JP2019087605A - Substrate delivery system and substrate delivery method - Google Patents

Substrate delivery system and substrate delivery method Download PDF

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JP2019087605A
JP2019087605A JP2017213811A JP2017213811A JP2019087605A JP 2019087605 A JP2019087605 A JP 2019087605A JP 2017213811 A JP2017213811 A JP 2017213811A JP 2017213811 A JP2017213811 A JP 2017213811A JP 2019087605 A JP2019087605 A JP 2019087605A
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substrate
connecting member
setting
speed
moving speed
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JP6896588B2 (en
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稲垣 幸彦
Yukihiko Inagaki
幸彦 稲垣
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Screen Holdings Co Ltd
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Priority to CN201811284971.8A priority patent/CN109755156B/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract

To provide a substrate delivery system and a substrate delivery method capable of preventing a substrate from being scratched when being delivered between multiple lifting members and a support part, while improving throughput of substrate processing, and capable of restraining increase in manufacturing cost of the substrate.SOLUTION: A substrate is delivered between a support part S and multiple lift pins 31, by movement of a coupling member 32 in the vertical direction. In order to set the travel speed of the coupling member 32 at the time of delivering the substrate, a setting member 90 is placed on the support part S. In this state, the coupling member 32 ascends so that the setting member 90 on the support part S is delivered onto the multiple lift pins 31. A reference position is determined base on the value of a pressure applied from the multiple lift pins 31 to the setting member 90, and a speed limit range including the reference position is determined. Travel speed of the coupling member 32 is set so that the travel speed in the speed limit range becomes lower than the travel speed on the outside of the speed limit range.SELECTED DRAWING: Figure 1

Description

本発明は、支持部と複数の昇降部材との間で基板の受け渡しを行うための基板受渡システムおよび基板受渡方法に関する。   The present invention relates to a substrate delivery system and a substrate delivery method for delivering a substrate between a support portion and a plurality of elevating members.

半導体基板、液晶表示装置もしくは有機EL(Electro Luminescence)表示装置等のFPD(Flat Panel Display)用基板、光ディスク用基板、磁気ディスク用基板、光磁気ディスク用基板、フォトマスク用基板、セラミック基板または太陽電池用基板等の各種基板に熱処理を行うために、熱処理装置が用いられる。   Substrate for FPD (Flat Panel Display) such as semiconductor substrate, liquid crystal display device or organic EL (Electro Luminescence) display device, substrate for optical disk, substrate for magnetic disk, substrate for magneto-optical disk, substrate for photomask, substrate for ceramic, solar substrate A heat treatment apparatus is used to heat treat various substrates such as a battery substrate.

熱処理装置の一例として、特許文献1に記載された熱処理ユニットは、温調プレートと昇降装置とを含む。温調プレートの上面には複数の基板載置片が設けられている。昇降装置は、温調プレートに対して昇降可能に設けられた複数の基板昇降ピンを含む。   As an example of the heat treatment apparatus, the heat treatment unit described in Patent Document 1 includes a temperature control plate and a lifting device. A plurality of substrate mounting pieces are provided on the upper surface of the temperature control plate. The lifting and lowering apparatus includes a plurality of substrate lifting and lowering pins provided to be able to be lifted and lowered with respect to the temperature control plate.

その熱処理ユニットにおいては、複数の基板昇降ピンが温調プレートから上方に突出した状態で、搬送装置により送られる基板が複数の基板昇降ピンの上端部上に渡される。その後、複数の基板昇降ピンの上端部が複数の基板載置片の上端部よりも下方に位置するように、複数の基板昇降ピンが下降する。それにより、複数の基板昇降ピンにより支持された基板が温調プレートの複数の基板載置片上に渡される。この状態で、温調プレートにより基板に熱処理が施される。   In the heat treatment unit, in a state in which the plurality of substrate elevating pins project upward from the temperature control plate, the substrates fed by the transfer device are passed over the upper end portions of the plurality of substrate elevating pins. Thereafter, the plurality of substrate elevating pins are lowered such that the upper ends of the plurality of substrate elevating pins are positioned below the upper ends of the plurality of substrate mounting pieces. As a result, the substrates supported by the plurality of substrate elevating pins are passed over the plurality of substrate mounting pieces of the temperature control plate. In this state, the substrate is heat-treated by the temperature control plate.

熱処理が終了すると、複数の基板昇降ピンの上端部が複数の基板載置片の上端部よりも上方に位置するように、複数の基板昇降ピンが上昇する。それにより、複数の基板昇降ピンにより支持された熱処理後の基板が複数の基板昇降ピンの上端部により支持される。その後、熱処理後の基板は、搬送装置により受け取られ、他の処理部へ搬送される。   When the heat treatment is completed, the plurality of substrate elevating pins are raised such that the upper ends of the plurality of substrate elevating pins are positioned above the upper ends of the plurality of substrate mounting pieces. Thus, the heat-treated substrate supported by the plurality of substrate elevating pins is supported by the upper end portions of the plurality of substrate elevating pins. Thereafter, the heat-treated substrate is received by the transfer device and transferred to another processing unit.

特開2005−117007号公報JP 2005-117007 A

上記の熱処理ユニットにおいては、複数の基板昇降ピンの動作速度を高くすることにより、基板処理のスループットを向上させることができる。一方、複数の基板昇降ピンの動作速度が高いと、例えば複数の基板昇降ピンから複数の基板載置片上に基板が渡される際に、基板と複数の基板載置片との接触時の衝撃により基板に傷が発生する可能性がある。   In the above heat treatment unit, the throughput of substrate processing can be improved by increasing the operation speed of the plurality of substrate elevating pins. On the other hand, when the operation speed of the plurality of substrate elevating pins is high, for example, when a substrate is transferred from the plurality of substrate elevating pins onto the plurality of substrate mounting pieces, the impact is caused when the substrate and the plurality of substrate mounting pieces contact. The substrate may be scratched.

基板に傷が発生することを防止するために、基板と複数の基板載置片とが接触する直前で複数の基板昇降ピンの動作速度を低下させることが考えられる。しかしながら、熱処理ユニットごとに複数の基板昇降ピンと複数の基板載置片との間の位置関係に誤差が存在するため、基板と複数の基板載置片とが接触するときの複数の基板昇降ピンの位置を正確に把握することは難しい。   In order to prevent the substrate from being scratched, it is conceivable to reduce the operating speed of the plurality of substrate elevating pins immediately before the substrate and the plurality of substrate mounting pieces come in contact with each other. However, since there is an error in the positional relationship between the plurality of substrate elevating pins and the plurality of substrate mounting pieces for each heat treatment unit, the plurality of substrate elevating pins when the substrate and the plurality of substrate mounting pieces contact each other. It is difficult to know the exact position.

一方、複数の基板昇降ピンから複数の基板載置片へ渡された基板に実際に傷が発生したか否かを確認しながら移動速度を低下させるタイミングを調整する作業は、煩雑でかつ長時間を要する。そのため、基板の製造コストが増加する。   On the other hand, the operation of adjusting the timing to reduce the moving speed while checking whether the substrate actually passed from the plurality of substrate lift pins to the plurality of substrate placing pieces is scratched is complicated and takes a long time It takes Therefore, the manufacturing cost of the substrate is increased.

本発明の目的は、基板処理のスループットを向上させつつ複数の昇降部材と支持部との間の基板の受け渡し時に基板に傷が発生することを防止することが可能でかつ基板の製造コストの増加を抑制することが可能な基板受渡システムおよび基板受渡方法を提供することである。   An object of the present invention is to improve substrate processing throughput while preventing generation of scratches on a substrate at the time of delivery of a substrate between a plurality of lifting members and a support, and also to increase the manufacturing cost of the substrate A substrate delivery system and a substrate delivery method capable of suppressing

(1)第1の発明に係る基板受渡システムは、基板の処理時に基板の下面を支持するように構成された支持部と、基板の下面を支持可能な上端部をそれぞれ有する3以上の複数の昇降部材と、複数の昇降部材を連結するとともに支持部に対して上下方向に移動可能に構成された連結部材と、支持部と複数の昇降部材との間での基板の受け渡し時に、複数の昇降部材の上端部が支持部の上端部よりも上方の位置と支持部の上端部よりも下方の位置との間で移動するように、連結部材を移動させる受渡駆動部と、複数の昇降部材により支持可能に構成された設定部材と、設定部材が複数の昇降部材により支持されたときに複数の昇降部材から設定部材の複数の部分にそれぞれ加えられる圧力を検出する検出部と連結部材の移動速度の設定時に、受渡駆動部を制御することにより支持部により設定部材が支持された状態で複数の昇降部材の上端部が支持部の上端部よりも下方の位置から支持部の上端部よりも上方の位置へ移動するように、連結部材を移動させる移動制御部と、移動制御部による連結部材の移動中に、検出部の出力信号に基づいて複数の昇降部材から設定部材の複数の部分にそれぞれ加えられる複数の圧力の値が予め定められた複数の基準圧力値にそれぞれ到達したか否かを判定し、複数の圧力の値が複数の基準圧力値にそれぞれ到達したときの連結部材の上下方向の位置を基準位置として決定する位置決定部と、基板の受け渡し時における連結部材の移動範囲のうち決定された基準位置を含む一部の範囲を速度制限範囲として決定する範囲決定部と、速度制限範囲内での連結部材の移動速度が速度制限範囲外での連結部材の移動速度よりも低くなるように、基板の受け渡し時における連結部材の移動速度を設定する移動速度設定部と、基板の受け渡し時に、移動速度設定部により設定された移動速度で連結部材が移動するように受渡駆動部を制御する受渡制御部とを備える。   (1) The substrate delivery system according to the first aspect of the present invention comprises a support portion configured to support the lower surface of the substrate at the time of processing the substrate, and a plurality of three or more having upper ends capable of supporting the lower surface of the substrate. A plurality of elevators are provided at the time of delivery of a substrate between a support member and a plurality of lift members, and a connection member configured to connect the lift members and to connect the plurality of lift members and to be movable in the vertical direction with respect to the support portion. A delivery drive for moving the connecting member so that the upper end of the member moves between a position above the upper end of the support and a position below the upper end of the support, and a plurality of lifting members A setting member configured to be supportable, and a moving speed of a detection unit and a coupling member that detect pressure applied to a plurality of portions of the setting member from the plurality of elevating members when the setting member is supported by the plurality of elevating members. When setting The upper end portions of the plurality of elevating members move from a position below the upper end portion of the support portion to a position above the upper end portion of the support portion while the setting member is supported by the support portion by controlling the drive portion Thus, while the movement control unit for moving the connection member and the movement of the connection member by the movement control unit, the plurality of pressures applied to the plurality of portions of the setting member from the plurality of elevation members based on the output signal of the detection unit It is determined whether or not the value of each has reached a plurality of predetermined reference pressure values, and the vertical position of the connecting member when each of the plurality of pressure values reaches a plurality of reference pressure values is used as a reference position. And a range determination unit which determines a partial range including the determined reference position of the movement range of the connecting member at the time of delivery of the substrate as the speed limit range, and A moving speed setting unit for setting a moving speed of the connecting member at the time of delivery of the substrate such that the moving speed of the connecting member is lower than the moving speed of the connecting member outside the speed limit range; And a delivery control unit configured to control the delivery drive unit such that the connecting member moves at the moving speed set by the setting unit.

その基板受渡システムにおいては、連結部材の移動速度の設定時に、支持部により設定部材が支持される。この状態で、複数の昇降部材の上端部が支持部の上端部よりも下方の位置から支持部の上端部よりも上方の位置へ移動するように、連結部材が移動する。   In the substrate delivery system, the setting member is supported by the support when setting the moving speed of the connecting member. In this state, the connecting member is moved such that the upper ends of the plurality of elevating members move from a position below the upper end of the support to a position above the upper end of the support.

この場合、複数の昇降部材の上端部が支持部の上端部と同じ高さに位置したときに複数の昇降部材の上端部が設定部材の下面の複数の部分にそれぞれに接触する。それにより、設定部材の複数の部分に圧力が加えられる。設定部材の複数の部分に加えられる複数の圧力の値が複数の基準圧力値に到達したか否かに基づいて、複数の昇降部材が設定部材に接触した時点における連結部材の上下方向の位置が基準位置として正確に決定される。決定された基準位置を含む速度制限範囲が決定される。また、速度制限範囲内での連結部材の移動速度が速度制限範囲外での連結部材の移動速度よりも低くなるように、基板の受け渡し時における連結部材の移動速度が設定される。   In this case, when the upper ends of the plurality of elevating members are positioned at the same height as the upper end of the support, the upper ends of the plurality of elevating members respectively contact the plurality of portions of the lower surface of the setting member. Thereby, pressure is applied to the portions of the setting member. The position of the connecting member in the vertical direction when the plurality of elevating members contact the setting member is determined based on whether or not the plurality of pressure values applied to the plurality of portions of the setting member has reached the plurality of reference pressure values. It is accurately determined as the reference position. A speed limit range including the determined reference position is determined. Further, the moving speed of the connecting member at the time of delivery of the substrate is set such that the moving speed of the connecting member within the speed limit range is lower than the moving speed of the connecting member outside the speed limit range.

基板の受け渡し時には、設定された移動速度で連結部材が移動するように受渡駆動部が制御される。この場合、連結部材が低い移動速度で速度制限範囲内を移動する際に、基板の下面に支持部または複数の昇降部材が接触する。したがって、基板の下面に支持部または複数の昇降部材が接触することにより発生する衝撃が緩和されるので、基板の下面に傷が発生することが防止される。一方、連結部材は、高い移動速度で速度制限範囲外を移動するので、基板の受け渡しに必要な時間が短縮される。   At the time of delivery of the substrate, the delivery drive unit is controlled such that the connecting member moves at the set moving speed. In this case, when the connecting member moves in the speed limit range at a low moving speed, the support portion or the plurality of elevating members contact the lower surface of the substrate. Therefore, since the impact generated by the contact of the support portion or the plurality of elevating members with the lower surface of the substrate is alleviated, the generation of scratches on the lower surface of the substrate is prevented. On the other hand, since the connecting member moves out of the speed limit range at a high moving speed, the time required for delivery of the substrate is shortened.

さらに、上記の構成によれば、支持部と複数の昇降部材との間の位置関係の誤差によらず、複数の昇降部材が設定部材に接触した時点における連結部材の上下方向の位置が基準位置として正確に決定され、速度制限範囲が決定される。それにより、速度制限範囲に基づいて設定部材の移動速度を変化させることができる。したがって、複数の昇降部材から支持部へ渡された基板に実際に傷が発生したか否かを確認しながら基板の移動速度を低下させるタイミングを調整する作業が不要となる。   Furthermore, according to the above configuration, the vertical position of the connecting member at the time when the plurality of lifting members contact the setting member is the reference position regardless of the error in the positional relationship between the support portion and the plurality of lifting members. The speed limit range is determined as Thereby, the moving speed of the setting member can be changed based on the speed limit range. Therefore, it is not necessary to adjust the timing for reducing the moving speed of the substrate while checking whether or not the substrate actually passed from the plurality of elevating members to the support portion is actually scratched.

