JP2017515985A5 - - Google Patents

Download PDF

Info

Publication number
JP2017515985A5
JP2017515985A5 JP2017512875A JP2017512875A JP2017515985A5 JP 2017515985 A5 JP2017515985 A5 JP 2017515985A5 JP 2017512875 A JP2017512875 A JP 2017512875A JP 2017512875 A JP2017512875 A JP 2017512875A JP 2017515985 A5 JP2017515985 A5 JP 2017515985A5
Authority
JP
Japan
Prior art keywords
mixture
gas
argon
helium
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017512875A
Other languages
English (en)
Other versions
JP7033919B2 (ja
JP2017515985A (ja
Filing date
Publication date
Priority claimed from US14/712,054 external-priority patent/US10196728B2/en
Application filed filed Critical
Publication of JP2017515985A publication Critical patent/JP2017515985A/ja
Publication of JP2017515985A5 publication Critical patent/JP2017515985A5/ja
Application granted granted Critical
Publication of JP7033919B2 publication Critical patent/JP7033919B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (1)

  1. 第１ガスは、一次ガス及び二次ガスを含むガス混合物のうちの一次ガスであり、ガス混合物は、アルゴンと水素の混合物、アルゴンとヘリウムの混合物、窒素と水素の混合物、窒素とヘリウムの混合物、及びアルゴンと酸素の混合物からなるリストから選択される、請求項８記載の方法。
JP2017512875A 2014-05-16 2015-05-15 相及び応力制御を使用したプラズマ溶射コーティング設計 Active JP7033919B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461994648P 2014-05-16 2014-05-16
US61/994,648 2014-05-16
US14/712,054 US10196728B2 (en) 2014-05-16 2015-05-14 Plasma spray coating design using phase and stress control
US14/712,054 2015-05-14
PCT/US2015/031172 WO2015175987A1 (en) 2014-05-16 2015-05-15 Plasma spray coating design using phase and stress control

Publications (3)

Publication Number Publication Date
JP2017515985A JP2017515985A (ja) 2017-06-15
JP2017515985A5 true JP2017515985A5 (ja) 2018-05-31
JP7033919B2 JP7033919B2 (ja) 2022-03-11

Family

ID=54480808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017512875A Active JP7033919B2 (ja) 2014-05-16 2015-05-15 相及び応力制御を使用したプラズマ溶射コーティング設計

Country Status (5)

