TWI661324B - 用於分析目標之系統、方法及設備 - Google Patents

用於分析目標之系統、方法及設備 Download PDF

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Publication number
TWI661324B
TWI661324B TW103143368A TW103143368A TWI661324B TW I661324 B TWI661324 B TW I661324B TW 103143368 A TW103143368 A TW 103143368A TW 103143368 A TW103143368 A TW 103143368A TW I661324 B TWI661324 B TW I661324B
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Taiwan
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target
measurement
parameters
targets
measurements
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TW103143368A
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English (en)
Chinese (zh)
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TW201535137A (zh
Inventor
麥克Ｅ 艾黛兒
紐瑞爾 艾米爾
馬克 吉納渥克
塔爾 夏斯特曼
大衛 格瑞奧迪
瑟吉 博羅迪揚斯凱
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克萊譚克公司
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/20—Design optimisation, verification or simulation

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
TW103143368A 2013-12-11 2014-12-11 用於分析目標之系統、方法及設備 TWI661324B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361914950P 2013-12-11 2013-12-11
US61/914,950 2013-12-11

Publications (2)

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TW201535137A TW201535137A (zh) 2015-09-16
TWI661324B true TWI661324B (zh) 2019-06-01

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TW103143368A TWI661324B (zh) 2013-12-11 2014-12-11 用於分析目標之系統、方法及設備

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US (1) US10726169B2 (OSRAM)
JP (1) JP6509225B2 (OSRAM)
KR (1) KR102265868B1 (OSRAM)
CN (1) CN105830069B (OSRAM)
SG (1) SG10201804964TA (OSRAM)
TW (1) TWI661324B (OSRAM)
WO (1) WO2015089231A1 (OSRAM)

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US10782616B2 (en) 2016-09-01 2020-09-22 Asml Netherlands B.V. Automatic selection of metrology target measurement recipes
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US10527952B2 (en) * 2016-10-25 2020-01-07 Kla-Tencor Corporation Fault discrimination and calibration of scatterometry overlay targets
JP6798263B2 (ja) * 2016-11-14 2020-12-09 富士通株式会社 シミュレーション支援装置、シミュレーション支援方法、およびシミュレーション支援プログラム
CN110249268B (zh) 2017-02-02 2021-08-24 Asml荷兰有限公司 量测方法和设备以及关联的计算机产品
US20230214690A1 (en) * 2017-06-12 2023-07-06 Palantir Technologies Inc. Database systems and user interfaces for processing discrete data items with statistical models associated with continuous processes
KR102540941B1 (ko) 2017-06-18 2023-06-05 코벤터, 인크. 가상 반도체 디바이스 제조 환경에서 키 파라미터 식별, 프로세스 모델 캘리브레이션 및 가변성 분석을 위한 시스템 및 방법
CN111052328B (zh) * 2017-08-30 2021-08-03 科磊股份有限公司 根据工艺变化的计量测量参数的快速调整
US10699969B2 (en) * 2017-08-30 2020-06-30 Kla-Tencor Corporation Quick adjustment of metrology measurement parameters according to process variation
EP3624068A1 (en) * 2018-09-14 2020-03-18 Covestro Deutschland AG Method for improving prediction relating to the production of a polymer-ic produc
DE102018128254A1 (de) * 2018-11-12 2020-05-14 Endress+Hauser SE+Co. KG Verfahren zur Verbesserung derMessperformance eines zu konfigurierenden Feldgeräts der Automatisierungstechnik
CN109933854B (zh) * 2019-02-15 2023-07-07 中国北方车辆研究所 一种基于情境需求的移动机器人设计方法
TWI831968B (zh) * 2019-05-10 2024-02-11 美商科文特股份有限公司 虛擬半導體裝置製造環境中之製程窗的最佳化系統及方法
DE102019207059A1 (de) * 2019-05-15 2020-11-19 Siemens Aktiengesellschaft Verfahren zur Validierung von Systemparametern eines Energiesystems, Verfahren zum Betrieb eines Energiesystems sowie Energiemanagementsystem für ein Energiesystem
US11727159B2 (en) * 2019-05-15 2023-08-15 Lawrence Livermore National Security, Llc Mission-driven design methodology for optical systems
US11360397B2 (en) 2019-09-17 2022-06-14 Kla Corporation System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements
CN110991101B (zh) * 2019-11-15 2022-08-02 湖南城市学院 一种压缩式压电加速度计结构优化设计方法
CN111160489A (zh) * 2020-01-02 2020-05-15 中冶赛迪重庆信息技术有限公司 基于大数据的多维对标分析服务器、系统、方法及电子终端
US11686576B2 (en) 2020-06-04 2023-06-27 Kla Corporation Metrology target for one-dimensional measurement of periodic misregistration
CN111863652B (zh) * 2020-07-31 2024-05-03 华天科技（西安）有限公司 一种弹坑超敏感产品生产参数优化方法
JP2023550904A (ja) 2020-11-27 2023-12-06 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジ方法並びに関連付けられたメトロロジ及びリソグラフィ装置
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US20060290947A1 (en) * 2005-06-16 2006-12-28 Timbre Technologies, Inc. Optical metrology model optimization for repetitive structures
US20100175033A1 (en) * 2009-01-08 2010-07-08 Kla-Tencor Corporation Scatterometry metrology target design optimization

Also Published As

Publication number Publication date
CN105830069A (zh) 2016-08-03
JP2017508273A (ja) 2017-03-23
JP6509225B2 (ja) 2019-05-08
US20160042105A1 (en) 2016-02-11
KR102265868B1 (ko) 2021-06-16
KR20160096118A (ko) 2016-08-12
US10726169B2 (en) 2020-07-28
CN105830069B (zh) 2021-04-20
TW201535137A (zh) 2015-09-16
SG10201804964TA (en) 2018-07-30
WO2015089231A1 (en) 2015-06-18

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