これらの結果、基板処理のスループットを向上させつつ複数の支持部材と支持部との間の基板の受け渡し時に基板に傷が発生することを防止することが可能でかつ基板の製造コストの増加を抑制することが可能となる。   As a result, while improving the throughput of substrate processing, it is possible to prevent the substrate from being scratched during delivery of the substrate between the plurality of support members and the support portion, and to suppress an increase in the manufacturing cost of the substrate. It is possible to

(2)基板受渡システムは、複数の昇降部材により設定部材が支持された状態で複数の昇降部材から設定部材の複数の部分にそれぞれ加えられる複数の圧力の値に基づいて複数の基準圧力値を決定する圧力決定部をさらに備えてもよい。   (2) The substrate delivery system performs the plurality of reference pressure values based on the plurality of pressure values respectively applied to the plurality of portions of the setting member from the plurality of elevation members in a state where the setting member is supported by the plurality of elevation members. It may further comprise a pressure determination unit to determine.

この場合、複数の基準圧力値は、複数の昇降部材により設定部材が実際に支持された状態で複数の昇降部材から設定部材の複数の部分にそれぞれ加えられる複数の圧力の値に等しい。それにより、複数の基準圧力値に基づいて連結部材の基準位置を正確に決定することができる。   In this case, the plurality of reference pressure values are equal to the values of the plurality of pressures respectively applied to the plurality of portions of the setting member from the plurality of elevating members in a state where the setting member is actually supported by the plurality of elevating members. Thereby, the reference position of the connecting member can be accurately determined based on the plurality of reference pressure values.

(3)範囲決定部は、基板の受け渡しのために連結部材が下降するときの速度制限範囲を下降速度制限範囲として決定し、下降速度制限範囲の上限は、基準位置よりも上方に位置し、移動速度設定部は、下降速度制限範囲内で下降するときの連結部材の移動速度が速度制限範囲外で下降するときの連結部材の移動速度よりも低くなるように、連結部材の移動速度を設定してもよい。   (3) The range determination unit determines the speed limit range when the connecting member moves down for delivery of the substrate as the descent speed limit range, and the upper limit of the descent speed limit range is located above the reference position, The moving speed setting unit sets the moving speed of the connecting member such that the moving speed of the connecting member when moving down in the falling speed limit range is lower than the moving speed of the connecting member when moving down outside the speed limit range. You may

支持部の上端部よりも上方の位置で基板が複数の昇降部材により支持されている場合、複数の昇降部材の上端部が支持部の上端部よりも下方の位置まで下降することにより、基板が複数の昇降部材から支持部に渡される。   When the substrate is supported by the plurality of elevation members at a position above the upper end portion of the support portion, the substrate is lowered by lowering the upper end portions of the plurality of elevation members to a position below the upper end portion of the support portion. A plurality of lifting members are passed to the support.

上記の構成によれば、下降速度制限範囲の上限が基準位置よりも上方に位置する。それにより、連結部材が下降速度制限範囲外で下降するときの移動速度が高く設定される場合でも、連結部材が下降することにより下降速度制限範囲の上限の位置から基準位置に到達するまでの間に連結部材の移動速度を十分低くすることができる。したがって、基板処理のスループットを向上させることができるとともに、基板に傷が発生することを防止することができる。   According to the above configuration, the upper limit of the falling speed limitation range is located above the reference position. As a result, even when the moving speed when the connecting member descends outside the descent speed limit range is set high, the descent speed of the connecting member from the upper limit position of the descent speed limit range to the reference position is reached The moving speed of the connecting member can be made sufficiently low. Therefore, the throughput of substrate processing can be improved, and the generation of scratches on the substrate can be prevented.

(4)範囲決定部は、基板の受け渡しのために連結部材が上昇するときの速度制限範囲を上昇速度制限範囲として決定し、上昇速度制限範囲の下限は、基準位置よりも下方に位置し、移動速度設定部は、上昇速度制限範囲内で上昇するときの連結部材の移動速度が上昇速度制限範囲外で上昇するときの連結部材の移動速度よりも低くなるように、連結部材の移動速度を設定してもよい。   (4) The range determination unit determines the speed limit range when the connecting member ascends to transfer the substrate as the increase speed limit range, and the lower limit of the increase speed limit range is located below the reference position, The moving speed setting unit sets the moving speed of the connecting member such that the moving speed of the connecting member when rising within the rising speed limit range is lower than the moving speed of the connecting member when rising outside the rising speed limit range. It may be set.

支持部の上端部が支持部の上端部よりも下方に位置するとともに基板が支持部により支持されている場合、複数の昇降部材の上端部が支持部の上端部よりも上方の位置まで上昇することにより、基板が支持部から複数の昇降部材に渡される。   When the upper end portion of the support portion is located below the upper end portion of the support portion and the substrate is supported by the support portion, the upper end portions of the plurality of elevating members rise to a position above the upper end portion of the support portion Thus, the substrate is transferred from the support to the plurality of lifting members.

上記の構成によれば、上昇速度制限範囲の下限が基準位置よりも下方に位置する。それにより、連結部材が上昇速度制限範囲外で上昇するときの移動速度が高く設定される場合でも、連結部材が上昇することにより上昇速度制限範囲の下限の位置から基準位置に到達するまでの間に連結部材の移動速度を十分低くすることができる。したがって、基板処理のスループットを向上させることができるとともに、基板に傷が発生することを防止することができる。   According to the above configuration, the lower limit of the rising speed limitation range is located below the reference position. As a result, even when the moving speed when the connecting member rises outside the rising speed limit range is set high, the connecting member moves up to reach the reference position from the position at the lower limit of the rising speed limit range. The moving speed of the connecting member can be made sufficiently low. Therefore, the throughput of substrate processing can be improved, and the generation of scratches on the substrate can be prevented.

(5)設定部材は、基板と同じ外形を有してもよい。   (5) The setting member may have the same outer shape as the substrate.

この場合、設定部材が基板と同じ形状を有するので、連結部材の移動速度の設定時に、支持部と複数の昇降部材との間で基板が受け渡される場合に近い状態で支持部と複数の昇降部材との間の設定部材の受け渡しが行われる。したがって、連結部材の移動速度の設定をより容易かつ適切に行うことができる。   In this case, since the setting member has the same shape as the substrate, at the time of setting the moving speed of the connection member, the support and the plurality of elevations are close to a case where the substrate is delivered between the support and the plurality of elevation members. Delivery of the setting member to and from the member is performed. Therefore, the moving speed of the connecting member can be set more easily and appropriately.

(6)設定部材は、樹脂で形成されてもよい。   (6) The setting member may be formed of resin.

この場合、設定部材は基板に比べて傷が発生しにくいので、移動速度の設定時に設定部材が破損することが防止される。   In this case, since the setting member is less likely to be damaged compared to the substrate, the setting member is prevented from being damaged when setting the moving speed.

(7)支持部は、平坦な支持面と、支持面から上方に突出するように設けられるとともに、基板の下面を支持可能に構成された複数の突起部材と、複数の突起部材により支持された基板に熱処理を行う熱処理機構とを含んでもよい。   (7) The supporting portion is provided by a flat supporting surface, a plurality of projecting members provided to project upward from the supporting surface and capable of supporting the lower surface of the substrate, and supported by the plurality of projecting members And a heat treatment mechanism for heat treating the substrate.

この場合、基板と複数の突起部材とが接触することにより基板に傷が発生することが防止されるので、傷が発生した基板に熱処理が施されることにより基板が破損することが防止される。また、基板と複数の昇降部材とが接触することにより基板に傷が発生することが防止されるので、熱処理後の基板が破損することが抑制される。   In this case, the substrate is prevented from being damaged by the contact between the substrate and the plurality of projecting members, so that the substrate is prevented from being damaged by applying the heat treatment to the substrate where the film is damaged. . In addition, since the substrate is prevented from being damaged by the contact between the substrate and the plurality of elevating members, breakage of the substrate after heat treatment is suppressed.

(8)第2の発明に係る基板受渡方法は、基板の処理時に基板の下面を支持するように構成された支持部と基板の下面を支持可能な上端部をそれぞれ有する3以上の複数の昇降部材との間で基板の受け渡しを行うための基板受渡方法であって、複数の昇降部材は、支持部に対して上下方向に移動可能に構成された連結部材により連結され、連結部材は、支持部と複数の昇降部材との間での基板の受け渡し時に、複数の昇降部材の上端部が支持部の上端部よりも上方の位置と支持部の上端部よりも下方の位置との間で移動するように移動し、基板受渡方法は、連結部材の移動速度の設定時に、複数の昇降部材により支持可能に構成された設定部材を支持部により支持するステップと、設定部材が支持部に支持された状態で複数の昇降部材の上端部が支持部の上端部よりも下方の位置から支持部の上端部よりも上方の位置へ移動するように、連結部材を移動させるステップと、設定部材が複数の昇降部材により支持されたときに複数の昇降部材から設定部材の複数の部分にそれぞれ加えられる圧力を検出するステップと、連結部材の移動中に、検出するステップの検出結果に基づいて複数の昇降部材から設定部材の複数の部分にそれぞれ加えられる複数の圧力の値が予め定められた複数の基準圧力値にそれぞれ到達したか否かを判定し、複数の圧力の値が複数の基準圧力値にそれぞれ到達したときの連結部材の上下方向の位置を基準位置として決定するステップと、基板の受け渡し時における連結部材の移動範囲のうち決定された基準位置を含む一部の範囲を速度制限範囲として決定するステップと、速度制限範囲内での連結部材の移動速度が速度制限範囲外での連結部材の移動速度よりも低くなるように、基板の受け渡し時における連結部材の移動速度を設定するステップと、基板の受け渡し時に、設定するステップにより設定された移動速度で連結部材が移動するように連結部材を移動させるステップとを含む。   (8) In the substrate delivery method according to the second aspect of the present invention, there is provided a supporting portion configured to support the lower surface of the substrate at the time of processing the substrate, and a plurality of three or more elevations each having an upper end capable of supporting the lower surface of the substrate. A substrate delivery method for delivering a substrate to and from a member, wherein a plurality of elevating members are connected by a connecting member configured to be movable in the vertical direction with respect to a support portion, and the connecting member is supported The upper end of the plurality of elevating members moves between a position above the upper end of the support and a position below the upper end of the support when the substrate is transferred between the unit and the plurality of elevating members The substrate delivery method includes the steps of supporting the setting member configured to be supported by the plurality of lifting members by the support when setting the moving speed of the connection member, and the setting member being supported by the support The upper end of a plurality of elevating members Moving the connecting member such that the moving member moves from a position below the upper end of the support to a position above the upper end of the support, and the setting member is supported by a plurality of lifting members Detecting the pressure applied to the plurality of portions of the setting member from the elevating members, and while moving the connecting member, based on the detection result of the detecting step, the plurality of elevating members to the plurality of portions of the setting member It is determined whether or not the plurality of pressure values to be applied has reached a plurality of predetermined reference pressure values respectively, and the vertical direction of the connecting member when the plurality of pressure values have respectively reached a plurality of reference pressure values And determining a partial range including the determined reference position of the movement range of the connecting member at the time of delivery of the substrate as the speed limit range. Setting the moving speed of the connecting member at the time of delivery of the substrate such that the moving speed of the connecting member within the speed limit range is lower than the moving speed of the connecting member outside the speed limit range; Moving the connecting member so that the connecting member moves at the moving speed set by the setting step.

その基板受渡方法においては、連結部材の移動速度の設定時に、支持部により設定部材が支持される。この状態で、複数の昇降部材の上端部が支持部の上端部よりも下方の位置から支持部の上端部よりも上方の位置へ移動するように、連結部材が移動する。   In the substrate delivery method, the setting member is supported by the support when setting the moving speed of the connecting member. In this state, the connecting member is moved such that the upper ends of the plurality of elevating members move from a position below the upper end of the support to a position above the upper end of the support.

この場合、複数の昇降部材の上端部が支持部の上端部と同じ高さに位置したときに複数の昇降部材の上端部が設定部材の下面の複数の部分にそれぞれに接触する。それにより、設定部材の複数の部分に圧力が加えられる。設定部材の複数の部分に加えられる複数の圧力の値が複数の基準圧力値に到達したか否かに基づいて、複数の昇降部材が設定部材に接触した時点における連結部材の上下方向の位置が基準位置として正確に決定される。決定された基準位置を含む速度制限範囲が決定される。また、速度制限範囲内での連結部材の移動速度が速度制限範囲外での連結部材の移動速度よりも低くなるように、基板の受け渡し時における連結部材の移動速度が設定される。   In this case, when the upper ends of the plurality of elevating members are positioned at the same height as the upper end of the support, the upper ends of the plurality of elevating members respectively contact the plurality of portions of the lower surface of the setting member. Thereby, pressure is applied to the portions of the setting member. The position of the connecting member in the vertical direction when the plurality of elevating members contact the setting member is determined based on whether or not the plurality of pressure values applied to the plurality of portions of the setting member has reached the plurality of reference pressure values. It is accurately determined as the reference position. A speed limit range including the determined reference position is determined. Further, the moving speed of the connecting member at the time of delivery of the substrate is set such that the moving speed of the connecting member within the speed limit range is lower than the moving speed of the connecting member outside the speed limit range.

基板の受け渡し時には、設定された移動速度で連結部材が移動するように受渡駆動部が制御される。この場合、連結部材が低い移動速度で速度制限範囲内を移動する際に、基板の下面に支持部または複数の昇降部材が接触する。したがって、基板の下面に支持部または複数の昇降部材が接触することにより発生する衝撃が緩和されるので、基板の下面に傷が発生することが防止される。一方、連結部材は、高い移動速度で速度制限範囲外を移動するので、基板の受け渡しに必要な時間が短縮される。   At the time of delivery of the substrate, the delivery drive unit is controlled such that the connecting member moves at the set moving speed. In this case, when the connecting member moves in the speed limit range at a low moving speed, the support portion or the plurality of elevating members contact the lower surface of the substrate. Therefore, since the impact generated by the contact of the support portion or the plurality of elevating members with the lower surface of the substrate is alleviated, the generation of scratches on the lower surface of the substrate is prevented. On the other hand, since the connecting member moves out of the speed limit range at a high moving speed, the time required for delivery of the substrate is shortened.