Country Link
US (3) US10196728B2 (ja)
JP (1) JP7033919B2 (ja)
KR (2) KR102410645B1 (ja)
CN (2) CN113620710B (ja)
WO (1) WO2015175987A1 (ja)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US9343289B2 (en) 2012-07-27 2016-05-17 Applied Materials, Inc. Chemistry compatible coating material for advanced device on-wafer particle performance
US9708713B2 (en) 2013-05-24 2017-07-18 Applied Materials, Inc. Aerosol deposition coating for semiconductor chamber components
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US9711334B2 (en) 2013-07-19 2017-07-18 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
US9583369B2 (en) 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US10468235B2 (en) 2013-09-18 2019-11-05 Applied Materials, Inc. Plasma spray coating enhancement using plasma flame heat treatment
US9440886B2 (en) 2013-11-12 2016-09-13 Applied Materials, Inc. Rare-earth oxide based monolithic chamber material
US9725799B2 (en) 2013-12-06 2017-08-08 Applied Materials, Inc. Ion beam sputtering with ion assisted deposition for coatings on chamber components
US9869013B2 (en) 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
US9976211B2 (en) 2014-04-25 2018-05-22 Applied Materials, Inc. Plasma erosion resistant thin film coating for high temperature application
US10730798B2 (en) 2014-05-07 2020-08-04 Applied Materials, Inc. Slurry plasma spray of plasma resistant ceramic coating
US10196728B2 (en) 2014-05-16 2019-02-05 Applied Materials, Inc. Plasma spray coating design using phase and stress control
US9460898B2 (en) 2014-08-08 2016-10-04 Applied Materials, Inc. Plasma generation chamber with smooth plasma resistant coating
CN105648386B (zh) * 2016-02-18 2018-12-07 中国科学院上海硅酸盐研究所 热喷涂氧化铝–氧化钇复合陶瓷涂层及其制备方法
US11326253B2 (en) 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US9850573B1 (en) 2016-06-23 2017-12-26 Applied Materials, Inc. Non-line of sight deposition of erbium based plasma resistant ceramic coating
US20180016678A1 (en) 2016-07-15 2018-01-18 Applied Materials, Inc. Multi-layer coating with diffusion barrier layer and erosion resistant layer
DE102016009730A1 (de) * 2016-07-28 2018-02-01 Forschungszentrum Jülich GmbH Verfahren zur Verstärkung von transparenten Keramiken sowie Keramik
US10186400B2 (en) 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US10755900B2 (en) 2017-05-10 2020-08-25 Applied Materials, Inc. Multi-layer plasma erosion protection for chamber components
US11279656B2 (en) 2017-10-27 2022-03-22 Applied Materials, Inc. Nanopowders, nanoceramic materials and methods of making and use thereof
KR102044333B1 (ko) * 2017-12-26 2019-11-13 주식회사 포스코 용사 코팅 장치
CN117637438A (zh) * 2018-01-15 2024-03-01 应用材料公司 添加氩至远程等离子体氧化
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
US10443126B1 (en) 2018-04-06 2019-10-15 Applied Materials, Inc. Zone-controlled rare-earth oxide ALD and CVD coatings
US11667575B2 (en) 2018-07-18 2023-06-06 Applied Materials, Inc. Erosion resistant metal oxide coatings
BE1026683B1 (nl) * 2018-10-05 2020-05-07 Soleras Advanced Coatings Bvba Sputterdoel
CN109207917B (zh) * 2018-10-19 2020-08-04 南京航空航天大学 一种NiCrAlSi/CeO2掺杂YSZ热障涂层及其制备方法
US11180847B2 (en) 2018-12-06 2021-11-23 Applied Materials, Inc. Atomic layer deposition coatings for high temperature ceramic components
US10858741B2 (en) 2019-03-11 2020-12-08 Applied Materials, Inc. Plasma resistant multi-layer architecture for high aspect ratio parts
CN109987947A (zh) * 2019-04-19 2019-07-09 中国科学院上海硅酸盐研究所 利用原位应力诱导相变同步优化氧化铝涂层导热与力学性能的方法
KR102042559B1 (ko) * 2019-05-30 2019-12-02 (주)쉬엔비 플라즈마를 이용하여 피부미용 및 피부재생이 가능한 플라즈마 핸드피스 및 이를 이용한 플라즈마 발생장치
CN110904361B (zh) * 2019-12-16 2020-10-30 北京君山表面技术工程有限公司 等离子喷涂用镍基合金复合粉末及熔覆涂层的制备方法
US20230051800A1 (en) * 2020-01-27 2023-02-16 Applied Materials, Inc. Methods and apparatus for plasma spraying silicon carbide coatings for semiconductor chamber applications
USD943539S1 (en) 2020-03-19 2022-02-15 Applied Materials, Inc. Confinement plate for a substrate processing chamber
USD979524S1 (en) 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
US11380524B2 (en) * 2020-03-19 2022-07-05 Applied Materials, Inc. Low resistance confinement liner for use in plasma chamber
CN112251706B (zh) * 2020-09-20 2022-05-17 苏州纳创佳环保科技工程有限公司 一种聚碳硅烷/氧化锆的激光防护复合涂层的制备方法
DE102020126082A1 (de) 2020-10-06 2022-04-07 Forschungszentrum Jülich GmbH Verfahren zur Herstellung einer Beschichtung sowie Beschichtung
CN115852294B (zh) * 2022-12-28 2023-08-01 西安交通大学 一种基于应力调控的含表面裂纹热障涂层及其制备方法

