JP2017537346A - 硬化効率が改善されたフレキソ刷版 - Google Patents
硬化効率が改善されたフレキソ刷版 Download PDFInfo
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- JP2017537346A JP2017537346A JP2017525530A JP2017525530A JP2017537346A JP 2017537346 A JP2017537346 A JP 2017537346A JP 2017525530 A JP2017525530 A JP 2017525530A JP 2017525530 A JP2017525530 A JP 2017525530A JP 2017537346 A JP2017537346 A JP 2017537346A
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- RBYJOOWYRXEJAM-UHFFFAOYSA-M sodium;5,9-dianilino-7-phenylbenzo[a]phenazin-7-ium-4,10-disulfonate Chemical compound [Na+].C=1C=CC=CC=1[N+]1=C2C=C(NC=3C=CC=CC=3)C(S(=O)(=O)[O-])=CC2=NC(C2=CC=CC(=C22)S([O-])(=O)=O)=C1C=C2NC1=CC=CC=C1 RBYJOOWYRXEJAM-UHFFFAOYSA-M 0.000 description 1
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- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
a)エチレン性不飽和モノマー;
b)バインダー;及び
c)波長365nmにおいて0.05を超える開始の量子収率(a quantum yield of initiation)(Qi)を示す光開始剤を含むことを特徴とする光硬化性組成物に関する。
a)バッキング層上に配置され、化学線に暴されることで選択的に架橋及び硬化することが可能であり、
i)エチレン性不飽和モノマー;
ii)バインダー;及び
iii)波長365nmにおいて0.05を超える開始の量子収率(Qi)を示す光開始剤を含む少なくとも1つの光硬化性層を提供する工程と;
b)前記少なくとも1つの光硬化性層を化学線に像様露光し、前記少なくとも1つの光硬化性層の一部を選択的に架橋及び硬化させる工程と;
c)前記レリーフ像印刷要素を現像して前記少なくとも1つの光硬化性層の未架橋及び未硬化の部分を分離除去し、その中のレリーフ像を露呈する工程と;を含み、
前記レリーフ像が複数のレリーフ像印刷ドットを含み、前記複数のレリーフ像印刷ドットが、前記ドットのショルダーと上面との交点における曲率半径reの、前記ドットの頂部の幅pに対する比が5%未満となるような前記ドットのエッジ鮮明度を示すことを特徴とするレリーフ像印刷要素の製造方法に関する。
a)バッキング層上に配置され、化学線に暴されることで選択的に架橋及び硬化することが可能であり、
i)エチレン性不飽和モノマー;
ii)バインダー;及び
iii)波長365nmにおいて0.05を超える開始の量子収率(Qi)を示す光開始剤を含む少なくとも1つの光硬化性層を提供する工程と;
b)前記少なくとも1つの光硬化性層を化学線に像様露光し、前記少なくとも1つの光硬化性層の一部を選択的に架橋及び硬化させる工程と;
c)前記レリーフ像印刷要素を現像して前記少なくとも1つの光硬化性層の未架橋及び未硬化の部分を分離除去し、その中のレリーフ像を露呈する工程と;を含み、
前記レリーフ像が複数のレリーフ像印刷ドットを含み、前記複数のレリーフ像印刷ドットが、前記ドットのショルダーと上面との交点における曲率半径reの、前記ドットの頂部の幅pに対する比が5%未満となるような前記ドットのエッジ鮮明度を示すことを特徴とするレリーフ像印刷要素の製造方法に関する。
a)エチレン性不飽和モノマー;
b)バインダー;及び
c)波長365nmにおいて0.05を超える開始の量子収率(Qi)を示す光開始剤を含むことを特徴とする光硬化性組成物に関する。
Riは式1で表される。
(1) Ri=Ia・Qi
Iaは吸収強度(mW)であり、以下式2に示すように算出される。
Qiは開始の量子収率であり、吸収された光子当たりの開始重合鎖の数として定義される。Qiは、1光子の吸収後に励起された分子に影響を及ぼすことが可能な全ての光化学的/物理的現象の影響を受ける。
(2) Ia=I0・(1−10−OD)
(3) OD=ε・[PI]・L
ここで、
I0=入射強度(mW)
ε=吸光係数
[PI]=光開始剤濃度(mol/L)
L=厚さ(cm)
Qiは、重合速度(Rp)の実験上の測定により、文献に見られるアクリレートモノマーの伝播(propagation)定数及び停止(termination)定数(kp及びkt)を用いて算出される。
Claims (20)
- 複数のレリーフ印刷ドットを含むレリーフ像印刷要素の製造方法であって、
a)バッキング層上に配置され、化学線に暴されることで選択的に架橋及び硬化することが可能であり、
i)エチレン性不飽和モノマー;
ii)バインダー;及び
iii)波長365nmにおいて0.05を超える開始の量子収率(Qi)を示す光開始剤;
を含む少なくとも1つの光硬化性層を提供する工程と;
b)前記少なくとも1つの光硬化性層を化学線に像様露光し、前記少なくとも1つの光硬化性層の一部を選択的に架橋及び硬化させる工程と;
c)前記レリーフ像印刷要素を現像して前記少なくとも1つの光硬化性層の未架橋及び未硬化の部分を分離除去し、その中のレリーフ像を露呈する工程と;を含み、前記レリーフ像が前記複数のレリーフ印刷ドットを含み、
前記複数のレリーフ印刷ドットが、前記ドットのショルダーと上面との交点における曲率半径reの、前記ドットの頂部の幅pに対する比が5%未満となるような前記ドットのエッジ鮮明度を示すことを特徴とする複数のレリーフ印刷ドットを含むレリーフ像印刷要素の製造方法。 - 前記少なくとも1つの光硬化性層を化学線に像様露光する工程が、大気酸素の存在下で行われる請求項1に記載の方法。
- 前記光開始剤が、波長365nmにおいて約0.075を超える開始の量子収率(Qi)を示す請求項1に記載の方法。
- 前記光開始剤が、波長365nmにおいて約0.08を超える開始の量子収率(Qi)を示す請求項3に記載の方法。
