JP6404353B2 - ブロックコポリマーの自己組織化によりナノメートル構造体の作製を可能にする方法 - Google Patents
ブロックコポリマーの自己組織化によりナノメートル構造体の作製を可能にする方法 Download PDFInfo
- Publication number
- JP6404353B2 JP6404353B2 JP2016538584A JP2016538584A JP6404353B2 JP 6404353 B2 JP6404353 B2 JP 6404353B2 JP 2016538584 A JP2016538584 A JP 2016538584A JP 2016538584 A JP2016538584 A JP 2016538584A JP 6404353 B2 JP6404353 B2 JP 6404353B2
- Authority
- JP
- Japan
- Prior art keywords
- block copolymer
- block
- copolymer
- methacrylate
- self
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229920001400 block copolymer Polymers 0.000 title claims description 53
- 238000000034 method Methods 0.000 title claims description 25
- 238000001338 self-assembly Methods 0.000 title description 12
- 238000004519 manufacturing process Methods 0.000 title description 7
- 239000004973 liquid crystal related substance Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 7
- 238000000137 annealing Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 4
- 229920000359 diblock copolymer Polymers 0.000 claims description 4
- 230000008520 organization Effects 0.000 claims description 4
- 238000001459 lithography Methods 0.000 claims description 3
- 239000002086 nanomaterial Substances 0.000 claims description 3
- 238000004320 controlled atmosphere Methods 0.000 claims description 2
- -1 cycloalkyl acrylates Chemical class 0.000 description 20
- 229920001577 copolymer Polymers 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 239000010408 film Substances 0.000 description 13
- 239000000178 monomer Substances 0.000 description 11
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 11
- 239000004926 polymethyl methacrylate Substances 0.000 description 10
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 8
- 238000005191 phase separation Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 230000003993 interaction Effects 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- YQQFFTNDQFUNHB-UHFFFAOYSA-N 1,1-dimethylsiletane Chemical compound C[Si]1(C)CCC1 YQQFFTNDQFUNHB-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000005329 nanolithography Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 229960000834 vinyl ether Drugs 0.000 description 3
- HWEALFHEZQVYSJ-UHFFFAOYSA-N 1-butyl-1-methylsiletane Chemical compound CCCC[Si]1(C)CCC1 HWEALFHEZQVYSJ-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 description 2
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000004990 Smectic liquid crystal Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000012705 nitroxide-mediated radical polymerization Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000747 poly(lactic acid) Polymers 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 239000004626 polylactic acid Substances 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 238000001542 size-exclusion chromatography Methods 0.000 description 2
- 229920006301 statistical copolymer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229920000428 triblock copolymer Polymers 0.000 description 2
- UZNHKBFIBYXPDV-UHFFFAOYSA-N trimethyl-[3-(2-methylprop-2-enoylamino)propyl]azanium;chloride Chemical compound [Cl-].CC(=C)C(=O)NCCC[N+](C)(C)C UZNHKBFIBYXPDV-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- FQERLIOIVXPZKH-UHFFFAOYSA-N 1,2,4-trioxane Chemical compound C1COOCO1 FQERLIOIVXPZKH-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- RKDVKSZUMVYZHH-UHFFFAOYSA-N 1,4-dioxane-2,5-dione Chemical compound O=C1COC(=O)CO1 RKDVKSZUMVYZHH-UHFFFAOYSA-N 0.000 description 1
- HBAIZGPCSAAFSU-UHFFFAOYSA-N 1-(2-hydroxyethyl)imidazolidin-2-one Chemical compound OCCN1CCNC1=O HBAIZGPCSAAFSU-UHFFFAOYSA-N 0.000 description 1
- YPAURZBMECSUPE-UHFFFAOYSA-N 1-(2-hydroxyethyl)imidazolidin-2-one;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.OCCN1CCNC1=O YPAURZBMECSUPE-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical class C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 1
