JP2018507933A5 - - Google Patents
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- JP2018507933A5 JP2018507933A5 JP2017542066A JP2017542066A JP2018507933A5 JP 2018507933 A5 JP2018507933 A5 JP 2018507933A5 JP 2017542066 A JP2017542066 A JP 2017542066A JP 2017542066 A JP2017542066 A JP 2017542066A JP 2018507933 A5 JP2018507933 A5 JP 2018507933A5
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- JP
- Japan
- Prior art keywords
- moiety
- aryl
- alkyl
- alkylene
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000000217 alkyl group Chemical group 0.000 claims 29
- 125000003118 aryl group Chemical group 0.000 claims 28
- 239000000203 mixture Substances 0.000 claims 28
- 125000002947 alkylene group Chemical group 0.000 claims 21
- 229910052739 hydrogen Inorganic materials 0.000 claims 9
- 239000001257 hydrogen Substances 0.000 claims 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 7
- 229920005862 polyol Polymers 0.000 claims 7
- -1 siloxanes Chemical class 0.000 claims 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims 6
- 125000005157 alkyl carboxy group Chemical group 0.000 claims 6
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 6
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims 6
- 125000002993 cycloalkylene group Chemical group 0.000 claims 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 5
- 229910052799 carbon Inorganic materials 0.000 claims 5
- 150000002431 hydrogen Chemical class 0.000 claims 5
- 150000003077 polyols Chemical group 0.000 claims 5
- 229910052710 silicon Inorganic materials 0.000 claims 5
- 239000010703 silicon Substances 0.000 claims 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 239000002904 solvent Substances 0.000 claims 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 3
- 150000002736 metal compounds Chemical class 0.000 claims 3
- 125000003107 substituted aryl group Chemical group 0.000 claims 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 2
- 229920000620 organic polymer Polymers 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims 1
- VFFFESPCCPXZOQ-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;oxirane Chemical compound C1CO1.OCC(CO)(CO)CO VFFFESPCCPXZOQ-UHFFFAOYSA-N 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 150000001298 alcohols Chemical group 0.000 claims 1
- 150000001408 amides Chemical class 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims 1
- 125000005594 diketone group Chemical group 0.000 claims 1
- 150000002148 esters Chemical group 0.000 claims 1
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 238000009499 grossing Methods 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 150000002576 ketones Chemical group 0.000 claims 1
- 150000002596 lactones Chemical group 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 150000002978 peroxides Chemical class 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 238000007725 thermal activation Methods 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 238000012876 topography Methods 0.000 claims 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/619,603 US9499698B2 (en) | 2015-02-11 | 2015-02-11 | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
| US14/619,603 | 2015-02-11 | ||
| PCT/EP2016/052167 WO2016128252A1 (en) | 2015-02-11 | 2016-02-02 | Metal hardmask composition and processes for forming fine patterns on semiconductor substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018507933A JP2018507933A (ja) | 2018-03-22 |
| JP2018507933A5 true JP2018507933A5 (enExample) | 2019-01-24 |
| JP6810696B2 JP6810696B2 (ja) | 2021-01-06 |
Family
ID=55275101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017542066A Active JP6810696B2 (ja) | 2015-02-11 | 2016-02-02 | ハードマスク組成物および半導体基板上での微細パターンの形成方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9499698B2 (enExample) |
| EP (1) | EP3257069B1 (enExample) |
| JP (1) | JP6810696B2 (enExample) |
| KR (1) | KR102367238B1 (enExample) |
| CN (1) | CN107251203B (enExample) |
| SG (1) | SG11201705487QA (enExample) |
| TW (1) | TWI669353B (enExample) |
| WO (1) | WO2016128252A1 (enExample) |
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| US11092890B2 (en) | 2018-07-31 | 2021-08-17 | Samsung Sdi Co., Ltd. | Semiconductor resist composition, and method of forming patterns using the composition |
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| US11609494B2 (en) * | 2019-04-30 | 2023-03-21 | Samsung Sdi Co., Ltd. | Semiconductor photoresist composition and method of forming patterns using the composition |
| US12099305B2 (en) | 2019-07-08 | 2024-09-24 | Merck Patent Gmbh | Rinse and method of use thereof for removing edge protection layers and residual metal hardmask components |
| KR102888630B1 (ko) | 2019-08-30 | 2025-11-19 | 램 리써치 코포레이션 | 저압에서의 고밀도, 고모듈러스, 및 고경도 비정질 탄소 막들 |
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| US9296922B2 (en) | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
-
2015
- 2015-02-11 US US14/619,603 patent/US9499698B2/en active Active
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2016
- 2016-02-02 SG SG11201705487QA patent/SG11201705487QA/en unknown
- 2016-02-02 CN CN201680009834.6A patent/CN107251203B/zh active Active
- 2016-02-02 WO PCT/EP2016/052167 patent/WO2016128252A1/en not_active Ceased
- 2016-02-02 KR KR1020177025519A patent/KR102367238B1/ko active Active
- 2016-02-02 EP EP16702558.4A patent/EP3257069B1/en active Active
- 2016-02-02 JP JP2017542066A patent/JP6810696B2/ja active Active
- 2016-02-05 TW TW105104156A patent/TWI669353B/zh active
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