Family Cites Families (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010062209A (ko) * 1999-12-10 2001-07-07 히가시 데쓰로 고내식성 막이 내부에 형성된 챔버를 구비하는 처리 장치
US6949203B2 (en) 1999-12-28 2005-09-27 Applied Materials, Inc. System level in-situ integrated dielectric etch process particularly useful for copper dual damascene
JP2002060943A (ja) * 2000-08-22 2002-02-28 Tohoku Electric Power Co Inc 高純度シリコンの被覆方法及び装置
JP4277973B2 (ja) * 2001-07-19 2009-06-10 日本碍子株式会社 イットリア−アルミナ複合酸化物膜の製造方法、イットリア−アルミナ複合酸化物膜および耐蝕性部材
US20030047464A1 (en) 2001-07-27 2003-03-13 Applied Materials, Inc. Electrochemically roughened aluminum semiconductor processing apparatus surfaces
BR0211578A (pt) 2001-08-02 2006-04-04 3M Innovative Properties Co vidro, cerámica, métodos para a fabricação de um vidro, de uma cerámica, e de um artigo compreendendo vidro, vidro-cerámica, métodos para a fabricação de um vidro-cerámica, e de um artigo de vidro-cerámica, partìcula abrasiva, método para a fabricação de partìculas abrasivas, pluralidade de partìculas abrasivas, artigo abrasivo, e, método para desbastar uma superfìcie
US20080264564A1 (en) 2007-04-27 2008-10-30 Applied Materials, Inc. Method of reducing the erosion rate of semiconductor processing apparatus exposed to halogen-containing plasmas
US20080213496A1 (en) * 2002-02-14 2008-09-04 Applied Materials, Inc. Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
US8067067B2 (en) * 2002-02-14 2011-11-29 Applied Materials, Inc. Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
US7026009B2 (en) * 2002-03-27 2006-04-11 Applied Materials, Inc. Evaluation of chamber components having textured coatings
US7179526B2 (en) * 2002-08-02 2007-02-20 3M Innovative Properties Company Plasma spraying
JP2004091269A (ja) * 2002-08-30 2004-03-25 Rikogaku Shinkokai 多相セラミックス用溶融体ならびにその鋳造および被覆方法
US20040148868A1 (en) * 2003-02-05 2004-08-05 3M Innovative Properties Company Methods of making ceramics
JP2005097722A (ja) * 2003-08-25 2005-04-14 Tosoh Corp 耐蝕性部材及びその製造方法
EP1524682B1 (en) * 2003-10-17 2011-10-05 Tosoh Corporation Component for vacuum apparatus, production method thereof and apparatus using the same
US7910218B2 (en) * 2003-10-22 2011-03-22 Applied Materials, Inc. Cleaning and refurbishing chamber components having metal coatings
DE102004044597B3 (de) * 2004-09-13 2006-02-02 Forschungszentrum Jülich GmbH Verfahren zur Herstellung dünner, dichter Keramikschichten
US7672110B2 (en) 2005-08-29 2010-03-02 Applied Materials, Inc. Electrostatic chuck having textured contact surface
US7968205B2 (en) 2005-10-21 2011-06-28 Shin-Etsu Chemical Co., Ltd. Corrosion resistant multilayer member
KR101344990B1 (ko) 2006-04-20 2013-12-24 신에쓰 가가꾸 고교 가부시끼가이샤 도전성 내플라즈마 부재
US20080029032A1 (en) 2006-08-01 2008-02-07 Sun Jennifer Y Substrate support with protective layer for plasma resistance
US7875370B2 (en) 2006-08-18 2011-01-25 United Technologies Corporation Thermal barrier coating with a plasma spray top layer
US7479464B2 (en) 2006-10-23 2009-01-20 Applied Materials, Inc. Low temperature aerosol deposition of a plasma resistive layer
US7718559B2 (en) 2007-04-20 2010-05-18 Applied Materials, Inc. Erosion resistance enhanced quartz used in plasma etch chamber
US7696117B2 (en) 2007-04-27 2010-04-13 Applied Materials, Inc. Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
US8367227B2 (en) 2007-08-02 2013-02-05 Applied Materials, Inc. Plasma-resistant ceramics with controlled electrical resistivity
JP2009068067A (ja) * 2007-09-13 2009-04-02 Covalent Materials Corp 耐プラズマ性セラミックス溶射膜
JP5047741B2 (ja) * 2007-09-13 2012-10-10 コバレントマテリアル株式会社 耐プラズマ性セラミックス溶射膜
US8129029B2 (en) 2007-12-21 2012-03-06 Applied Materials, Inc. Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating
US20090214825A1 (en) 2008-02-26 2009-08-27 Applied Materials, Inc. Ceramic coating comprising yttrium which is resistant to a reducing plasma
CA2658210A1 (en) * 2008-04-04 2009-10-04 Sulzer Metco Ag Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam
US9725797B2 (en) * 2008-04-30 2017-08-08 United Technologies Corporation Process for forming an improved durability thick ceramic coating
US8206829B2 (en) 2008-11-10 2012-06-26 Applied Materials, Inc. Plasma resistant coatings for plasma chamber components
