JP2018026735A5 - - Google Patents

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Publication number
JP2018026735A5
JP2018026735A5 JP2016158253A JP2016158253A JP2018026735A5 JP 2018026735 A5 JP2018026735 A5 JP 2018026735A5 JP 2016158253 A JP2016158253 A JP 2016158253A JP 2016158253 A JP2016158253 A JP 2016158253A JP 2018026735 A5 JP2018026735 A5 JP 2018026735A5
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JP
Japan
Prior art keywords
film
resonance region
dielectric film
piezoelectric
upper electrode
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JP2016158253A
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English (en)
Japanese (ja)
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JP6573853B2 (ja
JP2018026735A (ja
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Priority to JP2016158253A priority Critical patent/JP6573853B2/ja
Priority claimed from JP2016158253A external-priority patent/JP6573853B2/ja
Priority to US15/649,483 priority patent/US10491191B2/en
Publication of JP2018026735A publication Critical patent/JP2018026735A/ja
Publication of JP2018026735A5 publication Critical patent/JP2018026735A5/ja
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JP2016158253A 2016-08-10 2016-08-10 弾性波デバイスおよびその製造方法 Expired - Fee Related JP6573853B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016158253A JP6573853B2 (ja) 2016-08-10 2016-08-10 弾性波デバイスおよびその製造方法
US15/649,483 US10491191B2 (en) 2016-08-10 2017-07-13 Acoustic wave device and method of fabricating the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016158253A JP6573853B2 (ja) 2016-08-10 2016-08-10 弾性波デバイスおよびその製造方法

Publications (3)

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JP2018026735A JP2018026735A (ja) 2018-02-15
JP2018026735A5 true JP2018026735A5 (enExample) 2018-04-19
JP6573853B2 JP6573853B2 (ja) 2019-09-11

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JP2016158253A Expired - Fee Related JP6573853B2 (ja) 2016-08-10 2016-08-10 弾性波デバイスおよびその製造方法

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US (1) US10491191B2 (enExample)
JP (1) JP6573853B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6889423B2 (ja) * 2018-02-05 2021-06-18 株式会社村田製作所 フィルタ装置、高周波フロントエンド回路、および通信装置
JP7302981B2 (ja) * 2019-02-07 2023-07-04 太陽誘電株式会社 フィルタおよびマルチプレクサ
JP7288307B2 (ja) * 2019-02-07 2023-06-07 太陽誘電株式会社 弾性波デバイスおよびその製造方法、フィルタ並びにマルチプレクサ
JP7215413B2 (ja) 2019-12-27 2023-01-31 株式会社村田製作所 弾性波フィルタ
JP7485479B2 (ja) * 2020-03-17 2024-05-16 太陽誘電株式会社 フィルタ
KR102463862B1 (ko) 2020-08-20 2022-11-04 (주)와이솔 개선된 온도계수를 갖는 fbar 칩 및 패키지
US11515247B2 (en) * 2021-01-14 2022-11-29 Qualcomm Incorporated Capacitance fine tuning by fin capacitor design
US12047744B2 (en) * 2021-04-26 2024-07-23 Rf360 Singapore Pte. Ltd. Etch stop and protection layer for capacitor processing in electroacoustic devices
US12483226B2 (en) 2021-12-29 2025-11-25 Skyworks Solutions, Inc. Acoustic wave device with tilted multilayer interdigital transducer electrode
US20230223910A1 (en) 2022-01-13 2023-07-13 Skyworks Solutions, Inc. Method of making acoustic wave device with vertically mass loaded multi-layer interdigital transducer electrode for transverse mode suppression
US20230320227A1 (en) * 2022-03-29 2023-10-05 Taiwan Semiconductor Manufacturing Company Ltd. Method for manufacturing semiconductor structure and semiconductor structure thereof
CN119054201A (zh) * 2022-04-20 2024-11-29 株式会社村田制作所 弹性波装置以及其制造方法
CN117134739B (zh) * 2022-05-20 2024-05-28 锐石创芯(重庆)科技有限公司 滤波器、多工器、射频前端模组及滤波器的制备方法
CN115001440B (zh) * 2022-07-19 2022-10-21 深圳新声半导体有限公司 电子器件和电容结构

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187713A (ja) * 1987-01-29 1988-08-03 Toshiba Corp 集積型圧電薄膜機能素子
JPH07221587A (ja) * 1994-01-31 1995-08-18 Murata Mfg Co Ltd 共振子装置
EP1290790B1 (en) * 2000-04-06 2009-04-01 Nxp B.V. Tunable filter arrangement
TW540173B (en) * 2002-05-03 2003-07-01 Asia Pacific Microsystems Inc Bulk acoustic device having integrated fine-tuning and trimming devices
JP2005093465A (ja) * 2003-09-12 2005-04-07 Murata Mfg Co Ltd 薄膜キャパシタ、圧電フィルタおよびその製造方法、ならびに分波器、通信機
JP2008054046A (ja) * 2006-08-24 2008-03-06 Matsushita Electric Ind Co Ltd 圧電フィルタ及びそれを用いた共用器、通信機器
JP4342370B2 (ja) * 2004-04-19 2009-10-14 株式会社東芝 高周波集積回路装置
JP4697528B2 (ja) * 2004-06-02 2011-06-08 太陽誘電株式会社 弾性波装置
JP4791181B2 (ja) * 2005-12-28 2011-10-12 京セラ株式会社 薄膜バルク音響波共振子、それを備えるフィルタおよび通信装置ならびに薄膜バルク音響波共振子の製造方法
US8756778B2 (en) * 2009-10-01 2014-06-24 Stmicroelectronics Sa Method of adjustment during manufacture of a circuit having a capacitor
JP6336712B2 (ja) 2013-01-28 2018-06-06 太陽誘電株式会社 圧電薄膜共振器、フィルタおよびデュプレクサ
JP6333540B2 (ja) 2013-11-11 2018-05-30 太陽誘電株式会社 圧電薄膜共振子、フィルタ、及び分波器
JP6603012B2 (ja) * 2014-05-21 2019-11-06 太陽誘電株式会社 分波器

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