JP2018505551A5 - - Google Patents
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- Publication number
- JP2018505551A5 JP2018505551A5 JP2017534992A JP2017534992A JP2018505551A5 JP 2018505551 A5 JP2018505551 A5 JP 2018505551A5 JP 2017534992 A JP2017534992 A JP 2017534992A JP 2017534992 A JP2017534992 A JP 2017534992A JP 2018505551 A5 JP2018505551 A5 JP 2018505551A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processing chamber
- chamber
- processing
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- WYEMLYFITZORAB-UHFFFAOYSA-N boscalid Chemical compound C1=CC(Cl)=CC=C1C1=CC=CC=C1NC(=O)C1=CC=CN=C1Cl WYEMLYFITZORAB-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462098887P | 2014-12-31 | 2014-12-31 | |
| US62/098,887 | 2014-12-31 | ||
| US14/634,711 US9888528B2 (en) | 2014-12-31 | 2015-02-27 | Substrate support with multiple heating zones |
| US14/634,711 | 2015-02-27 | ||
| PCT/US2015/056934 WO2016109008A1 (en) | 2014-12-31 | 2015-10-22 | Substrate support with multiple heating zones |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018505551A JP2018505551A (ja) | 2018-02-22 |
| JP2018505551A5 true JP2018505551A5 (enExample) | 2018-12-06 |
| JP6974169B2 JP6974169B2 (ja) | 2021-12-01 |
Family
ID=56166038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017534992A Active JP6974169B2 (ja) | 2014-12-31 | 2015-10-22 | 複数の加熱ゾーンを有する基板支持体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9888528B2 (enExample) |
| JP (1) | JP6974169B2 (enExample) |
| KR (1) | KR102425944B1 (enExample) |
| CN (2) | CN107112262B (enExample) |
| TW (1) | TWI682489B (enExample) |
| WO (1) | WO2016109008A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6847610B2 (ja) * | 2016-09-14 | 2021-03-24 | 株式会社Ｓｃｒｅｅｎホールディングス | 熱処理装置 |
| US10468290B2 (en) * | 2016-11-02 | 2019-11-05 | Ultratech, Inc. | Wafer chuck apparatus with micro-channel regions |
| US11598003B2 (en) | 2017-09-12 | 2023-03-07 | Applied Materials, Inc. | Substrate processing chamber having heated showerhead assembly |
| US11330673B2 (en) * | 2017-11-20 | 2022-05-10 | Applied Materials, Inc. | Heated substrate support |
| SG11202007857XA (en) | 2018-02-09 | 2020-09-29 | Applied Materials Inc | Semiconductor processing apparatus having improved temperature control |
| US10910243B2 (en) | 2018-08-31 | 2021-02-02 | Applied Materials, Inc. | Thermal management system |
| CN113169109B (zh) * | 2018-11-30 | 2025-07-01 | 朗姆研究公司 | 用于增进热均匀性的具有多层加热器的陶瓷基座 |
| US11562913B2 (en) * | 2019-04-25 | 2023-01-24 | Watlow Electric Manufacturing Company | Multi-zone azimuthal heater |
| WO2020263939A1 (en) * | 2019-06-25 | 2020-12-30 | Applied Materials, Inc. | Dual-function wafer backside pressure control and edge purge |
| US20210035851A1 (en) * | 2019-07-30 | 2021-02-04 | Applied Materials, Inc. | Low contact area substrate support for etching chamber |
| CN114514602B (zh) * | 2019-09-27 | 2025-11-07 | 朗姆研究公司 | 用于影响衬底支撑件的温度分布轮廓的可调式和不可调式热屏 |
| JP7407752B2 (ja) * | 2021-02-05 | 2024-01-04 | 日本碍子株式会社 | ウエハ支持台 |
| US20220367236A1 (en) * | 2021-05-16 | 2022-11-17 | Applied Materials, Inc. | Heater pedestal with improved uniformity |
| EP4177031B1 (de) * | 2021-06-14 | 2024-07-24 | MULTIVAC Sepp Haggenmüller SE & Co. KG | Arbeitsstation für folienverarbeitende verpackungsmaschine |
| USD1071886S1 (en) * | 2022-01-20 | 2025-04-22 | Applied Materials, Inc. | Substrate support for a substrate processing chamber |
| TW202349558A (zh) * | 2022-04-28 | 2023-12-16 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | 靜電卡盤台座加熱器及用於選擇性地夾持及加熱基材之設備 |
| JP2025534167A (ja) * | 2022-10-24 | 2025-10-14 | ラム リサーチ コーポレーション | 処理ツールにおける熱流制御 |
