JP2019114692A - 成膜方法 - Google Patents
成膜方法 Download PDFInfo
- Publication number
- JP2019114692A JP2019114692A JP2017247937A JP2017247937A JP2019114692A JP 2019114692 A JP2019114692 A JP 2019114692A JP 2017247937 A JP2017247937 A JP 2017247937A JP 2017247937 A JP2017247937 A JP 2017247937A JP 2019114692 A JP2019114692 A JP 2019114692A
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- Prior art keywords
- gas
- space
- plasma
- film forming
- wafer
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0338—Process specially adapted to improve the resolution of the mask
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C16/45525—Atomic layer deposition [ALD]
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- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C16/45536—Use of plasma, radiation or electromagnetic fields
- C23C16/4554—Plasma being used non-continuously in between ALD reactions
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Abstract
Description
このように、堆積膜を形成する第1の工程では、まず、前駆体の材料を含む第1のガスによって被処理基板のパターンの表面に前駆体を吸着させ、この後に、当該前駆体に対して第2のガスのプラズマを供給することによって、被処理基板のパターンの表面に堆積膜を形成する。従って、ALD法(ALD:Atomic Layer Deposition)と同様の方法によって被処理基板のパターンの表面に堆積膜を形成し得る。
このように、堆積膜を形成する工程aでは、まず、電子供与性の第1の置換基を含むガスa1によって被処理基板のパターンの表面に第1の置換基を吸着させ、この後に、当該第1の置換基に対して電子吸引性の第2の置換基を含むガスa2を供給することによって重合反応を生成し、この重合反応によって被処理基板のパターンの表面に堆積膜が形成され得る。
Claims (12)
- 被処理基板上に形成されたパターンに成膜する成膜方法であって、該被処理基板は減圧環境下においてプラズマ処理可能な空間に設けられた載置台に配置され、該空間には該載置台に対向しており高周波電力が供給可能な上部電極が配置され、該方法は、
前記被処理基板の前記パターンに堆積膜を形成する第1の工程と、
電力を前記上部電極にのみ供給して前記空間にプラズマを発生させることによって、該空間をクリーニングする第2の工程と、
を備えるシーケンを繰り返し実行する、
成膜方法。 - 前記第1の工程は、
前駆体の材料を含む第1のガスを前記空間に供給し、該前駆体を前記パターンの表面に吸着させる工程と、
第2のガスのプラズマを発生させて、該プラズマを前記前駆体に供給する工程と、
を備える、
請求項1に記載の成膜方法。 - 前記第1のガスは、アミノシラン系ガスである、
請求項2に記載の成膜方法。 - 前記第2のガスは、酸素または窒素を含有する、
請求項2に記載の成膜方法。 - 前記第2の工程では、前記空間に第3のガスのプラズマを発生させ、
前記第3のガスは、ハロゲン化合物を含有する、
請求項2に記載の成膜方法。 - 前記第1のガスのアミノシラン系ガスは、1〜3個のケイ素原子を有するアミノシランを含む、
請求項2に記載の成膜方法。 - 前記第1のガスのアミノシラン系ガスは、1〜3個のアミノ基を有するアミノシランを含む、
請求項2に記載の成膜方法。 - 前記第1のガスは、ハロゲン化タングステンを含有する、
請求項2に記載の成膜方法。 - 前記第1のガスは、四塩化チタンまたはテトラキスジメチルアミノチタンを含有する、
請求項2に記載の成膜方法。 - 前記第1のガスは、ハロゲン化ボロンを含有する、
請求項2に記載の成膜方法。 - 前記第1の工程は、
電子供与性の第1の置換基を含む第1のガスを前記空間に供給し、前記第1の置換基を前記パターンの表面に吸着させる工程と、
電子吸引性の第2の置換基を含む第2のガスを前記第1の置換基に供給する工程と、
を備える、
請求項1に記載の成膜方法。 - 前記第1の工程は、イソシアネートとアミンとの重合反応、または、イソシアネートと水酸基を有する化合物との重合反応によって、前記堆積膜を形成する、
請求項1に記載の成膜方法。
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JP2017247937A JP2019114692A (ja) | 2017-12-25 | 2017-12-25 | 成膜方法 |
TW107145547A TW201937596A (zh) | 2017-12-25 | 2018-12-18 | 成膜方法 |
CN201811580087.9A CN110004431A (zh) | 2017-12-25 | 2018-12-24 | 成膜方法 |
KR1020180168346A KR20190077238A (ko) | 2017-12-25 | 2018-12-24 | 성막 방법 |
US16/232,243 US20190198321A1 (en) | 2017-12-25 | 2018-12-26 | Film forming method |
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US11002063B2 (en) * | 2018-10-26 | 2021-05-11 | Graffiti Shield, Inc. | Anti-graffiti laminate with visual indicia |
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JP2008538127A (ja) * | 2005-03-21 | 2008-10-09 | 東京エレクトロン株式会社 | プラズマ加速原子層成膜のシステムおよび方法 |
JP2015124422A (ja) * | 2013-12-27 | 2015-07-06 | 株式会社日立国際電気 | 半導体装置の製造方法、プログラム、及び基板処理装置 |
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CN103035466B (zh) * | 2011-10-08 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种预清洗方法及等离子体设备 |
JP5750496B2 (ja) | 2013-12-11 | 2015-07-22 | 株式会社日立ハイテクノロジーズ | プラズマ処理方法 |
US9624578B2 (en) | 2014-09-30 | 2017-04-18 | Lam Research Corporation | Method for RF compensation in plasma assisted atomic layer deposition |
JP6462477B2 (ja) * | 2015-04-27 | 2019-01-30 | 東京エレクトロン株式会社 | 被処理体を処理する方法 |
JP6537473B2 (ja) | 2015-10-06 | 2019-07-03 | 東京エレクトロン株式会社 | 被処理体を処理する方法 |
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JP2015124422A (ja) * | 2013-12-27 | 2015-07-06 | 株式会社日立国際電気 | 半導体装置の製造方法、プログラム、及び基板処理装置 |
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