さらに、上記の構成によれば、支持部と複数の昇降部材との間の位置関係の誤差によらず、複数の昇降部材が設定部材に接触した時点における連結部材の上下方向の位置が基準位置として正確に決定され、速度制限範囲が決定される。それにより、速度制限範囲に基づいて設定部材の移動速度を変化させることができる。したがって、複数の昇降部材から支持部へ渡された基板に実際に傷が発生したか否かを確認しながら基板の移動速度を低下させるタイミングを調整する作業が不要となる。   Furthermore, according to the above configuration, the vertical position of the connecting member at the time when the plurality of lifting members contact the setting member is the reference position regardless of the error in the positional relationship between the support portion and the plurality of lifting members. The speed limit range is determined as Thereby, the moving speed of the setting member can be changed based on the speed limit range. Therefore, it is not necessary to adjust the timing for reducing the moving speed of the substrate while checking whether or not the substrate actually passed from the plurality of elevating members to the support portion is actually scratched.

これらの結果、基板処理のスループットを向上させつつ複数の支持部材と支持部との間の基板の受け渡し時に基板に傷が発生することを防止することが可能でかつ基板の製造コストの増加を抑制することが可能となる。   As a result, while improving the throughput of substrate processing, it is possible to prevent the substrate from being scratched during delivery of the substrate between the plurality of support members and the support portion, and to suppress an increase in the manufacturing cost of the substrate. It is possible to

本発明によれば、基板処理のスループットを向上させつつ複数の昇降部材と支持部との間の基板の受け渡し時に基板に傷が発生することを防止することが可能になるとともに基板の製造コストの増加を抑制することが可能となる。   According to the present invention, while improving the throughput of substrate processing, it is possible to prevent the substrate from being scratched during delivery of the substrate between the plurality of lifting members and the support portion, and at the same time the manufacturing cost of the substrate is increased. It is possible to suppress the increase.

本発明の一実施の形態に係る熱処理装置の構成を示す模式的側面図である。It is a typical side view showing the composition of the heat treatment equipment concerning the 1 embodiment of the present invention. 図1の熱処理装置の模式的平面図である。It is a schematic plan view of the heat processing apparatus of FIG. 図1の設定部材および送信装置の模式的平面図である。It is a schematic plan view of the setting member of FIG. 1, and a transmitter. 図1の設定部材および送信装置の模式的側面図である。It is a typical side view of the setting member of FIG. 1, and a transmitter. 基板の受け渡し時の連結部材の移動速度の具体的な設定例を示す模式的側面図である。It is a schematic side view which shows the specific setting example of the moving speed of the connection member at the time of delivery of a board | substrate. 基板の受け渡し時の連結部材の移動速度の具体的な設定例を示す模式的側面図である。It is a schematic side view which shows the specific setting example of the moving speed of the connection member at the time of delivery of a board | substrate. 基板の受け渡し時の連結部材の移動速度の具体的な設定例を示す模式的側面図である。It is a schematic side view which shows the specific setting example of the moving speed of the connection member at the time of delivery of a board | substrate. 基板の受け渡し時の連結部材の移動速度の具体的な設定例を示す模式的側面図である。It is a schematic side view which shows the specific setting example of the moving speed of the connection member at the time of delivery of a board | substrate. 基板の受け渡し時の連結部材の移動速度の具体的な設定例を示す模式的側面図である。It is a schematic side view which shows the specific setting example of the moving speed of the connection member at the time of delivery of a board | substrate. 基板の受け渡し時の連結部材の移動速度の具体的な設定例を示す模式的側面図である。It is a schematic side view which shows the specific setting example of the moving speed of the connection member at the time of delivery of a board | substrate. 連結部材の移動速度の設定後に連結部材が下降することにより複数の昇降ピンから支持部上に基板が渡される状態を示す模式的側面図である。It is a typical side view showing the state where a substrate is passed on a support part from a plurality of elevating pins by descent of a connecting member after setting of moving speed of a connecting member. 連結部材の移動速度の設定後に連結部材が上昇することにより支持部から複数の昇降ピン上に基板が渡される状態を示す模式的側面図である。It is a typical side view showing the state where a substrate is passed on a plurality of raising and lowering pins from a supporter by rising of a connecting member after setting of moving speed of a connecting member. 移動速度設定処理の一例を示すフローチャートである。It is a flowchart which shows an example of a movement speed setting process. 図1の熱処理装置を備える基板処理装置の一例を示す模式的ブロック図である。It is a schematic block diagram which shows an example of a substrate processing apparatus provided with the heat processing apparatus of FIG.

以下、本発明の実施の形態に係る基板受渡システムおよび基板受渡方法について図面を用いて説明する。以下の説明において、基板とは、半導体基板、液晶表示装置もしくは有機EL(Electro Luminescence)表示装置等のFPD(Flat Panel Display)用基板、光ディスク用基板、磁気ディスク用基板、光磁気ディスク用基板、フォトマスク用基板、セラミック基板または太陽電池用基板等をいう。以下の説明においては、基板受渡システムの一例として基板に加熱処理を行う熱処理装置を説明する。   Hereinafter, a substrate delivery system and a substrate delivery method according to an embodiment of the present invention will be described using the drawings. In the following description, the substrate refers to a substrate for an FPD (Flat Panel Display) such as a semiconductor substrate, a liquid crystal display device or an organic EL (Electro Luminescence) display device, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, A photomask substrate, a ceramic substrate, a solar cell substrate or the like. In the following description, a heat treatment apparatus that heats a substrate will be described as an example of the substrate delivery system.

(1)熱処理装置の構成
図1は本発明の一実施の形態に係る熱処理装置の構成を示す模式的側面図であり、図2は図1の熱処理装置100の模式的平面図である。図1に示すように、熱処理装置100は、主として支持部S、昇降装置30、制御装置40、送信装置60、受信装置70および設定部材90を備える。なお、図2では、図1に示される複数の構成要素のうち制御装置40および送信装置60および受信装置70の図示が省略されている。
(1) Configuration of Heat Treatment Apparatus FIG. 1 is a schematic side view showing the configuration of a heat treatment apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic plan view of the heat treatment apparatus 100 of FIG. As shown in FIG. 1, the heat treatment apparatus 100 mainly includes a support portion S, an elevation device 30, a control device 40, a transmission device 60, a reception device 70, and a setting member 90. In FIG. 2, among the plurality of components shown in FIG. 1, the control device 40, the transmission device 60, and the reception device 70 are not shown.

支持部Sは、熱処理プレート10、複数の突起部材11、複数のガイド部材12および発熱体20を含み、ホットプレートとして用いられる。熱処理プレート10は、例えば円板形状を有する伝熱プレートであり、加熱処理の対象となる基板の外径よりも大きい外径を有する。熱処理プレート10には、発熱体20が設けられている。発熱体20は、例えばマイカヒータまたはペルチェ素子等で構成される。発熱体20には、発熱駆動回路21が接続されている。発熱駆動回路21は、後述する温度調整部46の制御に基づいて発熱体20を駆動する。それにより、基板の加熱処理時に発熱体20が発熱する。   The support portion S includes a heat treatment plate 10, a plurality of projecting members 11, a plurality of guide members 12 and a heating element 20, and is used as a hot plate. The heat treatment plate 10 is, for example, a heat transfer plate having a disk shape, and has an outer diameter larger than the outer diameter of a substrate to be subjected to heat treatment. The heat treatment plate 10 is provided with a heating element 20. The heating element 20 is formed of, for example, a mica heater or a peltier element. The heat generating drive circuit 21 is connected to the heat generating body 20. The heat generation drive circuit 21 drives the heat generating body 20 based on the control of the temperature adjustment unit 46 described later. As a result, the heating element 20 generates heat during the heat treatment of the substrate.

図2に示すように、熱処理プレート10の平坦な上面上に、複数(本例では10個)の突起部材11および複数(本例では4個)のガイド部材12が設けられている。   As shown in FIG. 2, on the flat upper surface of the heat treatment plate 10, a plurality (10 in this example) of projecting members 11 and a plurality (4 in this example) of guide members 12 are provided.

複数の突起部材11は、熱処理プレート10の上面のうち外周縁部およびその近傍を除く中央領域で離散的に配置され、処理対象となる基板または後述する設定部材90の下面を支持する。各突起部材11は、球状のプロキシミティボールであり、例えばセラミックにより形成される。   The plurality of projecting members 11 are discretely disposed in the central region excluding the outer peripheral edge and its vicinity of the upper surface of the heat treatment plate 10, and supports the substrate to be processed or the lower surface of the setting member 90 described later. Each projecting member 11 is a spherical proximity ball, and is formed of, for example, a ceramic.

複数のガイド部材12は、熱処理プレート10の上面の周縁部に等角度間隔で配置されている。各ガイド部材12の上部には、後述する複数の昇降ピン31から複数の突起部材11に基板または設定部材90が渡される際に、基板または設定部材90の外周端部を予め定められた位置に導くための傾斜面が形成されている。それにより、基板または設定部材90が予め定められた位置からずれた状態で複数の突起部材11により支持されることが防止される。各ガイド部材12は、例えばPEEK(ポリエーテルケトン)等の高い耐熱性を有する樹脂により形成される。   The plurality of guide members 12 are arranged at equal angular intervals on the periphery of the upper surface of the heat treatment plate 10. At the upper part of each guide member 12, when the substrate or setting member 90 is passed from the plurality of elevation pins 31 described later to the plurality of projecting members 11, the outer peripheral end of the substrate or setting member 90 is located at a predetermined position. An inclined surface for guiding is formed. This prevents the substrate or the setting member 90 from being supported by the plurality of projecting members 11 in a state of being deviated from the predetermined position. Each guide member 12 is formed of, for example, a resin having high heat resistance such as PEEK (polyether ketone).

熱処理プレート10には、厚み方向に貫通する複数(本例では3個)の貫通孔13が形成されている。複数の貫通孔13は、熱処理プレート10の中心を基準とする所定の仮想円上に等角度間隔で形成されている。   The heat treatment plate 10 is formed with a plurality of (three in this example) through holes 13 penetrating in the thickness direction. The plurality of through holes 13 are formed at equal angular intervals on a predetermined imaginary circle based on the center of the heat treatment plate 10.

図1に示すように、昇降装置30は、複数(本例では3個)の昇降ピン31、連結部材32、送り軸33、モータ34およびモータ駆動回路35を含む。複数の昇降ピン31は、熱処理プレート10に形成された複数の貫通孔13にそれぞれ挿入可能な棒状部材であり、例えばセラミックにより形成される。また、複数の昇降ピン31は、連結部材32により互いに連結されるとともに、複数の昇降ピン31の一部が熱処理プレート10の複数の貫通孔13にそれぞれ挿入された状態で上下方向に延びるように保持される。   As shown in FIG. 1, the lifting device 30 includes a plurality of (three in this example) lifting pins 31, a connecting member 32, a feed shaft 33, a motor 34 and a motor drive circuit 35. The plurality of lifting pins 31 are rod-like members that can be inserted into the plurality of through holes 13 formed in the heat treatment plate 10, and are formed of, for example, ceramic. Further, the plurality of lifting pins 31 are mutually connected by the connecting member 32 and extend in the vertical direction in a state in which some of the plurality of lifting pins 31 are respectively inserted into the plurality of through holes 13 of the heat treatment plate 10 It is held.

熱処理プレート10の近傍に、上下方向に延びる送り軸33、モータ34およびモータ駆動回路35が設けられている。送り軸33は、例えばボールねじであり、モータ34の回転軸に接続されている。この状態で、連結部材32の一部が送り軸33に取り付けられている。また、連結部材32には、送り軸33の回転時に連結部材32が送り軸33に沿って上下方向に移動するように、連結部材32を案内する図示しないガイド部材が取り付けられている。   In the vicinity of the heat treatment plate 10, a feed shaft 33 extending in the vertical direction, a motor 34 and a motor drive circuit 35 are provided. The feed shaft 33 is, for example, a ball screw, and is connected to the rotation shaft of the motor 34. In this state, a part of the connecting member 32 is attached to the feed shaft 33. Further, a guide member (not shown) for guiding the connecting member 32 is attached to the connecting member 32 so that the connecting member 32 moves up and down along the feed shaft 33 when the feed shaft 33 rotates.

モータ駆動回路35は、後述する移動制御部44または受渡制御部45の制御に基づいてモータ34を駆動する。それにより、送り軸33が一方向またはその逆方向に回転する。送り軸33が一方向に回転することにより複数の昇降ピン31が連結部材32とともに上昇(または下降)する。送り軸33が逆方向に回転することにより複数の昇降ピン31が連結部材32とともに下降(または上昇)する。   The motor drive circuit 35 drives the motor 34 based on the control of the movement control unit 44 or the delivery control unit 45 described later. As a result, the feed shaft 33 rotates in one direction or the opposite direction. As the feed shaft 33 rotates in one direction, the plurality of lifting pins 31 ascend (or descend) with the connecting member 32. As the feed shaft 33 rotates in the reverse direction, the plurality of elevation pins 31 move down (or rise) together with the connecting member 32.

この場合、複数の昇降ピン31および連結部材32の移動速度は、送り軸33の回転速度に依存する。送り軸33の回転速度が高くなるほど複数の昇降ピン31および連結部材32の移動速度が高くなる。一方、送り軸33の回転速度が低くなるほど複数の昇降ピン31および連結部材32の移動速度が低くなる。   In this case, the moving speeds of the plurality of lifting pins 31 and the connecting member 32 depend on the rotational speed of the feed shaft 33. The higher the rotational speed of the feed shaft 33, the higher the moving speeds of the plurality of lifting pins 31 and the connecting member 32. On the other hand, as the rotational speed of the feed shaft 33 decreases, the moving speeds of the plurality of elevation pins 31 and the connection member 32 decrease.

本実施の形態では、モータ34としてステッピングモータが用いられる。モータ34には、図示しないエンコーダが内蔵されている。モータ34のエンコーダからの出力信号は、後述する位置検出部43に与えられる。   In the present embodiment, a stepping motor is used as the motor 34. The motor 34 incorporates an encoder (not shown). An output signal from the encoder of the motor 34 is given to a position detection unit 43 described later.

本実施の形態に係る熱処理装置100では、支持部Sと複数の昇降ピン31との間での基板の受け渡し時における連結部材32の上下方向の移動速度を設定することが可能である。送信装置60、受信装置70および設定部材90は、連結部材32の移動速度を設定するために用いられる。図3は図1の設定部材90および送信装置60の模式的平面図であり、図4は図1の設定部材90および送信装置60の模式的側面図である。   In the heat treatment apparatus 100 according to the present embodiment, it is possible to set the moving speed in the vertical direction of the connection member 32 at the time of delivery of the substrate between the support portion S and the plurality of elevation pins 31. The transmitter 60, the receiver 70 and the setting member 90 are used to set the moving speed of the connecting member 32. 3 is a schematic plan view of the setting member 90 and the transmission device 60 of FIG. 1, and FIG. 4 is a schematic side view of the setting member 90 and the transmission device 60 of FIG.

