JP2017515985A - 相及び応力制御を使用したプラズマ溶射コーティング設計 - Google Patents
相及び応力制御を使用したプラズマ溶射コーティング設計 Download PDFInfo
- Publication number
- JP2017515985A JP2017515985A JP2017512875A JP2017512875A JP2017515985A JP 2017515985 A JP2017515985 A JP 2017515985A JP 2017512875 A JP2017512875 A JP 2017512875A JP 2017512875 A JP2017512875 A JP 2017512875A JP 2017515985 A JP2017515985 A JP 2017515985A
- Authority
- JP
- Japan
- Prior art keywords
- mol
- zro
- mole
- plasma
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/50—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
- C04B35/505—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds based on yttrium oxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
- H01J37/32495—Means for protecting the vessel against plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Analytical Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (15)
- Al、Al2O3、AlN、Y2O3、YSZ、又はSiCのうちの少なくとも1つを含む本体と、
本体の少なくとも1つの表面上のプラズマ溶射セラミックスコーティングであって、セラミックスコーティングは、Y2O3、Al2O3、及びZrO2を含む化合物を含み、複数の重なったパンケーキ形状のスプラットを更に含み、セラミックスコーティングは、アモルファス相を有するプラズマ溶射セラミックスコーティングとを含む物品。 - セラミックスコーティングは、約53モル%のY2O3と、約10モル%のZrO2と、約37モル%のAl2O3とを含む、請求項1記載の物品。
- セラミックスコーティングは、
50〜75モル%のY2O3、10〜30モル%のZrO2、及び10〜30モル%のAl2O3;
40〜100モル%のY2O3、0〜60モル%のZrO2、及び0〜10モル%のAl2O3;
40〜60モル%のY2O3、30〜50モル%のZrO2、及び10〜20モル%のAl2O3;
40〜50モル%のY2O3、20〜40モル%のZrO2、及び20〜40モル%のAl2O3;
70〜90モル%のY2O3、0〜20モル%のZrO2、及び10〜20モル%のAl2O3;
60〜80モル%のY2O3、0〜10モル%のZrO2、及び20〜40モル%のAl2O3;
40〜60モル%のY2O3、0〜20モル%のZrO2、及び30〜40モル%のAl2O3;
30〜60モル%のY2O3、0〜20モル%のZrO2、及び30〜60モル%のAl2O3;及び
20〜40モル%のY2O3、20〜80モル%のZrO2、及び0〜60モル%のAl2O3からなるリストから選択される組成を有する、請求項1記載の物品。 - セラミックスコーティングは、内部圧縮応力を有する、請求項1記載の物品。
- 物品は、前面、裏面、上部ライナー、スリットバルブドア、プラズマスクリーン、下部ライナー、及びカソードライナーを含むライナーキットを含む、請求項1記載の物品。
- パンケーキ形状のスプラットの大部分は亀裂を欠いている、請求項1記載の物品。
- セラミックスコーティングは、2〜15ミルの厚さと、プラズマ環境内での処理の少なくとも5000時間の寿命とを有する、請求項1記載の物品。
- プラズマ溶射システム用にプラズマ電流を約100A〜約1000Aの値に設定する工程と、
約60mm〜約250mmの間の本体からのトーチスタンドオフ距離にプラズマ溶射システムのトーチを位置決めする工程と、
約30L/分〜約400L/分の間の速度でプラズマ溶射システムを通して第1ガスを流す工程と、
内部圧縮応力及びアモルファス相を有するセラミックスコーティングを本体上に形成するためにプラズマ溶射コーティングを実行する工程を含み、セラミックスコーティングは、Y2O3、Al2O3、及びZrO2の化合物を含み、セラミックスコーティングのスプラットは、パンケーキ形状を有する方法。 - セラミックスコーティングは、約53モル%のY2O3と、約10モル%のZrO2と、約37モル%のAl2O3とを含む、請求項10記載の方法。
- セラミックスコーティングは、
50〜75モル%のY2O3、10〜30モル%のZrO2、及び10〜30モル%のAl2O3;
40〜100モル%のY2O3、0〜60モル%のZrO2、及び0〜10モル%のAl2O3;
40〜60モル%のY2O3、30〜50モル%のZrO2、及び10〜20モル%のAl2O3;
40〜50モル%のY2O3、20〜40モル%のZrO2、及び20〜40モル%のAl2O3;
70〜90モル%のY2O3、0〜20モル%のZrO2、及び10〜20モル%のAl2O3;
60〜80モル%のY2O3、0〜10モル%のZrO2、及び20〜40モル%のAl2O3;
40〜60モル%のY2O3、0〜20モル%のZrO2、及び30〜40モル%のAl2O3;
30〜60モル%のY2O3、0〜20モル%のZrO2、及び30〜60モル%のAl2O3;及び
20〜40モル%のY2O3、20〜80モル%のZrO2、及び0〜60モル%のAl2O3からなるリストから選択される組成を有する、請求項8記載の方法。 - プラズマ電流は、約450A〜約800Aの間の範囲内にあり、プラズマ溶射システムのトーチスタンドオフ距離は、約60mm〜約200mmの間にある、請求項8記載の方法。
- 第1ガスは、一次ガス及び二次ガスを含むガス混合物のうちの一次ガスであり、ガス混合物は、アルゴンと水素の混合物、アルゴンとヘリウムの混合物、窒素と水素の混合物、窒素とヘリウムの混合物、及びアルゴンと酸素の混合物からなるリストから選択される、請求項18記載の方法。
- 二次ガスは、約3L/分〜約100L/分の間の速度でプラズマ溶射システムを通って流れる、請求項12記載の方法。
