the guide plate is rotatable along the guide rail. Can be configured.

  According to this configuration, the first suction portion and the second suction portion can rotate along the guide rail via the guide plate when the suction surfaces face each other. Therefore, the substrate can smoothly rotate half a turn while being sandwiched between the suction surface of the first suction portion and the suction surface of the second suction portion. That is, simultaneously with the reversal of the substrate, the first suction unit and the second suction unit integrally rotate by half, so that the position of the first suction unit and the second suction unit that are located at the transfer position is alternated. . The substrate is adsorbed by the adsorbing unit located at the transfer position and transferred to a predetermined position by the transport mechanism. As described above, at the same time when the substrate is reversed, suction for transferring the substrate to a predetermined position is performed. Therefore, the substrate can be efficiently reversed and transferred to a predetermined position.

  In the substrate reversing apparatus according to this aspect, the reversing mechanism further includes a support plate that supports the guide rail, and the guide plate is connected to the support plate via the guide rail, and the transfer mechanism May be configured to be coupled to the support plate.

  According to this configuration, since the transport mechanism is coupled to the support plate, the first suction unit or the second suction unit is connected to the support plate via the guide plate and the guide rail. Therefore, the suction part, the guide plate, the guide rail, and the support plate can be integrally transferred by the transport mechanism.

  In the substrate reversing device according to this aspect, each of the guide rail, the guide plate, and the support plate is divided into two parts, and the two divided guide rails are combined into a circular shape, and one is the Each of the two guide plates is supported by the two divided support plates so as to be arranged on the transfer position side, and the two divided guide plates are combined to form a circular shape with respect to the guide rail. The first suction part and the second suction part are respectively connected to the two divided guide plates, and are combined with each other so as to be rotatable with respect to a position deviating from the transfer position. Of the two divided support plates, the support plate is connected only to the support plate disposed on the transfer position side, is located on the transfer position side, and is connected to the guide rail and the guide plate via the guide plate. It may be configured to selectively transfer the suction portion connected to the holding plates.

  According to this configuration, even when the suction portion located at the transfer position is changed between the first suction portion and the second suction portion, the support plate located at the transfer position is divided into two support plates. Of these, it is always the same support plate. Therefore, even if the first suction part and the second suction part are integrally rotated halfway by the reversing mechanism and the suction part located at the transfer position is switched, the transport mechanism and the suction part are changed each time. There is no need to reconnect. That is, since it is only necessary to exchange the positions of the guide plate and the suction portion supported by the transportable support plate, the substrate can be efficiently reversed.

  In the substrate reversing apparatus according to this aspect, the reversing mechanism includes a guide rail connected to each of the first suction portion and the second suction portion, and the first suction portion guided by the guide rail. And a guide plate for integrally rotating the second suction portion halfway. The guide plate is connected to each of the first suction portion and the second suction portion via the guide rail, and the suction surface of the first suction portion and the suction surface of the second suction portion. Can be configured such that the guide rails are circular and the guide plate is relatively rotatable along the guide rails.

  According to this configuration, the first suction portion and the second suction portion can rotate along the guide plate via the guide rail when the suction surfaces face each other. Therefore, in the same manner as described above, at the same time as the inversion of the substrate, the first suction unit and the second suction unit are integrally rotated by half, and the positions of the first suction unit and the second suction unit can be switched. it can.

  In the substrate reversing device according to this aspect, the reversing mechanism further includes a support plate that supports the guide plate, and the guide rail is connected to the support plate via the guide plate, and the transport mechanism May be configured to be coupled to the support plate.

  According to this structure, the 1st adsorption | suction part or the 2nd adsorption | suction part is connected to a support plate via a guide plate and a guide rail. Therefore, the suction part, the guide plate, the guide rail, and the support plate can be integrally transferred by the transport mechanism.

  In the substrate reversing apparatus according to this aspect, the guide rail, the guide plate, and the support plate are each divided in two, and one of the divided guide plates is arranged on the transfer position side. Further, each of the guide rails is supported by the two divided support plates, and the two divided guide rails are combined into a circular shape between the transfer position and the position deviating from the transfer position with respect to the guide plate. The first suction part and the second suction part are respectively connected to the two divided guide rails, and the transport mechanism is a part of the two divided support plates. A suction portion connected to only the support plate disposed on the transfer position side and located on the transfer position side and connected to the support plate via the guide plate and the guide rail is selectively used. It may be configured to feed.

  According to this structure, the support plate located in a transfer position is always the same support plate among the support plates divided into two. Therefore, even if the first suction part and the second suction part are integrally rotated by half by the reversing mechanism and the suction part located at the transfer position is switched, the transport mechanism and the suction part are connected each time. There is no need to redo. That is, since it is only necessary to replace the positions of the guide rail and the suction portion with respect to the transferable support plate, the substrate can be efficiently reversed.

  As described above, according to the present invention, it is possible to provide a substrate reversing apparatus that can simplify the configuration of the apparatus and save space, and can efficiently perform the reversal of the substrate.

  The effects and significance of the present invention will become more apparent from the following description of embodiments. However, the embodiment described below is merely an example when the present invention is implemented, and the present invention is not limited to what is described in the following embodiment.

FIG. 1 is a perspective view illustrating an external configuration of a substrate reversing apparatus according to an embodiment. FIG. 2 is a perspective view for explaining a suction portion of the substrate reversing device according to the embodiment. FIG. 3A is an exploded perspective view of the suction plate of the substrate reversing device according to the embodiment. FIG. 3B is a partially enlarged view for explaining the drive mechanism of the suction unit of the substrate reversing apparatus according to the embodiment. 4A to 4C are schematic views illustrating a state in which the suction unit of the substrate reversing device according to the embodiment sucks the substrate. FIG. 5A to FIG. 5C are schematic views showing a state in which the suction unit of the substrate reversing device according to the embodiment sucks the substrate. 6A is a perspective view of the reversing mechanism on the transfer position side of the substrate reversing device according to the embodiment, and FIG. 6B is a perspective view of the reversing mechanism on the standby position side of the substrate reversing device according to the embodiment. FIG. FIG. 7 is a diagram illustrating a part of the reversing mechanism of the substrate reversing device according to the embodiment, and is an exploded perspective view. FIGS. 8A to 8D are schematic views for explaining the substrate reversing operation by the substrate reversing device according to the embodiment. FIGS. 9A to 9D are schematic views for explaining the reversal of the substrate by the substrate reversing apparatus according to the embodiment. FIG. 10 is a block diagram illustrating a configuration of the substrate reversing device according to the embodiment. FIG. 11 is a flowchart of the operation of the substrate reversing apparatus according to the embodiment. FIG. 12A is a front view illustrating a part of the configuration of the substrate reversing apparatus according to the embodiment. FIG. 12B is a front view illustrating a part of the configuration of the substrate reversing apparatus according to the first modification of the embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In each figure, an X axis, a Y axis, and a Z axis that are orthogonal to each other are added for convenience. The XY plane is parallel to the horizontal plane, and the Z-axis direction is the vertical direction. The Z-axis positive side is upward, and the Z-axis negative side is downward.