図3および図4に示すように、設定部材90は円板形状を有し、例えばPEEK(ポリエーテルケトン)等の高い耐熱性を有する樹脂により形成される。設定部材90の外形は、熱処理装置100における処理対象となる基板の外形とほぼ同じとなるように形成される。例えば、処理対象となる基板の外径が300mmである場合、設定部材90の外径も300mmとなるように形成される。   As shown in FIGS. 3 and 4, the setting member 90 has a disk shape, and is formed of, for example, a resin having high heat resistance such as PEEK (polyether ketone). The outer shape of the setting member 90 is formed to be substantially the same as the outer shape of the substrate to be processed in the heat treatment apparatus 100. For example, when the outer diameter of the substrate to be processed is 300 mm, the outer diameter of the setting member 90 is also 300 mm.

設定部材90は一面90aおよび他面90bを有する。連結部材32の移動速度の設定時に、設定部材90は、一面90aが上方を向き、他面90bが下方を向くように、支持部Sまたは複数の昇降ピン31により支持される。   The setting member 90 has one surface 90a and the other surface 90b. When setting the moving speed of the connecting member 32, the setting member 90 is supported by the support portion S or the plurality of lifting pins 31 such that the one surface 90a faces upward and the other surface 90b faces downward.

ここで、設定部材90の他面90bには、図4に示すように、連結部材32の移動速度の設定時に図1の複数の昇降ピン31により支持されるべき複数(本例では3個)の被支持部91が定められている。設定部材90の一面90aにおいては、複数の被支持部91に重なる複数の部分に複数(本例では3個)の凹状部92がそれぞれ形成されている。   Here, on the other surface 90b of the setting member 90, as shown in FIG. 4, when setting the moving speed of the connecting member 32, plural (three in this example) should be supported by the plurality of lifting pins 31 of FIG. The supported portion 91 of is fixed. On one surface 90 a of the setting member 90, a plurality of (three in this example) concave portions 92 are formed in a plurality of portions overlapping the plurality of supported portions 91.

複数の凹状部92の底部に複数の圧力センサ99がそれぞれ接触するように取り付けられている。本例の圧力センサ99は、当該圧力センサ99に加わる圧力の大きさに応じて抵抗値が変化するセンサである。より具体的には、圧力センサ99は、当該圧力センサ99に加わる圧力が大きくなる程抵抗値が小さくなり、当該圧力センサ99に加わる圧力が小さく程抵抗値が大きくなるセンサである。設定部材90には、さらに送信装置60が取り付けられている。送信装置60は、図3に示すように、信号出力回路61、送信回路62および送信アンテナ63を含む。   A plurality of pressure sensors 99 are attached to the bottom of the plurality of concave portions 92 so as to be in contact with each other. The pressure sensor 99 of this example is a sensor whose resistance value changes according to the magnitude of the pressure applied to the pressure sensor 99. More specifically, the pressure sensor 99 is a sensor whose resistance decreases as the pressure applied to the pressure sensor 99 increases, and increases as the pressure applied to the pressure sensor 99 decreases. The transmitting device 60 is further attached to the setting member 90. The transmitting device 60 includes a signal output circuit 61, a transmitting circuit 62, and a transmitting antenna 63, as shown in FIG.

信号出力回路61は、複数の圧力センサ99と電気的に接続され、複数の圧力センサ99の抵抗値に対応する電気信号を出力する。送信回路62は、信号出力回路61から出力される電気信号を複数の圧力センサ99の出力信号として、送信アンテナ63を通して図1の受信装置70に無線送信する。   The signal output circuit 61 is electrically connected to the plurality of pressure sensors 99, and outputs an electrical signal corresponding to the resistance value of the plurality of pressure sensors 99. The transmission circuit 62 wirelessly transmits the electric signal output from the signal output circuit 61 as the output signal of the plurality of pressure sensors 99 to the reception device 70 of FIG. 1 through the transmission antenna 63.

受信装置70は、受信アンテナおよび受信回路を含む。図1に示すように、受信装置70は、送信装置60から無線送信された複数の圧力センサ99の出力信号を受信アンテナを通して受信回路により受信し、制御装置40に与える。   The receiving device 70 includes a receiving antenna and a receiving circuit. As shown in FIG. 1, the receiving device 70 receives the output signals of the plurality of pressure sensors 99 wirelessly transmitted from the transmitting device 60 by the receiving circuit through the receiving antenna, and supplies the signals to the control device 40.

制御装置40は、CPU(中央演算処理装置)、RAM(ランダムアクセスメモリ)およびROM(リードオンリメモリ)により構成され、圧力検出部41、位置決定部42、位置検出部43、移動制御部44、受渡制御部45、温度調整部46、圧力決定部47、範囲決定部48、移動速度設定部49および記憶部50を有する。制御装置40においては、CPUがROMまたは他の記憶媒体に記憶されたコンピュータプログラムを実行することにより、上記の各機能部が実現される。なお、制御装置40の機能的な構成要素の一部または全てが電子回路等のハードウェアにより実現されてもよい。   The controller 40 includes a CPU (central processing unit), a RAM (random access memory) and a ROM (read only memory), and the pressure detector 41, the position determiner 42, the position detector 43, the movement controller 44, A delivery control unit 45, a temperature adjustment unit 46, a pressure determination unit 47, a range determination unit 48, a moving speed setting unit 49, and a storage unit 50 are provided. In the control device 40, each function unit described above is realized by the CPU executing a computer program stored in the ROM or another storage medium. Note that some or all of the functional components of the control device 40 may be realized by hardware such as an electronic circuit.

圧力検出部41は、受信装置70から与えられる複数の圧力センサ99の出力信号に基づいて、複数の昇降ピン31から設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力を検出する。   The pressure detection unit 41 detects a plurality of pressures respectively applied to the plurality of supported portions 91 of the setting member 90 from the plurality of elevation pins 31 based on the output signals of the plurality of pressure sensors 99 supplied from the receiving device 70. .

後述するように、連結部材32の移動速度の設定が開始されると、初期状態で設定部材90が複数の昇降ピン31により支持されることになる。この状態で、圧力決定部47は、複数の昇降ピン31から設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力の値を複数の基準圧力値として決定する。このとき、記憶部50は、決定された複数の基準圧力値を記憶する。   As described later, when the setting of the moving speed of the connecting member 32 is started, the setting member 90 is supported by the plurality of lifting pins 31 in the initial state. In this state, the pressure determination unit 47 determines, as the plurality of reference pressure values, values of the plurality of pressures respectively applied to the plurality of supported portions 91 of the setting member 90 from the plurality of elevation pins 31. At this time, the storage unit 50 stores a plurality of determined reference pressure values.

位置検出部43は、モータ34のエンコーダからの出力信号に基づいて熱処理プレート10に対する連結部材32の上下方向の位置を検出する。   The position detection unit 43 detects the vertical position of the connecting member 32 with respect to the heat treatment plate 10 based on the output signal from the encoder of the motor 34.

後述するように、連結部材32の移動速度の設定時には、上記の複数の基準圧力値が決定された後、支持部Sにより設定部材90が支持される。この状態で、移動制御部44は、モータ駆動回路35を制御することにより、複数の昇降ピン31の上端部が支持部Sの上端部よりも下方の位置から支持部Sの上端部よりも上方の位置へ移動するように、連結部材32を上昇させる。   As described later, at the time of setting the moving speed of the connecting member 32, the setting member 90 is supported by the support portion S after the plurality of reference pressure values are determined. In this state, the movement control unit 44 controls the motor drive circuit 35 so that the upper end portions of the plurality of elevation pins 31 are higher than the upper end portions of the support portion S from the position below the upper end portions of the support portion S. The connecting member 32 is raised to move to the position of.

位置決定部42は、移動制御部44による連結部材32の上昇中に、圧力検出部41の検出結果に基づいて、設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力の値が決定された複数の基準圧力値にそれぞれ到達したか否かを判定する。また、位置決定部42は、位置検出部43の検出結果に基づいて、複数の圧力の値が複数の基準圧力値にそれぞれ到達したときの連結部材32の上下方向の位置を基準位置として決定する。   The position determination unit 42 sets values of a plurality of pressures applied to the plurality of supported portions 91 of the setting member 90 based on the detection result of the pressure detection unit 41 while the connection control unit 44 lifts the connection member 32. It is determined whether or not each of the plurality of reference pressure values determined has been reached. Further, based on the detection result of the position detection unit 43, the position determination unit 42 determines the vertical position of the connecting member 32 when the plurality of pressure values reach the plurality of reference pressure values as the reference position. .

範囲決定部48は、基板の受け渡し時における連結部材32の移動範囲のうち位置決定部42により決定された基準位置を含む一部の範囲を速度制限範囲として決定する。速度制限範囲の詳細は後述する。   The range determination unit 48 determines a partial range including the reference position determined by the position determination unit 42 in the movement range of the connecting member 32 at the time of delivery of the substrate as the speed limit range. Details of the speed limit range will be described later.

移動速度設定部49は、速度制限範囲内での連結部材32の移動速度が速度制限範囲外での連結部材32の移動速度よりも低くなるように、基板の受け渡し時における連結部材32の移動速度を設定する。このとき、記憶部50は、設定された連結部材32の移動速度を記憶する。   The movement speed setting unit 49 moves the movement speed of the connection member 32 at the time of delivery of the substrate such that the movement speed of the connection member 32 within the speed restriction range is lower than the movement speed of the connection member 32 outside the speed restriction range. Set At this time, the storage unit 50 stores the set moving speed of the connecting member 32.

受渡制御部45は、記憶部50に記憶された移動速度に基づいて、基板の受け渡し時に、連結部材32が設定された移動速度で移動するようにモータ駆動回路35を制御する。   The delivery control unit 45 controls the motor drive circuit 35 so that the connecting member 32 moves at the set moving speed when transferring the substrate, based on the moving speed stored in the storage unit 50.

記憶部50には、上記の複数の基準圧力値、速度制限範囲および設定された移動速度の他、発熱体20の温度を調整するための温度調整情報が記憶される。温度調整部46は、温度調整情報に基づいて発熱駆動回路21を制御する。   The storage unit 50 stores temperature adjustment information for adjusting the temperature of the heating element 20, in addition to the plurality of reference pressure values, the speed limit range, and the set moving speed. The temperature adjustment unit 46 controls the heat generation drive circuit 21 based on the temperature adjustment information.

(2)連結部材32の移動速度の設定
図5〜図10は、基板の受け渡し時の連結部材32の移動速度の具体的な設定例を示す模式的側面図である。以下の説明では、連結部材32の上下方向における移動可能範囲のうち最も高い位置を上方位置PAと呼び、連結部材32の上下方向における移動可能範囲のうち最も低い位置を下方位置PBと呼ぶ。
(2) Setting of Moving Speed of Connecting Member 32 FIGS. 5 to 10 are schematic side views showing a specific setting example of the moving speed of the connecting member 32 at the time of delivery of a substrate. In the following description, the highest position in the movable range in the vertical direction of the connecting member 32 is called the upper position PA, and the lowest position in the movable range in the vertical direction of the connecting member 32 is called the lower position PB.

初めに、図5に示すように、連結部材32が上方位置PAに移動する。連結部材32が上方位置PAにある状態で、複数の昇降ピン31の上端部が支持部Sの複数の突起部材11の上端部よりも上方に位置する。   First, as shown in FIG. 5, the connecting member 32 moves to the upper position PA. The upper end portions of the plurality of lifting pins 31 are positioned above the upper end portions of the plurality of projecting members 11 of the support portion S in a state where the connecting member 32 is at the upper position PA.

次に、図6に示すように、複数の昇降ピン31の上端部上に図3の設定部材90が載置される。この状態で、設定部材90の複数の被支持部91(図4)に複数の昇降ピン31から圧力がそれぞれ加えられる。このとき、複数の昇降ピン31から設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力の値が図3の複数の圧力センサ99の出力信号に基づいて検出される。設定部材90に加えられる複数の圧力の値は、例えば複数の圧力センサ99の抵抗値で表される。検出された複数の圧力の値が、設定部材90の複数の被支持部91にそれぞれ対応する複数の基準圧力値として決定される。   Next, as shown in FIG. 6, the setting member 90 of FIG. 3 is placed on the upper end portions of the plurality of lifting pins 31. In this state, pressure is applied to the plurality of supported portions 91 (FIG. 4) of the setting member 90 from the plurality of elevation pins 31 respectively. At this time, the values of the plurality of pressures respectively applied to the plurality of supported portions 91 of the setting member 90 from the plurality of elevation pins 31 are detected based on the output signals of the plurality of pressure sensors 99 of FIG. The plurality of pressure values applied to the setting member 90 are represented, for example, by resistance values of the plurality of pressure sensors 99. The plurality of detected pressure values are determined as a plurality of reference pressure values respectively corresponding to the plurality of supported portions 91 of the setting member 90.

次に、図7に示すように、連結部材32が上方位置PAから下方位置PBまで移動する。この移動中に、複数の昇降ピン31上に支持された設定部材90が支持部Sの複数の突起部材11上に渡される。連結部材32が下方位置PBにある状態で、複数の昇降ピン31の上端部は複数の突起部材11の上端部よりも下方に位置する。   Next, as shown in FIG. 7, the connecting member 32 is moved from the upper position PA to the lower position PB. During this movement, the setting members 90 supported on the plurality of elevation pins 31 are passed over the plurality of projecting members 11 of the support portion S. The upper end portions of the plurality of lifting pins 31 are positioned below the upper end portions of the plurality of projecting members 11 in the state where the connecting member 32 is in the lower position PB.

次に、図8に示すように、連結部材32が下方位置PBから上方位置PAに向かって上昇する。このとき、図1のモータ駆動回路35は、連結部材32が予め定められた微小距離移動して停止することを繰り返す、いわゆるステップ送りで上昇するように、モータ34を駆動する。   Next, as shown in FIG. 8, the connecting member 32 is lifted from the lower position PB toward the upper position PA. At this time, the motor drive circuit 35 of FIG. 1 drives the motor 34 so as to ascend in a so-called step feed, repeating that the connecting member 32 moves and stops by a predetermined minute distance.