- スプラットは、相変化を受けずにアモルファス相内で固化する、請求項8記載の方法。
- プラズマ溶射コーティングを実行するプラズマ溶射システムは、約6mmのノズル直径を有する、請求項8記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201461994648P | 2014-05-16 | 2014-05-16 | |
US61/994,648 | 2014-05-16 | ||
US14/712,054 US10196728B2 (en) | 2014-05-16 | 2015-05-14 | Plasma spray coating design using phase and stress control |
US14/712,054 | 2015-05-14 | ||
PCT/US2015/031172 WO2015175987A1 (en) | 2014-05-16 | 2015-05-15 | Plasma spray coating design using phase and stress control |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017515985A true JP2017515985A (ja) | 2017-06-15 |
JP2017515985A5 JP2017515985A5 (ja) | 2018-05-31 |
JP7033919B2 JP7033919B2 (ja) | 2022-03-11 |
Family
ID=54480808
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017512875A Active JP7033919B2 (ja) | 2014-05-16 | 2015-05-15 | 相及び応力制御を使用したプラズマ溶射コーティング設計 |
Country Status (5)
Country | Link |
---|---|
US (3) | US10196728B2 (ja) |
JP (1) | JP7033919B2 (ja) |
KR (2) | KR102410645B1 (ja) |
CN (2) | CN113620710B (ja) |
WO (1) | WO2015175987A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190078384A (ko) * | 2017-12-26 | 2019-07-04 | 주식회사 포스코 | 용사 코팅 장치 |
WO2021188362A1 (en) * | 2020-03-19 | 2021-09-23 | Applied Materials, Inc. | Low resistance confinement liner for use in plasma chamber |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9212099B2 (en) | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
US9343289B2 (en) | 2012-07-27 | 2016-05-17 | Applied Materials, Inc. | Chemistry compatible coating material for advanced device on-wafer particle performance |
US9708713B2 (en) | 2013-05-24 | 2017-07-18 | Applied Materials, Inc. | Aerosol deposition coating for semiconductor chamber components |
US9850568B2 (en) | 2013-06-20 | 2017-12-26 | Applied Materials, Inc. | Plasma erosion resistant rare-earth oxide based thin film coatings |
US9711334B2 (en) | 2013-07-19 | 2017-07-18 | Applied Materials, Inc. | Ion assisted deposition for rare-earth oxide based thin film coatings on process rings |
US9583369B2 (en) | 2013-07-20 | 2017-02-28 | Applied Materials, Inc. | Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles |
US20150079370A1 (en) | 2013-09-18 | 2015-03-19 | Applied Materials, Inc. | Coating architecture for plasma sprayed chamber components |
US9440886B2 (en) | 2013-11-12 | 2016-09-13 | Applied Materials, Inc. | Rare-earth oxide based monolithic chamber material |
US9725799B2 (en) | 2013-12-06 | 2017-08-08 | Applied Materials, Inc. | Ion beam sputtering with ion assisted deposition for coatings on chamber components |
US9869013B2 (en) | 2014-04-25 | 2018-01-16 | Applied Materials, Inc. | Ion assisted deposition top coat of rare-earth oxide |
US9976211B2 (en) | 2014-04-25 | 2018-05-22 | Applied Materials, Inc. | Plasma erosion resistant thin film coating for high temperature application |
US10730798B2 (en) | 2014-05-07 | 2020-08-04 | Applied Materials, Inc. | Slurry plasma spray of plasma resistant ceramic coating |
