JP2019009089A - 電子ビーム表面改質装置 - Google Patents
電子ビーム表面改質装置 Download PDFInfo
- Publication number
- JP2019009089A JP2019009089A JP2017126558A JP2017126558A JP2019009089A JP 2019009089 A JP2019009089 A JP 2019009089A JP 2017126558 A JP2017126558 A JP 2017126558A JP 2017126558 A JP2017126558 A JP 2017126558A JP 2019009089 A JP2019009089 A JP 2019009089A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- cathode electrode
- irradiated
- irradiation
- irradiation hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/316—Changing physical properties
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
1C 密閉空間
2 移動装置
3 真空装置
4 稀ガス発生装置
5 電子ビーム発生装置
5A カソード電極
5B アノード電極
5C コレクタ
5D ソレノイド
5E カソード電極
5F グランドライン
5G 導電性メッシュ
5H 電子ビーム発生用電源装置
5J プラズマ発生用電源装置
5K スイッチ
6 浄化装置
7 被照射体
7A 照射穴
40 テーブル
50A 基体
50B 金属突起
Claims (1)
- 真空チャンバの中に設置された被照射体に形成されている照射穴の少なくとも側面に対向する基体の面の全面にわたって多数の金属突起を有するカソード電極と、少なくとも前記カソード電極と前記照射穴の側面との間に配設され前記被照射体と部分的に接触して前記被照射体と同電位にされた導電性メッシュと、を備える電子ビーム表面改質装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017126558A JP6450809B1 (ja) | 2017-06-28 | 2017-06-28 | 電子ビーム表面改質装置 |
US16/000,898 US10460907B2 (en) | 2017-06-28 | 2018-06-06 | Electron beam surface modification apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017126558A JP6450809B1 (ja) | 2017-06-28 | 2017-06-28 | 電子ビーム表面改質装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP6450809B1 JP6450809B1 (ja) | 2019-01-09 |
JP2019009089A true JP2019009089A (ja) | 2019-01-17 |
Family
ID=64738895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017126558A Active JP6450809B1 (ja) | 2017-06-28 | 2017-06-28 | 電子ビーム表面改質装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US10460907B2 (ja) |
JP (1) | JP6450809B1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6744694B1 (ja) * | 2019-12-03 | 2020-08-19 | 株式会社ソディック | 表面改質装置および表面改質方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0480377A (ja) * | 1990-07-19 | 1992-03-13 | Nissin Electric Co Ltd | 表面処理装置 |
JPH0518646U (ja) * | 1991-08-15 | 1993-03-09 | 日新ハイボルテージ株式会社 | 電子線照射装置 |
US20040232355A1 (en) * | 2003-05-21 | 2004-11-25 | Asm Japan K.K. | Gas-shield electron-beam gun for thin-film curing application |
JP2005076061A (ja) * | 2003-08-29 | 2005-03-24 | Sodick Co Ltd | 金属部材の表面改質加工方法及び表面改質加工装置 |
JP2006344387A (ja) * | 2005-06-07 | 2006-12-21 | Sodick Co Ltd | 電子ビーム表面改質方法及び装置 |
JP2008105065A (ja) * | 2006-10-26 | 2008-05-08 | Sodick Co Ltd | 電子ビーム照射表面改質装置 |
JP2010100904A (ja) * | 2008-10-24 | 2010-05-06 | Sodick Co Ltd | 表面改質装置および表面改質方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3890503A (en) * | 1968-11-29 | 1975-06-17 | Hewlett Packard Co | Stimulated emission light source pumped by electron beam of field emission initiated vacuum arc |
US3921022A (en) * | 1974-09-03 | 1975-11-18 | Rca Corp | Field emitting device and method of making same |
JPS5525039B2 (ja) | 1975-01-29 | 1980-07-03 | ||
US5013902A (en) * | 1989-08-18 | 1991-05-07 | Allard Edward F | Microdischarge image converter |
US5635791A (en) * | 1995-08-24 | 1997-06-03 | Texas Instruments Incorporated | Field emission device with circular microtip array |
US5903804A (en) * | 1996-09-30 | 1999-05-11 | Science Applications International Corporation | Printer and/or scanner and/or copier using a field emission array |
JP2003123623A (ja) * | 2001-10-19 | 2003-04-25 | Noritake Itron Corp | 電子放出源用カーボンナノチューブおよびその製造方法 |
JP2004111293A (ja) * | 2002-09-20 | 2004-04-08 | Japan Science & Technology Corp | 光放射素子 |
US20080191607A1 (en) * | 2004-09-03 | 2008-08-14 | Sumitomo Electric Industries, Ltd. | Phosphor, Method For Producing Same, And Light-Emitting Device Using Same |
US7568479B2 (en) * | 2007-12-21 | 2009-08-04 | Mario Rabinowitz | Fresnel solar concentrator with internal-swivel and suspended swivel mirrors |
-
2017
- 2017-06-28 JP JP2017126558A patent/JP6450809B1/ja active Active
-
2018
- 2018-06-06 US US16/000,898 patent/US10460907B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0480377A (ja) * | 1990-07-19 | 1992-03-13 | Nissin Electric Co Ltd | 表面処理装置 |
JPH0518646U (ja) * | 1991-08-15 | 1993-03-09 | 日新ハイボルテージ株式会社 | 電子線照射装置 |
US20040232355A1 (en) * | 2003-05-21 | 2004-11-25 | Asm Japan K.K. | Gas-shield electron-beam gun for thin-film curing application |
JP2005076061A (ja) * | 2003-08-29 | 2005-03-24 | Sodick Co Ltd | 金属部材の表面改質加工方法及び表面改質加工装置 |
JP2006344387A (ja) * | 2005-06-07 | 2006-12-21 | Sodick Co Ltd | 電子ビーム表面改質方法及び装置 |
JP2008105065A (ja) * | 2006-10-26 | 2008-05-08 | Sodick Co Ltd | 電子ビーム照射表面改質装置 |
JP2010100904A (ja) * | 2008-10-24 | 2010-05-06 | Sodick Co Ltd | 表面改質装置および表面改質方法 |
Also Published As
Publication number | Publication date |
---|---|
US20190006148A1 (en) | 2019-01-03 |
US10460907B2 (en) | 2019-10-29 |
JP6450809B1 (ja) | 2019-01-09 |
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