連結部材32の上昇により、複数の昇降ピン31の上端部が設定部材90の複数の被支持部91(図4)に接触する。このとき、設定部材90が支持部Sの複数の突起部材11から複数の昇降ピン31に渡されることにより、設定部材90の複数の被支持部91に複数の昇降ピン31から圧力がそれぞれ加えられる。それにより、図3の複数の圧力センサ99の出力信号が、複数の昇降ピン31と複数の被支持部91との接触の前後で変化する。   The upper ends of the plurality of lifting pins 31 contact the plurality of supported portions 91 (FIG. 4) of the setting member 90 by the lifting of the connecting member 32. At this time, the setting member 90 is passed from the plurality of protruding members 11 of the support portion S to the plurality of elevation pins 31, whereby pressure is applied to the plurality of supported portions 91 of the setting member 90 from the plurality of elevation pins 31. . Thus, the output signals of the plurality of pressure sensors 99 in FIG. 3 change before and after the contact between the plurality of elevation pins 31 and the plurality of supported portions 91.

そこで、複数の昇降ピン31が設定部材90の複数の被支持部91とが接触した時点を把握するために、連結部材32がステップ送りで上昇する間、連結部材32が移動および停止するごとに複数の圧力センサ99の出力信号が取得される。また、複数の圧力センサ99の出力信号に基づいて、複数の昇降ピン31から設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力の値が決定された複数の基準圧力値にそれぞれ到達したか否かが判定される。その上で、図9に示すように、設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力の値が決定された複数の基準圧力値にそれぞれ到達したときの連結部材32の上下方向の位置が基準位置RPとして決定される。   Therefore, every time the connecting member 32 moves and stops while the connecting member 32 ascends in step feed, in order to grasp the point in time when the plurality of lift pins 31 contact the plurality of supported portions 91 of the setting member 90. Output signals of the plurality of pressure sensors 99 are acquired. Further, based on the output signals of the plurality of pressure sensors 99, the plurality of pressure values respectively applied to the plurality of supported portions 91 of the setting member 90 from the plurality of elevation pins 31 are set to the plurality of reference pressure values determined. It is determined whether it has reached. Further, as shown in FIG. 9, the upper and lower sides of the connecting member 32 when the values of the plurality of pressures applied to the plurality of supported portions 91 of the setting member 90 respectively reach the determined plurality of reference pressure values. The position in the direction is determined as the reference position RP.

基準位置RPが決定されると、支持部Sと複数の昇降ピン31との間での基板の受け渡し時に、基板に傷が発生しないように連結部材32の移動速度を制限すべき範囲が移動制限範囲として決定される。   When the reference position RP is determined, the range in which the moving speed of the connecting member 32 should be limited is limited so that the substrate is not scratched when the substrate is transferred between the support portion S and the plurality of lifting pins 31 Determined as a range.

本実施の形態では、図10に示すように、基板の受け渡しのために連結部材32が下降するときに対応する下降速度制限範囲LR1が、上方位置PAと下方位置PBとの間で決定される。また、基板の受け渡しのために連結部材32が上昇するときに対応する上昇速度制限範囲LR2が、上方位置PAと下方位置PBとの間で決定される。下降速度制限範囲LR1および上昇速度制限範囲LR2の各々の上下方向の距離は、予め定められた距離(例えば0.5mm)に設定される。   In the present embodiment, as shown in FIG. 10, the lowering speed limitation range LR1 corresponding to the lowering of the connecting member 32 for the delivery of the substrate is determined between the upper position PA and the lower position PB. . Further, when the connecting member 32 is lifted for the delivery of the substrate, a corresponding rising speed limit range LR2 is determined between the upper position PA and the lower position PB. The vertical distance between each of the falling speed limit range LR1 and the rising speed limit range LR2 is set to a predetermined distance (for example, 0.5 mm).

ここで、下降速度制限範囲LR1の上限は基準位置RPよりも上方に位置し、下降速度制限範囲LR1の下限は基準位置RPに位置する。また、上昇速度制限範囲LR2の上限は基準位置RPに位置し、上昇速度制限範囲LR2の下限は基準位置RPよりも下方に位置する。   Here, the upper limit of the falling speed limit range LR1 is located above the reference position RP, and the lower limit of the falling speed limit range LR1 is located at the reference position RP. The upper limit of the rising speed limit range LR2 is located at the reference position RP, and the lower limit of the rising speed limit range LR2 is located lower than the reference position RP.

その後、基板の受け渡し時に下降速度制限範囲LR1内で下降するときの移動速度が、連結部材32が下降速度制限範囲LR1外で下降するときの移動速度よりも低くなるように、連結部材32の移動速度が設定される。また、基板の受け渡し時に上昇速度制限範囲LR2内で上昇するときの移動速度が、連結部材32が上昇速度制限範囲LR2外で上昇するときの移動速度よりも低くなるように、連結部材32の移動速度が設定される。   Thereafter, the movement speed of the connection member 32 is lowered so that the movement speed when falling within the descent speed restriction range LR1 at the time of delivery of the substrate is lower than the movement speed when the connection member 32 falls outside the descent speed restriction range LR1. The speed is set. In addition, the movement speed of the connection member 32 is lower than the movement speed when the connection member 32 rises outside the rising speed restriction range LR2 when the movement speed when rising within the rising speed restriction range LR2 during delivery of the substrate is lower. The speed is set.

なお、下降速度制限範囲LR1内での連結部材32の下降時の移動速度は一定の値に設定されてもよいし、段階的または連続的に変化するように設定されてもよい。また、下降速度制限範囲LR1外での連結部材32の下降時の移動速度も一定の値に設定されてもよいし、段階的または連続的に変化するように設定されてもよい。さらに、上昇速度制限範囲LR2内での連結部材32の上昇時の移動速度は一定の値に設定されてもよいし、段階的または連続的に変化するように設定されてもよい。また、上昇速度制限範囲LR2外での連結部材32の上昇時の移動速度も一定の値に設定されてもよいし、段階的または連続的に変化するように設定されてもよい。   In addition, the moving speed at the time of descent | fall of the connection member 32 in descent | fall speed limit range LR1 may be set to a fixed value, and may be set so that it may change in steps or continuously. Further, the moving speed at the time of lowering of the connection member 32 outside the lowering speed limit range LR1 may be set to a constant value, or may be set to change stepwise or continuously. Furthermore, the moving speed at the time of rising of the connection member 32 within the rising speed limit range LR2 may be set to a constant value, or may be set to change stepwise or continuously. Further, the moving speed at the time of rising of the connecting member 32 outside the rising speed limit range LR2 may also be set to a constant value, or may be set to change stepwise or continuously.

上記のように連結部材32の移動速度が設定された後、連結部材32が上方位置PAまで上昇することにより、設定部材90が複数の昇降ピン31上から取り除かれる。   After the moving speed of the connecting member 32 is set as described above, the setting member 90 is removed from the plurality of lifting pins 31 by raising the connecting member 32 to the upper position PA.

なお、下降速度制限範囲LR1の下限は基準位置RPよりも下方に位置してもよいし、上昇速度制限範囲LR2の上限は基準位置RPよりも上方に位置してもよい。さらに、下降速度制限範囲LR1の上限から上昇速度制限範囲LR2の下限までの範囲が、連結部材32の上昇時および下降時の共通の移動制限範囲として用いられてもよい。   The lower limit of the falling speed limit range LR1 may be located below the reference position RP, and the upper limit of the rising speed limit range LR2 may be located above the reference position RP. Furthermore, a range from the upper limit of the falling speed limit range LR1 to the lower limit of the rising speed limit range LR2 may be used as a common movement limit range when the connecting member 32 moves up and down.

図11は、連結部材32の移動速度の設定後に連結部材32が下降することにより複数の昇降ピン31から支持部S上に基板が渡される状態を示す模式的側面図である。上記の図5〜図10の例により連結部材32の移動速度が設定されている場合、複数の昇降ピン31上に基板Wが載置された状態で連結部材32は上方位置PAから下降速度制限範囲LR1の上限まで比較的高い移動速度で下降する。   FIG. 11 is a schematic side view showing a state in which the substrate is passed from the plurality of elevation pins 31 onto the support portion S by lowering the connection member 32 after setting the moving speed of the connection member 32. When the moving speed of the connecting member 32 is set according to the examples of FIGS. 5 to 10, the connecting member 32 is lowered from the upper position PA while the substrate W is placed on the plurality of lifting pins 31. It descends at a relatively high moving speed up to the upper limit of the range LR1.

その後、連結部材32は下降速度制限範囲LR1内で移動速度を低下させる。このとき、下降速度制限範囲LR1の上限が基準位置RPよりも上方に位置するので、連結部材32が基準位置RPに到達するまでの間に連結部材32の移動速度を十分低くすることができる。したがって、基板Wの下面に支持部Sの複数の突起部材11が接触することにより発生する衝撃が十分緩和されるので、基板Wの下面に傷が発生することが防止される。   Thereafter, the connecting member 32 reduces the moving speed within the descent speed limit range LR1. At this time, since the upper limit of the falling speed limit range LR1 is located above the reference position RP, the moving speed of the connecting member 32 can be sufficiently lowered until the connecting member 32 reaches the reference position RP. Therefore, since the impact generated by the contact of the plurality of projecting members 11 of the support portion S with the lower surface of the substrate W is sufficiently alleviated, the generation of a scratch on the lower surface of the substrate W is prevented.

また、基板Wの移動速度が熱処理プレート10の上面の近傍で低下することにより、基板Wの下面と熱処理プレート10の上面との間の空間に大きな圧力が発生することが防止される。それにより、支持部S上で基板Wが浮遊することにより、本来支持されるべき位置からずれた状態で基板Wが支持部Sにより支持されることが防止される。   In addition, the movement speed of the substrate W decreases near the upper surface of the heat treatment plate 10, whereby generation of a large pressure in the space between the lower surface of the substrate W and the upper surface of the heat treatment plate 10 is prevented. As a result, the substrate W floats on the support portion S, whereby the substrate W is prevented from being supported by the support portion S in a state of being deviated from the position to be originally supported.

複数の昇降ピン31から支持部S上に基板Wが渡された後、連結部材32は、下降速度制限範囲LR1の下限である基準位置RPから下方位置PBまで比較的高い移動速度で下降する。このように、下降速度制限範囲LR1外で下降するときの連結部材32の移動速度が高く設定されることにより、基板Wの受け渡しに要する時間が短縮される。   After the substrate W is transferred from the plurality of lifting pins 31 onto the support portion S, the connecting member 32 is lowered at a relatively high moving speed from the reference position RP which is the lower limit of the lowering speed limit range LR1 to the lower position PB. As described above, by setting the moving speed of the connecting member 32 high when falling outside the lowering speed limit range LR1, the time required for delivery of the substrate W is shortened.

図12は、連結部材32の移動速度の設定後に連結部材32が上昇することにより支持部Sから複数の昇降ピン31上に基板Wが渡される状態を示す模式的側面図である。上記の図5〜図10の例により連結部材32の移動速度が設定されている場合、支持部S上に基板Wが載置された状態で連結部材32は下方位置PBから上昇速度制限範囲LR2の下限まで比較的高い移動速度で上昇する。   FIG. 12 is a schematic side view showing a state in which the substrate W is passed from the support portion S onto the plurality of elevation pins 31 by raising the connection member 32 after setting the moving speed of the connection member 32. When the moving speed of the connecting member 32 is set according to the examples of FIGS. 5 to 10, the connecting member 32 is lifted from the lower position PB in the rising speed limit range LR2 in a state where the substrate W is placed on the support portion S. Rising at a relatively high moving speed to the lower limit of

その後、連結部材32は上昇速度制限範囲LR2内で移動速度を低下させる。このとき、上昇速度制限範囲LR2の下限が基準位置RPよりも下方に位置するので、連結部材32が基準位置RPに到達するまでの間に連結部材32の移動速度を十分低くすることができる。したがって、基板Wの下面に複数の昇降ピン31が接触することにより発生する衝撃が十分緩和されるので、基板Wの下面に傷が発生することが防止される。   Thereafter, the connecting member 32 reduces the moving speed within the rising speed limit range LR2. At this time, since the lower limit of the rising speed limit range LR2 is located below the reference position RP, the moving speed of the connecting member 32 can be sufficiently lowered until the connecting member 32 reaches the reference position RP. Therefore, since the impact generated by the contact of the plurality of elevation pins 31 with the lower surface of the substrate W is sufficiently alleviated, the generation of a scratch on the lower surface of the substrate W is prevented.

複数の突起部材11から複数の昇降ピン31上に基板Wが渡された後、連結部材32は、上昇速度制限範囲LR2の上限である基準位置RPから上方位置PAまで比較的高い移動速度で上昇する。このように、上昇速度制限範囲LR2外で上昇するときの連結部材32の移動速度が高く設定されることにより、基板Wの受け渡しに要する時間が短縮される。   After the substrate W is delivered from the plurality of projecting members 11 onto the plurality of lifting pins 31, the connecting member 32 is lifted at a relatively high moving speed from the reference position RP which is the upper limit of the rising speed limit range LR2 to the upper position PA. Do. As described above, by setting the moving speed of the connecting member 32 high when rising outside the rising speed limit range LR2, the time required for delivery of the substrate W is shortened.

なお、上記の図11および図12の例では、支持部Sと複数の昇降ピン31との間の基板Wの受け渡し時における連結部材32の上下方向の移動範囲が上方位置PAから下方位置PBまでの間に設定されているが、本発明はこれに限定されない。連結部材32は、基板Wの受け渡し時に、上方位置PAよりも下方でかつ下降速度制限範囲LR1よりも上方の任意の位置から、下方位置PBよりも上方でかつ上昇速度制限範囲LR2よりも下方の任意の位置までの範囲を移動してもよい。   In the example shown in FIGS. 11 and 12, the moving range of the connecting member 32 in the vertical direction from the upper position PA to the lower position PB at the time of delivery of the substrate W between the support portion S and the plurality of elevation pins 31 is However, the present invention is not limited thereto. The connecting member 32 is, when delivering the substrate W, from any position below the upper position PA and above the descent speed limit range LR1, above the lower position PB and below the descent speed limit range LR2. The range may be moved to any position.

(3)移動速度設定処理
連結部材32の移動速度の設定は、図1の制御装置40が以下に示す移動速度設定処理を実行することにより行われる。図1の熱処理装置100には、使用者が制御装置40に各種処理の指令を与えるための図示しない操作部が設けられている。移動速度設定処理は、熱処理装置100の使用開始時または熱処理装置100のメンテナンス時等に、例えば使用者による操作部の操作に基づいて実行される。図13は、移動速度設定処理の一例を示すフローチャートである。
(3) Moving Speed Setting Process The setting of the moving speed of the connecting member 32 is performed by the moving speed setting process shown below by the control device 40 of FIG. The heat treatment apparatus 100 of FIG. 1 is provided with an operation unit (not shown) for the user to give the control device 40 various processing instructions. The moving speed setting process is performed based on, for example, the operation of the operation unit by the user at the start of use of the heat treatment apparatus 100 or at the time of maintenance of the heat treatment apparatus 100 or the like. FIG. 13 is a flowchart showing an example of the moving speed setting process.