US10196728B2 (en) | 2014-05-16 | 2019-02-05 | Applied Materials, Inc. | Plasma spray coating design using phase and stress control |
US9460898B2 (en) | 2014-08-08 | 2016-10-04 | Applied Materials, Inc. | Plasma generation chamber with smooth plasma resistant coating |
CN105648386B (zh) * | 2016-02-18 | 2018-12-07 | 中国科学院上海硅酸盐研究所 | 热喷涂氧化铝–氧化钇复合陶瓷涂层及其制备方法 |
US11326253B2 (en) | 2016-04-27 | 2022-05-10 | Applied Materials, Inc. | Atomic layer deposition of protective coatings for semiconductor process chamber components |
US9850573B1 (en) | 2016-06-23 | 2017-12-26 | Applied Materials, Inc. | Non-line of sight deposition of erbium based plasma resistant ceramic coating |
US20180016678A1 (en) | 2016-07-15 | 2018-01-18 | Applied Materials, Inc. | Multi-layer coating with diffusion barrier layer and erosion resistant layer |
DE102016009730A1 (de) * | 2016-07-28 | 2018-02-01 | Forschungszentrum Jülich GmbH | Verfahren zur Verstärkung von transparenten Keramiken sowie Keramik |
US10186400B2 (en) | 2017-01-20 | 2019-01-22 | Applied Materials, Inc. | Multi-layer plasma resistant coating by atomic layer deposition |
US10755900B2 (en) | 2017-05-10 | 2020-08-25 | Applied Materials, Inc. | Multi-layer plasma erosion protection for chamber components |
US11279656B2 (en) | 2017-10-27 | 2022-03-22 | Applied Materials, Inc. | Nanopowders, nanoceramic materials and methods of making and use thereof |
CN111566780B (zh) * | 2018-01-15 | 2023-12-01 | 应用材料公司 | 添加氩至远程等离子体氧化 |
US11047035B2 (en) | 2018-02-23 | 2021-06-29 | Applied Materials, Inc. | Protective yttria coating for semiconductor equipment parts |
US10443126B1 (en) | 2018-04-06 | 2019-10-15 | Applied Materials, Inc. | Zone-controlled rare-earth oxide ALD and CVD coatings |
US11667575B2 (en) | 2018-07-18 | 2023-06-06 | Applied Materials, Inc. | Erosion resistant metal oxide coatings |
BE1026683B1 (nl) * | 2018-10-05 | 2020-05-07 | Soleras Advanced Coatings Bvba | Sputterdoel |
CN109207917B (zh) * | 2018-10-19 | 2020-08-04 | 南京航空航天大学 | 一种NiCrAlSi/CeO2掺杂YSZ热障涂层及其制备方法 |
US11180847B2 (en) | 2018-12-06 | 2021-11-23 | Applied Materials, Inc. | Atomic layer deposition coatings for high temperature ceramic components |
US10858741B2 (en) | 2019-03-11 | 2020-12-08 | Applied Materials, Inc. | Plasma resistant multi-layer architecture for high aspect ratio parts |
CN109987947A (zh) * | 2019-04-19 | 2019-07-09 | 中国科学院上海硅酸盐研究所 | 利用原位应力诱导相变同步优化氧化铝涂层导热与力学性能的方法 |
KR102042559B1 (ko) * | 2019-05-30 | 2019-12-02 | (주)쉬엔비 | 플라즈마를 이용하여 피부미용 및 피부재생이 가능한 플라즈마 핸드피스 및 이를 이용한 플라즈마 발생장치 |
CN110904361B (zh) * | 2019-12-16 | 2020-10-30 | 北京君山表面技术工程有限公司 | 等离子喷涂用镍基合金复合粉末及熔覆涂层的制备方法 |
US20230051800A1 (en) * | 2020-01-27 | 2023-02-16 | Applied Materials, Inc. | Methods and apparatus for plasma spraying silicon carbide coatings for semiconductor chamber applications |
USD943539S1 (en) | 2020-03-19 | 2022-02-15 | Applied Materials, Inc. | Confinement plate for a substrate processing chamber |
