SG11201604475WA - Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film - Google Patents
Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer filmInfo
- Publication number
- SG11201604475WA SG11201604475WA SG11201604475WA SG11201604475WA SG11201604475WA SG 11201604475W A SG11201604475W A SG 11201604475WA SG 11201604475W A SG11201604475W A SG 11201604475WA SG 11201604475W A SG11201604475W A SG 11201604475WA SG 11201604475W A SG11201604475W A SG 11201604475WA
- Authority
- SG
- Singapore
- Prior art keywords
- block copolymer
- copolymer film
- nonstructured
- nanostructuring
- styrene
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/08—Heat treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/945—Special, e.g. metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S524/905—Etch masking compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S525/915—Polymer from monoethylenic cyclic hydrocarbon
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1362735A FR3014877B1 (en) | 2013-12-17 | 2013-12-17 | METHOD FOR NANOSTRUCTURING A BLOCK COPOLYMER FILM FROM A NON-STRUCTURED BLOCK COPOLYMER BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM |
PCT/FR2014/053329 WO2015092241A1 (en) | 2013-12-17 | 2014-12-15 | Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201604475WA true SG11201604475WA (en) | 2016-07-28 |
Family
ID=50289951
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201604475WA SG11201604475WA (en) | 2013-12-17 | 2014-12-15 | Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film |
Country Status (9)
Country | Link |
---|---|
US (1) | US10011675B2 (en) |
EP (1) | EP3083488A1 (en) |
JP (2) | JP2017501270A (en) |
KR (1) | KR101840960B1 (en) |
CN (1) | CN105829239A (en) |
FR (1) | FR3014877B1 (en) |
SG (1) | SG11201604475WA (en) |
TW (1) | TWI548657B (en) |
WO (1) | WO2015092241A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3029921B1 (en) * | 2014-12-16 | 2018-06-29 | Arkema France | METHOD FOR CONTROLLING THE SYNTHESIS OF A BLOCK COPOLYMER CONTAINING AT LEAST ONE APOLAR BLOCK AND AT LEAST ONE POLAR BLOCK AND USE OF SUCH A BLOCK COPOLYMER IN DIRECT SELF-ASSEMBLY NANO-LITHOGRAPHY APPLICATIONS |
FR3045643A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS |
FR3045645B1 (en) * | 2015-12-18 | 2019-07-05 | Arkema France | METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM |
FR3045642A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS |
FR3045644A1 (en) * | 2015-12-18 | 2017-06-23 | Arkema France | PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER |
JP6819950B2 (en) * | 2016-11-30 | 2021-01-27 | エルジー・ケム・リミテッド | Block copolymer |
CN112358643B (en) * | 2020-11-10 | 2022-09-30 | 浙江工业大学 | Preparation method of homogeneous pore membrane based on block copolymer bulk polymerization |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2679237B1 (en) | 1991-07-19 | 1994-07-22 | Atochem | PRIMING SYSTEM FOR THE ANIONIC POLYMERIZATION OF (METH) ACRYLIC MONOMERS. |
FR2735480B1 (en) | 1995-06-15 | 1997-07-18 | Atochem Elf Sa | CONTINUOUS ANIONIC POLYMERIZATION PROCESS OF AT LEAST ONE (METH) ACRYLIC MONOMER FOR THE OBTAINING OF POLYMERS WITH A HIGH SOLID RATE |
US6835778B2 (en) * | 1995-08-29 | 2004-12-28 | Chevron Phillips Chemical Company Lp | Conjugated diene/monovinylarene block copolymers blends |
US7255920B2 (en) * | 2004-07-29 | 2007-08-14 | 3M Innovative Properties Company | (Meth)acrylate block copolymer pressure sensitive adhesives |
JP5457027B2 (en) * | 2006-05-16 | 2014-04-02 | 日本曹達株式会社 | Block copolymer |
US7964107B2 (en) * | 2007-02-08 | 2011-06-21 | Micron Technology, Inc. | Methods using block copolymer self-assembly for sub-lithographic patterning |
US8425982B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
US8304493B2 (en) * | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
FR2974094A1 (en) | 2011-04-15 | 2012-10-19 | Arkema France | PROCESS FOR PREPARING SURFACES |
JP6218241B2 (en) | 2011-07-29 | 2017-10-25 | ウィスコンシン・アルムナイ・リサーチ・ファウンデーションWisconsin Alumni Research Foundation | Method for preparing block copolymer materials for inductive organization of thin films, and compositions and structures having block copolymers |
-
2013
- 2013-12-17 FR FR1362735A patent/FR3014877B1/en active Active
-
2014
- 2014-12-11 TW TW103143326A patent/TWI548657B/en active
- 2014-12-15 CN CN201480068975.6A patent/CN105829239A/en active Pending
- 2014-12-15 KR KR1020167019169A patent/KR101840960B1/en active IP Right Grant
- 2014-12-15 JP JP2016539329A patent/JP2017501270A/en not_active Withdrawn
- 2014-12-15 WO PCT/FR2014/053329 patent/WO2015092241A1/en active Application Filing
- 2014-12-15 US US15/105,245 patent/US10011675B2/en active Active
- 2014-12-15 SG SG11201604475WA patent/SG11201604475WA/en unknown
- 2014-12-15 EP EP14827509.2A patent/EP3083488A1/en not_active Ceased
-
2019
- 2019-05-14 JP JP2019091140A patent/JP2019173019A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
EP3083488A1 (en) | 2016-10-26 |
WO2015092241A1 (en) | 2015-06-25 |
CN105829239A (en) | 2016-08-03 |
KR101840960B1 (en) | 2018-03-21 |
TWI548657B (en) | 2016-09-11 |
FR3014877A1 (en) | 2015-06-19 |
KR20160100351A (en) | 2016-08-23 |
JP2017501270A (en) | 2017-01-12 |
TW201536825A (en) | 2015-10-01 |
FR3014877B1 (en) | 2017-03-31 |
US10011675B2 (en) | 2018-07-03 |
JP2019173019A (en) | 2019-10-10 |
US20170002127A1 (en) | 2017-01-05 |
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