JP2017500445A - Evaporation source transfer unit, vapor deposition apparatus and vapor deposition method - Google Patents

Abstract

An evaporation source transfer unit, an evaporation apparatus, and an evaporation method are disclosed. According to an aspect of the present invention, there is provided an evaporation source transfer unit that is disposed in a deposition chamber and transfers a linear evaporation source. A linear first rail, a linear second rail perpendicular to a virtual second radial direction across the deposition chamber at the center point, and a curved third rail connecting the first rail and the second rail. A lower rail including: a linear fourth rail spaced apart and parallel to the first rail; a linear fifth rail spaced apart and parallel to the second rail; the fourth rail and the fifth rail; An upper rail including a curved sixth rail connecting; the linear evaporation source is coupled to be perpendicular to the lower rail and the upper rail, and reciprocates along the lower rail and the upper rail Do Including feeding portion, the evaporation source transfer unit is provided.

Description

  The present invention relates to an evaporation source transfer unit, an evaporation apparatus, and an evaporation method. More specifically, the deposition process for a plurality of substrates is performed in one chamber, but the tact time may be reduced by performing a transfer process or an alignment process for another substrate during the deposition process of one substrate. In particular, the present invention relates to an organic vapor deposition apparatus capable of reducing loss of an organic material generated during a transfer process or alignment process with respect to a substrate, and a vapor deposition method using the same.

  An organic electroluminescent device (OLED) is a self-luminous device that emits light using an electroluminescent phenomenon that emits light when a current flows through a fluorescent organic compound, and emits light to a non-luminous device. Since no additional backlight is required, it is lightweight and a thin flat panel display device can be manufactured.

  A flat panel display using such an organic electroluminescent element has a high response speed and a wide viewing angle, and therefore has a head as a next generation display.

  Particularly, since the manufacturing process is simple, it is an advantage that the production cost can be greatly reduced as compared with the existing liquid crystal display device.

  In the organic electroluminescence device, the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer, which are other constituent layers excluding the anode and the cathode electrode, are made of an organic thin film. An organic thin film is deposited on a substrate by a vacuum thermal evaporation method.

  In the vacuum thermal evaporation method, the substrate is transferred into a vacuum chamber, a shadow mask with a fixed pattern is aligned with the transferred substrate, heat is applied to the crucible containing the organic matter, and then the crucible is removed. This is a method in which an organic substance to be sublimated is deposited on a substrate.

  In the conventional vacuum thermal deposition method, the deposition process is performed on one substrate in one chamber. Therefore, the deposition process on the substrate is interrupted during the substrate transfer process and the shadow mask alignment process. ) Increased.

  In addition, since the organic matter is continuously sublimated from the crucible during the substrate transfer process and the shadow mask alignment process, there is a problem that the organic material is lost.

  In the present invention, the deposition process is performed on a plurality of substrates in one chamber, but the tact time may be reduced by performing a transfer process or an alignment process on another substrate during the deposition process of one substrate. An evaporation source transfer unit, an evaporation apparatus, and an evaporation method using the evaporation source transfer unit that can reduce the loss of an organic material generated during the transfer process or alignment process with respect to a substrate.

  According to an aspect of the present invention, there is provided an evaporation source transfer unit that is disposed in a deposition chamber and transfers a linear evaporation source, and is perpendicular to a virtual first radiation direction across the deposition chamber at one central point. A linear first rail, a linear second rail perpendicular to a virtual second radial direction across the deposition chamber at the center point, and a curved third rail connecting the first rail and the second rail. A lower rail including; a linear fourth rail spaced apart and parallel to the first rail; a linear fifth rail spaced apart and parallel to the second rail; the fourth rail and the fifth rail; An upper rail including a curved sixth rail connecting the rails; and the linear evaporation source is coupled so as to be perpendicular to the lower rail and the upper rail, along the lower rail and the upper rail Reciprocate Including the transfer unit, the evaporation source transfer unit is provided.

  The transfer unit includes a pair of first sliders coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail; and the pair of first sliders A pair of second sliders that are spaced apart from each other and coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail, respectively, A moving block that moves along the lower rail or the upper rail; and a rotating block that is coupled to the upper side of the moving block so as to be able to rotate in the horizontal direction, and the second slider includes the lower rail or the upper rail A moving block that moves along a rail; a rotating block that is coupled to the upper side of the moving block so as to be horizontally rotatable; and It can include a sliding bar that is coupled to the rotary block to sliding against the rolling block.