USD979524S1 (en) | 2020-03-19 | 2023-02-28 | Applied Materials, Inc. | Confinement liner for a substrate processing chamber |
CN112251706B (zh) * | 2020-09-20 | 2022-05-17 | 苏州纳创佳环保科技工程有限公司 | 一种聚碳硅烷/氧化锆的激光防护复合涂层的制备方法 |
DE102020126082A1 (de) | 2020-10-06 | 2022-04-07 | Forschungszentrum Jülich GmbH | Verfahren zur Herstellung einer Beschichtung sowie Beschichtung |
CN115852294B (zh) * | 2022-12-28 | 2023-08-01 | 西安交通大学 | 一种基于应力调控的含表面裂纹热障涂层及其制备方法 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030185965A1 (en) * | 2002-03-27 | 2003-10-02 | Applied Materials, Inc. | Evaluation of chamber components having textured coatings |
JP2004091269A (ja) * | 2002-08-30 | 2004-03-25 | Rikogaku Shinkokai | 多相セラミックス用溶融体ならびにその鋳造および被覆方法 |
JP2005097722A (ja) * | 2003-08-25 | 2005-04-14 | Tosoh Corp | 耐蝕性部材及びその製造方法 |
JP2005534814A (ja) * | 2002-08-02 | 2005-11-17 | スリーエム イノベイティブ プロパティズ カンパニー | プラズマ溶射 |
JP2008045211A (ja) * | 2006-08-18 | 2008-02-28 | United Technol Corp <Utc> | タービンエンジンコンポーネント及びタービンエンジンコンポーネントのコーティング方法 |
JP2009068066A (ja) * | 2007-09-13 | 2009-04-02 | Covalent Materials Corp | 耐プラズマ性セラミックス溶射膜 |
JP2009068067A (ja) * | 2007-09-13 | 2009-04-02 | Covalent Materials Corp | 耐プラズマ性セラミックス溶射膜 |
JP2011117012A (ja) * | 2009-11-30 | 2011-06-16 | Mitsubishi Heavy Ind Ltd | 遮熱コーティングの施工方法、耐熱部材及びガスタービン |
US20130143037A1 (en) * | 2010-07-09 | 2013-06-06 | Teknologian Tutkimuskeskus Vtt | Thermally sprayed completely amorphic oxide coating |
WO2013162909A1 (en) * | 2012-04-27 | 2013-10-31 | Applied Materials, Inc. | Plasma spray coating process enhancement for critical chamber components |
WO2014018830A1 (en) * | 2012-07-27 | 2014-01-30 | Applied Materials, Inc. | Chemistry compatible coating material for advanced device on-wafer particle performance |
Family Cites Families (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010062209A (ko) * | 1999-12-10 | 2001-07-07 | 히가시 데쓰로 | 고내식성 막이 내부에 형성된 챔버를 구비하는 처리 장치 |
US6949203B2 (en) | 1999-12-28 | 2005-09-27 | Applied Materials, Inc. | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene |
JP2002060943A (ja) * | 2000-08-22 | 2002-02-28 | Tohoku Electric Power Co Inc | 高純度シリコンの被覆方法及び装置 |
JP4277973B2 (ja) * | 2001-07-19 | 2009-06-10 | 日本碍子株式会社 | イットリア−アルミナ複合酸化物膜の製造方法、イットリア−アルミナ複合酸化物膜および耐蝕性部材 |
US20030047464A1 (en) | 2001-07-27 | 2003-03-13 | Applied Materials, Inc. | Electrochemically roughened aluminum semiconductor processing apparatus surfaces |
RU2004101636A (ru) | 2001-08-02 | 2005-06-10 | 3М Инновейтив Пропертиз Компани (US) | Материалы на основе оксида алюминия, оксида иттрия, оксида циркония/оксида гафния и способы их изготовления и использования |
US20080264564A1 (en) | 2007-04-27 | 2008-10-30 | Applied Materials, Inc. | Method of reducing the erosion rate of semiconductor processing apparatus exposed to halogen-containing plasmas |
US20080213496A1 (en) * | 2002-02-14 | 2008-09-04 | Applied Materials, Inc. | Method of coating semiconductor processing apparatus with protective yttrium-containing coatings |
