JP2017524644A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2017524644A5 JP2017524644A5 JP2017507882A JP2017507882A JP2017524644A5 JP 2017524644 A5 JP2017524644 A5 JP 2017524644A5 JP 2017507882 A JP2017507882 A JP 2017507882A JP 2017507882 A JP2017507882 A JP 2017507882A JP 2017524644 A5 JP2017524644 A5 JP 2017524644A5
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- organic
- organic layer
- organic compound
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 claims 18
- 239000000758 substrate Substances 0.000 claims 17
- 238000000034 method Methods 0.000 claims 8
- 150000002894 organic compounds Chemical group 0.000 claims 8
- 239000012044 organic layer Substances 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 239000010408 film Substances 0.000 claims 4
- 239000010409 thin film Substances 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- 125000003277 amino group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000002091 cationic group Chemical group 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000007935 neutral effect Effects 0.000 claims 2
- 150000001282 organosilanes Chemical class 0.000 claims 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 150000001491 aromatic compounds Chemical class 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462036166P | 2014-08-12 | 2014-08-12 | |
| US62/036,166 | 2014-08-12 | ||
| PCT/US2015/044226 WO2016025320A1 (en) | 2014-08-12 | 2015-08-07 | Organic surface treatments for display glasses to reduce esd |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017524644A JP2017524644A (ja) | 2017-08-31 |
| JP2017524644A5 true JP2017524644A5 (enExample) | 2018-09-20 |
| JP6734842B2 JP6734842B2 (ja) | 2020-08-05 |
Family
ID=55304510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017507882A Expired - Fee Related JP6734842B2 (ja) | 2014-08-12 | 2015-08-07 | ディスプレイ用ガラスの静電放電を抑制するための有機表面処理 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10153268B2 (enExample) |
| JP (1) | JP6734842B2 (enExample) |
| KR (1) | KR20170041248A (enExample) |
| CN (1) | CN106573831B (enExample) |
| TW (1) | TWI687378B (enExample) |
| WO (1) | WO2016025320A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI778019B (zh) * | 2017-02-14 | 2022-09-21 | 美商康寧公司 | 併入積層基板的電子組件及其製造方法 |
| JP2019081124A (ja) * | 2017-10-30 | 2019-05-30 | 横浜油脂工業株式会社 | ガラス基板に蓄積する静電気を低減させる洗浄方法 |
| JP7405757B2 (ja) * | 2018-03-07 | 2023-12-26 | コーニング インコーポレイテッド | 静電帯電の低減のための起伏加工済みガラス表面 |
| JP2020101616A (ja) * | 2018-12-20 | 2020-07-02 | 日本電気硝子株式会社 | 電子デバイスの製造方法及びガラス基板 |
| CN113527743B (zh) * | 2021-07-26 | 2022-12-23 | 马鞍山东毅新材料科技有限公司 | 一种防静电转移的显示屏保护膜及其生产工艺 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3338696A (en) | 1964-05-06 | 1967-08-29 | Corning Glass Works | Sheet forming apparatus |
| BE757057A (fr) | 1969-10-06 | 1971-04-05 | Corning Glass Works | Procede et appareil de controle d'epaisseur d'une feuille de verre nouvellement etiree |
| US4102664A (en) | 1977-05-18 | 1978-07-25 | Corning Glass Works | Method for making glass articles with defect-free surfaces |
| US4214886A (en) | 1979-04-05 | 1980-07-29 | Corning Glass Works | Forming laminated sheet glass |
| US4880453A (en) | 1988-12-19 | 1989-11-14 | Corning Incorporated | Method for making glass articles with defect-free surfaces and soluble glasses therefor |
| US5119258A (en) | 1990-02-06 | 1992-06-02 | Hmt Technology Corporation | Magnetic disc with low-friction glass substrate |
| JP2720612B2 (ja) * | 1991-02-27 | 1998-03-04 | 日本電気株式会社 | 薄膜トランジスタアレイ基板の製造方法 |
| JPH0753948A (ja) * | 1993-08-19 | 1995-02-28 | Kao Corp | 帯電防止材料およびこれを含む光記録媒体 |
| US5792327A (en) | 1994-07-19 | 1998-08-11 | Corning Incorporated | Adhering metal to glass |
| JP2001500467A (ja) | 1996-09-17 | 2001-01-16 | コーニング インコーポレイテッド | きめのある表面およびきめを出す方法 |
| US5985700A (en) * | 1996-11-26 | 1999-11-16 | Corning Incorporated | TFT fabrication on leached glass surface |