<Embodiment>
A brittle material substrate such as a glass substrate and a ceramic substrate, a resin substrate such as a PET (polyethylene terephthalate resin) substrate and a polyimide resin substrate (hereinafter simply referred to as “substrate”) is subjected to various treatments and becomes a final product. . Examples of such a process include a process of cutting the substrate into a predetermined number of dividing elements, a process of removing offcuts generated when the substrate is cut, and a process of cleaning the surface of the substrate. The substrate is transferred to a predetermined stage for each process, and when the process is completed, the substrate is transferred to another stage for the next process. The substrate reversing device 1 according to the embodiment is a device for reversing the substrate when the substrate F is transported from a predetermined stage to the next stage. For example, in the cutting step of cutting a multilayer substrate, when cutting from the upper surface side of the multilayer substrate first, after cutting the upper surface side, the surface that was the lower surface side is reversed to the upper surface side and then cut again. In such a case, it is necessary to invert the substrate. In such a case, the substrate is reversed by the substrate reversing device 1.

  Examples of substrate types include organic substrates (including films and sheets) such as polyimide resins, polyamide resins, polyester resins such as PET, polyolefin resins such as polyethylene and polypropylene, and resin substrates such as polystyrene resins and polyvinyl resins such as polyvinyl chloride. And the like), and there are inorganic substrates such as brittle material substrates such as glass substrates and ceramic substrates. When the substrate is a resin substrate, different substrates may be laminated, for example, a substrate obtained by laminating PET, polyimide resin, and PET in this order from the lower layer.

  The substrate F transported by the substrate reversing device 1 may be in a state of being divided into a plurality in a predetermined direction through a breaking process. Such a substrate F may be divided in a predetermined direction, and may be further divided perpendicularly to the predetermined direction, and the divided substrate F has a grid shape. In the thus-divided substrate F, the “predetermined direction” is the positive X-axis direction and coincides with the direction in which the substrate reversing device 1 transports the substrate F.

[Overall configuration of substrate reversing device]
FIG. 1 is a perspective view showing an external configuration of a substrate reversing apparatus 1 according to the embodiment. As shown in FIG. 1, the substrate reversing device 1 includes a suction unit 100, a reversing mechanism 200, and a transport mechanism 300.

  As described above, the substrate F to be reversed by the substrate reversing device 1 may be directly carried in from, for example, a cutting device that cuts from the upper surface side of the substrate F. In addition, the inverted substrate F may be carried out to the original apparatus or may be carried out to another apparatus. Alternatively, the substrate F may once be transferred from the apparatus to another place from a cutting apparatus or the like and then carried into the substrate reversing apparatus 1. Therefore, in the embodiment, an area on which the substrate is placed before being loaded into the substrate reversing apparatus 1 and after the substrate F is reversed is referred to as “substrate placing portion 2”. Further, in the substrate platform 2, the surface on which the substrate F is placed is referred to as “placement surface 2 a”.

  It is mounted on the mounting surface 2a of such a substrate mounting part 2. The substrate mounting part 2 is a member having a flat surface for mounting the substrate F, that is, a mounting surface, and may include, for example, a table or a belt conveyor. A large number of pores are formed in the substrate mounting unit 2, and the pressure applying unit 3 described below applies pressure to the substrate F through these pores.

  The pressure application unit 3 includes an air pressure source, is provided on the lower surface of the substrate platform 2, and applies pressure to the lower surface of the substrate F. The pressure applying unit 3 applies pressure to the lower surface of the substrate F through a large number of minute holes formed on the lower surface of the substrate mounting unit 2. When the pressure application unit 3 applies a negative pressure to the substrate F, the substrate F is attracted to the substrate platform 2 and the substrate F is in close contact with the substrate platform 2. On the other hand, when the pressure applying unit 3 does not apply a negative pressure to the substrate F, and when a positive pressure is applied, the substrate F and the substrate mounting unit 2 are not in the adsorbing state. It can be easily separated from the substrate platform 2.

  The suction unit 100 sucks the substrate F. The reversing mechanism 200 reverses the substrate F sucked by the sucking unit 100. The transport mechanism 300 transfers the suction unit 100 to a predetermined position.

  The substrate F to be reversed by the substrate reversing apparatus 1 according to the embodiment includes various substrates as described above. Here, when the substrate F is a resin substrate, air is interposed between the substrate F and the suction surface or the placement surface, such as when the substrate F is sucked or when the substrate F is placed, Prone to wrinkles. The substrate F having wrinkles affects the quality of the final product. Therefore, in the substrate reversing apparatus 1 according to the embodiment, it is assumed that the substrate F is a resin substrate. Further, as the adsorption unit, the adsorption unit 100 having a configuration capable of adsorbing such a substrate F without causing wrinkles is applied.

  As illustrated in FIG. 1, the adsorption unit 100 includes a first adsorption unit 110 and a second adsorption unit 160. The first adsorption unit 110 and the second adsorption unit 160 have the same configuration, and the adsorption surface of the first adsorption unit 110 and the adsorption surface of the second adsorption unit 160 are opposed to each other. Be placed. Hereinafter, the description will be given focusing on the first suction unit 110 disposed above in FIG.

  FIG. 2 is a perspective view for explaining the suction unit 100 of the substrate reversing apparatus 1 according to the embodiment, specifically, a perspective view of the first suction unit 110. FIG. 3A is an exploded perspective view of the suction plate 120 of the substrate reversing apparatus 1 according to the embodiment. FIG. 3B is a partially enlarged view for explaining the drive mechanism 130 of the suction unit 100 of the substrate reversing apparatus 1 according to the embodiment.

  As shown in FIG. 2, the first suction unit 110 includes a suction plate 120 and a drive mechanism 130. The suction plate 120 is a member that actually sucks the substrate F, and includes a plurality of members as will be described below. The drive mechanism 130 drives the suction plate 120 to approach and separate from the substrate F.

  As shown in FIG. 3A, the suction plate 120 includes a plate 121, a base 124, and a suction member 125, which are stacked in this order from the top. The plate 121 is provided with a drive mechanism 130 on the upper surface. The plate 121 is not particularly limited as long as it is a material having a predetermined strength and flexibility. In the embodiment, the plate 121 is aluminum. The plate 121 has a rectangular shape with the long side in the X-axis direction. The plate 121 has a plurality of small holes 122 formed therein, and pipes (not shown) are connected to the holes 122.

