JP2017538966A5 - - Google Patents

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Publication number
JP2017538966A5
JP2017538966A5 JP2017528558A JP2017528558A JP2017538966A5 JP 2017538966 A5 JP2017538966 A5 JP 2017538966A5 JP 2017528558 A JP2017528558 A JP 2017528558A JP 2017528558 A JP2017528558 A JP 2017528558A JP 2017538966 A5 JP2017538966 A5 JP 2017538966A5
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JP
Japan
Prior art keywords
mirror
facet
grating
mirror according
diffraction
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JP2017528558A
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English (en)
Japanese (ja)
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JP2017538966A (ja
JP6650452B2 (ja
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Priority claimed from DE102014117453.4A external-priority patent/DE102014117453A1/de
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JP2017528558A 2014-11-27 2015-11-26 ミラー、特にマイクロリソグラフィ用のコレクタミラー Active JP6650452B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014117453.4 2014-11-27
DE102014117453.4A DE102014117453A1 (de) 2014-11-27 2014-11-27 Kollektorspiegel für Mikrolithografie
PCT/EP2015/077717 WO2016083487A1 (de) 2014-11-27 2015-11-26 Spiegel, insbesondere kollektorspiegel für mikrolithografie

Publications (3)

Publication Number Publication Date
JP2017538966A JP2017538966A (ja) 2017-12-28
JP2017538966A5 true JP2017538966A5 (enExample) 2019-01-10
JP6650452B2 JP6650452B2 (ja) 2020-02-19

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JP2017528558A Active JP6650452B2 (ja) 2014-11-27 2015-11-26 ミラー、特にマイクロリソグラフィ用のコレクタミラー

Country Status (5)

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US (1) US10101569B2 (enExample)
EP (1) EP3224677B1 (enExample)
JP (1) JP6650452B2 (enExample)
DE (1) DE102014117453A1 (enExample)
WO (1) WO2016083487A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10754012B2 (en) * 2019-01-04 2020-08-25 Blackmore Sensors & Analytics, Llc Lidar system including multifaceted deflector
EP3949617A1 (en) 2019-03-27 2022-02-09 Telefonaktiebolaget LM Ericsson (publ) Methods for sl sr/bsr handling
CN110146992A (zh) * 2019-05-10 2019-08-20 厦门市承谱科学仪器有限公司 一种激光二极管阵列的光束整形装置
DE102019213063A1 (de) * 2019-08-30 2021-03-04 Carl Zeiss Smt Gmbh Optische Beugungskomponente
JP7403271B2 (ja) * 2019-10-10 2023-12-22 ギガフォトン株式会社 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法
DE102019215829A1 (de) 2019-10-15 2021-04-15 Asml Netherlands B.V. EUV-Kollektorspiegel
DE102020208298A1 (de) * 2020-07-02 2022-01-05 Carl Zeiss Smt Gmbh EUV-Kollektor
DE102022207359A1 (de) 2022-07-19 2024-01-25 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Bestimmen eines Passformfehlers bei einem Hohlspiegel
WO2025233082A1 (en) * 2024-05-07 2025-11-13 Carl Zeiss Smt Gmbh Collector device, wafer inspection apparatus having a collector device

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4995714A (en) * 1988-08-26 1991-02-26 Cohen Allen L Multifocal optical device with novel phase zone plate and method for making
US5153780A (en) * 1991-06-10 1992-10-06 The United States Of America As Represented By The United States Department Of Energy Method and apparatus for uniformly concentrating solar flux for photovoltaic applications
EP0519112B1 (de) * 1991-06-21 1996-03-13 Tetsuhiro Kano Reflektor und Verfahren zum Erzeugen einer Reflektorform
DE10214259A1 (de) * 2002-03-28 2003-10-23 Zeiss Carl Semiconductor Mfg Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm
US7623235B2 (en) * 2004-03-20 2009-11-24 Seng-Tiong Ho Curved grating spectrometer with very high wavelength resolution
JP4508708B2 (ja) * 2004-04-12 2010-07-21 キヤノン株式会社 Ｅｕｖ光を用いた露光装置および露光方法
JP5061069B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光を用いる半導体露光装置
US8227778B2 (en) 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5061063B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
FR2941528A1 (fr) * 2009-01-27 2010-07-30 Univ Paris Curie Spectrographe a miroir elliptique
DE102009044462A1 (de) * 2009-11-06 2011-01-05 Carl Zeiss Smt Ag Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage
DE102010063530A1 (de) * 2009-12-22 2011-06-30 Carl Zeiss SMT GmbH, 73447 Blendenelement und optisches System für die EUV-Lithographie
DE102011084266A1 (de) * 2011-10-11 2013-04-11 Carl Zeiss Smt Gmbh Kollektor
NL2010274C2 (en) * 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
US20140118830A1 (en) 2012-10-25 2014-05-01 L-3 Integrated Optical Systems Tinsley Optical grating including a smoothing layer
NL2012499A (en) * 2013-04-17 2014-10-20 Asml Netherlands Bv Radiation collector, radiation source and lithographic apparatus.
CN103499851B (zh) * 2013-09-29 2015-06-10 清华大学深圳研究生院 一种闪耀凹面光栅制作方法

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