JP2018507323A - スパッタリング用フッ素系高分子複合ターゲット - Google Patents
スパッタリング用フッ素系高分子複合ターゲット Download PDFInfo
- Publication number
- JP2018507323A JP2018507323A JP2017539574A JP2017539574A JP2018507323A JP 2018507323 A JP2018507323 A JP 2018507323A JP 2017539574 A JP2017539574 A JP 2017539574A JP 2017539574 A JP2017539574 A JP 2017539574A JP 2018507323 A JP2018507323 A JP 2018507323A
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- JP
- Japan
- Prior art keywords
- fluorine
- based polymer
- composite target
- polymer composite
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title claims abstract description 184
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 182
- 239000011737 fluorine Substances 0.000 title claims abstract description 182
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 180
- 239000002131 composite material Substances 0.000 title claims abstract description 138
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 82
- 229910052751 metal Inorganic materials 0.000 claims abstract description 60
- 239000002184 metal Substances 0.000 claims abstract description 60
- 238000000034 method Methods 0.000 claims description 82
- 239000003795 chemical substances by application Substances 0.000 claims description 66
- 150000002736 metal compounds Chemical class 0.000 claims description 65
- 238000000151 deposition Methods 0.000 claims description 63
- 230000008021 deposition Effects 0.000 claims description 48
- 229920002313 fluoropolymer Polymers 0.000 claims description 42
- -1 polypyrene Polymers 0.000 claims description 40
- 239000004811 fluoropolymer Substances 0.000 claims description 38
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 38
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 38
- 239000010410 layer Substances 0.000 claims description 36
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 31
- 239000002245 particle Substances 0.000 claims description 27
- 238000007740 vapor deposition Methods 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 21
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 18
- 239000002041 carbon nanotube Substances 0.000 claims description 18
- 229920001940 conductive polymer Polymers 0.000 claims description 17
- 229920001971 elastomer Polymers 0.000 claims description 13
- 239000002346 layers by function Substances 0.000 claims description 11
- 239000004812 Fluorinated ethylene propylene Substances 0.000 claims description 10
- 229920001577 copolymer Polymers 0.000 claims description 10
- 229920009441 perflouroethylene propylene Polymers 0.000 claims description 10
- 239000004020 conductor Substances 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 229920001774 Perfluoroether Polymers 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 239000006229 carbon black Substances 0.000 claims description 6
- 230000002829 reductive effect Effects 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 5
- 229920001519 homopolymer Polymers 0.000 claims description 5
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 claims description 5
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 claims description 5
- 229920000128 polypyrrole Polymers 0.000 claims description 5
- 229920001780 ECTFE Polymers 0.000 claims description 4
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 claims description 4
- 229910002804 graphite Inorganic materials 0.000 claims description 4
- 239000010439 graphite Substances 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 229910000000 metal hydroxide Inorganic materials 0.000 claims description 4