| US6099971A (en) | 1998-09-09 | 2000-08-08 | Plaskolite, Inc. | Polysiloxane abrasion and static resistant coating |
| JP2002072922A (ja) | 2000-06-13 | 2002-03-12 | Asahi Glass Co Ltd | ディスプレイ用ガラス基板およびその選別方法 |
| JP3545319B2 (ja) * | 2000-07-31 | 2004-07-21 | 株式会社巴川製紙所 | 帯電防止性反射防止フィルム |
| JP2002308643A (ja) * | 2001-02-01 | 2002-10-23 | Nippon Electric Glass Co Ltd | 無アルカリガラス及びディスプレイ用ガラス基板 |
| CN1283574C (zh) * | 2002-03-14 | 2006-11-08 | 碧悠国际光电股份有限公司 | 平面显示器用的基板玻璃 |
| US20050001201A1 (en) | 2003-07-03 | 2005-01-06 | Bocko Peter L. | Glass product for use in ultra-thin glass display applications |
| JP4752725B2 (ja) | 2005-11-17 | 2011-08-17 | 株式会社ニコン | ガラス基板およびその製造方法 |
| US7666508B2 (en) | 2007-05-22 | 2010-02-23 | Corning Incorporated | Glass article having a laser melted surface |
| KR20090123540A (ko) * | 2008-05-28 | 2009-12-02 | 삼성전자주식회사 | 유기 광전 변환막, 이를 구비하는 광전 변환 소자 및이미지 센서 |
| WO2010128673A1 (ja) * | 2009-05-07 | 2010-11-11 | 日本電気硝子株式会社 | ガラス基板及びその製造方法 |
| KR20120106766A (ko) * | 2009-11-20 | 2012-09-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 제작 방법 |
| KR101671489B1 (ko) * | 2010-07-29 | 2016-11-02 | 삼성디스플레이 주식회사 | 유기물 증발원 및 그를 포함하는 증착 장치 |
| US9676649B2 (en) | 2011-08-26 | 2017-06-13 | Corning Incorporated | Glass substrates with strategically imprinted B-side features and methods for manufacturing the same |
| US9126858B2 (en) | 2012-04-27 | 2015-09-08 | Avanstrate Inc. | Method for making glass substrate for display, glass substrate and display panel |
| EP2855384B1 (en) | 2012-05-29 | 2020-12-09 | Corning Incorporated | Method for texturing a glass surface |
| US8857216B2 (en) | 2012-05-31 | 2014-10-14 | Corning Incorporated | Burner modules, methods of forming glass sheets, and glass sheets formed thereby |
| KR20160004302A (ko) | 2013-04-30 | 2016-01-12 | 코닝 인코포레이티드 | 낮은 정전기 방전 융합 인발된 유리를 위한 표면 처리 |
-
2015
- 2015-08-07 WO PCT/US2015/044226 patent/WO2016025320A1/en not_active Ceased
- 2015-08-07 CN CN201580043135.9A patent/CN106573831B/zh not_active Expired - Fee Related
- 2015-08-07 KR KR1020177006436A patent/KR20170041248A/ko not_active Ceased
- 2015-08-07 US US15/502,535 patent/US10153268B2/en not_active Expired - Fee Related
- 2015-08-07 JP JP2017507882A patent/JP6734842B2/ja not_active Expired - Fee Related
- 2015-08-11 TW TW104126151A patent/TWI687378B/zh not_active IP Right Cessation
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2017524644A5 (enExample) | ||
| JP2006302891A5 (enExample) | ||
| JP2014521123A5 (enExample) | ||
| TW200735126A (en) | Method of manufacture of semiconductor device and conductive compositions used therein | |
| JP2012118545A5 (enExample) | ||
| JP2016076469A5 (ja) | 電極、蓄電装置、および電極の作製方法 | |
| CA2929917C (en) | Coating method for surfaces in chemical installations | |
| JP2011520246A5 (enExample) | ||
| JP2008293961A5 (enExample) | ||
| JP2012069519A5 (enExample) | ||
| JP2009278072A5 (enExample) | ||
| PH12019500371A1 (en) | A method of manufacturing an insulation layer on silicon carbide and a semiconductor device | |
| JP2016066793A5 (enExample) | ||
| TW201501290A (zh) | 電子裝置及其製造方法 | |
| JP2009010372A5 (enExample) | ||
| CN109863259A8 (zh) | 母板、母板的制造方法、掩模的制造方法及oled像素蒸镀方法 | |
| MY177552A (en) | A method of fabricating a resistive gas sensor device | |
| JP2016210192A5 (ja) | フィルム | |
| WO2015189701A3 (en) | Self-assembled monolayers of phosphonic acids as dielectric surfaces for high-performance organic thin film transistors | |
| TWI687378B (zh) | 用於降低esd的顯示器玻璃的有機表面處理 | |
| Kim et al. | Photoinduced high-quality ultrathin SiO2 film from hybrid nanosheet at room temperature | |
| WO2017048259A8 (en) | Methods for doping a sub-fin region of a semiconductor fin structure and devices containing the same | |
| JP2011228679A5 (ja) | トランジスタ | |
| FR2976729B1 (fr) | Substrat a electrode pour dispositif oled et un tel dispositif oled | |
| CN105355589A (zh) | 阵列基板及其制造方法 |