  The base 124 is a stainless steel having a number of minute holes and a thickness of about 1 mm. The suction member 125 contacts the substrate F. The adsorbing member 125 is not particularly limited as long as it is made of a material that does not damage the surface of the substrate F and is a porous member. Examples of such a material include foamed materials such as foamed plastic and foamed rubber having open cells, and sponges. In the embodiment, the adsorption member 125 is a sponge. The “adsorption surface of the first adsorption unit 110” refers to the adsorption surface of the adsorption member 125. The same applies to the suction surface of the second suction unit 160.

  When the suction plate 120 sucks the substrate F, air sent from an air pressure source (not shown) passes through the above-described piping, and air pressure is applied to the suction member 125 through a number of holes formed in the base 124. .

  The suction plate 120 sucks the entire upper surface of the substrate F. Therefore, the plate 121, the base 124, and the suction member 125 constituting the suction plate 120 are at least larger than the upper surface of the substrate F. The plate 121 is formed by arranging rectangular plates 123 having long sides in the Y-axis direction in the X-axis direction. In the embodiment, the plate 121 is formed of 27 plates 123 and arranged in a slat-like shape. Then, the suction plate 120 is divided into a plurality of regions with an appropriate number of plates 123 as one set. In the embodiment, three plates 123 form one set, and are divided into nine regions 120A to 120I in order from the X-axis negative side. FIG. 3A shows a part of the regions 120A to 120I. In a region excluding the region 120E located at the center of the suction plate 120, a drive unit 140 or the like constituting the drive mechanism 130 is provided. A central shaft 126 is provided in the region 120E. Next, the drive mechanism 130 will be described.

  The drive mechanism 130 includes a plurality of drive units 140 and drives the suction plate 120 to approach and separate from the substrate F. Each of the plurality of drive units 140 is provided with a first stopper 131, a second stopper 132, a moving member 133, and a support unit 150. That is, the drive mechanism 130 is a drive body that includes the drive section 140, the first stopper 131, the second stopper 132, the moving member 133, and the support section 150, and a plurality of such drive bodies are provided. Configured. Therefore, the above-described set centering on the drive unit 140 is referred to as a “drive body”. Specifically, the drive unit 140 is an air cylinder. Hereinafter, the “drive unit 140” is referred to as an “air cylinder 140”.

  Next, the driving body will be described with reference to FIG. FIG. 3B is an enlarged view of the driving body provided in the region 120A. The air cylinder 140 includes a main body 141, a piston rod 142 accommodated in the main body 141, an outer cylinder 143 that guides the piston rod 142, a connecting member 144 provided in a lower portion of the main body 141, and a connection provided in the main body 141. Part 145. The connecting member 144 has a hole 144a formed in the Y-axis direction.

  The support unit 150 includes a support shaft 151, four shafts 152, two support members 153, a lower plate 154, an upper plate 155, and two columns 156. Two four shafts 152 are provided on each of the Y-axis negative side and the positive side, and the lower end surface of each shaft 152 is fixed to the plate 102. Each of the two support members 153 has two holes 153a formed in the Z-axis direction, and each shaft 152 is passed through each hole 153a. The two support members 153 have holes 153b formed in the Y-axis direction.

  The support shaft 151 is a shaft that rotatably supports the air cylinder 140, is parallel to the suction plate 120, that is, the Y-axis direction of the plate 121, and is provided in a direction perpendicular to the plate 121. The support shaft 151 is passed through the hole 153b of the support member 153 on the Y-axis negative side, the hole 144a of the connecting member 144, and the hole 153b of the support member 153 on the Y-axis positive side. The two moving members 133 each have a hole 133a in the Y-axis direction. In the above-described support shaft 151, the hole 133a of the moving member 133 is passed through the support shaft 151 from the Y axis positive side, and the hole 133a of the moving member 133 is passed through the support shaft 151 from the Y axis negative side. As described above, since the connecting member 144 is provided in the lower portion of the main body 141 of the air cylinder 140, the support shaft 151 is connected to the air cylinder 140 and the support portion 150 so as to be rotatable.

  The lower plate 154 has a rectangular hole 154a formed in the center portion, and the lower plate 154 is placed on and connected to the upper end surfaces of the four shafts 152 so that the hole 154a surrounds the main body 141. The lower plate 154 is provided with columns 156 on the Y-axis negative side and the positive side through holes 154a, and the upper plate 155 is connected to the upper end surface of each column 156. Here, the upper plate 155 is formed with a hole 155a in the center, and the outer cylinder 143 is passed through the hole 155a.

  The two moving members 133 are each provided with a slider 134 at the top. The slider 134 fits into a groove formed on the lower surface of the frame 4 and allows the moving member 133 to slide in the X-axis direction. The moving member 133 is connected to the support portion 150 and the air cylinder 140 via the support shaft 151. Therefore, when the moving member 133 slides in the X axis direction, the air cylinder 140 and the support portion 150 also slide in the X axis direction.

  Two first stoppers 131 are provided for each driver, and are provided below the two support members 153 so as not to contact the shaft 152 passing through the support members 153 in the Z-axis direction. The second stopper 132 is connected to the frame 4 so as to be positioned closer to the central portion of the first suction portion 110 with respect to the moving member 133 provided on the Y axis positive side, that is, closer to the central shaft 126. The

  The drive body centering on the drive part 140 comprised as mentioned above drives as follows. When positive pressure is applied to the air cylinder 140 from an air pressure source (not shown), the piston rod 142 moves upward while being guided by the outer cylinder 143. At this time, the four shafts 152 also move upward while sliding through the holes 153a in accordance with the movement of the piston rod 142. Since the four shafts 152 are connected to the suction plate 120, that is, the region 120A, when the shaft 152 moves upward, the region 120A also rises. In this way, the region 120A moves upward, but the moving distance is restricted by the first stopper 131.

  The above-described configuration is the same in all the driving bodies shown in FIGS. However, the size of the first stopper 131 differs for each region where the air cylinder 140 is provided. The first stoppers 131 provided in the regions 120A to 120D are provided in the support members 153 so that the moving distance becomes longer in order from the region 120D to the region 120A when the suction plate 120 is raised. Therefore, when positive pressure is applied to each air cylinder 140 provided in each of the regions 120A to 120D and the regions 120A to 120D are raised, the regions 120A to 120D are deformed into a substantially arc shape that swells toward the substrate platform 2 side. To do.

