JP2019060005A - プラズマ窒化方法 - Google Patents

プラズマ窒化方法 Download PDF

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Publication number
JP2019060005A
JP2019060005A JP2017187387A JP2017187387A JP2019060005A JP 2019060005 A JP2019060005 A JP 2019060005A JP 2017187387 A JP2017187387 A JP 2017187387A JP 2017187387 A JP2017187387 A JP 2017187387A JP 2019060005 A JP2019060005 A JP 2019060005A
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Japan
Prior art keywords
plasma
voltage
temperature
process gas
nitriding method
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JP2017187387A
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Japanese (ja)
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JP2019060005A5 (enExample
Inventor
宏樹 出岡
Hiroki Ideoka
宏樹 出岡
松尾　英明
Hideaki Matsuo
英明 松尾
成剛 高島
Seigo Takashima
成剛 高島
進 市村
Susumu Ichimura
進 市村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NAKANIHON ROKOGYO KK
Nagoya Industries Promotion Corp
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NAKANIHON ROKOGYO KK
Nagoya Industries Promotion Corp
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Priority to JP2017187387A priority Critical patent/JP2019060005A/ja
Publication of JP2019060005A publication Critical patent/JP2019060005A/ja
Publication of JP2019060005A5 publication Critical patent/JP2019060005A5/ja
Pending legal-status Critical Current

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  • Plasma Technology (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
JP2017187387A 2017-09-28 2017-09-28 プラズマ窒化方法 Pending JP2019060005A (ja)

Priority Applications (1)

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JP2017187387A JP2019060005A (ja) 2017-09-28 2017-09-28 プラズマ窒化方法

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JP2017187387A JP2019060005A (ja) 2017-09-28 2017-09-28 プラズマ窒化方法

Publications (2)

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JP2019060005A true JP2019060005A (ja) 2019-04-18
JP2019060005A5 JP2019060005A5 (enExample) 2019-05-30

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JP2017187387A Pending JP2019060005A (ja) 2017-09-28 2017-09-28 プラズマ窒化方法

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116479371A (zh) * 2023-04-13 2023-07-25 江西省检验检测认证总院工业产品检验检测院 一种碳钢储罐内壁Cr2N耐蚀涂层及其制备方法
EP4249626A1 (de) * 2022-03-22 2023-09-27 Plasmanitriertechnik Dr. Böhm GmbH Verfahren und vorrichtung zum plasmanitrieren und anschliessendem oxidieren einer oberfläche eines bauteils
JP7582749B2 (ja) 2021-05-20 2024-11-13 東京エレクトロン株式会社 温度制御方法及び温度制御装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
""The influence of active screen plasma nitriding parameters on corrosion behavior of a low-alloy ste", JOURNAL OF ALLOYS AND COMPOUNDS, vol. Volume 484, Issues 1-2, JPN6021037322, 2009, pages 222 - 229, ISSN: 0004600560 *
"「アクティブスクリーンプラズマ窒化装置と処理特性」", 工業加熱, vol. 第44巻、第2号, JPN6021016272, 2007, pages 41 - 45, ISSN: 0004600559 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7582749B2 (ja) 2021-05-20 2024-11-13 東京エレクトロン株式会社 温度制御方法及び温度制御装置
EP4249626A1 (de) * 2022-03-22 2023-09-27 Plasmanitriertechnik Dr. Böhm GmbH Verfahren und vorrichtung zum plasmanitrieren und anschliessendem oxidieren einer oberfläche eines bauteils
CN116479371A (zh) * 2023-04-13 2023-07-25 江西省检验检测认证总院工业产品检验检测院 一种碳钢储罐内壁Cr2N耐蚀涂层及其制备方法
CN116479371B (zh) * 2023-04-13 2025-09-26 江西省检验检测认证总院工业产品检验检测院 一种碳钢储罐内壁Cr2N耐蚀涂层及其制备方法

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