- 前記光開始剤の吸光係数が、波長365nmにおいて約300 l・cm−1・mol−1を超える請求項1に記載の方法。
- 前記光開始剤の吸光係数が、波長365nmにおいて約400 l・cm−1・mol−1を超える請求項5に記載の方法。
- 前記光開始剤の吸光係数が、波長365nmにおいて約500 l・cm−1・mol−1を超えている請求項6に記載の方法。
- 前記光開始剤が、1−ブタノン−2−(ジメチルアミノ)−2−[(4−メチルフェニル)メチル]−1−[4−(4−モルホリニル)フェニル]、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−ブタノン−1、ジフェニル(2,4,6−トリメチルベンゾイル)ホスフィンオキシド、フェニルビス(2,4,6−トリメチルベンゾイル)ホスフィンオキシド、及びこれらの1以上の組合せからなる群から選択される請求項1に記載の方法。
- 前記光開始剤が、前記光硬化性層中に約1.5重量%〜約5.0重量%の濃度で存在する請求項1に記載の方法。
- 前記光開始剤が、前記光硬化性層中に約2.0重量%〜約3.5重量%の濃度で存在する請求項9に記載の方法。
- 前記少なくとも1つの光硬化性層を化学線に像様露光する工程が、前記露光工程中に放射線の種類、パワー、又は入射角を変更することなく行われる請求項1に記載の方法。
- レリーフ像印刷要素を製造するための光硬化性組成物であって、
a)エチレン性不飽和モノマー;
b)バインダー;及び
c)波長365nm波長において0.05を超える開始の量子収率(Qi)を示す光開始剤;
を含むことを特徴とする光硬化性組成物。 - 前記光開始剤が、波長365nmにおいて約0.075を超える開始の量子収率(Qi)を示す請求項12に記載の光硬化性組成物。
- 前記光開始剤が、波長365nmにおいて約0.08を超える開始の量子収率(Qi)を示す請求項13に記載の光硬化性組成物。
- 前記光開始剤の吸光係数が、波長365nmにおいて約300 l・cm−1・mol−1を超える請求項12に記載の光硬化性組成物。
- 前記光開始剤の吸光係数が、波長365nmにおいて約400 l・cm−1・mol−1を超える請求項15に記載の光硬化性組成物。
- 前記光開始剤の吸光係数が、波長365nmにおいて約500 l・cm−1・mol−1を超える請求項16に記載の光硬化性組成物。
- 前記光開始剤が、1−ブタノン−2−(ジメチルアミノ)−2−[(4−メチルフェニル)メチル]−1−[4−(4−モルホリニル)フェニル]、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−ブタノン−1、ジフェニル(2,4,6−トリメチルベンゾイル)ホスフィンオキシド、フェニルビス(2,4,6−トリメチルベンゾイル)ホスフィンオキシド、及びこれらの1以上の組合せからなる群から選択される請求項12に記載の光硬化性組成物。
- 前記光開始剤が、前記光硬化性組成物中に約1.5重量%〜約5.0重量%の濃度で存在する請求項12に記載の光硬化性組成物。
- 前記光開始剤が、前記光硬化性組成物中に約2.0重量%〜約3.5重量%の濃度で存在する請求項19に記載の光硬化性組成物。
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9598622B2 (en) | 2012-09-25 | 2017-03-21 | Cold Chain Technologies, Inc. | Gel comprising a phase-change material, method of preparing the gel, thermal exchange implement comprising the gel, and method of preparing the thermal exchange implement |
US10732507B2 (en) | 2015-10-26 | 2020-08-04 | Esko-Graphics Imaging Gmbh | Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof |
US10036956B2 (en) * | 2016-05-03 | 2018-07-31 | Macdermid Graphics Solutions, Llc | Method of making relief image printing elements |
CN106707625A (zh) * | 2017-01-23 | 2017-05-24 | 武汉华星光电技术有限公司 | 配向膜印刷版及其制作方法 |
US10599035B2 (en) * | 2017-04-12 | 2020-03-24 | Macdermid Graphics Solutions, Llc | Method of improving light stability of flexographic printing plates featuring flat top dots |
US10457082B2 (en) * | 2017-05-09 | 2019-10-29 | Macdermid Graphics Solutions, Llc | Flexographic printing plate with improved storage stability |
FR3074180B1 (fr) * | 2017-11-24 | 2021-01-01 | Arkema France | Procede de controle de la planeite d'un empilement polymerique |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001512777A (ja) * | 1997-08-05 | 2001-08-28 | セリコル、リミテッド | インクジェットインク |
JP2003015283A (ja) * | 2001-06-28 | 2003-01-15 | Hitachi Chem Co Ltd | 拡散反射下地層形成用感光性エレメント及びこれを用いた拡散反射板の製造方法。 |
JP2009040992A (ja) * | 2007-07-13 | 2009-02-26 | Sumitomo Rubber Ind Ltd | ゴム組成物および該ゴム組成物により作製したスタッドレスタイヤ |
JP2012207076A (ja) * | 2011-03-29 | 2012-10-25 | Hitachi Kasei Polymer Co Ltd | 熱活性接着剤及び熱活性接着フィルム |