  The source support may be further supported by the first slider and the second slider, and the evaporation source may be coupled to the source support.

  A rack rail disposed along the upper rail and the lower rail and spaced apart from each other by an interval between the lower rail and the upper rail; a pinion engaged with the rack rail; and a rotational force applied to the pinion And a motor unit coupled to the source support.

  According to another aspect of the present invention, the first deposition region and the second deposition region are partitioned, and the first substrate is drawn or drawn into the first deposition region in a first radial direction from one central point, A deposition chamber in which a second substrate is drawn or drawn into the second deposition region in a second radial direction from a central point; and a first substrate loading unit in which the first substrate is loaded and seated in the first radial direction A second substrate loading portion on which the second substrate is loaded and seated in the second radial direction; a linear evaporation source for injecting an evaporating substance facing the first substrate or the second substrate; An evaporation source transfer unit for transferring the linear evaporation source, wherein the evaporation source transfer unit includes a linear first rail perpendicular to the first radial direction and a linear perpendicular to the second radial direction; A second rail; A lower rail including a curved third rail connecting the first rail and the second rail; a linear fourth rail spaced apart and parallel to the first rail; and a linear rail spaced apart and parallel to the second rail A fifth rail; an upper rail including a curved sixth rail connecting the fourth rail and the fifth rail; the linear evaporation source coupled so as to be perpendicular to the lower rail and the upper rail And a deposition apparatus including a transfer unit that reciprocates along the lower rail and the upper rail.

  The transfer unit includes a pair of first sliders coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail; and the pair of first sliders A pair of second sliders that are spaced apart from each other and coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail, respectively, A moving block that moves along the lower rail or the upper rail; and a rotating block that is coupled to the upper side of the moving block so as to be able to rotate in the horizontal direction, and the second slider includes the lower rail or the upper rail A moving block that moves along a rail; a rotating block that is coupled to the upper side of the moving block so as to be horizontally rotatable; and It can include a sliding bar that is coupled to the rotary block to sliding in the direction perpendicular to the first radiating direction.

  The deposition apparatus may further include a source support base supported by the first slider and the second slider, and the evaporation source may be coupled to the source support base.

  The deposition apparatus includes a rack rail disposed along the upper rail and spaced apart from the upper rail by a certain distance; a pinion meshed with the rack rail; and a rotational force to the pinion. A motor unit coupled to the source support may further be included.

  According to another aspect of the present invention, there is provided a method for depositing an evaporating substance using the deposition apparatus, wherein the transfer unit is moved to the end portions of the upper rail and the lower rail in the first deposition region. Loading the first substrate in the first radial direction and seating the first substrate on the first substrate loading unit; moving the transfer unit along the first rail and the third rail, and Depositing the evaporated material on the first substrate; depositing the evaporated particles on the first substrate; and simultaneously loading the second substrate in the second radial direction to rest on the second substrate loading unit. And passing the transfer section through the curved third rail and the fifth rail and moving along the second rail and the fourth rail to deposit evaporated particles on the second substrate. Chakuhoho is provided.

  After the evaporation material is deposited on the first substrate, the first substrate that has been deposited is pulled out of the deposition chamber, and a new first substrate is loaded in the first radial direction to load the first substrate loading unit. The method may further include the step of suspending.

  According to an embodiment of the present invention, a deposition process is performed on a plurality of substrates in one chamber, and a tact time (tact time) is achieved by performing a transfer process or an alignment process on another substrate during the deposition process of one substrate. time), and loss of organic material generated during the transfer process or alignment process with respect to the substrate can be reduced.

The cross-sectional view for demonstrating the structure of the vapor deposition apparatus by one Example of this invention. The longitudinal cross-sectional view for demonstrating the structure of the vapor deposition apparatus by one Example of this invention. 1 is a plan view briefly showing an evaporation source transfer unit according to an embodiment of the present invention. The figure which expanded the A section of FIG. 1 is a side view briefly showing an evaporation source transfer unit according to an embodiment of the present invention. FIG. 3 is a view for explaining an operation process of an evaporation source transfer unit according to an embodiment of the present invention. FIG. 3 is a view for explaining an operation process of an evaporation source transfer unit according to an embodiment of the present invention. FIG. 3 is a view for explaining an operation process of an evaporation source transfer unit according to an embodiment of the present invention.