US8067067B2 (en) * | 2002-02-14 | 2011-11-29 | Applied Materials, Inc. | Clean, dense yttrium oxide coating protecting semiconductor processing apparatus |
US20040148868A1 (en) * | 2003-02-05 | 2004-08-05 | 3M Innovative Properties Company | Methods of making ceramics |
EP1524682B1 (en) * | 2003-10-17 | 2011-10-05 | Tosoh Corporation | Component for vacuum apparatus, production method thereof and apparatus using the same |
US7910218B2 (en) * | 2003-10-22 | 2011-03-22 | Applied Materials, Inc. | Cleaning and refurbishing chamber components having metal coatings |
DE102004044597B3 (de) * | 2004-09-13 | 2006-02-02 | Forschungszentrum Jülich GmbH | Verfahren zur Herstellung dünner, dichter Keramikschichten |
US7672110B2 (en) | 2005-08-29 | 2010-03-02 | Applied Materials, Inc. | Electrostatic chuck having textured contact surface |
US7968205B2 (en) | 2005-10-21 | 2011-06-28 | Shin-Etsu Chemical Co., Ltd. | Corrosion resistant multilayer member |
US7655328B2 (en) | 2006-04-20 | 2010-02-02 | Shin-Etsu Chemical Co., Ltd. | Conductive, plasma-resistant member |
US20080029032A1 (en) | 2006-08-01 | 2008-02-07 | Sun Jennifer Y | Substrate support with protective layer for plasma resistance |
US7479464B2 (en) | 2006-10-23 | 2009-01-20 | Applied Materials, Inc. | Low temperature aerosol deposition of a plasma resistive layer |
US7718559B2 (en) | 2007-04-20 | 2010-05-18 | Applied Materials, Inc. | Erosion resistance enhanced quartz used in plasma etch chamber |
US7696117B2 (en) | 2007-04-27 | 2010-04-13 | Applied Materials, Inc. | Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas |
US8367227B2 (en) | 2007-08-02 | 2013-02-05 | Applied Materials, Inc. | Plasma-resistant ceramics with controlled electrical resistivity |
US8129029B2 (en) | 2007-12-21 | 2012-03-06 | Applied Materials, Inc. | Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating |
US20090214825A1 (en) | 2008-02-26 | 2009-08-27 | Applied Materials, Inc. | Ceramic coating comprising yttrium which is resistant to a reducing plasma |
CA2658210A1 (en) * | 2008-04-04 | 2009-10-04 | Sulzer Metco Ag | Method and apparatus for the coating and for the surface treatment of substrates by means of a plasma beam |
US9725797B2 (en) * | 2008-04-30 | 2017-08-08 | United Technologies Corporation | Process for forming an improved durability thick ceramic coating |
US8206829B2 (en) | 2008-11-10 | 2012-06-26 | Applied Materials, Inc. | Plasma resistant coatings for plasma chamber components |
US9017765B2 (en) | 2008-11-12 | 2015-04-28 | Applied Materials, Inc. | Protective coatings resistant to reactive plasma processing |
US20110198034A1 (en) * | 2010-02-11 | 2011-08-18 | Jennifer Sun | Gas distribution showerhead with coating material for semiconductor processing |
JP2011177743A (ja) * | 2010-03-01 | 2011-09-15 | Honda Motor Co Ltd | プラズマ溶接トーチ、及びプラズマ溶接トーチを用いた溶接方法 |
US8619406B2 (en) | 2010-05-28 | 2013-12-31 | Fm Industries, Inc. | Substrate supports for semiconductor applications |