- 150000004692 metal hydroxides Chemical class 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 4
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 4
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 3
- UJOBWOGCFQCDNV-UHFFFAOYSA-N Carbazole Natural products C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 claims description 3
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 3
- 229920000265 Polyparaphenylene Polymers 0.000 claims description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- 239000004917 carbon fiber Substances 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 claims description 3
- 229910021389 graphene Inorganic materials 0.000 claims description 3
- 239000013212 metal-organic material Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229920000553 poly(phenylenevinylene) Polymers 0.000 claims description 3
- 229920001197 polyacetylene Polymers 0.000 claims description 3
- 229920000767 polyaniline Polymers 0.000 claims description 3
- 229920001088 polycarbazole Polymers 0.000 claims description 3
- 229920002098 polyfluorene Polymers 0.000 claims description 3
- 229920000414 polyfuran Polymers 0.000 claims description 3
- 229920000417 polynaphthalene Polymers 0.000 claims description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 3
- 229920000123 polythiophene Polymers 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000004698 Polyethylene Substances 0.000 claims description 2
- 239000002134 carbon nanofiber Substances 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229920000329 polyazepine Polymers 0.000 claims description 2
- 229920000323 polyazulene Polymers 0.000 claims description 2
- 229920000573 polyethylene Polymers 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 238000003856 thermoforming Methods 0.000 claims 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 claims 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 66
- 229940058401 polytetrafluoroethylene Drugs 0.000 description 37
- 230000000704 physical effect Effects 0.000 description 19
- 238000002834 transmittance Methods 0.000 description 19
- 239000000758 substrate Substances 0.000 description 17
- 230000000694 effects Effects 0.000 description 13
- 238000002156 mixing Methods 0.000 description 13
- 238000001755 magnetron sputter deposition Methods 0.000 description 12
- 238000000427 thin-film deposition Methods 0.000 description 12
- 239000000843 powder Substances 0.000 description 11
- 238000000748 compression moulding Methods 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 238000001552 radio frequency sputter deposition Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 230000000670 limiting effect Effects 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000005661 hydrophobic surface Effects 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000005477 sputtering target Methods 0.000 description 3
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 2
- 229910016509 CuF 2 Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000006258 conductive agent Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
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- 229920003002 synthetic resin Polymers 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 208000006930 Pseudomyxoma Peritonei Diseases 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920001038 ethylene copolymer Polymers 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003100 immobilizing effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
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- 150000002739 metals Chemical class 0.000 description 1