図13に示すように、初めに、図1の移動制御部44は、モータ駆動回路35を制御することにより、連結部材32を上方位置PAに移動させる(ステップS101)。   As shown in FIG. 13, first, the movement control unit 44 of FIG. 1 moves the connecting member 32 to the upper position PA by controlling the motor drive circuit 35 (step S101).

この状態で、使用者または後述する図14の基板搬送装置450により複数の昇降ピン31上に図3の設定部材90が載置される。そこで、図1の圧力検出部41は、受信装置70から与えられる出力信号に基づいて、複数の昇降ピン31から設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力を一定周期で検出する(ステップS102)。この圧力の検出処理は、移動速度設定処理が終了するまで継続される。   In this state, the setting member 90 of FIG. 3 is placed on the plurality of elevation pins 31 by the user or the substrate transfer device 450 of FIG. 14 described later. Therefore, the pressure detection unit 41 of FIG. 1 sets a plurality of pressures respectively applied from the plurality of elevation pins 31 to the plurality of supported portions 91 of the setting member 90 based on the output signal supplied from the receiving device 70 at a constant cycle. It detects (step S102). The pressure detection process is continued until the moving speed setting process is completed.

なお、ステップS102の処理は、複数の昇降ピン31上に設定部材90が載置された後、例えば使用者による操作部の操作に応答して行われてもよい。あるいは、ステップS102の処理は、移動速度設定処理が実行される間一定周期で継続して行われてもよい。   The process of step S102 may be performed, for example, in response to the operation of the operation unit by the user after the setting member 90 is placed on the plurality of elevation pins 31. Alternatively, the process of step S102 may be continuously performed in a constant cycle while the moving speed setting process is performed.

次に、図1の圧力決定部47は、ステップS102の処理で検出される複数の圧力の値に基づいて、複数の昇降ピン31から設定部材90の複数の被支持部91にそれぞれ加えられる複数の圧力の値を複数の基準圧力値として決定する(ステップS103)。決定された複数の基準圧力値は、図1の記憶部50に記憶される。   Next, the pressure determination unit 47 of FIG. 1 is configured to be applied to the plurality of supported portions 91 of the setting member 90 from the plurality of elevation pins 31 based on the values of the plurality of pressures detected in the process of step S102. The value of pressure is determined as a plurality of reference pressure values (step S103). The determined plurality of reference pressure values are stored in the storage unit 50 of FIG.

次に、図1の移動制御部44は、モータ駆動回路35を制御することにより、連結部材32を下方位置PBに移動させる(ステップS104)。その後、移動制御部44は、モータ駆動回路35を制御することにより、複数の昇降ピン31の上端部が支持部Sの上端部よりも下方の位置から支持部Sの上端部よりも上方の位置へ移動するように、連結部材32をステップ送りで上昇させる(ステップS105)。   Next, the movement control unit 44 in FIG. 1 moves the connecting member 32 to the lower position PB by controlling the motor drive circuit 35 (step S104). Thereafter, the movement control unit 44 controls the motor drive circuit 35 to position the upper ends of the plurality of lifting pins 31 above the upper end of the support S from the position below the upper end of the support S. The connecting member 32 is raised by step feeding so as to move to the next (step S105).

図1の位置決定部42は、移動制御部44による連結部材32の上昇中に、圧力検出部41による複数の圧力の検出に基づいて、複数の被支持部91にそれぞれ加えられる複数の圧力の値がステップS103で決定された複数の基準圧力値にそれぞれ到達したか否かを判定する(ステップS106)。   The position determination unit 42 illustrated in FIG. 1 is configured to receive the plurality of pressures applied to the plurality of supported portions 91 based on the detection of the plurality of pressures by the pressure detection unit 41 while the connection control unit 44 is moving up. It is determined whether the values have reached the plurality of reference pressure values determined in step S103 (step S106).

位置決定部42は、複数の被支持部91にそれぞれ加えられる複数の圧力の値が決定された複数の基準圧力値に到達するまで、上記のステップS106の処理を繰り返す。また、複数の被支持部91にそれぞれ加えられる複数の圧力の値が決定された複数の基準圧力値に到達すると、位置決定部42は、その時点で図1の位置検出部43により検出される連結部材32の上下方向の位置を基準位置として決定する(ステップS107)。   The position determination unit 42 repeats the process of step S106 described above until the values of the plurality of pressures applied to the plurality of supported portions 91 reach the determined plurality of reference pressure values. Further, when the values of the plurality of pressures applied to the plurality of supported portions 91 reach the determined plurality of reference pressure values, the position determination unit 42 is detected by the position detection unit 43 of FIG. 1 at that time. The position in the vertical direction of the connecting member 32 is determined as the reference position (step S107).

次に、図1の範囲決定部48は、決定された基準位置を含むように速度制限範囲を決定する(ステップS108)。このとき、範囲決定部48は、複数の昇降ピン31が下降するときの下降速度制限範囲LR1と、複数の昇降ピン31が上昇するときの上昇速度制限範囲LR2とを速度制限範囲として個別に決定してもよい。   Next, the range determination unit 48 of FIG. 1 determines the speed limit range so as to include the determined reference position (step S108). At this time, the range determination unit 48 individually determines, as the speed limit range, the lowering speed limit range LR1 when the plurality of lifting pins 31 are lowered and the rising speed limit range LR2 when the plurality of lifting pins 31 are rising. You may

さらに、図1の移動速度設定部49は、決定された速度制限範囲内での連結部材32の移動速度が速度制限範囲外での連結部材32の移動速度よりも低くなるように、基板Wの受け渡し時における連結部材32の移動速度を設定する(ステップS109)。設定された連結部材32の移動速度は、図1の記憶部50に記憶される。その後、移動速度設定処理が終了する。   Furthermore, the moving speed setting unit 49 of FIG. 1 is configured such that the moving speed of the connecting member 32 within the determined speed limit range is lower than the moving speed of the connecting member 32 outside the speed limit range. The moving speed of the connecting member 32 at the time of delivery is set (step S109). The moving speed of the set connection member 32 is stored in the storage unit 50 of FIG. After that, the moving speed setting process ends.

上記の移動速度設定処理後、熱処理装置100において基板Wに処理が行われる際には、支持部Sと複数の昇降ピン31との間での基板Wの受け渡し時に、図1の受渡制御部45がモータ駆動回路35を制御する。それにより、連結部材32が設定された移動速度で上下方向に移動する。   When the substrate W is processed in the heat treatment apparatus 100 after the above moving speed setting process, the delivery control unit 45 of FIG. 1 is performed when the substrate W is transferred between the support portion S and the plurality of elevation pins 31. Controls the motor drive circuit 35. As a result, the connecting member 32 moves up and down at the set moving speed.

(4)効果
(a)上記の熱処理装置100においては、複数の基準圧力値が決定された後、支持部Sの複数の突起部材11により設定部材90が支持された状態で、連結部材32が下方位置PBから上昇する。
(4) Effects (a) In the heat treatment apparatus 100 described above, the connection member 32 is in a state where the setting member 90 is supported by the plurality of projecting members 11 of the support portion S after the plurality of reference pressure values are determined. Ascends from the lower position PB.

この場合、複数の昇降ピン31の上端部が複数の突起部材11の上端部と同じ高さに位置したときに複数の昇降ピン31の上端部が設定部材90の複数の被支持部91にそれぞれに接触する。それにより、複数の被支持部91に圧力が加えられる。複数の被支持部91に加えられる複数の圧力の値が複数の基準圧力値に到達したか否かに基づいて、複数の昇降ピン31が設定部材90に接触した時点における連結部材32の上下方向の位置が基準位置RPとして正確に決定される。決定された基準位置を含む速度制限範囲(図10の例では、下降速度制限範囲LR1および上昇速度制限範囲LR2)が決定される。   In this case, when the upper ends of the plurality of elevation pins 31 are positioned at the same height as the upper ends of the plurality of projecting members 11, the upper ends of the plurality of elevation pins 31 are respectively supported by the plurality of supported portions 91 of the setting member 90. Contact Thereby, pressure is applied to the plurality of supported portions 91. The vertical direction of the connecting member 32 at the time when the plurality of lifting pins 31 contact the setting member 90 based on whether or not the plurality of pressure values applied to the plurality of supported portions 91 have reached the plurality of reference pressure values. Is accurately determined as the reference position RP. A speed limit range (in the example of FIG. 10, the falling speed limit range LR1 and the rising speed limit range LR2) including the determined reference position is determined.

その後、速度制限範囲内での連結部材の移動速度が速度制限範囲外での連結部材32の移動速度よりも低くなるように、基板Wの受け渡し時における連結部材32の移動速度が設定される。   Thereafter, the moving speed of the connecting member 32 at the time of delivery of the substrate W is set such that the moving speed of the connecting member within the speed limit range is lower than the moving speed of the connecting member 32 outside the speed limit range.

基板Wの受け渡し時には、設定された移動速度で連結部材32が移動する。この場合、連結部材32が低い移動速度で速度制限範囲内を移動する際に、基板Wの下面に支持部Sまたは複数の昇降ピン31が接触する。したがって、基板Wの下面に支持部Sまたは複数の昇降ピン31が接触することにより発生する衝撃が緩和されるので、基板Wの下面に傷が発生することが防止される。一方、連結部材32は、高い移動速度で速度制限範囲外を移動するので、基板Wの受け渡しに必要な時間が短縮される。   At the time of delivery of the substrate W, the connecting member 32 moves at a set moving speed. In this case, when the connecting member 32 moves within the speed limit range at a low moving speed, the support portion S or the plurality of lifting pins 31 contact the lower surface of the substrate W. Therefore, since the impact generated by the contact of the support portion S or the plurality of elevation pins 31 with the lower surface of the substrate W is alleviated, the generation of a scratch on the lower surface of the substrate W is prevented. On the other hand, since the connecting member 32 moves out of the speed limit range at a high moving speed, the time required for delivery of the substrate W is shortened.

さらに、上記の構成によれば、支持部Sと複数の昇降ピン31との間の位置関係の誤差によらず、基準位置RPが正確に決定され、速度制限範囲が決定される。それにより、速度制限範囲に基づいて設定部材90の移動速度を正確に変化させることができる。したがって、複数の昇降ピン31から支持部Sへ渡された基板Wに実際に傷が発生したか否かを確認しながら基板Wの移動速度を低下させるタイミングを調整する作業が不要となる。   Furthermore, according to the above configuration, the reference position RP is accurately determined and the speed limit range is determined regardless of the error in the positional relationship between the support portion S and the plurality of elevation pins 31. Thus, the moving speed of the setting member 90 can be accurately changed based on the speed limit range. Therefore, the operation of adjusting the timing for reducing the moving speed of the substrate W while checking whether the substrate W passed to the support portion S from the plurality of elevation pins 31 is actually scratched becomes unnecessary.

これらの結果、基板処理のスループットを向上させつつ支持部Sと複数の昇降ピン31との間の基板Wの受け渡し時に基板Wに傷が発生することを防止することが可能でかつ基板Wの製造コストの増加を抑制することが可能となる。   As a result of these, while improving the throughput of substrate processing, it is possible to prevent the generation of a scratch on the substrate W at the time of delivery of the substrate W between the support portion S and the plurality of elevation pins 31 and manufacturing of the substrate W It becomes possible to suppress the increase in cost.

(b)本実施の形態では、複数の基準圧力値は、複数の昇降ピン31により設定部材90が実際に支持された状態で複数の被支持部91にそれぞれ加えられる複数の圧力の値に等しい。それにより、連結部材32の移動速度の設定時に、複数の基準圧力値に基づいて設定部材90の基準位置を正確に決定することができる。   (B) In the present embodiment, the plurality of reference pressure values are equal to the values of the plurality of pressures respectively applied to the plurality of supported portions 91 in a state where the setting member 90 is actually supported by the plurality of lifting pins 31 . Thus, when setting the moving speed of the connecting member 32, the reference position of the setting member 90 can be accurately determined based on the plurality of reference pressure values.

(c)上記の設定部材90は基板Wと同じ形状を有する。それにより、連結部材32の移動速度の設定時に、支持部Sと複数の昇降ピン31との間で基板Wが受け渡される場合に近い状態で、支持部Sと複数の昇降ピン31との間の設定部材90の受け渡しが行われる。したがって、連結部材32の移動速度の設定をより容易かつ適切に行うことができる。   (C) The setting member 90 has the same shape as the substrate W. Thereby, when setting the moving speed of the connecting member 32, between the support portion S and the plurality of elevation pins 31 in a state close to the case where the substrate W is delivered between the support portion S and the plurality of elevation pins 31. Delivery of the setting member 90 is performed. Therefore, the setting of the moving speed of the connecting member 32 can be performed more easily and appropriately.

(d)設定部材90は、樹脂で形成されている。この場合、設定部材90は基板Wに比べて傷が発生しにくいので、連結部材32の移動速度の設定時に設定部材90が破損することが防止される。   (D) The setting member 90 is formed of resin. In this case, since the setting member 90 is less likely to be damaged compared to the substrate W, the setting member 90 is prevented from being damaged when setting the moving speed of the connecting member 32.

(e)設定部材90に設けられる複数の圧力センサ99の出力信号は、送信装置60および受信装置70を用いた無線通信により制御装置40に与えられる。それにより、簡単な構成で遠隔操作により連結部材32の移動速度を設定することができる。   (E) Output signals of the plurality of pressure sensors 99 provided in the setting member 90 are given to the control device 40 by wireless communication using the transmission device 60 and the reception device 70. Thereby, the moving speed of the connecting member 32 can be set by remote control with a simple configuration.

(5)図1の熱処理装置100を備える基板処理装置
図14は、図1の熱処理装置100を備える基板処理装置の一例を示す模式的ブロック図である。図14に示すように、基板処理装置400は、露光装置500に隣接して設けられ、制御部410、塗布処理部420、現像処理部430、熱処理部440および基板搬送装置450を備える。熱処理部440は、基板Wに加熱処理を行う複数の図1の熱処理装置100と、基板Wに冷却処理を行う複数の熱処理装置(図示せず)とを含む。
(5) Substrate Processing Apparatus Comprising the Heat Treatment Apparatus 100 of FIG. 1 FIG. 14 is a schematic block diagram showing an example of a substrate processing apparatus comprising the heat treatment apparatus 100 of FIG. As shown in FIG. 14, the substrate processing apparatus 400 is provided adjacent to the exposure apparatus 500, and includes a control unit 410, a coating processing unit 420, a development processing unit 430, a thermal processing unit 440, and a substrate transfer apparatus 450. The thermal processing unit 440 includes a plurality of thermal processing apparatuses 100 of FIG. 1 that perform thermal processing on the substrate W, and a plurality of thermal processing apparatuses (not shown) that perform thermal processing on the substrate W.