- QTKPMCIBUROOGY-UHFFFAOYSA-N 2,2,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)F QTKPMCIBUROOGY-UHFFFAOYSA-N 0.000 description 1
- JMIZWXDKTUGEES-UHFFFAOYSA-N 2,2-di(cyclopenten-1-yloxy)ethyl 2-methylprop-2-enoate Chemical class C=1CCCC=1OC(COC(=O)C(=C)C)OC1=CCCC1 JMIZWXDKTUGEES-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- PFPUZMSQZJFLBK-UHFFFAOYSA-N 2-(2-oxoimidazolidin-1-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN1CCNC1=O PFPUZMSQZJFLBK-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- FKLBRTJRFNSRJD-UHFFFAOYSA-N 2-methyl-6-trimethylsilylhex-1-en-3-one Chemical compound CC(=C)C(=O)CCC[Si](C)(C)C FKLBRTJRFNSRJD-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- WIYVVIUBKNTNKG-UHFFFAOYSA-N 6,7-dimethoxy-3,4-dihydronaphthalene-2-carboxylic acid Chemical compound C1CC(C(O)=O)=CC2=C1C=C(OC)C(OC)=C2 WIYVVIUBKNTNKG-UHFFFAOYSA-N 0.000 description 1
- NUXLDNTZFXDNBA-UHFFFAOYSA-N 6-bromo-2-methyl-4h-1,4-benzoxazin-3-one Chemical compound C1=C(Br)C=C2NC(=O)C(C)OC2=C1 NUXLDNTZFXDNBA-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical class OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 150000003950 cyclic amides Chemical class 0.000 description 1
- 150000005676 cyclic carbonates Chemical class 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000000469 dry deposition Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002290 germanium Chemical class 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical class CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- UBIJTWDKTYCPMQ-UHFFFAOYSA-N hexachlorophosphazene Chemical compound ClP1(Cl)=NP(Cl)(Cl)=NP(Cl)(Cl)=N1 UBIJTWDKTYCPMQ-UHFFFAOYSA-N 0.000 description 1
- 239000013033 iniferter Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- JJTUDXZGHPGLLC-UHFFFAOYSA-N lactide Chemical compound CC1OC(=O)C(C)OC1=O JJTUDXZGHPGLLC-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000002535 lyotropic effect Effects 0.000 description 1
- 229920001427 mPEG Polymers 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical class O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229920006030 multiblock copolymer Polymers 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical class CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- MVLTYZQFAOWEOK-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.C=CC(=O)OCC1CO1 MVLTYZQFAOWEOK-UHFFFAOYSA-N 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- RSVDRWTUCMTKBV-UHFFFAOYSA-N sbb057044 Chemical compound C12CC=CC2C2CC(OCCOC(=O)C=C)C1C2 RSVDRWTUCMTKBV-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- YFHICDDUDORKJB-UHFFFAOYSA-N trimethylene carbonate Chemical class O=C1OCCCO1 YFHICDDUDORKJB-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00428—Etch mask forming processes not provided for in groups B81C1/00396 - B81C1/0042
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0147—Film patterning
- B81C2201/0149—Forming nanoscale microstructures using auto-arranging or self-assembling material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Graft Or Block Polymers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Liquid Crystal Substances (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
Description
− 低温で(333−603Kの間で、好ましくは373K−603Kの間で)10nmをはるかに下回るドメインサイズをもたらす、低い分子質量に対する急速な自己組織化速度(1−20分の間)。
− このようなブロックコポリマーの自己組織化の間のドメインの配向は、担体の調製を必要とせず(中和層なし)、ドメインの配向は、堆積したブロックコポリマーフィルムの厚さにより管理される。
− 溶媒中にブロックコポリマーを溶解させる工程、
− この溶液を表面上に堆積させる工程、
− アニーリングする工程
を含む、方法に関する。
ポリ(1,1−ジメチルシラシクロブタン)−ブロック−PMMA(PDMSB−b−PMMA)の合成
1,1−ジメチルシラシクロブタン(DMSB)は、式(I)(式中、X=Si(CH3)2、Y=Z=T=CH2である)のモノマーである。
ポリ(1−ブチル−1−メチルシラシクロブタン)−b−ポリ(メタクリル酸メチル)の合成
反応物質の量を変化させ、1−ブチル−1−メチルシラシクロブタン(BMSB)を使用することによって、実施例1の手順に従いこのコポリマーを調製する。
Claims (6)