| JP2024155101A (ja) | 2023-04-20 | 2024-10-31 | 住友電気工業株式会社 | ウエハ保持体 |
| WO2024257286A1 (ja) | 2023-06-14 | 2024-12-19 | 住友電気工業株式会社 | ウエハ保持台、および半導体処理装置 |
| KR102731017B1 (ko) | 2023-10-30 | 2024-11-19 | 주식회사 미코세라믹스 | 세라믹 서셉터 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5128515A (en) * | 1990-05-21 | 1992-07-07 | Tokyo Electron Sagami Limited | Heating apparatus |
| JP2527836B2 (ja) * | 1990-08-17 | 1996-08-28 | 日本碍子株式会社 | 半導体ウエハ―加熱装置 |
| JP3210051B2 (ja) * | 1992-01-16 | 2001-09-17 | 株式会社東芝 | 気相成長装置 |
| US6001183A (en) * | 1996-06-10 | 1999-12-14 | Emcore Corporation | Wafer carriers for epitaxial growth processes |
| US6179924B1 (en) * | 1998-04-28 | 2001-01-30 | Applied Materials, Inc. | Heater for use in substrate processing apparatus to deposit tungsten |
| US6617553B2 (en) * | 1999-05-19 | 2003-09-09 | Applied Materials, Inc. | Multi-zone resistive heater |
| JP2002100460A (ja) * | 2000-09-22 | 2002-04-05 | Ibiden Co Ltd | セラミックヒータおよびホットプレートユニット |
| JP4660926B2 (ja) | 2001-01-09 | 2011-03-30 | 東京エレクトロン株式会社 | 枚葉式の処理装置 |
| JP3642746B2 (ja) * | 2001-06-21 | 2005-04-27 | 日本発条株式会社 | セラミックスヒータ |
| US20020195201A1 (en) * | 2001-06-25 | 2002-12-26 | Emanuel Beer | Apparatus and method for thermally isolating a heat chamber |
| JP3897563B2 (ja) * | 2001-10-24 | 2007-03-28 | 日本碍子株式会社 | 加熱装置 |
| JP2005136104A (ja) * | 2003-10-29 | 2005-05-26 | Ngk Spark Plug Co Ltd | 静電チャック |
| JP4642358B2 (ja) * | 2004-01-13 | 2011-03-02 | 株式会社日立ハイテクノロジーズ | ウエハ載置用電極 |
| JP3769583B1 (ja) * | 2004-07-09 | 2006-04-26 | 積水化学工業株式会社 | 基材処理装置及び方法 |
| US8226769B2 (en) | 2006-04-27 | 2012-07-24 | Applied Materials, Inc. | Substrate support with electrostatic chuck having dual temperature zones |
| JP5069452B2 (ja) * | 2006-04-27 | 2012-11-07 | アプライド マテリアルズ インコーポレイテッド | 二重温度帯を有する静電チャックをもつ基板支持体 |
| US7705276B2 (en) * | 2006-09-14 | 2010-04-27 | Momentive Performance Materials Inc. | Heater, apparatus, and associated method |
| JP2008207198A (ja) * | 2007-02-26 | 2008-09-11 | Matsushita Electric Ind Co Ltd | 金型ガイド機構および金型 |
| JP2009054871A (ja) | 2007-08-28 | 2009-03-12 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
| JP4913695B2 (ja) * | 2007-09-20 | 2012-04-11 | 東京エレクトロン株式会社 | 基板処理装置及びそれに用いる基板載置台 |
| US20090274590A1 (en) * | 2008-05-05 | 2009-11-05 | Applied Materials, Inc. | Plasma reactor electrostatic chuck having a coaxial rf feed and multizone ac heater power transmission through the coaxial feed |
| US8274017B2 (en) * | 2009-12-18 | 2012-09-25 | Applied Materials, Inc. | Multifunctional heater/chiller pedestal for wide range wafer temperature control |
| JP2012028428A (ja) * | 2010-07-21 | 2012-02-09 | Tokyo Electron Ltd | 載置台構造及び処理装置 |
| US10242890B2 (en) * | 2011-08-08 | 2019-03-26 | Applied Materials, Inc. | Substrate support with heater |
| KR101343556B1 (ko) * | 2012-05-18 | 2013-12-19 | 주식회사 케이에스엠컴포넌트 | 2차원적으로 배선된 열선을 포함하는 세라믹 히터 |
| US9538583B2 (en) | 2013-01-16 | 2017-01-03 | Applied Materials, Inc. | Substrate support with switchable multizone heater |
| US9853579B2 (en) | 2013-12-18 | 2017-12-26 | Applied Materials, Inc. | Rotatable heated electrostatic chuck |
-
2015
- 2015-02-27 US US14/634,711 patent/US9888528B2/en active Active
- 2015-10-21 TW TW104134575A patent/TWI682489B/zh active
- 2015-10-22 CN CN201580068865.4A patent/CN107112262B/zh active Active
- 2015-10-22 JP JP2017534992A patent/JP6974169B2/ja active Active
- 2015-10-22 WO PCT/US2015/056934 patent/WO2016109008A1/en not_active Ceased
- 2015-10-22 KR KR1020177021355A patent/KR102425944B1/ko active Active
- 2015-10-22 CN CN201811129813.5A patent/CN109616428B/zh active Active
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