JP2019040971A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP2019040971A JP2019040971A JP2017160887A JP2017160887A JP2019040971A JP 2019040971 A JP2019040971 A JP 2019040971A JP 2017160887 A JP2017160887 A JP 2017160887A JP 2017160887 A JP2017160887 A JP 2017160887A JP 2019040971 A JP2019040971 A JP 2019040971A
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- JP
- Japan
- Prior art keywords
- semiconductor device
- sealing member
- region
- embedded
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Abstract
【解決手段】半導体装置10は、封止部材25と封止部材25により封止される放熱部30の被封止領域Bの埋設部33との線膨張係数の差は±25%以内であるため、放熱部30の被封止領域Bにおける封止部材25の剥離の発生が抑制される。さらに、放熱部30は、平板部31及びフィン部32がアルミニウムまたはアルミニウム合金で構成されており、平板部31及びフィン部32よりも体積が小さい埋設部33が銅または銅合金により構成されているため、放熱部30の軽量化を図ることができる。
【選択図】図1
Description
まず、第1の実施の形態の半導体装置について図1及び図2を用いて説明する。
第2の実施の形態では、第1の実施の形態の半導体装置10において、放熱部30の平板部31の掘り込み部分の側面と埋設部33の側面との合わせ面(境界)がセラミック回路基板21の下部に位置する場合を例に挙げて説明する。
第3の実施の形態では、半導体素子及びセラミック回路基板等がケースに収納された半導体装置について、図6及び図7を用いて説明する。
第4の実施の形態では、第3の実施の形態の半導体装置10bにおいて、放熱部30bの平板部31bと埋設部33bとの合わせ面(境界)がケースの下に位置する場合を例に挙げて説明する。
第5の実施の形態では、第1の実施の形態の半導体装置10にケースを取り付けた場合を例に挙げて説明する。
第6の実施の形態では、第5の実施の形態の半導体装置10dにおいて、放熱部30cの平板部31cと埋設部33cとの合わせ面がそれぞれケース26及びセラミック回路基板21の下部に位置する場合を例に挙げて説明する。
第7の実施の形態では、第3の実施の形態の半導体装置10bにおいて、放熱部30bの被封止領域Bに凸部を形成した場合を例に挙げて説明する。
第8の実施の形態では、第3の実施の形態の半導体装置10bにおいて、放熱部30bの被封止領域Bに凹部を形成した場合を例に挙げて説明する。
20,20a,20b 半導体ユニット
21 セラミック回路基板
21a 絶縁板
21b 金属板
21c 回路板
22a,22b 半導体素子
23 接続端子
24a,24b,24c はんだ
25 封止部材
26,36 ケース
26c,36c 開口
26a1,26b1 内部接続部
26a2,26b2 外部接続部
27a,27b ボンディングワイヤ
28 接合材
29a,29b 外部接続端子
30,30a,30b,30c,30d,30e,30f 放熱部
31,31a,31b,31c,31d 平板部
32 フィン部
33,33a,33b,33c,33d 埋設部
33a1,33a2,33d1,33d2 合わせ面
33b1 凸部
33b2 凹部
36c1,36c2 内壁面
A 搭載領域
B 被封止領域
C 配置領域
Claims (20)
- 半導体素子と、
絶縁板と前記絶縁板のおもて面に形成される回路板とを有し、前記回路板の主面に前記半導体素子が配置される基板と、
第1金属材料で構成される基体部と、前記基体部のおもて面に埋設され、第2金属材料で構成される埋設部とを有する放熱部と、
前記半導体素子、前記基板及び前記放熱部のおもて面を封止する封止部材と、
を有し、
前記放熱部のおもて面は、前記基板が配置される搭載領域と、前記搭載領域に隣接し、前記封止部材により封止される被封止領域とを備え、少なくとも前記被封止領域に前記埋設部が形成され、
前記第2金属材料の線膨張係数が、前記第1金属材料よりも小さく、前記封止部材との差が±25%以内である半導体装置。 - 前記被封止領域は、前記搭載領域の周囲を取り囲んでいる、
請求項1に記載の半導体装置。 - 前記埋設部は、前記被封止領域と共に前記搭載領域に埋設されている、
請求項2に記載の半導体装置。 - 前記第1金属材料の比重は前記第2金属材料の比重よりも小さい、
請求項1に記載の半導体装置。 - 前記第2金属材料の線膨張係数は、10.5ppm/℃以上、22.5ppm/℃以下である、
請求項1に記載の半導体装置。 - 前記第2金属材料の線膨張係数は、16.0ppm/℃以上、18.0ppm/℃以下である、
請求項5に記載の半導体装置。 - 前記第2金属材料は、銅、銅合金または金属基複合材料である、
請求項5または6に記載の半導体装置。 - 前記金属基複合材料は、炭化シリコンを含む複合材料である、
請求項7に記載の半導体装置。 - 前記金属基複合材料は、前記炭化シリコンに対して、アルミニウムまたはマグネシウムのいずれかを含む、
請求項8に記載の半導体装置。 - 前記埋設部の前記搭載領域側の前記基体部との内側境界が前記基板の下部に位置している、
請求項1に記載の半導体装置。 - 前記封止部材は、その線膨張係数が、14.0ppm/℃以上、18.0ppm/℃以下である、
請求項1に記載の半導体装置。 - 前記封止部材は、エポキシ樹脂と前記エポキシ樹脂に含有された充填材とを含む、
請求項11に記載の半導体装置。 - 前記充填材は、二酸化シリコン、酸化アルミニウム、窒化ホウ素または窒化アルミニウムである、
請求項12に記載の半導体装置。 - 前記第1金属材料は、アルミニウムまたはアルミニウム合金である、
請求項1に記載の半導体装置。 - 前記放熱部のおもて面に前記被封止領域の周囲を取り囲む配置領域をさらに備え、前記配置領域上に接合材を介して配置されているケースをさらに有する、
請求項1に記載の半導体装置。 - 前記埋設部の前記配置領域側の前記基体部との外側境界が前記ケースの下部に位置している、
請求項15に記載の半導体装置。 - 前記放熱部は、前記埋設部上に複数の凸部が形成されている、
請求項1に記載の半導体装置。 - 前記放熱部は、前記埋設部上に複数の凹部が形成されている、
請求項1に記載の半導体装置。 - 前記放熱部の前記配置領域上に金属膜または酸化膜が形成されている、
請求項15に記載の半導体装置。 - 前記基体部は、
前記搭載領域及び前記被封止領域がおもて面に設定された平板状の平板部と、
前記平板部のおもて面の反対側の面に形成された複数のフィンを具備するフィン部と、
を備える請求項1に記載の半導体装置。
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