- ブロックコポリマーのブロックの少なくとも1つが、結晶化可能であるか、又は少なくとも1つの液晶相を有するブロックコポリマーを含む組成物を使用したナノ構造組織化方法であって、
− 溶媒中にブロックコポリマーを溶解させる工程、
− この溶液を表面上に堆積させる工程、
− アニーリングする工程
を含み、
ブロックコポリマーが結晶化可能なブロックを有し、
ブロックコポリマーの配向が、1−20分(境界は含まれる)の間の時間中に行われる、
方法。 - ブロックコポリマーがジブロックコポリマーである、請求項1に記載の方法。
- 液晶相を有するブロックがサーモトロピックである、請求項1に記載の方法。
- ブロックコポリマーの配向が、333K−603Kの間の温度で行われる、請求項1に記載の方法。
- ブロックコポリマーの配向が、溶媒蒸気を含む制御雰囲気又は溶媒雰囲気/温度の組合せの下で行われる、請求項1に記載の方法。
- リソグラフィーの分野、又はさらに一般的には、エレクトロニクスのための表面ナノ構造化の分野における、請求項1から5の何れか一項に記載の方法の使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1362597A FR3014888B1 (fr) | 2013-12-13 | 2013-12-13 | Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres a blocs |
FR1362597 | 2013-12-13 | ||
PCT/FR2014/053279 WO2015087005A1 (fr) | 2013-12-13 | 2014-12-11 | Procédé permettant la création de structures nanométriques par l'auto-assemblage de copolymères a blocs |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017503043A JP2017503043A (ja) | 2017-01-26 |
JP6404353B2 true JP6404353B2 (ja) | 2018-10-10 |
Family
ID=50828979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016538584A Expired - Fee Related JP6404353B2 (ja) | 2013-12-13 | 2014-12-11 | ブロックコポリマーの自己組織化によりナノメートル構造体の作製を可能にする方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US20160333221A1 (ja) |
EP (1) | EP3080218A1 (ja) |
JP (1) | JP6404353B2 (ja) |
KR (1) | KR101990187B1 (ja) |
CN (1) | CN105980494A (ja) |
FR (1) | FR3014888B1 (ja) |
SG (1) | SG11201604777YA (ja) |
TW (1) | TWI547519B (ja) |
WO (1) | WO2015087005A1 (ja) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6410327B2 (ja) | 2013-12-06 | 2018-10-24 | エルジー・ケム・リミテッド | ブロック共重合体 |
US10202480B2 (en) | 2013-12-06 | 2019-02-12 | Lg Chem, Ltd. | Block copolymer |
CN105899560B (zh) | 2013-12-06 | 2018-01-12 | 株式会社Lg化学 | 嵌段共聚物 |
US10087276B2 (en) | 2013-12-06 | 2018-10-02 | Lg Chem, Ltd. | Block copolymer |
WO2015084129A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
EP3078687B1 (en) | 2013-12-06 | 2020-06-03 | LG Chem, Ltd. | Block copolymer |
CN105934454B (zh) | 2013-12-06 | 2019-01-18 | 株式会社Lg化学 | 嵌段共聚物 |
WO2015084123A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
EP3101043B1 (en) | 2013-12-06 | 2021-01-27 | LG Chem, Ltd. | Block copolymer |
JP6334706B2 (ja) | 2013-12-06 | 2018-05-30 | エルジー・ケム・リミテッド | ブロック共重合体 |
WO2015084126A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
CN106459326B (zh) | 2013-12-06 | 2019-08-13 | 株式会社Lg化学 | 嵌段共聚物 |
JP6521975B2 (ja) | 2013-12-06 | 2019-05-29 | エルジー・ケム・リミテッド | ブロック共重合体 |
US10160822B2 (en) | 2013-12-06 | 2018-12-25 | Lg Chem, Ltd. | Monomer and block copolymer |
EP3203497B1 (en) | 2014-09-30 | 2023-11-29 | LG Chem, Ltd. | Method for producing patterned substrate |
CN107075054B (zh) | 2014-09-30 | 2020-05-05 | 株式会社Lg化学 | 嵌段共聚物 |
WO2016053005A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
US10281820B2 (en) | 2014-09-30 | 2019-05-07 | Lg Chem, Ltd. | Block copolymer |
CN107075028B (zh) | 2014-09-30 | 2020-04-03 | 株式会社Lg化学 | 嵌段共聚物 |
EP3202800B1 (en) | 2014-09-30 | 2021-12-29 | LG Chem, Ltd. | Block copolymer |
CN107075051B (zh) | 2014-09-30 | 2019-09-03 | 株式会社Lg化学 | 嵌段共聚物 |
US10295908B2 (en) | 2014-09-30 | 2019-05-21 | Lg Chem, Ltd. | Block copolymer |
JP6451966B2 (ja) | 2014-09-30 | 2019-01-16 | エルジー・ケム・リミテッド | ブロック共重合体 |
JP6637495B2 (ja) | 2014-09-30 | 2020-01-29 | エルジー・ケム・リミテッド | パターン化基板の製造方法 |
FR3042794B1 (fr) * | 2015-10-23 | 2020-03-27 | Arkema France | Procede permettant la creation de structures nanometriques par l'auto-assemblage de copolymeres di-blocs |
FR3089981B1 (fr) * | 2018-12-12 | 2021-01-08 | Arkema France | Procédé de fabrication d’un copolymère à blocs contenant des ions métalliques |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6893705B2 (en) * | 2001-05-25 | 2005-05-17 | Massachusetts Institute Of Technology | Large area orientation of block copolymer microdomains in thin films |
JP3979470B2 (ja) * | 2002-09-11 | 2007-09-19 | 財団法人理工学振興会 | ブロック共重合体、及びミクロ相分離構造膜の製造方法 |