US20120196139A1 (en) | 2010-07-14 | 2012-08-02 | Christopher Petorak | Thermal spray composite coatings for semiconductor applications |
US8916021B2 (en) | 2010-10-27 | 2014-12-23 | Applied Materials, Inc. | Electrostatic chuck and showerhead with enhanced thermal properties and methods of making thereof |
CN103194715B (zh) * | 2012-01-05 | 2015-07-01 | 中国科学院微电子研究所 | 一种大气等离子喷涂技术制备非晶Y3Al5O12涂层的方法 |
KR101382591B1 (ko) * | 2012-02-03 | 2014-04-10 | 주식회사케이세라셀 | 정전척 제조용 플라즈마 스프레이 코팅 재료 및 이의 제조방법 |
US9034199B2 (en) | 2012-02-21 | 2015-05-19 | Applied Materials, Inc. | Ceramic article with reduced surface defect density and process for producing a ceramic article |
US9212099B2 (en) | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
WO2013140668A1 (ja) | 2012-03-22 | 2013-09-26 | トーカロ株式会社 | フッ化物溶射皮膜の形成方法およびフッ化物溶射皮膜被覆部材 |
US20130273313A1 (en) | 2012-04-13 | 2013-10-17 | Applied Materials, Inc. | Ceramic coated ring and process for applying ceramic coating |
US9090046B2 (en) | 2012-04-16 | 2015-07-28 | Applied Materials, Inc. | Ceramic coated article and process for applying ceramic coating |
US9394615B2 (en) | 2012-04-27 | 2016-07-19 | Applied Materials, Inc. | Plasma resistant ceramic coated conductive article |
KR101637801B1 (ko) | 2012-05-22 | 2016-07-07 | 가부시끼가이샤 도시바 | 플라즈마 처리 장치용 부품 및 플라즈마 처리 장치용 부품의 제조 방법 |
US9604249B2 (en) | 2012-07-26 | 2017-03-28 | Applied Materials, Inc. | Innovative top-coat approach for advanced device on-wafer particle performance |
US9447365B2 (en) | 2012-07-27 | 2016-09-20 | Applied Materials, Inc. | Enhanced cleaning process of chamber used plasma spray coating without damaging coating |
JP6246567B2 (ja) | 2012-11-22 | 2017-12-13 | 群馬県 | 複層皮膜付き基材およびその製造方法 |
US9916998B2 (en) | 2012-12-04 | 2018-03-13 | Applied Materials, Inc. | Substrate support assembly having a plasma resistant protective layer |
US8941969B2 (en) | 2012-12-21 | 2015-01-27 | Applied Materials, Inc. | Single-body electrostatic chuck |
US9358702B2 (en) | 2013-01-18 | 2016-06-07 | Applied Materials, Inc. | Temperature management of aluminium nitride electrostatic chuck |
WO2014142019A1 (ja) | 2013-03-13 | 2014-09-18 | 株式会社 フジミインコーポレーテッド | 溶射用粉末、溶射皮膜、及び溶射皮膜の形成方法 |
US9816392B2 (en) * | 2013-04-10 | 2017-11-14 | General Electric Company | Architectures for high temperature TBCs with ultra low thermal conductivity and abradability and method of making |
US9583369B2 (en) | 2013-07-20 | 2017-02-28 | Applied Materials, Inc. | Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles |
US20150079370A1 (en) | 2013-09-18 | 2015-03-19 | Applied Materials, Inc. | Coating architecture for plasma sprayed chamber components |
US9440886B2 (en) | 2013-11-12 | 2016-09-13 | Applied Materials, Inc. | Rare-earth oxide based monolithic chamber material |
CN104823116B (zh) | 2013-11-21 | 2017-04-26 | 京瓷办公信息系统株式会社 | 定影装置以及具有该定影装置的图像形成装置 |
JP5894198B2 (ja) | 2014-01-06 | 2016-03-23 | 株式会社フジミインコーポレーテッド | 溶射用スラリー及び溶射皮膜の形成方法 |
