JP2017501270A - スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム - Google Patents

スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム Download PDF

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JP2017501270A
JP2017501270A JP2016539329A JP2016539329A JP2017501270A JP 2017501270 A JP2017501270 A JP 2017501270A JP 2016539329 A JP2016539329 A JP 2016539329A JP 2016539329 A JP2016539329 A JP 2016539329A JP 2017501270 A JP2017501270 A JP 2017501270A
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Prior art keywords
block
block copolymer
comonomer
copolymer
methyl methacrylate
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JP2016539329A
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Japanese (ja)
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JP2017501270A5 (enExample
Inventor
クリストフ ナヴァロ，
クリストフ ナヴァロ，
セリア ニコレ，
セリア ニコレ，
ザビエル シュバリエ，
ザビエル シュバリエ，
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Arkema France SA
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Arkema France SA
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Publication of JP2017501270A publication Critical patent/JP2017501270A/ja
Publication of JP2017501270A5 publication Critical patent/JP2017501270A5/ja
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/945—Special, e.g. metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/905—Etch masking compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/915—Polymer from monoethylenic cyclic hydrocarbon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Composite Materials (AREA)
  • Thermal Sciences (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2016539329A 2013-12-17 2014-12-15 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム Withdrawn JP2017501270A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1362735A FR3014877B1 (fr) 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
FR1362735 2013-12-17
PCT/FR2014/053329 WO2015092241A1 (fr) 2013-12-17 2014-12-15 Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019091140A Division JP2019173019A (ja) 2013-12-17 2019-05-14 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム

Publications (2)

Publication Number Publication Date
JP2017501270A true JP2017501270A (ja) 2017-01-12
JP2017501270A5 JP2017501270A5 (enExample) 2019-07-04

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JP2016539329A Withdrawn JP2017501270A (ja) 2013-12-17 2014-12-15 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム
JP2019091140A Pending JP2019173019A (ja) 2013-12-17 2019-05-14 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム

Family Applications After (1)

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JP2019091140A Pending JP2019173019A (ja) 2013-12-17 2019-05-14 スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム

Country Status (9)

Country Link
US (1) US10011675B2 (enExample)
EP (1) EP3083488A1 (enExample)
JP (2) JP2017501270A (enExample)
KR (1) KR101840960B1 (enExample)
CN (1) CN105829239A (enExample)
FR (1) FR3014877B1 (enExample)
SG (1) SG11201604475WA (enExample)
TW (1) TWI548657B (enExample)
WO (1) WO2015092241A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024501808A (ja) * 2020-12-17 2024-01-16 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029921B1 (fr) 2014-12-16 2018-06-29 Arkema France Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct.
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
US11155666B2 (en) * 2016-11-30 2021-10-26 Lg Chem, Ltd. Block copolymer
CN112358643B (zh) * 2020-11-10 2022-09-30 浙江工业大学 一种基于嵌段共聚物本体聚合的均孔膜制备方法

Citations (1)

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WO2007132901A1 (ja) * 2006-05-16 2007-11-22 Nippon Soda Co., Ltd. ブロックコポリマー

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FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
US6835778B2 (en) * 1995-08-29 2004-12-28 Chevron Phillips Chemical Company Lp Conjugated diene/monovinylarene block copolymers blends
US7255920B2 (en) * 2004-07-29 2007-08-14 3M Innovative Properties Company (Meth)acrylate block copolymer pressure sensitive adhesives
US7964107B2 (en) * 2007-02-08 2011-06-21 Micron Technology, Inc. Methods using block copolymer self-assembly for sub-lithographic patterning
US8425982B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
US8304493B2 (en) 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
KR101963924B1 (ko) 2011-07-29 2019-03-29 위스콘신 얼럼나이 리서어치 화운데이션 박막의 유도 조립을 위한 블록 공중합체 재료

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007132901A1 (ja) * 2006-05-16 2007-11-22 Nippon Soda Co., Ltd. ブロックコポリマー

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024501808A (ja) * 2020-12-17 2024-01-16 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 誘導自己集合化のための交互コポリマーセグメントからなる調整可能な高カイジブロックコポリマー及びそれの応用

Also Published As

Publication number Publication date
JP2019173019A (ja) 2019-10-10
US20170002127A1 (en) 2017-01-05
TW201536825A (zh) 2015-10-01
SG11201604475WA (en) 2016-07-28
KR20160100351A (ko) 2016-08-23
KR101840960B1 (ko) 2018-03-21
EP3083488A1 (fr) 2016-10-26
TWI548657B (zh) 2016-09-11
FR3014877B1 (fr) 2017-03-31
WO2015092241A1 (fr) 2015-06-25
CN105829239A (zh) 2016-08-03
FR3014877A1 (fr) 2015-06-19
US10011675B2 (en) 2018-07-03

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