JP2013083928A (ja) * | 2011-08-03 | 2013-05-09 | Fujifilm Corp | 塗膜付きフィルムの製造方法 |
WO2014031329A1 (en) * | 2012-08-22 | 2014-02-27 | Macdermid Printing Solutions, Llc | Method of improving surface cure in digital flexographic printing plates |
WO2014035566A1 (en) * | 2012-08-27 | 2014-03-06 | Macdermid Printing Solutions, Llc | Method of improving print performance in flexographic printing plates |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL288289A (ja) | 1962-01-29 | |||
CA1099435A (en) | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
US4323636A (en) | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
US3867153A (en) | 1972-09-11 | 1975-02-18 | Du Pont | Photohardenable element |
DE2942183A1 (de) | 1979-10-18 | 1981-05-07 | Basf Ag, 6700 Ludwigshafen | Fotopolymerisierbare gemische und elemente daraus |
US4264705A (en) | 1979-12-26 | 1981-04-28 | Uniroyal, Inc. | Multilayered elastomeric printing plate |
US4423135A (en) | 1981-01-28 | 1983-12-27 | E. I. Du Pont De Nemours & Co. | Preparation of photosensitive block copolymer elements |
US4427759A (en) | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
US4540649A (en) | 1984-09-12 | 1985-09-10 | Napp Systems (Usa) Inc. | Water developable photopolymerizable composition and printing plate element containing same |
US4622088A (en) | 1984-12-18 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Process for preparing photopolymer flexographic element with melt extrusion coated elastomeric surface layer |
ES2054861T3 (es) | 1987-03-26 | 1994-08-16 | Ciba Geigy Ag | Nuevas alfa-aminoacetofenonas como fotoiniciadores. |
DE4004512A1 (de) | 1990-02-14 | 1991-08-22 | Hoechst Ag | Verfahren zur herstellung von photopolymerplatten |
NZ237919A (en) | 1990-04-26 | 1994-09-27 | Grace W R & Co | Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates |
EP0460919A3 (en) | 1990-06-05 | 1993-04-28 | Nippon Paint Co., Ltd. | Process for exposing a photosensitive resin composition to light |
US5223375A (en) | 1991-07-15 | 1993-06-29 | W. R. Grace & Co.-Conn. | Flexographic printing plate comprising photosensitive elastomer polymer composition |
US5262275A (en) | 1992-08-07 | 1993-11-16 | E. I. Du Pont De Nemours And Company | Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
DE4339010C2 (de) | 1993-06-25 | 2000-05-18 | Pt Sub Inc | Photohärtbares Erzeugnis für Druckplatten |
JP3423077B2 (ja) | 1993-08-25 | 2003-07-07 | ダブリュ・アール・グレイス・アンド・カンパニー・コネテイカット | 版面の製造方法 |
US6238837B1 (en) | 1995-05-01 | 2001-05-29 | E.I. Du Pont De Nemours And Company | Flexographic element having an infrared ablatable layer |
US5976765A (en) * | 1998-09-04 | 1999-11-02 | Polyfibron Technologies, Inc. | Solid-capped liquid photopolymer printing elements |
US20030129533A1 (en) | 2001-12-14 | 2003-07-10 | Creo Products, Inc. | Photosensitive flexographic device with associated addressable mask |