  Further, when the regions 120A to 120D move upward, the regions 120A to 120D are inclined toward the X-axis negative side while the air cylinders 140 are rotated. Accordingly, the regions 120A to 120D are deformed into a smooth arc shape that swells toward the substrate platform 2 side. At this time, the inclinations of the regions 120A to 120D are regulated by the second stoppers 132, respectively. Thereby, the shape of area | region 120A-120D can be set to the circular arc shape of a predetermined curvature.

  As shown in FIG. 2, the above four driving bodies are similarly provided on the Y axis negative side in the regions 120 </ b> A to 120 </ b> D. Further, the air cylinder 140 is provided at a symmetrical position in the X-axis direction around the region 120E where the central shaft 126 is provided in the XY plane. Therefore, as described above, when the regions 120A to 120D are deformed into an arc shape having a predetermined curvature, the regions 120F to 120I are similarly deformed, and the regions 120A to 120I are deformed into a semicircle.

  In the embodiment, the suction plate 120 is divided into the regions 120A to 120I, but is not limited to such a division. Depending on the size of the substrate F, the sizes of the plate 121, the base 124, and the suction member 125 constituting the suction plate 120 are appropriately adjusted. The plate 121 is formed of a plurality of plates 123, but the size and number of plates 123 to be used are also adjusted as appropriate. Further, the number of driving units 140 provided on the suction plate 120 may be adjusted according to the size of the substrate F.

  The adsorption | suction of the board | substrate F by the 1st adsorption | suction part 110 of the above structures is demonstrated based on Fig.4 (a)-FIG.5 (c). FIG. 4A to FIG. 5C are schematic views showing how the suction unit 100 of the substrate reversing apparatus 1 according to the embodiment sucks the substrate. Here, the adsorption unit 100 will be described as the first adsorption unit 110. Further, FIGS. 4A to 5C show cases when viewed from the Y axis positive side.

  When positive pressure is simultaneously applied to each air cylinder 140 from an air pressure source (not shown), each first piston rod 142 extends upward, and the regions 120A to 120I move upward. To do. However, the region 10E is excluded because the air cylinder 140 is not provided. The moving distance of each region is regulated by each first stopper 131. At this time, each air cylinder 140 is inclined in the direction opposite to the central shaft 126 around each support shaft 151. For this reason, each moving member 133 slides toward the central shaft 126. Further, the moving distance of each moving member 133 is regulated by the second stopper 132. Thereby, as shown to Fig.4 (a), area | region 120A-120I deform | transforms into the smooth circular arc shape which has a predetermined curvature. In this state, the first suction unit 110 approaches so that the region 120E first contacts the substrate F.

  As shown in FIG. 4B, when the negative pressure is simultaneously applied to the air cylinders 140 in order to overlap the first suction unit 110 with the substrate F, the piston rod 142 moves downward. The distance between each first stopper 131 and the substrate F provided in each region is in order from the central portion of the suction plate 120 to both end portions. Therefore, it contacts the substrate F in order from the region 120E to the region 120A and from the region 120E to the region 120I. As a result, the air interposed between the substrate F and the first suction unit 110 is expelled from the central portion of the substrate F to both ends, and between the substrate F and the first suction unit 110. The first suction unit 110 overlaps the substrate F in a state where no air is present. In this state, air pressure is applied to the first suction unit 110 and suction of the substrate F is started.

  As shown in FIG. 4C, positive pressure is simultaneously applied to the air cylinders 140, so that the first suction unit 110 is deformed into a smooth arc shape. The substrate F is transferred to the reversing mechanism 200 by the transport mechanism 300.

  As shown in FIG. 5A, when the substrate F is transferred to the reversing mechanism 200, the substrate F is placed so that the central portion first comes into contact with the suction surface of the second suction unit 160. At this time, similarly to the case of FIG. 4B, negative pressure is simultaneously applied to the air cylinders 140, the piston rod 142 moves downward, and the substrate F is moved from the central portion to both end portions in order. It approaches the suction surface of the suction part 160. Then, as shown in FIG. 5B, when the substrate F is placed on the suction surface of the second suction unit 160, the substrate F is reversed.

  After the substrate F is reversed, the substrate F is adsorbed by the second adsorption unit 160 as shown in FIG. Then, positive pressure is applied to the air cylinders 140 of the second suction unit 160 all at once, and the second suction unit 160 rises in order from the region 120A to the region 120E and from the region 120I to the region 120E. Deforms into an arc of curvature. The second suction unit 160 is transferred to a predetermined position by the transport mechanism 300 and places the substrate F thereon. This is the same as the case shown in FIGS. 4 (a) and 4 (b). In this way, the substrate F is adsorbed by the adsorption unit 100.

  As described above, the first suction unit 110 and the second suction unit 160 have the same configuration. In the above description, it has been described that the first suction unit 110 is positioned above the second suction unit 160. However, the first suction unit 110 and the second suction unit 160 simultaneously with the inversion of the substrate F. Are rotated halfway together, and the second suction portion 160 is positioned above. Thus, every time the substrate F rotates, the upper and lower positions of the first suction unit 110 and the second suction unit 160 are switched. Then, the suction unit located on the upper side transfers the substrate F to the reversing mechanism 200 or transfers the substrate F after the reversal to a predetermined position. Here, the position where the substrate F is placed in the reversing mechanism 200 of the substrate reversing apparatus 1 is referred to as a “transfer position 200a”. On the other hand, in the reversing mechanism 200, the position deviated from the transfer position 200a is referred to as “non-transfer position 200b”.

  Next, the reversing mechanism 200 will be described. FIG. 6A is a perspective view of the transfer position 200a side in the reversing mechanism 200 of the substrate reversing device 1 according to the embodiment, and FIG. 6B is the reversing mechanism 200 of the substrate reversing device 1 according to the embodiment. It is a perspective view by the side of the non-transfer position 200b. FIG. 7 is an exploded perspective view of a main part of the reversing mechanism 200 of the substrate reversing apparatus 1 according to the embodiment. The reversing mechanism 200 is provided on each of the X-axis negative side and the positive side.

  As shown in FIG. 6A, the reversing mechanism 200 at the transfer position 200a includes a guide rail 210 and a support plate 220. As shown in FIG. 6B, the reversing mechanism 200 at the non-transfer position 200 b includes a guide rail 211 and a support plate 221. The guide rail and the support plate are the same as members only in the positions where they are provided. The reversing mechanism 200 includes a gear 201 and a cover 202.