KR20160119187A (ko) | 2014-03-31 | 2016-10-12 | 가부시끼가이샤 도시바 | 내플라즈마 부품 및 내플라즈마 부품의 제조 방법 및 내플라즈마 부품의 제조에 사용하는 막 퇴적 장치 |
US10730798B2 (en) | 2014-05-07 | 2020-08-04 | Applied Materials, Inc. | Slurry plasma spray of plasma resistant ceramic coating |
US10196728B2 (en) | 2014-05-16 | 2019-02-05 | Applied Materials, Inc. | Plasma spray coating design using phase and stress control |
-
2015
- 2015-05-14 US US14/712,054 patent/US10196728B2/en active Active
- 2015-05-15 KR KR1020167002586A patent/KR102410645B1/ko active IP Right Grant
- 2015-05-15 JP JP2017512875A patent/JP7033919B2/ja active Active
- 2015-05-15 KR KR1020227020158A patent/KR20220084213A/ko not_active Application Discontinuation
- 2015-05-15 WO PCT/US2015/031172 patent/WO2015175987A1/en active Application Filing
- 2015-05-15 CN CN202110908948.7A patent/CN113620710B/zh active Active
- 2015-05-15 CN CN201580001477.4A patent/CN105431926B/zh not_active Expired - Fee Related
-
2018
- 2018-12-21 US US16/231,139 patent/US10604831B2/en active Active
-
2020
- 2020-02-19 US US16/794,634 patent/US11578398B2/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030185965A1 (en) * | 2002-03-27 | 2003-10-02 | Applied Materials, Inc. | Evaluation of chamber components having textured coatings |
JP2005521868A (ja) * | 2002-03-27 | 2005-07-21 | アプライド マテリアルズ インコーポレイテッド | テックスチャコーティングを有するチャンバ要素の評価方法 |
JP2005534814A (ja) * | 2002-08-02 | 2005-11-17 | スリーエム イノベイティブ プロパティズ カンパニー | プラズマ溶射 |
JP2004091269A (ja) * | 2002-08-30 | 2004-03-25 | Rikogaku Shinkokai | 多相セラミックス用溶融体ならびにその鋳造および被覆方法 |
JP2005097722A (ja) * | 2003-08-25 | 2005-04-14 | Tosoh Corp | 耐蝕性部材及びその製造方法 |
JP2008045211A (ja) * | 2006-08-18 | 2008-02-28 | United Technol Corp <Utc> | タービンエンジンコンポーネント及びタービンエンジンコンポーネントのコーティング方法 |
JP2009068066A (ja) * | 2007-09-13 | 2009-04-02 | Covalent Materials Corp | 耐プラズマ性セラミックス溶射膜 |
JP2009068067A (ja) * | 2007-09-13 | 2009-04-02 | Covalent Materials Corp | 耐プラズマ性セラミックス溶射膜 |
JP2011117012A (ja) * | 2009-11-30 | 2011-06-16 | Mitsubishi Heavy Ind Ltd | 遮熱コーティングの施工方法、耐熱部材及びガスタービン |
US20130143037A1 (en) * | 2010-07-09 | 2013-06-06 | Teknologian Tutkimuskeskus Vtt | Thermally sprayed completely amorphic oxide coating |
WO2013162909A1 (en) * | 2012-04-27 | 2013-10-31 | Applied Materials, Inc. | Plasma spray coating process enhancement for critical chamber components |
JP2015522710A (ja) * | 2012-04-27 | 2015-08-06 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 重要チャンバコンポーネント用プラズマ溶射プロセスの強化 |
WO2014018830A1 (en) * | 2012-07-27 | 2014-01-30 | Applied Materials, Inc. | Chemistry compatible coating material for advanced device on-wafer particle performance |
US20140030486A1 (en) * | 2012-07-27 | 2014-01-30 | Applied Materials, Inc. | Chemistry compatible coating material for advanced device on-wafer particle performance |