- 239000002121 nanofiber Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
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Abstract
Description
完成された薄膜の水接触角を接触角測定装置(PHOEIX 300 TOUCH,SEO社製)を使用して測定した。
完成された薄膜にSpectrophotometer(U‐4100、Hitachi社製)を用いて光を照射し、可視光線(550nm)の透過率を測定した。
完成されたターゲットをCuバックキングプレートとSiエラストマー(Hankel、Loctite ABLESTIK ICP 4298)を用いて接着した後、接着維持時間を測定した。
完成されたターゲットの表面シート抵抗を4‐point probe(MCP‐T610、Mitsubishi Chemical Analytech社製)を用いて測定した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)20wt%、銅粉末(平均粒径25μm)80wt%を用いて電極面と接合する接合層(厚さ1.0mm)を、前記接合層の上部に形成される蒸着層である機能層はPTFE80wt%、銅粉末20wt%を用いて厚さ5.0mmにした後、金型(横120mm、縦55mm、厚さ30mm)の上部に順に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。
粉末PTFE(polytetrafluoroethylene)20wt%および銅80wt%を用いて接合層(厚さ1.0mm)を、前記接合層の上部にPTFE(polytetrafluoroethylene)100wt%を用いて機能層(厚さ5.0mm)を有するフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した後、前記実施例1の方法と同様、100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene)80wt%および銀(Ag)20wt%を均一に混合した後、金型(横120mm、縦55mm、厚さ30mm)の上部に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した後、前記実施例1の方法と同様、100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)80wt%および銅(平均粒径25μm)10wt%とTiO2(平均粒径20μm)10wt%を均一に混合した後、金型(120mm、縦55mm、厚さ30mm)の上部に入れて300kgf/cm2の条件で圧縮成形して、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した後、前記実施例1の方法と同様、100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)80wt%およびシリコン金属(Si、平均粒径20μm)20wt%を均一に混合した後、金型(120mm、縦55mm、厚さ30mm)の上部に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した後、前記実施例1の方法と同様、100nmの薄膜(thin film)を作製した。
粉末PFA(perfluoroalkoxy copolymer、3M Dyneon PFA 6503)80wt%およびアルミナ(Al2O3)20wt%を均一に混合した後、金型(120mm、縦55mm、厚さ30mm)の上部に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ)その結果を表1に示した。この際、前記組成のフッ素系高分子複合ターゲットを用いて薄膜を作製する際、蒸着率が若干低下し、同一厚さの薄膜を形成するために、実施例1の蒸着時間より2倍の時間が必要となった。
粉末FEP(Fluorinated Ethylene Propylene Copolymer、3M Dyneon FEP 6338Z)80wt%およびカーボンブラック(Carbon Black)20wt%を均一に混合した後、金型(120mm、縦55mm、厚さ30mm)の上部に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した後、前記実施例1の方法と同様、100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)20wt%、銅粉末(平均粒径25μm)80wt%を用いて電極面と接合する接合層(厚さ1.0mm)を、前記接合層の上部に形成される蒸着層である機能層はPTFE85wt%、カーボンナノチューブ(Carbon Nanotube)15wt%を用いて厚さ5.0mmにした後、金型(横120mm、縦55mm、厚さ30mm)の上部に順に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。
前記実施例8のフッ素系高分子複合ターゲットを用いて、MF(Mid‐range Frequency)マグネトロンスパッタリング(magnetron sputtering)電源方式でパワー200Wの条件で前記実施例8の方法と同様、100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)85wt%、グラファイト(Graphite)15wt%を用いてフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。また、実施例9と同様、MF電源方式で200Wの条件で100nmの薄膜(thin film)を作製した。
粉末FEP(Fluorinated Ethylene Propylene Copolymer、3M Dyneon FEP 6338Z)90wt%、カーボンナノチューブ(Carbon Nanotube)10wt%を用いてフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。そして実施例9と同様、MF電源方式で200Wの条件で100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)80wt%、カーボンナノチューブ(Carbon Nanotube)10wt%、酸化シリカ(SiO2)10wt%を用いてフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。また、実施例9と同様、MF電源方式で200Wの条件で100nmの薄膜(thin film)を作製した。
粉末PFA(perfluoroalkoxy copolymer、3M Dyneon PFA 6503)60wt%、粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)30wt%、カーボンナノチューブ(Carbon Nanotube)10wt%を用いてフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。また、実施例9と同様、MF電源方式で300Wの条件で100nmの薄膜(thin film)を作製した。
粉末PFA(perfluoroalkoxy copolymer、3M Dyneon PFA 6503)99wt%、カーボンナノチューブ(Carbon Nanotube)1wt%を用いてフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。また、実施例9と同様、MF電源方式で200Wの条件で100nmの薄膜(thin film)を作製した。