  Further, as shown in FIG. 7, the reversing mechanism 200 includes a gear 203, and on the transfer position 200a side, a guide plate 230, a connection plate 240, a connection member 250, a first base 260, and a second base plate. A base 270. The non-transfer position 200 b includes a connection plate 241, a connection member 251, a first base 261, and a second base 271. Among these, the guide plate, the connection plate, the connection member, the first base, and the second base are provided symmetrically with respect to the Y axis in the Z-Y axis plane, respectively, and the Z axis negative side and positive side members Can be combined. That is, it can be said that the guide plate, the connection plate, the connection member, the first base, and the second base are each arranged by dividing one member into two parts. In particular, the guide rails 210 and 211 are semicircular members, and form a circular shape when combined with each other. The guide rail 210 is attached to the support plate 220.

  The connection plate 240 is connected to the guide plate 230. A plurality of rotating members 232 are provided on the guide plate 230. This rotating member 232 fits into the groove 212 of the guide rail 210. As described above, the guide rail 210 has a semicircular shape. Therefore, the rotating member 232 is arranged in a semicircular shape along the groove 212 of the guide rail 210 in the guide plate 230. In addition, the shape of the guide plate 230 is a semicircular shape in FIG. 7, but it is sufficient that the rotating member 232 is arranged in a semicircular shape in accordance with the guide rail 210, and the guide plate 230 itself is a rectangular shape. It doesn't matter. Further, the rotating member 232 is a cam follower. Therefore, the groove 212 of the guide rails 210 and 211 can be smoothly rotated.

  The gear 203 fits into a circular hole 201a formed in the central portion of the gear 201. Rectangular holes 201b are formed on the positive and negative sides of the Y axis with the hole 201a interposed therebetween. There are two second bases 270 and 271, respectively, and a recess 272 is formed. Other than the recess 272 of the second bases 270 and 271 fit into the hole 201b. The first bases 260 and 261 are attached to the respective recesses 272 of the second bases 270 and 271. At this time, the first bases 260 and 261 contact the gear 201. There are two connection members 250 and 251 each having a protrusion 252 and a shaft 253. The protrusions 252 of the connection members 250 and 251 are passed through holes 233 formed in the guide plate 230 and the guide plate 231, respectively. The shaft 253 abuts on the first bases 260 and 261.

  In the configuration described above, the two recesses 242 of the connection plate 240 are connected to the frame 4 of the first suction unit 110. Specifically, as shown in FIG. 2, both ends of the Y-axis negative side and the positive side of the frame 4 provided in the first suction unit 110 are connected to the recess 242. For this reason, the guide plate 230, the connection plate 240, and the connection member 250 are connected to the first suction unit 110. The same applies to the second suction unit 160.

  Due to such a configuration, when the gear 201 and the gear 203 rotate, the rotating member 232 of the guide plate 230 moves along the groove 212 of the guide rail 210, so that the guide plate 230 also moves. The gear 201 can be driven by a motor. Alternatively, a rack may be provided under the gear 201, and a so-called rack and pinion may be formed and driven. FIG. 1 and FIG. 6B show the case where this rack and pinion is provided.

  Moreover, the guide rails 210 and 211 form a circular shape. Since the rotating members 232 of the guide plates 230 and 231 move while fitting the respective grooves of the guide rails 210 and 211, the guide plates 230 and 231 can rotate with respect to the guide rails 210 and 211. Therefore, the 1st adsorption | suction part 110 connected via the connection board 240 becomes rotatable. As described above, among the constituent members of the reversing mechanism 200, the guide plate 230, the connection plate 240, and the connection member 250 rotate together with the first suction unit 110. The same applies to the guide plate 231, the connection plate 241, and the connection member 251.

  As illustrated in FIG. 1, the transport mechanism 300 includes an elevating member 310, a rail 320, and a slider 330. The elevating member 310 is connected to the support plate 220 of the reversing mechanism 200. As described above, among the constituent members of the reversing mechanism 200, the guide plate 230, the connection plate 240, and the connection member 250 are rotatable. On the other hand, the support plate 220 does not rotate. That is, the support plates 220 and 221 provided at the transfer position 200a side and the non-transfer position 200b are fixed at the positions. Therefore, the support plate connected to the elevating member 310 of the transport mechanism 300 is the support plate 220 disposed on the transfer position 200a side. Therefore, for example, when the transport mechanism 300 transfers the first suction unit 110, the first suction unit 110 is connected to the connection plate 240, and the connection plate 240 is connected to the guide plate 230. Further, since the guide rail 210 is connected to the support plate 220, the guide rail 210, the guide plate 230, the connection plate 240, the support plate 220, and the connection including the first suction part 110 located at the transfer position 200a are also included. The whole member 250 is transferred.

  Next, the reversing operation of the substrate F by the substrate reversing device 1 will be described with reference to FIGS. 8 (a) to 9 (d). FIGS. 8A to 8D and FIGS. 9A to 9D are schematic views for explaining the inversion operation of the substrate F by the substrate inversion apparatus 1 according to the embodiment. The substrate F is adsorbed and transferred in a curved state by the adsorbing unit 100. In FIGS. 8A to 9D, the curved state is not shown. Further, FIGS. 8A to 9D show a case where the substrate F placed on the placement surface 2a is transferred and reversed, and again transferred to the placement surface 2a. Furthermore, in order to make it easy to understand before and after the reversal of the substrate F, the upper surface side of the substrate F first placed on the placement surface 2a is shown in black.

  As shown in FIG. 8A, when the first suction unit 110 is arranged at the transfer position 200a and the second suction unit 160 is arranged at the non-transfer position 200b, as shown in FIG. The first adsorption unit 110 is transferred to the placement surface 2 a on which the substrate F is placed, by the slider 330 slidingly moving on the rail 320. As shown in FIG. 8C, the first suction unit 110 sucks the substrate F and is transferred from the placement surface 2a to the reversing mechanism 200, that is, the transfer position 200a, as shown in FIG. 8D.

  As shown in FIG. 9A, in the reversing mechanism 200, the suction surface of the first suction unit 110 and the suction surface of the second suction unit 160 are arranged to face each other with the substrate F interposed therebetween. In this state, as shown in FIG. 9B, the first suction unit 110, the substrate F, and the second suction unit 160 are integrally rotated by half. At this time, the guide plate 230, the connection plate 240, and the connection member 250 connected to the first suction unit 110 rotate together with the first suction unit 110. Similarly, in the second suction part 160, the guide plate 231, the connection plate 241 and the connection member 251 connected to the second suction part 160 rotate together with the second suction part 160. Thereby, the position of the 1st adsorption | suction part 110 and the 2nd adsorption | suction part 160 interchanges. Then, the adsorption of the substrate F by the first adsorption unit 110 is released, and the second adsorption unit 160 newly located at the transfer position 200a adsorbs the substrate F.