US9017765B2 (en) 2008-11-12 2015-04-28 Applied Materials, Inc. Protective coatings resistant to reactive plasma processing
JP2011117012A (ja) * 2009-11-30 2011-06-16 Mitsubishi Heavy Ind Ltd 遮熱コーティングの施工方法、耐熱部材及びガスタービン
US20110198034A1 (en) * 2010-02-11 2011-08-18 Jennifer Sun Gas distribution showerhead with coating material for semiconductor processing
JP2011177743A (ja) * 2010-03-01 2011-09-15 Honda Motor Co Ltd プラズマ溶接トーチ、及びプラズマ溶接トーチを用いた溶接方法
WO2011150311A1 (en) 2010-05-28 2011-12-01 Praxair Technology, Inc. Substrate supports for semiconductor applications
FI125358B (fi) * 2010-07-09 2015-09-15 Teknologian Tutkimuskeskus Vtt Oy Termisesti ruiskutettu täysin amorfinen oksidipinnoite
US20120196139A1 (en) 2010-07-14 2012-08-02 Christopher Petorak Thermal spray composite coatings for semiconductor applications
US8916021B2 (en) 2010-10-27 2014-12-23 Applied Materials, Inc. Electrostatic chuck and showerhead with enhanced thermal properties and methods of making thereof
CN103194715B (zh) * 2012-01-05 2015-07-01 中国科学院微电子研究所 一种大气等离子喷涂技术制备非晶Y3Al5O12涂层的方法
KR101382591B1 (ko) * 2012-02-03 2014-04-10 주식회사케이세라셀 정전척 제조용 플라즈마 스프레이 코팅 재료 및 이의 제조방법
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US20150064406A1 (en) 2012-03-22 2015-03-05 Tocalo Co., Ltd. Method for forming fluoride spray coating, and fluoride spray coating covered member
US20130273313A1 (en) 2012-04-13 2013-10-17 Applied Materials, Inc. Ceramic coated ring and process for applying ceramic coating
US9090046B2 (en) 2012-04-16 2015-07-28 Applied Materials, Inc. Ceramic coated article and process for applying ceramic coating
US9394615B2 (en) 2012-04-27 2016-07-19 Applied Materials, Inc. Plasma resistant ceramic coated conductive article
US20130288037A1 (en) 2012-04-27 2013-10-31 Applied Materials, Inc. Plasma spray coating process enhancement for critical chamber components
US9988702B2 (en) 2012-05-22 2018-06-05 Kabushiki Kaisha Toshiba Component for plasma processing apparatus and method for manufacturing component for plasma processing apparatus
US9604249B2 (en) 2012-07-26 2017-03-28 Applied Materials, Inc. Innovative top-coat approach for advanced device on-wafer particle performance
US9447365B2 (en) 2012-07-27 2016-09-20 Applied Materials, Inc. Enhanced cleaning process of chamber used plasma spray coating without damaging coating
US9343289B2 (en) 2012-07-27 2016-05-17 Applied Materials, Inc. Chemistry compatible coating material for advanced device on-wafer particle performance
JP6246567B2 (ja) 2012-11-22 2017-12-13 群馬県 複層皮膜付き基材およびその製造方法
US9916998B2 (en) 2012-12-04 2018-03-13 Applied Materials, Inc. Substrate support assembly having a plasma resistant protective layer
US8941969B2 (en) 2012-12-21 2015-01-27 Applied Materials, Inc. Single-body electrostatic chuck
US9358702B2 (en) 2013-01-18 2016-06-07 Applied Materials, Inc. Temperature management of aluminium nitride electrostatic chuck
KR102164024B1 (ko) 2013-03-13 2020-10-12 가부시키가이샤 후지미인코퍼레이티드 용사용 분말, 용사 피막 및 용사 피막의 형성 방법
US9816392B2 (en) * 2013-04-10 2017-11-14 General Electric Company Architectures for high temperature TBCs with ultra low thermal conductivity and abradability and method of making
US9583369B2 (en) 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US10468235B2 (en) 2013-09-18 2019-11-05 Applied Materials, Inc. Plasma spray coating enhancement using plasma flame heat treatment
US9440886B2 (en) 2013-11-12 2016-09-13 Applied Materials, Inc. Rare-earth oxide based monolithic chamber material
JP5864814B2 (ja) 2013-11-21 2016-02-17 京セラドキュメントソリューションズ株式会社 定着装置およびこれを備える画像形成装置
JP5894198B2 (ja) 2014-01-06 2016-03-23 株式会社フジミインコーポレーテッド 溶射用スラリー及び溶射皮膜の形成方法
US20170022595A1 (en) 2014-03-31 2017-01-26 Kabushiki Kaisha Toshiba Plasma-Resistant Component, Method For Manufacturing The Plasma-Resistant Component, And Film Deposition Apparatus Used For Manufacturing The Plasma-Resistant Component
US10730798B2 (en) 2014-05-07 2020-08-04 Applied Materials, Inc. Slurry plasma spray of plasma resistant ceramic coating
US10196728B2 (en) 2014-05-16 2019-02-05 Applied Materials, Inc. Plasma spray coating design using phase and stress control