制御部410は、例えばCPUおよびメモリ、またはマイクロコンピュータを含み、塗布処理部420、現像処理部430、熱処理部440および基板搬送装置450の動作を制御する。また、制御部410は、熱処理装置100の使用開始時または熱処理装置100のメンテナンス時等に、熱処理部440の複数の熱処理装置100において、移動速度設定処理を行うための指令を複数の熱処理装置100に与える。   The control unit 410 includes, for example, a CPU and a memory, or a microcomputer, and controls the operations of the coating processing unit 420, the development processing unit 430, the thermal processing unit 440, and the substrate transfer apparatus 450. Further, the control unit 410 instructs the plurality of heat treatment apparatuses 100 to perform the moving speed setting process in the plurality of heat treatment apparatuses 100 of the heat treatment unit 440 at the start of use of the heat treatment apparatus 100 or at the time of maintenance of the heat treatment apparatus 100. Give to.

基板搬送装置450は、基板処理装置400による基板Wの処理時に、基板Wを塗布処理部420、現像処理部430、熱処理部440および露光装置500の間で搬送する。   The substrate transfer apparatus 450 transfers the substrate W between the coating processing unit 420, the development processing unit 430, the heat processing unit 440, and the exposure apparatus 500 when the substrate processing apparatus 400 processes the substrate W.

塗布処理部420は、未処理の基板Wの一面上にレジスト膜を形成する(塗布処理)。レジスト膜が形成された塗布処理後の基板Wには、露光装置500において露光処理が行われる。現像処理部430は、露光装置500による露光処理後の基板Wに現像液を供給することにより、基板Wの現像処理を行う。熱処理部440は、塗布処理部420による塗布処理、現像処理部430による現像処理、および露光装置500による露光処理の前後に基板Wの熱処理を行う。   The coating processing unit 420 forms a resist film on one surface of the unprocessed substrate W (coating processing). The exposure processing is performed in the exposure apparatus 500 on the substrate W after the coating processing on which the resist film is formed. The development processing unit 430 performs the development processing of the substrate W by supplying the developing solution to the substrate W after the exposure processing by the exposure device 500. The thermal processing unit 440 performs thermal processing of the substrate W before and after the coating processing by the coating processing unit 420, the development processing by the development processing unit 430, and the exposure processing by the exposure apparatus 500.

なお、塗布処理部420は、基板Wに反射防止膜を形成してもよい。この場合、熱処理部440には、基板Wと反射防止膜との密着性を向上させるための密着強化処理を行うための処理ユニットが設けられてもよい。また、塗布処理部420は、基板W上に形成されたレジスト膜を保護するためのレジストカバー膜を基板Wに形成してもよい。   The coating processing unit 420 may form an antireflective film on the substrate W. In this case, the heat treatment unit 440 may be provided with a processing unit for performing an adhesion strengthening process to improve the adhesion between the substrate W and the antireflective film. In addition, the coating processing unit 420 may form a resist cover film on the substrate W for protecting a resist film formed on the substrate W.

上記の基板処理装置400においては、基板Wの処理前に熱処理部440の複数の熱処理装置100の各々で移動速度設定処理が実行されることにより、各熱処理装置100内での基板Wの受け渡し時に、基板Wに傷が発生することが防止される。また、各熱処理装置100において基板Wの受け渡しに要する時間が短縮されることにより、基板処理のスループットが向上する。その結果、基板処理装置400における製品の歩留まりが向上するとともに、基板Wの製造コストが低減される。   In the substrate processing apparatus 400 described above, the movement speed setting process is performed in each of the plurality of heat treatment apparatuses 100 of the heat treatment unit 440 before the processing of the substrate W, whereby the substrate W is transferred in each heat treatment apparatus 100. The generation of a scratch on the substrate W is prevented. In addition, by shortening the time required for delivery of the substrate W in each heat treatment apparatus 100, the throughput of the substrate processing is improved. As a result, the yield of the product in the substrate processing apparatus 400 is improved, and the manufacturing cost of the substrate W is reduced.

ここで、熱処理部440においては、1個の設定部材90(図3)を2以上の複数の熱処理装置100に共通に用いてもよい。この場合、1個の設定部材90を基板搬送装置450により複数の熱処理装置100に順次搬送し、複数の熱処理装置100において順次移動速度設定処理を行う。それにより、全ての熱処理装置100に対応する数の設定部材90を用意する必要がない。   Here, in the heat treatment section 440, one setting member 90 (FIG. 3) may be commonly used for two or more heat treatment apparatuses 100. In this case, one setting member 90 is sequentially transferred to the plurality of heat treatment apparatuses 100 by the substrate transfer apparatus 450, and the movement speed setting process is sequentially performed in the plurality of heat treatment apparatuses 100. Thereby, it is not necessary to prepare the number of setting members 90 corresponding to all the heat treatment apparatuses 100.

(6)他の実施の形態
(a)上記実施の形態は、本発明に係る基板受渡システムを加熱処理用の熱処理装置100に適用した例であるが、本発明に係る基板受渡システムは、冷却処理用の熱処理装置に適用してもよい。
(6) Other Embodiments (a) Although the above-described embodiment is an example in which the substrate delivery system according to the present invention is applied to the heat treatment apparatus 100 for heat treatment, the substrate delivery system according to the present invention You may apply to the heat processing apparatus for processing.

例えば、熱処理装置100には、図1の発熱体20に代えて、冷却装置が設けられてもよい。この場合、支持部Sは、熱処理プレート10、複数の突起部材11、複数のガイド部材12および冷却装置を含み、クーリングプレートとして用いられる。冷却装置は、例えばペルチェ素子で構成されてもよいし、冷却水を循環させる配管により構成されてもよい。   For example, the heat treatment apparatus 100 may be provided with a cooling device in place of the heating element 20 of FIG. In this case, the support portion S includes the heat treatment plate 10, the plurality of protruding members 11, the plurality of guide members 12, and the cooling device, and is used as a cooling plate. The cooling device may be configured by, for example, a Peltier element, or may be configured by a pipe that circulates the cooling water.

基板Wに冷却処理を行う熱処理装置100においても、移動速度設定処理が行われることにより上記実施の形態と同様の効果を得ることができる。   Also in the heat treatment apparatus 100 for performing the cooling process on the substrate W, the movement speed setting process can be performed to obtain the same effect as that of the above-described embodiment.

なお、基板Wに冷却処理を行う複数の熱処理装置100が、基板Wに加熱処理を行う複数の熱処理装置100とともに、図14の熱処理部440に設けられてもよい。この場合、図14の基板処理装置400における製品の歩留まりがより向上するとともに、基板Wの製造コストがより低減される。   A plurality of heat treatment apparatuses 100 for performing the cooling process on the substrate W may be provided in the heat treatment unit 440 of FIG. 14 together with the plurality of heat treatment apparatuses 100 for performing the heat treatment on the substrate W. In this case, the yield of products in the substrate processing apparatus 400 of FIG. 14 is further improved, and the manufacturing cost of the substrate W is further reduced.

(b)図14に示される基板処理装置400は、複数の基板搬送装置450を備えてもよい。一の基板搬送装置450と他の基板搬送装置450との間で基板Wが一時的に載置される基板載置部が設けられる場合には、基板に冷却処理を行うように構成された熱処理装置100が基板載置部として用いられてもよい。この場合、基板Wの処理前に、予め基板載置部において移動速度設定処理が行われることにより上記実施の形態と同様の効果を得ることができる。   (B) The substrate processing apparatus 400 shown in FIG. 14 may include a plurality of substrate transfer apparatuses 450. When a substrate placement unit on which a substrate W is temporarily placed is provided between one substrate transfer device 450 and another substrate transfer device 450, a heat treatment configured to perform a cooling process on the substrate The apparatus 100 may be used as a substrate placement unit. In this case, the movement speed setting process is performed in advance in the substrate mounting unit before the processing of the substrate W, and the same effect as that of the above-described embodiment can be obtained.

(c)上記実施の形態においては、設定部材90の複数の被支持部91にそれぞれ対応する複数の基準圧力値が移動速度設定処理中に圧力センサ99の出力信号に基づいて決定されるが、本発明はこれに限定されない。複数の基準圧力値は、設計値として予め定められていてもよい。   (C) In the above embodiment, a plurality of reference pressure values respectively corresponding to the plurality of supported portions 91 of the setting member 90 are determined based on the output signal of the pressure sensor 99 during the moving speed setting process, The present invention is not limited to this. The plurality of reference pressure values may be predetermined as design values.

(d)上記実施の形態においては、圧力センサ99の出力信号が送信装置60および受信装置70を用いた無線通信により制御装置40の圧力検出部41に与えられるが、本発明はこれに限定されない。設定部材90に設けられた複数の圧力センサ99の出力信号は、電線ケーブルまたは光ファイバケーブル等を用いた有線通信により制御装置40の圧力検出部41に与えられてもよい。   (D) In the above embodiment, the output signal of the pressure sensor 99 is given to the pressure detection unit 41 of the control device 40 by wireless communication using the transmission device 60 and the reception device 70, but the present invention is not limited thereto . The output signals of the plurality of pressure sensors 99 provided in the setting member 90 may be given to the pressure detection unit 41 of the control device 40 by wired communication using a wire cable or an optical fiber cable.

(e)上記実施の形態においては、複数の昇降ピン31として3個の昇降ピン31が用いられるが、複数の昇降ピン31の数は3以上であればよく、4であってもよいし、5であってもよい。この場合、設定部材90には、複数の昇降ピン31にそれぞれ対応する数の圧力センサ99が設けられることが好ましい。   (E) In the above embodiment, three elevating pins 31 are used as the plurality of elevating pins 31, but the number of the plurality of elevating pins 31 may be three or more, or four. It may be five. In this case, it is preferable that the setting member 90 be provided with a number of pressure sensors 99 respectively corresponding to the plurality of lifting pins 31.

(f)上記実施の形態においては、支持部Sは、熱処理プレート10に基板Wの下面を支持するための複数の突起部材11を有するが、本発明はこれに限定されない。支持部Sの熱処理プレート10の上面上には、複数の突起部材11に代えて、基板Wの下面を支持するための樹脂製のシート状部材が設けられてもよい。   (F) In the above embodiment, the support portion S has the plurality of projection members 11 for supporting the lower surface of the substrate W on the heat treatment plate 10, but the present invention is not limited to this. A resin sheet-like member for supporting the lower surface of the substrate W may be provided on the upper surface of the heat treatment plate 10 of the support portion S instead of the plurality of projecting members 11.

この場合、複数の昇降ピン31から支持部Sに基板Wが渡される際に、基板Wの下面がシート状部材に接触しても基板Wには傷が発生しにくい。したがって、連結部材32の移動速度の設定時に、上記の下降速度制限範囲LR1および上昇速度制限範囲LR2のうち、上昇速度制限範囲LR2のみが決定されてもよい。すなわち、下降時における連結部材32の移動速度を低くしなくてもよい。それにより、基板Wの受け渡しに要する時間をさらに短縮することができる。   In this case, when the substrate W is transferred from the plurality of elevation pins 31 to the support portion S, the substrate W is unlikely to be damaged even if the lower surface of the substrate W contacts the sheet-like member. Therefore, when setting the moving speed of the connecting member 32, only the rising speed limit range LR2 may be determined among the falling speed limit range LR1 and the rising speed limit range LR2. That is, the moving speed of the connection member 32 at the time of lowering may not be reduced. Thereby, the time required for delivery of the substrate W can be further shortened.

(g)上記実施の形態においては、複数の昇降ピン31はセラミックにより形成されるが、本発明はこれに限定されない。複数の昇降ピン31は、それらの上端部がセラミックに代えて樹脂またはゴムにより構成されてもよい。   (G) In the above embodiment, the plurality of lifting pins 31 are formed of ceramic, but the present invention is not limited to this. The upper end portions of the plurality of lifting pins 31 may be made of resin or rubber instead of ceramic.

この場合、支持部Sから複数の昇降ピン31に基板Wが渡される際に、基板Wの下面が複数の昇降ピン31に接触しても基板Wには傷が発生しにくい。したがって、連結部材32の移動速度の設定時に、上記の下降速度制限範囲LR1および上昇速度制限範囲LR2のうち、下降速度制限範囲LR1のみが決定されてもよい。すなわち、上昇時における連結部材32の移動速度を低くしなくてもよい。それにより、基板Wの受け渡しに要する時間をさらに短縮することができる。   In this case, when the substrate W is transferred from the support portion S to the plurality of lift pins 31, even if the lower surface of the substrate W contacts the plurality of lift pins 31, the substrate W is unlikely to be scratched. Therefore, at the time of setting the moving speed of the connecting member 32, only the falling speed limit range LR1 may be determined among the falling speed limit range LR1 and the rising speed limit range LR2. That is, the moving speed of the connecting member 32 at the time of rising may not be reduced. Thereby, the time required for delivery of the substrate W can be further shortened.

(7)請求項の各構成要素と実施の形態の各要素との対応関係
以下、請求項の各構成要素と実施の形態の各要素との対応の例について説明するが、本発明は下記の例に限定されない。
(7) Correspondence Between Each Component of the Claim and Each Element of Embodiment Hereinafter, an example of the correspondence between each component of the claim and each element of the embodiment will be described. It is not limited to the example.

上記実施の形態では、支持部Sが支持部の例であり、複数の昇降ピン31が複数の昇降部材の例であり、連結部材32が連結部材の例であり、送り軸33、モータ34およびモータ駆動回路35が受渡駆動部の例であり、設定部材90が設定部材の例であり、複数の圧力センサ99、送信装置60、受信装置70および圧力検出部41が検出部の例である。   In the above embodiment, the support portion S is an example of a support portion, the plurality of elevation pins 31 are examples of a plurality of elevation members, and the connection member 32 is an example of a connection member. The motor drive circuit 35 is an example of a delivery drive unit, the setting member 90 is an example of a setting member, and the plurality of pressure sensors 99, the transmitter 60, the receiver 70, and the pressure detector 41 are examples of a detector.