US7799504B2 (en) | 2007-06-05 | 2010-09-21 | Eastman Kodak Company | Mask film to form relief images and method of use |
US8153347B2 (en) | 2008-12-04 | 2012-04-10 | Eastman Kodak Company | Flexographic element and method of imaging |
US20100215865A1 (en) * | 2009-02-26 | 2010-08-26 | Xerox Corporation | Preparation of flexographic printing masters using an additive process |
US8158331B2 (en) * | 2009-10-01 | 2012-04-17 | Recchia David A | Method of improving print performance in flexographic printing plates |
US9720326B2 (en) | 2009-10-01 | 2017-08-01 | David A. Recchia | Method of improving print performance in flexographic printing plates |
US9126394B2 (en) * | 2010-05-18 | 2015-09-08 | Agfa Graphics Nv | Method of preparing a flexographic printing master |
JP2012014021A (ja) | 2010-07-01 | 2012-01-19 | Fujifilm Corp | 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、反射防止膜、絶縁膜、光学デバイス及び電子デバイス |
US8652761B2 (en) | 2011-02-18 | 2014-02-18 | David A. Recchia | Photosensitive resin laminate and thermal processing of the same |
CN103502855B (zh) * | 2011-05-13 | 2016-12-28 | 3M创新有限公司 | 具有可变折射率光提取层的背照式透射型显示器 |
US8669041B2 (en) * | 2011-07-15 | 2014-03-11 | Brian Cook | Method for improving print performance of flexographic printing elements |
JP5699064B2 (ja) | 2011-09-29 | 2015-04-08 | 富士フイルム株式会社 | カラーフィルタの製造方法 |
JP2013140329A (ja) * | 2011-12-08 | 2013-07-18 | Jnc Corp | 透明導電膜用感光性組成物 |
US9114601B2 (en) * | 2012-03-01 | 2015-08-25 | Kyle P. Baldwin | Clean flexographic printing plate and method of making the same |
US9097974B2 (en) * | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
US9096767B2 (en) | 2012-11-06 | 2015-08-04 | Xerox Corporation | Curable solid inks containing cyclohexyl-based crystalline gellants |
US9040226B2 (en) * | 2013-05-13 | 2015-05-26 | Macdermid Printing Solutions, Llc | Method of improving print performance in flexographic printing plates |
-
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- 2014-11-12 US US14/539,171 patent/US9740099B2/en active Active
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001512777A (ja) * | 1997-08-05 | 2001-08-28 | セリコル、リミテッド | インクジェットインク |
JP2003015283A (ja) * | 2001-06-28 | 2003-01-15 | Hitachi Chem Co Ltd | 拡散反射下地層形成用感光性エレメント及びこれを用いた拡散反射板の製造方法。 |
JP2009040992A (ja) * | 2007-07-13 | 2009-02-26 | Sumitomo Rubber Ind Ltd | ゴム組成物および該ゴム組成物により作製したスタッドレスタイヤ |
JP2012207076A (ja) * | 2011-03-29 | 2012-10-25 | Hitachi Kasei Polymer Co Ltd | 熱活性接着剤及び熱活性接着フィルム |
JP2013083928A (ja) * | 2011-08-03 | 2013-05-09 | Fujifilm Corp | 塗膜付きフィルムの製造方法 |
WO2014031329A1 (en) * | 2012-08-22 | 2014-02-27 | Macdermid Printing Solutions, Llc | Method of improving surface cure in digital flexographic printing plates |
WO2014035566A1 (en) * | 2012-08-27 | 2014-03-06 | Macdermid Printing Solutions, Llc | Method of improving print performance in flexographic printing plates |
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