Similar Documents

Publication Publication Date Title
JP2017515985A5 (ja)
MX2017006219A (es) Materiales adsorbentes y metodos de uso.
MX2019003406A (es) Estructuras de nonofibra y metodos de uso de las mismas.
WO2017172645A3 (en) Bacteriophage engineering methods
IL248713A0 (en) Methods and devices for the production of purified hydrogen peroxide gas
GB2544147B (en) Hydrogen gas generator
IL255287B (en) Methods for using hydrogen peroxide gas in agricultural produce, transportation and storage
IL260848A (en) Methods for production of carbon and hydrogen from natural gas and other hydrocarbons
EP3285816A4 (en) Clean rooms having dilute hydrogen peroxide (dhp) gas and methods of use thereof
EP3217097A4 (en) Burner, combustor, and gas turbine
EP3653285A4 (en) GRAPHENE NANOWINDOW STRUCTURE AND VERY PURE GAS PRODUCTION PROCESS
EP3186411A4 (en) Hydrogen and oxygen generator
IT201700092437A1 (it) Procedimento per il trattamento di una miscela di gas comprendente metano ed anidride carbonica
EP3604770A4 (en) GAS TURBINE
SG11202001195PA (en) Gyroscope, methods of forming and operating the same
EP3220974A4 (en) Gas exchange composite membranes and methods of use thereof
EP3733592A4 (en) HYDROGEN GAS GENERATOR BODY
SG11201902917PA (en) Gas phase etching apparatus and gas phase etching equipment
EP3152369A4 (en) Reformer flue gas tunnel and refractory components therefor
EP3463991A4 (en) GAS GENERATING COMPOSITIONS AND METHOD FOR THE PRODUCTION AND USE THEREOF
EP3283746A4 (en) Novel multiloop gas turbine and method of operation thereof
EP3134134A4 (en) System and method for the manufacture, storage and transportation of hydrogen and oxygen gas
EP3702026A4 (en) GAS GENERATING DEVICE AND GAS GENERATING METHOD
EP3550648A4 (en) GAS DIFFUSION ELECTRODE AND MANUFACTURING METHOD THEREFOR
MX2018007275A (es) Proceso para tratamiento de superficie con fase gaseosa.