JP2017508273A5 - - Google Patents

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JP2017508273A5
JP2017508273A5 JP2016538764A JP2016538764A JP2017508273A5 JP 2017508273 A5 JP2017508273 A5 JP 2017508273A5 JP 2016538764 A JP2016538764 A JP 2016538764A JP 2016538764 A JP2016538764 A JP 2016538764A JP 2017508273 A5 JP2017508273 A5 JP 2017508273A5
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target
parameters
measurement
metric
film stack
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JP2016538764A
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JP2017508273A (ja
JP6509225B2 (ja
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JP2016538764A 2013-12-11 2014-12-10 要件に対するターゲット及びプロセス感度の分析 Active JP6509225B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361914950P 2013-12-11 2013-12-11
US61/914,950 2013-12-11
PCT/US2014/069617 WO2015089231A1 (en) 2013-12-11 2014-12-10 Target and process sensitivity analysis to requirements

Publications (3)

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JP2017508273A JP2017508273A (ja) 2017-03-23
JP2017508273A5 true JP2017508273A5 (OSRAM) 2019-03-14
JP6509225B2 JP6509225B2 (ja) 2019-05-08

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JP2016538764A Active JP6509225B2 (ja) 2013-12-11 2014-12-10 要件に対するターゲット及びプロセス感度の分析

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US (1) US10726169B2 (OSRAM)
JP (1) JP6509225B2 (OSRAM)
KR (1) KR102265868B1 (OSRAM)
CN (1) CN105830069B (OSRAM)
SG (1) SG10201804964TA (OSRAM)
TW (1) TWI661324B (OSRAM)
WO (1) WO2015089231A1 (OSRAM)

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WO2015124391A1 (en) * 2014-02-21 2015-08-27 Asml Netherlands B.V. Measuring a process parameter for a manufacturing process involving lithography
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US9903711B2 (en) * 2015-04-06 2018-02-27 KLA—Tencor Corporation Feed forward of metrology data in a metrology system
US10962886B2 (en) * 2015-12-31 2021-03-30 Asml Netherlands B.V. Selection of measurement locations for patterning processes
KR102350572B1 (ko) * 2016-02-22 2022-01-11 에이에스엠엘 네델란즈 비.브이. 계측 데이터에 대한 기여도들의 분리
US10782616B2 (en) 2016-09-01 2020-09-22 Asml Netherlands B.V. Automatic selection of metrology target measurement recipes
MX2019004433A (es) * 2016-10-18 2019-09-26 Reifenhaeuser Masch Metodo para monitorear un proceso de produccion, metodo para deducir indirectamente una dependencia sistematica, metodo para adaptar la calidad, metodo para iniciar un proceso de produccion, metodo para la produccion de un producto de extrusion y dispositivo para producir un producto de extrusion.
US10527952B2 (en) * 2016-10-25 2020-01-07 Kla-Tencor Corporation Fault discrimination and calibration of scatterometry overlay targets
JP6798263B2 (ja) * 2016-11-14 2020-12-09 富士通株式会社 シミュレーション支援装置、シミュレーション支援方法、およびシミュレーション支援プログラム
CN110249268B (zh) 2017-02-02 2021-08-24 Asml荷兰有限公司 量测方法和设备以及关联的计算机产品
US20230214690A1 (en) * 2017-06-12 2023-07-06 Palantir Technologies Inc. Database systems and user interfaces for processing discrete data items with statistical models associated with continuous processes
KR102540941B1 (ko) 2017-06-18 2023-06-05 코벤터, 인크. 가상 반도체 디바이스 제조 환경에서 키 파라미터 식별, 프로세스 모델 캘리브레이션 및 가변성 분석을 위한 시스템 및 방법
CN111052328B (zh) * 2017-08-30 2021-08-03 科磊股份有限公司 根据工艺变化的计量测量参数的快速调整
US10699969B2 (en) * 2017-08-30 2020-06-30 Kla-Tencor Corporation Quick adjustment of metrology measurement parameters according to process variation
EP3624068A1 (en) * 2018-09-14 2020-03-18 Covestro Deutschland AG Method for improving prediction relating to the production of a polymer-ic produc
DE102018128254A1 (de) * 2018-11-12 2020-05-14 Endress+Hauser SE+Co. KG Verfahren zur Verbesserung derMessperformance eines zu konfigurierenden Feldgeräts der Automatisierungstechnik
CN109933854B (zh) * 2019-02-15 2023-07-07 中国北方车辆研究所 一种基于情境需求的移动机器人设计方法
TWI831968B (zh) * 2019-05-10 2024-02-11 美商科文特股份有限公司 虛擬半導體裝置製造環境中之製程窗的最佳化系統及方法
DE102019207059A1 (de) * 2019-05-15 2020-11-19 Siemens Aktiengesellschaft Verfahren zur Validierung von Systemparametern eines Energiesystems, Verfahren zum Betrieb eines Energiesystems sowie Energiemanagementsystem für ein Energiesystem
US11727159B2 (en) * 2019-05-15 2023-08-15 Lawrence Livermore National Security, Llc Mission-driven design methodology for optical systems
US11360397B2 (en) 2019-09-17 2022-06-14 Kla Corporation System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements
CN110991101B (zh) * 2019-11-15 2022-08-02 湖南城市学院 一种压缩式压电加速度计结构优化设计方法
CN111160489A (zh) * 2020-01-02 2020-05-15 中冶赛迪重庆信息技术有限公司 基于大数据的多维对标分析服务器、系统、方法及电子终端
US11686576B2 (en) 2020-06-04 2023-06-27 Kla Corporation Metrology target for one-dimensional measurement of periodic misregistration
CN111863652B (zh) * 2020-07-31 2024-05-03 华天科技（西安）有限公司 一种弹坑超敏感产品生产参数优化方法
JP2023550904A (ja) 2020-11-27 2023-12-06 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジ方法並びに関連付けられたメトロロジ及びリソグラフィ装置
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