  As shown in FIG. 9C, the second suction unit 160 is transferred to the placement surface 2 a by the transport mechanism 300. After placing the substrate F on the placement surface 2a, as shown in FIG. 9D, the second suction unit 160 returns to the reversing mechanism 200, that is, the transfer position 200a.

  In the above description, the case where the substrate F placed on the placement surface 2a is transferred, reversed, and transferred again to the placement surface 2a has been described, but FIG. 8A and FIG. In d), the place where the substrate F is placed may be different. For example, the path | route in which the board | substrate F carried in from the cutting device is reversed and conveyed to another apparatus may be sufficient.

[Operation of substrate reversing device]
Next, the operation of the substrate reversing device 1 will be described. FIG. 10 is a block diagram illustrating a configuration of the substrate reversing device 1. As shown in FIG. 10, the substrate reversing device 1 includes a substrate placing unit 2, a pressure applying unit 3, a first suction unit 110, a second suction unit 160, an air cylinder 140, and a reversing mechanism 200. And a transport mechanism 300, and further includes a drive flow rate adjustment valve 10, an adsorption flow rate adjustment valve 20, an input unit 30, a detection unit 40, a motor 50, and a control unit 60.

  The input unit 30 receives the number of substrates F transferred by the substrate reversing device 1. The detection unit 40 detects a position when the suction unit 100 of the substrate reversing device 1 approaches and separates from the substrate F. Further, the position of the substrate F being transferred by the transport mechanism 300 may be detected. The detection unit 40 can use, for example, a sensor, an imaging device, or the like. The motor 50 drives the transport mechanism 300.

  The control unit 60 includes an arithmetic processing circuit such as a CPU and a memory such as a ROM, a RAM, and a hard disk. The control unit 60 controls each unit according to a program stored in the memory.

  The substrate reversing device 1 also includes a driving flow rate adjustment valve 10 and an adsorption flow rate adjustment valve 20. The driving flow rate adjusting valve 10 is a valve that switches between a negative pressure and a positive pressure with respect to the air cylinder 140. The driving flow rate adjusting valve 10 is provided in a connection portion 145 provided in the main body 141 of the air cylinder 140, and is a so-called speed controller. The adsorption flow rate adjustment valve 20 is a valve that switches between a negative pressure and a positive pressure with respect to the adsorption unit 100. The adsorption flow control valve 20 is provided in a pipe (not shown) connected to a plurality of small holes 122 formed in the plate 121.

  FIG. 11 is a flowchart showing the operation of the substrate reversing apparatus 1 according to the embodiment. This control is executed by the control unit 60 shown in FIG. In the flowchart of FIG. 11, the state of the substrate reversing apparatus 1 at the “start” is a state in which the suction surface of the first suction unit 110 and the suction surface of the second suction unit 160 are arranged to face each other. This is shown in FIG. Further, the control unit 60 may cause the pressure applying unit 3 to apply a negative pressure to the substrate platform 2. In this case, since the substrate F is adsorbed by the substrate mounting unit 2, it does not deviate from the place where it is mounted until it is adsorbed by the first adsorption unit 110.

  In step S11, the control unit 60 drives the motor 50 to cause the transport mechanism 300 to transfer the first suction unit 110 to the placement surface 2a. The operation in step S11 is shown in FIG.

  In step S12, the first suction unit 110 sucks the substrate F. At this time, the control unit 60 switches the driving flow rate adjustment valve 10 in order to apply a positive pressure from the air pressure source to each air cylinder 140. Thereby, the suction plate 120 of the first suction unit 110 is deformed into an arc shape having a predetermined curvature. In this state, the first suction unit 110 is brought close to the substrate F. The control unit 60 switches the driving flow rate adjusting valve 10 to apply a negative pressure from the air pressure source to each air cylinder 140. Thereby, the suction plate 120 of the first suction unit 110 overlaps the substrate F. This operation is shown in FIG.

  When the first suction unit 110 overlaps the substrate F, the control unit 60 causes the pressure applying unit 3 to apply a positive pressure to the substrate mounting unit 2. Alternatively, when the control unit 60 causes the pressure applying unit 3 to apply a negative pressure to the substrate mounting unit 2, the control may be performed only to cause the pressure applying unit 3 to release the negative pressure. Thereby, since the substrate F is not in a state of being adsorbed to the substrate platform 2, it is easily separated from the substrate platform 2. Further, the control unit 60 switches the adsorption flow rate adjusting valve 20 in order to apply a negative pressure from the air pressure source to the first adsorption unit 110. Thereby, the first suction unit 110 sucks the substrate F. This is illustrated in FIGS. 4 (b) and 8 (c).

  In step S13, the control unit 60 drives the motor 50 to cause the transport mechanism 300 to transfer the first suction unit 110 to the reversing mechanism 200, that is, the transfer position 200a. The operation in step S13 is shown in FIG. 8 (d) and FIG. 9 (a).

  In step S <b> 14, the controller 60 causes the reversing mechanism 200 to reverse the substrate F. At this time, the first suction unit 110 and the second suction unit 160 rotate together with the substrate F halfway. Step S14 is shown in FIG.

  In step S <b> 14, the control unit 60 causes the second suction unit 160 to suck the substrate F. The control unit 60 causes the adsorption flow rate adjustment valve 20 to switch the negative pressure from the air pressure source from the first adsorption unit 110 to the second adsorption unit 160.

  In step S15, the control unit 60 drives the motor 50 to cause the transport mechanism 300 to transfer the second suction unit 160 to the placement surface 2a. This is illustrated in FIG. At this time, the control unit 60 switches the driving flow rate adjustment valve 10 in order to apply a positive pressure from the air pressure source to each air cylinder 140. As a result, the suction plate 120 of the second suction unit 160 is deformed into an arc shape having a predetermined curvature. This is illustrated in FIG. 4 (c).

  In step S <b> 16, the control unit 60 switches the driving flow rate adjustment valve 10 in order to apply a negative pressure from the air pressure source to each air cylinder 140. As a result, the substrate F is placed on the substrate platform 2. This is shown in FIGS. 5 (a) to 5 (c) and FIG. 9 (d).

  In step S17, it is determined whether or not the substrate F is to be continuously reversed. If there is no substrate F to be reversed, the reversal of the substrate F is completed. When the reversal of the substrate F is continued, steps S11 to S16 are repeated.

<Effect of embodiment>
According to the embodiment, the following effects are produced.

  As shown in FIG. 3A, the plate 121 included in the suction unit 100 includes a plurality of plates 102 arranged in the X-axis direction. At this time, the plurality of plates 123 are arranged in a sawtooth shape, and each plate 123 can be folded. For this reason, by moving each plate 123 to a predetermined position, that is, approaching and separating from the substrate F, the suction unit 100 can be deformed into a smooth arc shape.