また、移動制御部44が移動制御部の例であり、位置決定部42が位置決定部の例であり、範囲決定部48が範囲決定部の例であり、移動速度設定部49が移動速度設定部49の例であり、速度制限範囲、下降速度制限範囲LR1および上昇速度制限範囲LR2が速度制限範囲の例であり、受渡制御部45が受渡制御部の例であり、熱処理装置100が基板受渡システムの例である。   The movement control unit 44 is an example of a movement control unit, the position determination unit 42 is an example of a position determination unit, the range determination unit 48 is an example of a range determination unit, and the movement speed setting unit 49 is a movement speed setting. In the example of the unit 49, the speed limit range, the falling speed limit range LR1, and the rising speed limit range LR2 are examples of the speed limit range, the delivery control unit 45 is an example of the delivery control unit, and the heat treatment apparatus 100 delivers the substrate. It is an example of a system.

また、圧力決定部47が圧力決定部の例であり、下降速度制限範囲LR1が下降速度制限範囲の例であり、上昇速度制限範囲LR2が上昇速度制限範囲の例であり、熱処理プレート10の上面が支持面の例であり、複数の突起部材11が複数の突起部材の例であり、発熱体20が熱処理機構の例である。   Further, the pressure determination unit 47 is an example of a pressure determination unit, the falling speed limit range LR1 is an example of a falling speed limit range, and the rising speed limit range LR2 is an example of a rising speed limit range. Is an example of a support surface, the plurality of projecting members 11 is an example of a plurality of projecting members, and the heating element 20 is an example of a heat treatment mechanism.

請求項の各構成要素として、請求項に記載されている構成または機能を有する他の種々の要素を用いることもできる。   As each component of a claim, other various elements having the configuration or function described in the claim can also be used.

本発明は、種々の基板の処理に有効に利用することができる。   The present invention can be effectively used for processing of various substrates.

10…熱処理プレート,11…突起部材,12…ガイド部材,13…貫通孔,20…発熱体,21…発熱駆動回路,30…昇降装置,31…昇降ピン,32…連結部材,33…送り軸,34…モータ,35…モータ駆動回路,40…制御装置,41…圧力検出部,42…位置決定部,43…位置検出部,44…移動制御部,45…受渡制御部,46…温度調整部,47…圧力決定部,48…範囲決定部,49…移動速度設定部,50…記憶部,60…送信装置,61…信号出力回路,62…送信回路,63…送信アンテナ,70…受信装置,90…設定部材,90a…一面,90b…他面,91…被支持部,92…凹状部,99…圧力センサ,100…熱処理装置,400…基板処理装置,410…制御部,420…塗布処理部,430…現像処理部,440…熱処理部,450…基板搬送装置,500…露光装置,LR1…下降速度制限範囲,LR2…上昇速度制限範囲,PA…上方位置,PB…下方位置,RP…基準位置,S…支持部,W…基板   DESCRIPTION OF SYMBOLS 10 Heat treatment plate 11 Protruding member 12 Guide member 13 Through hole 20 Heating element 21 Heat generation driving circuit 30 Lifting device 31 Lifting pin 31 Connecting member 33 Feeding shaft , 34: motor, 35: motor drive circuit, 40: control device, 41: pressure detection unit, 42: position determination unit, 43: position detection unit, 44: movement control unit, 45: delivery control unit, 46: temperature adjustment 5, 47: pressure determination unit, 48: range determination unit, 49: moving speed setting unit, 50: storage unit, 60: transmission device, 61: signal output circuit, 62: transmission circuit, 63: transmission antenna, 70: reception Device, 90: setting member, 90a: one surface, 90b: other surface, 91: supported portion, 92: concave portion, 99: pressure sensor, 100: heat treatment device, 400: substrate processing device, 410: control unit, 420: Coating processing unit, 430 ... present Processing unit 440 Heat treatment unit 450 Substrate transfer device 500 Exposure device LR1 Falling speed restriction range LR2 Rising speed restriction range PA Upper position PB Lower position RP Reference position S Support part, W ... board

Claims (8)

基板の処理時に基板の下面を支持するように構成された支持部と、
基板の下面を支持可能な上端部をそれぞれ有する3以上の複数の昇降部材と、
前記複数の昇降部材を連結するとともに前記支持部に対して上下方向に移動可能に構成された連結部材と、
前記支持部と前記複数の昇降部材との間での基板の受け渡し時に、前記複数の昇降部材の上端部が前記支持部の上端部よりも上方の位置と前記支持部の上端部よりも下方の位置との間で移動するように、前記連結部材を移動させる受渡駆動部と、
前記複数の昇降部材により支持可能に構成された設定部材と、
前記設定部材が前記複数の昇降部材により支持されたときに前記複数の昇降部材から前記設定部材の複数の部分にそれぞれ加えられる圧力を検出する検出部と
前記連結部材の移動速度の設定時に、前記受渡駆動部を制御することにより前記支持部により前記設定部材が支持された状態で前記複数の昇降部材の上端部が前記支持部の上端部よりも下方の位置から前記支持部の上端部よりも上方の位置へ移動するように、前記連結部材を移動させる移動制御部と、
前記移動制御部による前記連結部材の移動中に、前記検出部の出力信号に基づいて前記複数の昇降部材から前記設定部材の前記複数の部分にそれぞれ加えられる複数の圧力の値が予め定められた複数の基準圧力値にそれぞれ到達したか否かを判定し、前記複数の圧力の値が前記複数の基準圧力値にそれぞれ到達したときの前記連結部材の上下方向の位置を基準位置として決定する位置決定部と、
前記基板の受け渡し時における前記連結部材の移動範囲のうち前記決定された基準位置を含む一部の範囲を速度制限範囲として決定する範囲決定部と、
前記速度制限範囲内での前記連結部材の移動速度が前記速度制限範囲外での前記連結部材の移動速度よりも低くなるように、前記基板の受け渡し時における前記連結部材の移動速度を設定する移動速度設定部と、
前記基板の受け渡し時に、前記移動速度設定部により設定された移動速度で前記連結部材が移動するように前記受渡駆動部を制御する受渡制御部とを備える、基板受渡システム。
A support configured to support the lower surface of the substrate during processing of the substrate;
Three or more elevating members each having an upper end capable of supporting the lower surface of the substrate;
A connecting member configured to connect the plurality of elevating members and configured to be movable in the vertical direction with respect to the support portion;
At the time of delivery of the substrate between the supporting portion and the plurality of elevating members, upper ends of the plurality of elevating members are located above the upper end of the supporting portion and below the upper end of the supporting portion. A delivery drive for moving the connecting member to move between the positions;
A setting member configured to be supported by the plurality of elevating members;
When setting the moving speed of the connection member, a detection unit that detects the pressure applied to the plurality of portions of the setting member from the plurality of elevating members when the setting member is supported by the plurality of elevating members In a state where the setting member is supported by the support portion by controlling the delivery drive portion, the upper end portions of the plurality of elevating members are lower than the upper end portion of the support portion than the upper end portion of the support portion A movement control unit for moving the connection member to move to the upper position;
During movement of the connection member by the movement control unit, values of a plurality of pressures respectively applied to the plurality of portions of the setting member from the plurality of elevation members based on an output signal of the detection unit are predetermined. It is determined whether or not each of a plurality of reference pressure values has been reached, and a position at which the vertical position of the connecting member when each of the plurality of pressure values reaches each of the plurality of reference pressure values is determined as a reference position. The decision unit,
A range determination unit which determines a partial range including the determined reference position in the movement range of the connection member at the time of delivery of the substrate as the speed limit range;
Movement for setting the movement speed of the connection member at the time of delivery of the substrate such that the movement speed of the connection member within the speed restriction range is lower than the movement speed of the connection member outside the speed restriction range Speed setting unit,
A delivery control unit configured to control the delivery drive unit such that the connection member is moved at the moving speed set by the moving speed setting unit when the substrate is transferred.
前記複数の昇降部材により前記設定部材が支持された状態で前記複数の昇降部材から前記設定部材の前記複数の部分にそれぞれ加えられる複数の圧力の値に基づいて前記複数の基準圧力値を決定する圧力決定部をさらに備える、請求項1記載の基板受渡システム。 The plurality of reference pressure values are determined based on values of a plurality of pressures respectively applied to the plurality of portions of the setting member from the plurality of elevating members while the setting member is supported by the plurality of elevating members. The substrate delivery system according to claim 1, further comprising a pressure determination unit. 前記範囲決定部は、前記基板の受け渡しのために前記連結部材が下降するときの速度制限範囲を下降速度制限範囲として決定し、
前記下降速度制限範囲の上限は、前記基準位置よりも上方に位置し、
前記移動速度設定部は、前記下降速度制限範囲内で下降するときの前記連結部材の移動速度が前記速度制限範囲外で下降するときの前記連結部材の移動速度よりも低くなるように、前記連結部材の移動速度を設定する、請求項1または2記載の基板受渡システム。
The range determining unit determines a speed limit range when the connecting member is lowered for delivery of the substrate as a lowering speed limit range.
The upper limit of the falling speed limitation range is located above the reference position,
The moving speed setting unit is configured such that the moving speed of the connecting member when moving down within the lowering speed limit range is lower than the moving speed of the connecting member when moving down outside the speed limit range. The substrate delivery system according to claim 1, wherein the moving speed of the member is set.
前記範囲決定部は、前記基板の受け渡しのために前記連結部材が上昇するときの速度制限範囲を上昇速度制限範囲として決定し、
前記上昇速度制限範囲の下限は、前記基準位置よりも下方に位置し、
前記移動速度設定部は、前記上昇速度制限範囲内で上昇するときの前記連結部材の移動速度が前記上昇速度制限範囲外で上昇するときの前記連結部材の移動速度よりも低くなるように、前記連結部材の移動速度を設定する、請求項1または2記載の基板受渡システム。
The range determination unit determines a speed limit range when the connection member is raised for delivery of the substrate as a rising speed limit range.
The lower limit of the rising speed limit range is located below the reference position,
The moving speed setting unit is configured such that the moving speed of the connecting member when rising within the rising speed limit range is lower than the moving speed of the connecting member when rising outside the rising speed limit range. The substrate delivery system according to claim 1, wherein a moving speed of the connecting member is set.
前記設定部材は、基板と同じ外形を有する、請求項1〜4のいずれか一項に記載の基板受渡システム。 The substrate delivery system according to any one of claims 1 to 4, wherein the setting member has the same outer shape as the substrate. 前記設定部材は、樹脂で形成された、請求項1〜5のいずれか一項に記載の基板受渡システム。 The said setting member is a board | substrate delivery system as described in any one of Claims 1-5 formed by resin. 前記支持部は、
平坦な支持面と、
前記支持面から上方に突出するように設けられるとともに、基板の下面を支持可能に構成された複数の突起部材と、
前記複数の突起部材により支持された基板に熱処理を行う熱処理機構とを含む、請求項1〜6のいずれか一項に記載の基板受渡システム。
The support portion is
A flat support surface,
A plurality of projecting members provided so as to project upward from the support surface and capable of supporting the lower surface of the substrate;
The substrate delivery system according to any one of claims 1 to 6, further comprising: a heat treatment mechanism that performs a heat treatment on the substrate supported by the plurality of projecting members.
基板の処理時に基板の下面を支持するように構成された支持部と基板の下面を支持可能な上端部をそれぞれ有する3以上の複数の昇降部材との間で基板の受け渡しを行うための基板受渡方法であって、
前記複数の昇降部材は、前記支持部に対して上下方向に移動可能に構成された連結部材により連結され、
前記連結部材は、前記支持部と前記複数の昇降部材との間での基板の受け渡し時に、前記複数の昇降部材の上端部が前記支持部の上端部よりも上方の位置と前記支持部の上端部よりも下方の位置との間で移動するように移動し、
前記基板受渡方法は、
前記連結部材の移動速度の設定時に、前記複数の昇降部材により支持可能に構成された設定部材を前記支持部により支持するステップと、
前記設定部材が前記支持部に支持された状態で前記複数の昇降部材の上端部が前記支持部の上端部よりも下方の位置から前記支持部の上端部よりも上方の位置へ移動するように、前記連結部材を移動させるステップと、
前記設定部材が前記複数の昇降部材により支持されたときに前記複数の昇降部材から前記設定部材の複数の部分にそれぞれ加えられる圧力を検出するステップと、
前記連結部材の移動中に、前記検出するステップの検出結果に基づいて前記複数の昇降部材から前記設定部材の前記複数の部分にそれぞれ加えられる複数の圧力の値が予め定められた複数の基準圧力値にそれぞれ到達したか否かを判定し、前記複数の圧力の値が前記複数の基準圧力値にそれぞれ到達したときの前記連結部材の上下方向の位置を基準位置として決定するステップと、
前記基板の受け渡し時における前記連結部材の移動範囲のうち前記決定された基準位置を含む一部の範囲を速度制限範囲として決定するステップと、
前記速度制限範囲内での前記連結部材の移動速度が前記速度制限範囲外での前記連結部材の移動速度よりも低くなるように、前記基板の受け渡し時における前記連結部材の移動速度を設定するステップと、
前記基板の受け渡し時に、前記設定するステップにより設定された移動速度で前記連結部材が移動するように前記連結部材を移動させるステップとを含む、基板受渡方法。
Substrate delivery for delivering a substrate between a support configured to support the lower surface of the substrate at the time of processing the substrate and a plurality of three or more elevation members each having an upper end capable of supporting the lower surface of the substrate Method,
The plurality of elevating members are connected by a connecting member configured to be movable in the vertical direction with respect to the support portion,
In the connection member, when the substrate is transferred between the support portion and the plurality of elevating members, the upper end portion of the plurality of elevating members is located above the upper end portion of the support portion and the upper end of the support portion Move to move to a position lower than the
The substrate delivery method is
Supporting the setting member configured to be supported by the plurality of raising and lowering members by the support portion at the time of setting the moving speed of the connection member;
In a state where the setting member is supported by the support portion, upper end portions of the plurality of elevating members move from a position below the upper end portion of the support portion to a position above the upper end portion of the support portion Moving the connecting member;
Detecting the pressure applied to the plurality of portions of the setting member from the plurality of elevating members when the setting member is supported by the plurality of elevating members;
A plurality of reference pressures in which a plurality of pressure values respectively applied to the plurality of portions of the setting member from the plurality of elevating members based on the detection result of the detecting step while the connecting member is moving Determining whether each of the plurality of pressure values has reached each of the plurality of reference pressure values, as the reference position.
Determining a partial range including the determined reference position of the movement range of the connecting member at the time of delivery of the substrate as the speed limit range;
Setting the moving speed of the connecting member at the time of delivery of the substrate such that the moving speed of the connecting member within the speed limit range is lower than the moving speed of the connecting member outside the speed limit range When,
Moving the connecting member such that the connecting member moves at the moving speed set in the setting step when transferring the substrate.
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