JP3926360B2 (ja) * | 2004-10-13 | 2007-06-06 | 株式会社東芝 | パターン形成方法およびそれを用いた構造体の加工方法 |
CN101432224B (zh) * | 2006-04-19 | 2012-06-20 | 独立行政法人科学技术振兴机构 | 表面排列有微细金属块的基板的制造方法 |
US7553760B2 (en) * | 2006-10-19 | 2009-06-30 | International Business Machines Corporation | Sub-lithographic nano interconnect structures, and method for forming same |
JP5598970B2 (ja) * | 2010-06-18 | 2014-10-01 | 凸版印刷株式会社 | 微細構造体の製造方法、複合体 |
US8304493B2 (en) | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
JP5652092B2 (ja) * | 2010-09-30 | 2015-01-14 | 凸版印刷株式会社 | ブロック共重合体及びそれを用いた太陽電池 |
WO2012144735A2 (en) * | 2011-04-22 | 2012-10-26 | Lg Chem, Ltd. | Novel diblock copolymer, preparation method thereof, and method of forming nano pattern using the same |
JP2012236866A (ja) * | 2011-05-09 | 2012-12-06 | Asahi Kasei E-Materials Corp | ブロック共重合体 |
US8939709B2 (en) * | 2011-07-18 | 2015-01-27 | General Electric Company | Clearance control for a turbine |
JP5988258B2 (ja) * | 2011-07-29 | 2016-09-07 | 凸版印刷株式会社 | 微細構造体の製造方法、複合体の製造方法 |
US10253187B2 (en) * | 2011-11-08 | 2019-04-09 | Samsung Electronics Co., Ltd. | Nano-structure of block copolymer and method of manufacturing the same |
US8513356B1 (en) * | 2012-02-10 | 2013-08-20 | Dow Global Technologies Llc | Diblock copolymer blend composition |
CN102627774A (zh) * | 2012-03-26 | 2012-08-08 | 复旦大学 | 一种聚烷基噻吩与聚氧化乙烯的嵌段共聚物及其制备方法 |
-
2013
- 2013-12-13 FR FR1362597A patent/FR3014888B1/fr not_active Expired - Fee Related
-
2014
- 2014-12-11 KR KR1020167018199A patent/KR101990187B1/ko active IP Right Grant
- 2014-12-11 TW TW103143324A patent/TWI547519B/zh not_active IP Right Cessation
- 2014-12-11 SG SG11201604777YA patent/SG11201604777YA/en unknown
- 2014-12-11 JP JP2016538584A patent/JP6404353B2/ja not_active Expired - Fee Related
- 2014-12-11 WO PCT/FR2014/053279 patent/WO2015087005A1/fr active Application Filing
- 2014-12-11 EP EP14827499.6A patent/EP3080218A1/fr not_active Withdrawn
- 2014-12-11 CN CN201480068285.0A patent/CN105980494A/zh active Pending
- 2014-12-11 US US15/103,740 patent/US20160333221A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
FR3014888B1 (fr) | 2017-05-26 |
US20160333221A1 (en) | 2016-11-17 |
TW201538605A (zh) | 2015-10-16 |
SG11201604777YA (en) | 2016-07-28 |
CN105980494A (zh) | 2016-09-28 |
JP2017503043A (ja) | 2017-01-26 |
EP3080218A1 (fr) | 2016-10-19 |
TWI547519B (zh) | 2016-09-01 |
KR101990187B1 (ko) | 2019-06-17 |
FR3014888A1 (fr) | 2015-06-19 |
WO2015087005A1 (fr) | 2015-06-18 |
KR20160095125A (ko) | 2016-08-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6404353B2 (ja) | ブロックコポリマーの自己組織化によりナノメートル構造体の作製を可能にする方法 | |
JP2019173019A (ja) | スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム | |
JP6373998B2 (ja) | 基材上のブロックコポリマーフィルムを生産するための方法 | |
US20180171134A1 (en) | Process for reducing the defectivity of a block copolymer film | |
JP6449342B2 (ja) | スチレン及びメチルメタクリレートに基づくナノ構造化ブロック共重合体フィルムの周期をコントロールする方法、及びナノ構造化ブロック共重合体フィルム | |
JP6419494B2 (ja) | ブロックコポリマーのブレンドを含むナノ構造化組織体の周期を制御する方法 | |
JP6143955B2 (ja) | ブロックコポリマーのそれぞれのブロック中に存在するモノマーとは少なくとも部分的に異なるモノマーのランダムコポリマーまたはグラジエントコポリマーを使ったブロックコポリマー・ナノドメインの垂直配向方法 | |
JP6377749B2 (ja) | ブロックコポリマーの自己組織化によりナノメートル構造体の作製を可能にする方法 | |
JP6777736B2 (ja) | ジブロックコポリマーの自己組織化によりナノメートル構造の作成を可能にする方法 | |
JP6411529B2 (ja) | 基材の表面エネルギーの制御のための方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170914 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170926 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20171218 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180220 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180326 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180828 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180912 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6404353 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |