CN105829239A - 用于对使用基于苯乙烯和基于甲基丙烯酸甲酯的未经结构化的嵌段共聚物的嵌段共聚物膜进行纳米结构化的工艺、以及经纳米结构化的嵌段共聚物膜 - Google Patents

用于对使用基于苯乙烯和基于甲基丙烯酸甲酯的未经结构化的嵌段共聚物的嵌段共聚物膜进行纳米结构化的工艺、以及经纳米结构化的嵌段共聚物膜 Download PDF

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Publication number
CN105829239A
CN105829239A CN201480068975.6A CN201480068975A CN105829239A CN 105829239 A CN105829239 A CN 105829239A CN 201480068975 A CN201480068975 A CN 201480068975A CN 105829239 A CN105829239 A CN 105829239A
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CN
China
Prior art keywords
block
block copolymer
comonomer
copolymer
styrene
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Pending
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CN201480068975.6A
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English (en)
Chinese (zh)
Inventor
C.纳瓦罗
C.尼科利特
X.希瓦利埃
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Arkema France SA
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Arkema France SA
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Publication date
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Publication of CN105829239A publication Critical patent/CN105829239A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/08—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/945—Special, e.g. metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/905—Etch masking compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/915—Polymer from monoethylenic cyclic hydrocarbon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Composite Materials (AREA)
  • Thermal Sciences (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
CN201480068975.6A 2013-12-17 2014-12-15 用于对使用基于苯乙烯和基于甲基丙烯酸甲酯的未经结构化的嵌段共聚物的嵌段共聚物膜进行纳米结构化的工艺、以及经纳米结构化的嵌段共聚物膜 Pending CN105829239A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1362735A FR3014877B1 (fr) 2013-12-17 2013-12-17 Procede de nanostructuration d'un film de copolymere a blocs a partir d'un copolymere a blocs non structure a base de styrene et de methacrylate de methyle, et film de copolymere a blocs nanostructure
FRFR1362735 2013-12-17
PCT/FR2014/053329 WO2015092241A1 (fr) 2013-12-17 2014-12-15 Procédé de nanostructuration d'un film de copolymère a blocs a partir d'un copolymère a blocs non structure a base de styrène et de methacrylate de méthyle, et film de copolymère a blocs nanostructure

Publications (1)

Publication Number Publication Date
CN105829239A true CN105829239A (zh) 2016-08-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480068975.6A Pending CN105829239A (zh) 2013-12-17 2014-12-15 用于对使用基于苯乙烯和基于甲基丙烯酸甲酯的未经结构化的嵌段共聚物的嵌段共聚物膜进行纳米结构化的工艺、以及经纳米结构化的嵌段共聚物膜

Country Status (9)

Country Link
US (1) US10011675B2 (enExample)
EP (1) EP3083488A1 (enExample)
JP (2) JP2017501270A (enExample)
KR (1) KR101840960B1 (enExample)
CN (1) CN105829239A (enExample)
FR (1) FR3014877B1 (enExample)
SG (1) SG11201604475WA (enExample)
TW (1) TWI548657B (enExample)
WO (1) WO2015092241A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107108824A (zh) * 2014-12-16 2017-08-29 阿科玛法国公司 控制包含至少一个非极性嵌段和至少一个极性嵌段的嵌段共聚物的合成的方法和这样的嵌段共聚物通过直接自组装在纳米光刻应用中的用途
CN109906237A (zh) * 2016-11-30 2019-06-18 株式会社Lg化学 嵌段共聚物
CN112358643A (zh) * 2020-11-10 2021-02-12 浙江工业大学 一种基于嵌段共聚物本体聚合的均孔膜制备方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3045644A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'obtention de films ordonnes epais et de periodes elevees comprenant un copolymere a blocs
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs
FR3045643A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede d'amelioration de l'uniformite de dimension critique de films ordonnes de copolymere a blocs
FR3045642A1 (fr) * 2015-12-18 2017-06-23 Arkema France Procede de reduction du temps de structuration de films ordonnes de copolymere a blocs
KR20230119186A (ko) * 2020-12-17 2023-08-16 메르크 파텐트 게엠베하 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용

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CN101578232A (zh) * 2007-02-08 2009-11-11 美光科技公司 使用嵌段共聚物自组装进行亚光刻图案化的方法
US20120046415A1 (en) * 2010-08-20 2012-02-23 Micron Technology, Inc. Methods of forming block copolymers, methods of forming a self-assembled block copolymer structure and related compositions

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FR2679237B1 (fr) 1991-07-19 1994-07-22 Atochem Systeme d'amorcage pour la polymerisation anionique de monomeres (meth) acryliques.
FR2735480B1 (fr) 1995-06-15 1997-07-18 Atochem Elf Sa Procede de polymerisation anionique en continu d'au moins un monomere (meth)acrylique pour l'obtention de polymeres a haut taux de solide
US6835778B2 (en) * 1995-08-29 2004-12-28 Chevron Phillips Chemical Company Lp Conjugated diene/monovinylarene block copolymers blends
US7255920B2 (en) * 2004-07-29 2007-08-14 3M Innovative Properties Company (Meth)acrylate block copolymer pressure sensitive adhesives
WO2007132901A1 (ja) * 2006-05-16 2007-11-22 Nippon Soda Co., Ltd. ブロックコポリマー
US8425982B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
FR2974094A1 (fr) 2011-04-15 2012-10-19 Arkema France Procede de preparation de surfaces
KR101963924B1 (ko) 2011-07-29 2019-03-29 위스콘신 얼럼나이 리서어치 화운데이션 박막의 유도 조립을 위한 블록 공중합체 재료

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101578232A (zh) * 2007-02-08 2009-11-11 美光科技公司 使用嵌段共聚物自组装进行亚光刻图案化的方法
US20120046415A1 (en) * 2010-08-20 2012-02-23 Micron Technology, Inc. Methods of forming block copolymers, methods of forming a self-assembled block copolymer structure and related compositions

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107108824A (zh) * 2014-12-16 2017-08-29 阿科玛法国公司 控制包含至少一个非极性嵌段和至少一个极性嵌段的嵌段共聚物的合成的方法和这样的嵌段共聚物通过直接自组装在纳米光刻应用中的用途
CN107108824B (zh) * 2014-12-16 2020-05-12 阿科玛法国公司 嵌段共聚物的合成的方法和其在纳米光刻中的应用
CN109906237A (zh) * 2016-11-30 2019-06-18 株式会社Lg化学 嵌段共聚物
CN112358643A (zh) * 2020-11-10 2021-02-12 浙江工业大学 一种基于嵌段共聚物本体聚合的均孔膜制备方法
CN112358643B (zh) * 2020-11-10 2022-09-30 浙江工业大学 一种基于嵌段共聚物本体聚合的均孔膜制备方法

Also Published As

Publication number Publication date
JP2019173019A (ja) 2019-10-10
US20170002127A1 (en) 2017-01-05
JP2017501270A (ja) 2017-01-12
TW201536825A (zh) 2015-10-01
SG11201604475WA (en) 2016-07-28
KR20160100351A (ko) 2016-08-23
KR101840960B1 (ko) 2018-03-21
EP3083488A1 (fr) 2016-10-26
TWI548657B (zh) 2016-09-11
FR3014877B1 (fr) 2017-03-31
WO2015092241A1 (fr) 2015-06-25
FR3014877A1 (fr) 2015-06-19
US10011675B2 (en) 2018-07-03

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Application publication date: 20160803