  The substrate reversing device 1 is provided with a base 124 in which a large number of minute holes are formed. For this reason, the air pressure applied to the suction member 125 is transmitted to the suction member 125 through these many holes and diffuses over the entire surface of the suction member 125. Therefore, the adsorption member 125, that is, the adsorption unit 100 can adsorb the substrate F with a uniform air pressure.

  As shown in FIGS. 4A to 5C, the suction unit 100 approaches the substrate F in order from the center to both ends. Thus, when the suction unit 100 overlaps the substrate F, the air interposed between the suction unit 100 and the substrate F is expelled from the portion where the suction unit 100 contacts to both ends of the substrate F. Therefore, no air pool is generated between the substrate F and the suction unit 100. As a result, no wrinkles occur on the substrate F, and the substrate F can be smoothly transported in a good state.

  Further, when the substrate F is transferred and placed on the placement surface 2a, the substrate F approaches the substrate placement portion 2 in order from the center to both ends, and the substrate F and the substrate placement portion 2 overlap. . At this time, the substrate F can be placed on the substrate platform 2 without interposing air between the substrate F and the substrate platform 2. Therefore, no air pool is generated between the substrate F and the substrate platform 2. Thereby, a wrinkle does not arise in the board | substrate F but the board | substrate F can be mounted in the mounting surface 2a in a favorable state. Furthermore, even if the substrate F is wrinkled, the substrate F can be placed again without wrinkles.

  As shown in FIG. 3 (a), the first stopper 131 provided for each air cylinder 140 includes the first stopper 131 and the substrate F in order from the region 10E to the region 120A and from the region 10E to the region 10I. A distance is provided. As a result, when positive pressure is applied to each air cylinder 140, each region is displaced so that the distance from the substrate F increases from the center to both ends of the substrate F due to the restriction by the first stopper 131. be able to. Thereby, the adsorption | suction part 100 can be deform | transformed in the substantially circular arc shape which swells to the board | substrate F side from both ends toward the center part. Therefore, when adsorbing the substrate F, the substrate F can be stacked on the substrate F in order from the center to both ends.

  A second stopper 132 is provided for each air cylinder 140. Thereby, when the adsorption | suction part 100 leaves | separates with respect to the board | substrate F, the inclination of each area | region of the adsorption | suction part 100 can be adjusted. Therefore, the shape of the suction part 100 can be set to an arc shape with a predetermined curvature. As a result, the suction unit 100 can be stacked on the substrate F so that wrinkles do not occur on the substrate F. Moreover, the board | substrate F can be mounted in the mounting surface 2a in a favorable state.

  As shown in FIG. 1, the lifting member 310 of the transport mechanism 300 is connected only to the support plate 220 at the transfer position 200 a of the reversing mechanism 200. For this reason, the 1st adsorption | suction part 110 or the 2nd adsorption | suction part 160 can be selectively transferred. Therefore, the adsorption unit 100 itself also serves as a transfer, and the apparatus can be simplified.

  As shown in FIGS. 8A to 9D, the suction unit 100 that sucks the substrate F is replaced at the same time as the substrate F is reversed. For example, after the substrate F is inverted, the troublesome operation of temporarily moving the substrate F to another place and adsorbing it by another adsorption unit is not performed, so that the substrate F can be efficiently inverted. it can. In addition, since the position where the substrate F is reversed and the position where the suction unit 100 is replaced are the same, the space of the apparatus can be saved.

  Further, when the transport mechanism 300 transports the suction unit 100 so as to reciprocate between the transport position 200a and the placement surface 2a, since the transport path is one, it is possible to prevent the apparatus from becoming large.

  As illustrated in FIG. 7, the reversing mechanism 200 can exchange the positions of the first suction unit 110 and the second suction unit 160 simply by rotating the guide plates 230 and 231. That is, even when the suction unit 100 located at the transfer position 200a is alternated between the first suction unit 110 and the second suction unit 160, the support plate located at the transfer position 200a is divided into two parts. Of the plates 220, they are always the same support plate. Therefore, even if the first suction unit 110 and the second suction unit 160 are integrally rotated halfway by the reversing mechanism 200 and the suction unit 100 located at the transfer position 200a is replaced, the transport mechanism There is no need to redo the connection between 300 and the suction unit 100. That is, since it is only necessary to replace the guide plates 230 and 231 and the suction unit 100 with respect to the support plate 220, the substrate F can be reversed efficiently.

<Example of change of embodiment>
(1) Configuration of Reversing Mechanism FIG. 12A is a front view showing a part of the configuration of the substrate reversing device according to the embodiment. FIG. 12B is a front view illustrating a part of the configuration of the substrate reversing apparatus according to the first modification of the embodiment. Here, the front view is a view seen from the X axis positive side. In the substrate reversing apparatus 1 according to the above-described embodiment, as shown in FIG. 12A, guide rails 210 and 211 are supported by the support plates 220 and 221, respectively, and the guide plates 230 and 231 are the suction unit 100. It was the structure which carried out the half rotation in the state connected to each of these.

  On the other hand, in the modified example of the embodiment, the guide rails 210 and 211 are connected to the suction unit 100, respectively. Specifically, as shown in FIG. 12B, the guide plate 230 is attached to the support plate 220 on the transfer position 200a side. The guide rail 210 is connected to the suction unit 100 via the connection plate 240. The rotating member 232 of the guide plate 230 is fitted into the groove 212 of the guide rail 210. The same applies to the non-transfer position 200b. With such a configuration, when the guide rail 210 is connected to the first suction portion 110 via the connection plate 240, the first suction portion 110 located at the transfer position 200a is guided by the guide rail 210. It rotates by rotating along the plate 230.

  As described above, the reversing mechanism 200 can exchange the positions of the first suction unit 110 and the second suction unit 160 only by rotating the guide rails 210 and 211. Therefore, since it is only necessary to replace the guide rails 210 and 211 and the suction part 100 with respect to the support plate 220, the substrate F can be reversed efficiently.

(2) In the case where the switching valve is provided In the substrate reversing device 1 according to the above embodiment, when the air cylinders 140 are driven, the movement of the piston rods 142 is controlled by the driving flow rate adjusting valve 10. Here, for example, when the movement of the piston rod 142 in any region becomes faster than a predetermined value and the region reaches the substrate F earlier than the adjacent region, the suction unit 100 swells toward the substrate F side. It is deformed into a wavy shape instead of an arc shape. In such a case, air intervening between the substrate F and the suction unit 100 cannot be expelled, and an air pool is generated between the substrate F and the suction unit 100, which may cause wrinkles in the substrate F.

  Therefore, the substrate reversing apparatus 1 according to the modified example of the embodiment further includes a switching valve (not shown). When air pressure is applied to the adjacent air cylinder 140 by the switching valve, the switch of the switching valve is switched and air pressure is applied to the next air cylinder 140.

  Specifically, when the suction unit 100 moves upward, a positive pressure is applied to each air cylinder 140. At this time, a positive pressure is not applied to the air cylinders 140 at the same time, but a positive pressure is applied to the air cylinders 140 in the adjacent regions in order from both ends of the suction unit 100 to the center. When the suction unit 100 is moved downward, a negative pressure is applied to the air cylinder 140 in the adjacent region in order from the center to both ends of the suction unit 100.

  As described above, by providing the switching valve in the substrate reversing apparatus 1, it is possible to control the timing at which air pressure is applied to the air cylinder 140. Therefore, the order in which each region of the suction unit 100 approaches and separates from the substrate F does not change, and is deformed into an arc shape with a predetermined curvature. Therefore, the suction unit 100 can overlap the substrate F so as not to cause air accumulation and can suck the substrate F. Thereby, wrinkles do not occur in the substrate F.

(3) When the first stopper and the second stopper are variable In the substrate reversing device 1 according to the embodiment, the distance between the first stopper 131 and the substrate F may be variable. . For example, the first stopper 131 may be fitted into the support portion 150 with a screw, and the distance between the first stopper 131 and the substrate F may be adjusted by the amount of fitting of the screw. As for the distance between the second stopper 132 and the moving member 133, for example, a plurality of screw holes are provided in the frame 4, an appropriate screw hole is selected, and the second stopper 132 is attached to the frame 4. With this configuration, the distance between the second stopper 132 and the moving member 133 can be changed.

  If comprised as mentioned above, it is effective when changing the predetermined curvature of the adsorption | suction part 100. In such a case, the distance between the first stopper 131 and the substrate F and the position of the second stopper 132 may be adjusted with screws, and the first stopper 131 and the second stopper 132 need not be replaced.

(4) When the drive unit is a motor The substrate reversing device 1 according to the embodiment can employ a motor instead of the air cylinder 140 as a drive unit that drives the suction unit 100. In this case, the motor cannot stop while maintaining the driving force. Therefore, when a motor is employed as the drive unit, it is necessary to generate pressure by combining an elastic member such as a spring with the motor.

  On the other hand, even if the movement of the air cylinder 140 according to the embodiment is restricted by the first stopper 131 in a state where a positive pressure is applied, the air cylinder 140 stops while maintaining the driving force (pressure). In addition, even when a negative pressure is applied to the air cylinder 140, when each region of the suction unit 100 hits the substrate F, the air cylinder 140 stops while maintaining the driving force (pressure). That is, the air cylinder 140 can smoothly position each region at the separation position and the contact position, and each region is defined on the substrate F in a state where it is regulated by the contact position, that is, the first stopper 131. Press properly with pressure.

  Therefore, the air cylinder 140 can smoothly position each region at the separation position and the contact position as compared with the motor, and the adsorption unit 100 can be effectively adsorbed to the substrate F.

DESCRIPTION OF SYMBOLS 1 ... Substrate inversion apparatus 100 ... Adsorption part 110 ... 1st adsorption part 160 ... 2nd adsorption part 200 ... Inversion mechanism 200a ... Transfer position 210, 211 ... Guide rail 220, 221 ... Support plate 230, 231 ... Guide plate 300 ... Conveying mechanism F ... Substrate

Claims (7)

A substrate reversing device for reversing a substrate,
A first adsorption part;
A second adsorption part;
A reversing mechanism that integrally rotates the first suction portion and the second suction portion in a half-rotation state in a state where the suction surface of the first suction portion and the suction surface of the second suction portion face each other;
A transport mechanism for selectively transferring the suction part positioned at the transfer position in the reversing mechanism among the first suction part and the second suction part;
A substrate reversing device. The substrate reversing apparatus according to claim 1,
The reversing mechanism is
A guide rail that integrally rotates the first suction part and the second suction part by half rotation;
A guide plate guided by the guide rail and connected to each of the first suction portion and the second suction portion;
The guide rail is connected to each of the first suction portion and the second suction portion via the guide plate,
When the suction surface of the first suction portion and the suction surface of the second suction portion face each other, the guide rail is circular, and the guide plate is rotatable along the guide rail. Become,
A substrate reversing device. The substrate reversing device according to claim 2,
The reversing mechanism further includes a support plate that supports the guide rail,
The guide plate is connected to the support plate via the guide rail,
The transport mechanism is coupled to the support plate;
A substrate reversing device. The substrate reversing apparatus according to claim 3,
The guide rail, the guide plate, and the support plate are each divided into two parts,
The two divided guide rails are combined to form a circle, and one is arranged on the transfer position side, and is supported by the two divided support plates, respectively.
The two divided guide plates are combined with each other so as to be rotatable between the transfer position and the position deviating from the transfer position with respect to the guide rail that has been combined into a circular shape.
Each of the first suction part and the second suction part is connected to the guide plate divided into two parts,
The transport mechanism is connected to only the support plate arranged on the transfer position side among the two divided support plates, is located on the transfer position side, and is supported by the guide rail and the guide plate. Selectively transfer the suction part connected to the plate,
A substrate reversing device. The substrate reversing apparatus according to claim 1,
The reversing mechanism is
A guide rail connected to each of the first suction part and the second suction part;
A guide plate that is guided by the guide rail and integrally rotates the first suction portion and the second suction portion halfway,
The guide plate is connected to each of the first suction part and the second suction part via the guide rail,
When the suction surface of the first suction portion and the suction surface of the second suction portion face each other, the guide rail is circular, and the guide plate is relatively moved along the guide rail. Can be rotated,
A substrate reversing device. The substrate reversing device according to claim 5, wherein
The reversing mechanism further includes a support plate that supports the guide plate,
The guide rail is connected to the support plate via the guide plate,
The transport mechanism is coupled to the support plate;
A substrate reversing device. The substrate reversing apparatus according to claim 6, wherein
The guide rail, the guide plate, and the support plate are each divided into two parts,
Each of the two divided guide plates is supported by the two divided support plates so that one is arranged on the transfer position side,
The two divided guide rails are combined into a circular shape, and are combined to be rotatable with respect to the guide plate between the transfer position and a position deviating from the transfer position,
Each of the first suction part and the second suction part is connected to the guide rail divided into two parts,
The transport mechanism is connected to only the support plate arranged on the transfer position side among the two divided support plates, and is located on the transfer position side, and supports the support plate via the guide plate and the guide rail. Selectively transfer the suction part connected to the plate,
A substrate reversing device.

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