JP2019083243A5 - - Google Patents
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- Publication number
- JP2019083243A5 JP2019083243A5 JP2017209114A JP2017209114A JP2019083243A5 JP 2019083243 A5 JP2019083243 A5 JP 2019083243A5 JP 2017209114 A JP2017209114 A JP 2017209114A JP 2017209114 A JP2017209114 A JP 2017209114A JP 2019083243 A5 JP2019083243 A5 JP 2019083243A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- partial
- partial region
- conductive
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 41
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 8
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 8
- 239000012535 impurity Substances 0.000 description 2
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017209114A JP2019083243A (ja) | 2017-10-30 | 2017-10-30 | 半導体装置及びその製造方法 |
| US15/902,360 US10381441B2 (en) | 2017-10-30 | 2018-02-22 | Semiconductor device and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017209114A JP2019083243A (ja) | 2017-10-30 | 2017-10-30 | 半導体装置及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019083243A JP2019083243A (ja) | 2019-05-30 |
| JP2019083243A5 true JP2019083243A5 (enExample) | 2020-03-26 |
Family
ID=66244950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017209114A Pending JP2019083243A (ja) | 2017-10-30 | 2017-10-30 | 半導体装置及びその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US10381441B2 (enExample) |
| JP (1) | JP2019083243A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019110160A (ja) * | 2017-12-15 | 2019-07-04 | 株式会社東芝 | 半導体装置 |
| JP7204491B2 (ja) * | 2019-01-08 | 2023-01-16 | 株式会社東芝 | 半導体装置 |
| US11769828B2 (en) | 2020-10-28 | 2023-09-26 | Wolfspeed, Inc. | Gate trench power semiconductor devices having improved deep shield connection patterns |
| US12080790B2 (en) * | 2020-10-28 | 2024-09-03 | Wolfspeed, Inc. | Power semiconductor devices including angled gate trenches |
| US11610991B2 (en) | 2020-10-28 | 2023-03-21 | Wolfspeed, Inc. | Gate trench power semiconductor devices having improved deep shield connection patterns |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6090805A (ja) | 1983-10-25 | 1985-05-22 | Kobe Steel Ltd | 不透過性炭素成形体の製造方法 |
| JPS647826A (en) | 1987-06-30 | 1989-01-11 | Fujikura Ltd | Switching method for optical line |
| JPH11354780A (ja) * | 1998-06-03 | 1999-12-24 | Nissan Motor Co Ltd | 半導体装置及びその製造方法 |
| DE59814430D1 (de) | 1998-12-18 | 2010-03-25 | Infineon Technologies Ag | Feldeffekt-transistoranordnung mit einer grabenförmigen gate-elektrode und einer zusätzlichen hochdotierten schicht im bodygebiet |
| JP5531787B2 (ja) * | 2010-05-31 | 2014-06-25 | 株式会社デンソー | 炭化珪素半導体装置およびその製造方法 |
| JP5498431B2 (ja) * | 2011-02-02 | 2014-05-21 | ローム株式会社 | 半導体装置およびその製造方法 |
| JP2014099670A (ja) | 2011-02-02 | 2014-05-29 | Rohm Co Ltd | 半導体装置およびその製造方法 |
| JP2015207588A (ja) | 2014-04-17 | 2015-11-19 | ローム株式会社 | 半導体装置 |
| JP6667893B2 (ja) | 2015-10-20 | 2020-03-18 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
-
2017
- 2017-10-30 JP JP2017209114A patent/JP2019083243A/ja active Pending
-
2018
- 2018-02-22 US US15/902,360 patent/US10381441B2/en not_active Expired - Fee Related
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