粉末PTFE(polytetrafluoroethylene、DuPont 7AJ)95wt%、ポリピロール(polypyrrole)5wt%、またドーパント(dopant)としてDBSA(Dodecyl Benzene Sulfonic Acid)0.1mol%を用いてフッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。また、実施例9と同様、MF電源方式で200Wの条件で100nmの薄膜(thin film)を作製した。
前記実施例8の機能層の組成の代わりにPTFE65wt%、カーボンナノチューブ(Carbon Nanotube)15wt%、銀(Ag)20wt%に変更し、フッ素系高分子複合ターゲット(直径4インチ、厚さ6mm)を製造した。また、実施例9と同様、MF電源方式で200Wの条件で100nmの薄膜(thin film)を作製した。
反応容器にPTFE(polytetrafluoroethylene)100wt%を均一に混合した後、金型(120mm、縦55mm、厚さ30mm)の上部に入れて300kgf/cm2の条件で圧縮成形し、370℃で熱処理した後、徐々に冷却して加工した後、フッ素系高分子ターゲット(直径4インチ、厚さ6mm)を製造した。
Claims (17)
- スパッタリングチャンバの内部に導入されて蒸着されるフッ素系高分子複合ターゲットであって、
前記フッ素系高分子複合ターゲットは、フッ素系高分子と導電性物質および金属化合物から選択される一つ以上の成分を含む、スパッタリング用フッ素系高分子複合ターゲット。 - 前記導電性物質は、伝導性粒子、伝導性高分子および金属成分から選択される一つ以上である、請求項1に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記伝導性粒子は、カーボンナノチューブ、カーボンナノファイバ、カーボンブラック、グラフェン、グラファイトおよびカーボンファイバから選択される一つ以上である、請求項2に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記伝導性高分子は、ポリアニリン、ポリアセチレン、ポリチオフェン、ポリピロール、ポリフルオレン、ポリピレン、ポリアズレン、ポリナフタレン、ポリフェニレン、ポリフェニレンビニレン、ポリカルバゾール、ポリインドール、ポリアゼピン、ポリエチレン、ポリエチレンビニレン、ポリフェニレンスルフィド、ポリフラン、ポリセレノフェン、ポリテルロフェンまたはこれらの混合物から選択される一つ以上である、請求項2に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記金属成分は、Cu、Al、Ag、Au、W、Mg、Ni、Mo、V、Nb、Ti、Pt、CrおよびTaから選択される一つ以上である、請求項2に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記金属化合物は、金属有機物、金属酸化物、金属炭素体、金属水酸化物、金属カーボネート、金属バイカーボネート、金属窒化物および金属フッ化物から選択される一つ以上である、請求項1に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記フッ素系高分子は、ポリテトラフルオロエチレン、ポリクロロトリフルオロエチレン、ポリビニリデンジフルオライド、フッ化エチレンプロピレンコポリマー、エチレン‐テトラフルオロエチレンコポリマー、エチレン‐クロロトリフルオロエチレンコポリマー、パーフルオロアルコキシコポリマー、ビニルフルオライドホモポリマーゴム、ビニルフルオライドコポリマーゴム、ビニリデンフルオライドホモポリマーゴムおよびビニリデンフルオライドコポリマーゴムから選択される一つ以上である、請求項1に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記フッ素系高分子複合ターゲットは、同一または異なる導電性物質または導電性物質と金属化合物との混合成分を含む2層以上の複数層に勾配を有するか、連続した含有量の勾配を有する、請求項1に記載のスパッタリング用フッ素系高分子複合ターゲット。
- 前記フッ素系高分子複合ターゲットは、導電性物質を含むDCまたはMF印加型スパッタリングに使用する、請求項1に記載のスパッタリング用フッ素系高分子複合ターゲット。
- フッ素系高分子と導電性物質および金属化合物から選択される一つ以上の成分を含む、スパッタリング用フッ素系高分子複合ターゲットの製造方法。
- 前記フッ素系高分子複合ターゲットは、電極の一面にフッ素系高分子と導電性物質を含む接合層およびフッ素系高分子を含む機能層が積層された形態に熱成形されて製造されるか、フッ素系高分子に導電性機能化剤が連続した含有量の勾配を有するように熱成形されて製造される、請求項10に記載のスパッタリング用フッ素系高分子複合ターゲットの製造方法。
- 前記機能層は、導電性物質および金属化合物から選択される一つ以上をさらに含む、請求項11に記載のスパッタリング用フッ素系高分子複合ターゲットの製造方法。
- 前記フッ素系高分子複合ターゲットは、厚さ方向に導電性物質または導電性物質と金属化合物との混合成分の含有量が高く、被着体の方向には導電性物質または導電性物質と金属化合物との混合成分の含有量が減少するように電極面上に接着されるか、またはその反対に接着される、請求項10に記載のスパッタリング用フッ素系高分子複合ターゲットの製造方法。
- 前記フッ素系高分子複合ターゲットは、フッ素系高分子100重量部に対して前記導電性物質または導電性物質と金属化合物との混合成分を0.01〜2000重量部含有する、請求項10に記載のスパッタリング用フッ素系高分子複合ターゲットの製造方法。
- スパッタリングチャンバと、前記チャンバの内部に形成される第1電極印加部と、前記第1電極印加部の上部面に位置する請求項1に記載のフッ素系高分子複合ターゲットと、第2電極印加部と、被着体とを含む、スパッタリング蒸着システム。
- 請求項1に記載のフッ素系高分子複合ターゲットを蒸着チャンバ内に固定するステップと、
前記フッ素系高分子複合ターゲットにRF、DCおよびMFから選択されるいずれか一つの印加方式でプラズマを発生させて蒸着するステップとを含む、フッ素系高分子複合ターゲットを用いるスパッタリング方法。 - 前記印加方式としてDCおよびMFから選択されるいずれか一つの印加方式でプラズマを発生させて蒸着するステップを含む、請求項15に記載のフッ素系高分子複合ターゲットを用いるスパッタリング方法。
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CN113416937B (zh) * | 2021-08-23 | 2021-11-09 | 北京航天天美科技有限公司 | 直流磁控溅射法制备银、石墨/聚四氟乙烯复合电磁屏蔽膜层的方法 |
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KR20170102858A (ko) | 2017-09-12 |
US10861685B2 (en) | 2020-12-08 |
KR20170140148A (ko) | 2017-12-20 |
KR20160092904A (ko) | 2016-08-05 |
KR101906301B1 (ko) | 2018-10-11 |
KR20160092896A (ko) | 2016-08-05 |
KR20170127396A (ko) | 2017-11-21 |
CN107208254B (zh) | 2021-05-28 |
US20180277341A1 (en) | 2018-09-27 |
KR102020319B1 (ko) | 2019-09-11 |
JP6877347B2 (ja) | 2021-05-26 |
KR20160092948A (ko) | 2016-08-05 |
KR20160092897A (ko) | 2016-08-05 |
CN107208254A (zh) | 2017-09-26 |
KR20160092947A (ko) | 2016-08-05 |
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