JP2015530737A (ja) * | 2012-07-27 | 2015-10-15 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 高度なデバイスのウェハ上の粒子性能に対して化学的適合性のあるコーティング材料 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190078384A (ko) * | 2017-12-26 | 2019-07-04 | 주식회사 포스코 | 용사 코팅 장치 |
KR102044333B1 (ko) * | 2017-12-26 | 2019-11-13 | 주식회사 포스코 | 용사 코팅 장치 |
WO2021188362A1 (en) * | 2020-03-19 | 2021-09-23 | Applied Materials, Inc. | Low resistance confinement liner for use in plasma chamber |
Also Published As
Publication number | Publication date |
---|---|
JP7033919B2 (ja) | 2022-03-11 |
CN105431926B (zh) | 2021-08-27 |
CN105431926A (zh) | 2016-03-23 |
KR20170005784A (ko) | 2017-01-16 |
US11578398B2 (en) | 2023-02-14 |
WO2015175987A4 (en) | 2016-01-07 |
US20190136360A1 (en) | 2019-05-09 |
CN113620710A (zh) | 2021-11-09 |
KR102410645B1 (ko) | 2022-06-16 |
KR20220084213A (ko) | 2022-06-21 |
US20200190653A1 (en) | 2020-06-18 |
US20150329955A1 (en) | 2015-11-19 |
WO2015175987A1 (en) | 2015-11-19 |
CN113620710B (zh) | 2022-11-11 |
US10604831B2 (en) | 2020-03-31 |
US10196728B2 (en) | 2019-02-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11578398B2 (en) | Plasma spray coating design using phase and stress control | |
JP6640250B2 (ja) | 高度なデバイスのウェハ上の粒子性能に対して化学的適合性のあるコーティング材料 | |
JP2015522710A (ja) | 重要チャンバコンポーネント用プラズマ溶射プロセスの強化 | |
TW201515087A (zh) | 使用電漿火焰熱處理之電漿噴塗增進 | |
TWI722986B (zh) | 使用相和應力控制的電漿噴灑塗佈設計 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180413 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20180413 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20190313 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190522 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20190821 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20191021 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20191122 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200421 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20200720 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20200922 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20201015 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210302 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20210601 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20210802 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210830 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20210907 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220105 |
|
C60 | Trial request (containing other claim documents, opposition documents) |
Free format text: JAPANESE INTERMEDIATE CODE: C60 Effective date: 20220105 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20220112 |
|
C21 | Notice of transfer of a case for reconsideration by examiners before appeal proceedings |
Free format text: JAPANESE INTERMEDIATE CODE: C21 Effective date: 20220118 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220202 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220301 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7033919 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |