FR3014877B1 - Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure - Google Patents
Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructureInfo
- Publication number
- FR3014877B1 FR3014877B1 FR1362735A FR1362735A FR3014877B1 FR 3014877 B1 FR3014877 B1 FR 3014877B1 FR 1362735 A FR1362735 A FR 1362735A FR 1362735 A FR1362735 A FR 1362735A FR 3014877 B1 FR3014877 B1 FR 3014877B1
- Authority
- FR
- France
- Prior art keywords
- block copolymer
- styrene
- methyl methacrylate
- block
- copolymer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
- C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/08—Heat treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/945—Special, e.g. metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S524/905—Etch masking compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S525/915—Polymer from monoethylenic cyclic hydrocarbon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Composite Materials (AREA)
- Thermal Sciences (AREA)
- Graft Or Block Polymers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1362735A FR3014877B1 (fr) | 2013-12-17 | 2013-12-17 | Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
| TW103143326A TWI548657B (zh) | 2013-12-17 | 2014-12-11 | 使用建基於苯乙烯及甲基丙烯酸甲酯之奈米結構嵌段共聚物以使嵌段共聚物膜奈米結構化之方法，及具奈米結構之嵌段共聚物膜 |
| SG11201604475WA SG11201604475WA (en) | 2013-12-17 | 2014-12-15 | Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film |
| US15/105,245 US10011675B2 (en) | 2013-12-17 | 2014-12-15 | Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film |
| JP2016539329A JP2017501270A (ja) | 2013-12-17 | 2014-12-15 | スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム |
| KR1020167019169A KR101840960B1 (ko) | 2013-12-17 | 2014-12-15 | 스티렌 및 메틸 메타크릴레이트 기재의 비구조화 블록 코폴리머를 사용하는 블록 코폴리머 필름의 나노구조화 방법, 및 나노구조화 블록 코폴리머 필름 |
| EP14827509.2A EP3083488A1 (fr) | 2013-12-17 | 2014-12-15 | Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure |
| PCT/FR2014/053329 WO2015092241A1 (fr) | 2013-12-17 | 2014-12-15 | Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure |
| CN201480068975.6A CN105829239A (zh) | 2013-12-17 | 2014-12-15 | 用于对使用基于苯乙烯和基于甲基丙烯酸甲酯的未经结构化的嵌段共聚物的嵌段共聚物膜进行纳米结构化的工艺、以及经纳米结构化的嵌段共聚物膜 |
| JP2019091140A JP2019173019A (ja) | 2013-12-17 | 2019-05-14 | スチレン及びメタクリル酸メチルをベースとする非構造化ブロックコポリマーを用いるブロックコポリマーフィルムのナノ構造化のための方法、並びにナノ構造ブロックコポリマーフィルム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1362735A FR3014877B1 (fr) | 2013-12-17 | 2013-12-17 | Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR3014877A1 FR3014877A1 (fr) | 2015-06-19 |
| FR3014877B1 true FR3014877B1 (fr) | 2017-03-31 |
Family
ID=50289951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1362735A Active FR3014877B1 (fr) | 2013-12-17 | 2013-12-17 | Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10011675B2 (enExample) |
| EP (1) | EP3083488A1 (enExample) |
| JP (2) | JP2017501270A (enExample) |
| KR (1) | KR101840960B1 (enExample) |
| CN (1) | CN105829239A (enExample) |
| FR (1) | FR3014877B1 (enExample) |
| SG (1) | SG11201604475WA (enExample) |
| TW (1) | TWI548657B (enExample) |
| WO (1) | WO2015092241A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3029921B1 (fr) | 2014-12-16 | 2018-06-29 | Arkema France | Procede de controle de la synthese d'un copolymere a blocs contenant au moins un bloc apolaire et au moins un bloc polaire et utilisation d'un tel copolymere a blocs dans des applications de nano-lithographie par auto-assemblage direct. |
| FR3045644A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs |
| FR3045645B1 (fr) * | 2015-12-18 | 2019-07-05 | Arkema France | Procede de reduction des defauts dans un film ordonne de copolymeres a blocs |
| FR3045643A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs |
| FR3045642A1 (fr) * | 2015-12-18 | 2017-06-23 | Arkema France | Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs |
| US11155666B2 (en) * | 2016-11-30 | 2021-10-26 | Lg Chem, Ltd. | Block copolymer |
| CN112358643B (zh) * | 2020-11-10 | 2022-09-30 | 浙江工业大学 | 一种基于嵌段共聚物本体聚合的均孔膜制备方法 |
| KR20230119186A (ko) * | 2020-12-17 | 2023-08-16 | 메르크 파텐트 게엠베하 | 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2679237B1 (fr) | 1991-07-19 | 1994-07-22 | Atochem | Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques. |
| FR2735480B1 (fr) | 1995-06-15 | 1997-07-18 | Atochem Elf Sa | Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide |
| US6835778B2 (en) * | 1995-08-29 | 2004-12-28 | Chevron Phillips Chemical Company Lp | Conjugated diene/monovinylarene block copolymers blends |
| US7255920B2 (en) * | 2004-07-29 | 2007-08-14 | 3M Innovative Properties Company | (Meth)acrylate block copolymer pressure sensitive adhesives |
| WO2007132901A1 (ja) * | 2006-05-16 | 2007-11-22 | Nippon Soda Co., Ltd. | ブロックコポリマー |
| US7964107B2 (en) * | 2007-02-08 | 2011-06-21 | Micron Technology, Inc. | Methods using block copolymer self-assembly for sub-lithographic patterning |
| US8425982B2 (en) * | 2008-03-21 | 2013-04-23 | Micron Technology, Inc. | Methods of improving long range order in self-assembly of block copolymer films with ionic liquids |
| US8304493B2 (en) | 2010-08-20 | 2012-11-06 | Micron Technology, Inc. | Methods of forming block copolymers |
| FR2974094A1 (fr) | 2011-04-15 | 2012-10-19 | Arkema France | Procede de preparation de surfaces |
| KR101963924B1 (ko) | 2011-07-29 | 2019-03-29 | 위스콘신 얼럼나이 리서어치 화운데이션 | 박막의 유도 조립을 위한 블록 공중합체 재료 |
-
2013
- 2013-12-17 FR FR1362735A patent/FR3014877B1/fr active Active
-
2014
- 2014-12-11 TW TW103143326A patent/TWI548657B/zh not_active IP Right Cessation
- 2014-12-15 SG SG11201604475WA patent/SG11201604475WA/en unknown
- 2014-12-15 KR KR1020167019169A patent/KR101840960B1/ko active Active
- 2014-12-15 JP JP2016539329A patent/JP2017501270A/ja not_active Withdrawn
- 2014-12-15 WO PCT/FR2014/053329 patent/WO2015092241A1/fr not_active Ceased
- 2014-12-15 CN CN201480068975.6A patent/CN105829239A/zh active Pending
- 2014-12-15 EP EP14827509.2A patent/EP3083488A1/fr not_active Ceased
- 2014-12-15 US US15/105,245 patent/US10011675B2/en active Active
-
2019
- 2019-05-14 JP JP2019091140A patent/JP2019173019A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019173019A (ja) | 2019-10-10 |
| US20170002127A1 (en) | 2017-01-05 |
| JP2017501270A (ja) | 2017-01-12 |
| TW201536825A (zh) | 2015-10-01 |
| SG11201604475WA (en) | 2016-07-28 |
| KR20160100351A (ko) | 2016-08-23 |
| KR101840960B1 (ko) | 2018-03-21 |
| EP3083488A1 (fr) | 2016-10-26 |
| TWI548657B (zh) | 2016-09-11 |
| WO2015092241A1 (fr) | 2015-06-25 |
| CN105829239A (zh) | 2016-08-03 |
| FR3014877A1 (fr) | 2015-06-19 |
| US10011675B2 (en) | 2018-07-03 |
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