  While the invention is susceptible to various modifications and alternative embodiments, specific embodiments are illustrated in the drawings and will be described in detail in the detailed description. However, this should not be construed as limiting the invention to any particular embodiment, but should be understood to include all transformations, equivalents or alternatives that fall within the spirit and scope of the invention. In describing the present invention, if it is determined that a specific description of a related known technique may obscure the gist of the present invention, a detailed description thereof will be omitted.

  Hereinafter, embodiments of an evaporation source transfer unit and a vapor deposition apparatus according to the present invention will be described in detail with reference to the accompanying drawings. In the description with reference to the accompanying drawings, the same or corresponding components are assigned the same drawing numbers. , The description which overlaps with this is omitted.

  FIG. 1 is a cross-sectional view for explaining the configuration of a vapor deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a vertical cross-sectional view for explaining the configuration of a vapor deposition apparatus according to an embodiment of the present invention. FIG. 3 is a plan view briefly showing an evaporation source transfer unit according to an embodiment of the present invention.

  1 to 3, the evaporation source transfer unit 10, the vapor deposition chamber 12, the first vapor deposition region 14, the second vapor deposition region 16, the center point 18, the first radiation direction 20, the second radiation direction 22, the transfer chamber 24, Robot arm 26, first substrate loading unit 28, second substrate loading unit 30, first substrate 32, mask 33, second substrate 34, lower rail 36, upper rail 38, evaporation source 40, first rail 42, first rail 2 rail 44, 3rd rail 46, 4th rail 48, 5th rail 50, 6th rail 52, transfer part 54, 1st slider 56, 2nd slider 58, and source support stand 60 are illustrated.

  The vapor deposition apparatus according to the present embodiment is divided into a first vapor deposition region 14 and a second vapor deposition region 16, and a first substrate 32 is drawn or drawn into the first vapor deposition region 14 from one central point 18 in the first radial direction 20. And a deposition chamber 12 in which a second substrate 34 is drawn or drawn into the second deposition region 16 in the second radial direction 22 from the center point 18; and the first substrate 32 is in the first radial direction 20. A first substrate loading portion 28 loaded and seated; a second substrate loading portion 30 loaded and seated in the second radial direction 22; and the first substrate 32 or the An evaporation source 40 for injecting an evaporation substance facing the second substrate 34; and an evaporation source transfer unit 10 for transferring the evaporation source 40. The evaporation source transfer unit 10 includes a linear first rail 42 perpendicular to the first radial direction 20, a linear second rail 44 perpendicular to the second radial direction 22, and the first rail. 42 and a lower rail 36 including a curved third rail 46 connecting the second rail 44; a linear fourth rail 48 spaced apart from and parallel to the first rail 42; and spaced apart from the second rail 44. A linear fifth rail 50 in parallel; an upper rail 38 including a curved sixth rail 52 connecting the fourth rail 48 and the fifth rail 50; and the linear evaporation source 40 is connected to the lower rail 36. The lower rail 36 and the transfer portion 54 that reciprocates along the upper rail 38 are coupled to the upper rail 38 so as to be perpendicular.

  The deposition chamber 12 is divided into a first deposition region 14 and a second deposition region 16, and a first substrate 32 is drawn or drawn into the first deposition region 14 from one central point 18 in the first radial direction 20. The second substrate 34 may be drawn or drawn into the second deposition region 16 from 18 in the second radial direction 22.

  The vapor deposition chamber 12 is a place where evaporation material is deposited on the substrate, and the inside can be maintained in a vacuum state by a vacuum pump. When the evaporating substance is generated in the atmospheric pressure state, the inside can be maintained in the atmospheric pressure state. The deposition chamber 12 may be partitioned into a plurality of deposition regions such that deposition is performed on a plurality of substrates in one deposition chamber 12. Here, the evaporation material means a gas phase material that is vaporized or sublimated when the source material is heated, and may include a gas phase organic material obtained by heating the organic material.

  The deposition area means a virtual space in which an evaporation substance can be deposited on one substrate by moving the evaporation source 40. Referring to FIG. 1, the deposition area is indicated by a one-dot chain line in FIG. The deposition chamber 12 may be divided into a first deposition region 14 and a second deposition region 16 by the center line. In the first deposition region 14, the evaporation material for the first substrate 32 is deposited, and in the second deposition region 16 in contact with the first deposition region 14, the evaporation material for the second substrate 34 is deposited.

  The first substrate 32 is drawn into or pulled out of the first deposition region 14 of the deposition chamber 12 from one central point 18 in the first radial direction 20, and the second substrate 34 is extracted from the central point 18 in the second radial direction 22. Are drawn into or pulled out of the second vapor deposition region 16 of the vapor deposition chamber 12. That is, the first substrate 32 and the second substrate 34 are drawn into or pulled out from the deposition chamber 12 with a certain inclination.

  In a cluster type deposition system, the substrate can be pulled into and out of the deposition chamber 12 by a robot arm 26 in a transfer chamber 24 connected to the deposition chamber 12. Since the substrate is drawn or drawn into the deposition chamber 12 in the radial direction from the center of rotation, the substrate can be drawn or drawn into the deposition chamber 12 with a certain inclination. Therefore, when the first substrate 32 and the second substrate 34 are drawn into or pulled out from the deposition chamber 12 by the robot arm 26, the first radial direction 20 in the first radial direction 20 with respect to the rotation center of the robot arm 26 constituting the center point 18. The first substrate 32 is drawn or drawn into the deposition chamber 12, and the second substrate 34 moves to the second radiation direction 22 different from the first radiation direction 20 with respect to the rotation center of the robot arm 26 constituting the center point 18. 12 can be withdrawn or withdrawn. Therefore, the first radiation direction 20 and the second radiation direction 22 form a certain angle with the center point 18 as the center.

  However, the robot substrate 26 is not limited to the first substrate 32 and the second substrate 34 being drawn or drawn into the vapor deposition chamber 12 by the robot arm 26, and the first substrate 32 and the second substrate 34 are inclined with respect to the vapor deposition chamber 12. In this case, the vapor deposition apparatus according to the present embodiment can be applied. For example, when the first substrate 32 and the second substrate 34 are drawn or drawn into the deposition chamber 12 by the two robot arms 26, the rotation center of the robot arm 26 does not constitute the above-described center point 18, A point where two virtual inclined lines formed by the inclination directions of the first substrate 32 and the second substrate 34 meet each other constitutes the center point 18.

  The first substrate loading unit 28 and the second substrate loading unit 30 are loaded with a first substrate 32 and a second substrate 34, respectively. In the present embodiment, the first substrate 32 and the second substrate are disposed below the first substrate loading unit 28 and the second substrate loading unit 30 so that the evaporation material is ejected upward from the evaporation source 40 and the evaporation material is deposited on the substrate. Each substrate 34 is attached.

  When the first substrate 32 and the second substrate 34 are loaded and seated on the first substrate loading unit 28 and the second substrate loading unit 30, respectively, the mask 33 is disposed on the surface of the substrate in each substrate loading unit, and the substrate And the mask 33 are aligned with each other.

  A linear evaporation source 40 is coupled to the evaporation source transfer unit 10, and the evaporation source 40 moves between the first vapor deposition region 14 and the second vapor deposition region 16 by the evaporation source transfer unit 10, and the evaporation substance is applied to the substrate. Vapor deposited.

  The evaporation source transfer unit 10 includes a linear first rail 42 perpendicular to the first radial direction 20, a linear second rail 44 perpendicular to the second radial direction 22, and the first rail 42 and the second rail 44. A lower rail 36 including a curved third rail 46, a linear fourth rail 48 spaced apart and parallel to the first rail 42, and a linear fifth rail 50 spaced apart and parallel to the second rail 44. And an upper rail 38 including a curved sixth rail 52 connecting the fourth rail 48 and the fifth rail 50.

  Although the lower rail 36 and the upper rail 38 are spaced apart from each other by a certain distance, the linear evaporation source 40 can be stably supported by the lower rail 36 and the upper rail 38. As the glass substrate on which the vapor deposition is performed is increased, the linear evaporation source 40 is also increased in size, thereby increasing the weight of the evaporation source 40. Therefore, in order to guide the movement smoothly while stably supporting the evaporation source 40 of weight, the lower rail 36 and the upper rail 38 are configured as a pair.

  The first rail 42 of the lower rail 36 and the fourth rail 48 of the upper rail 38 form a straight section in the first deposition region 14, and the second rail 44 of the lower rail 36 and the fifth rail 50 of the upper rail 38 are A straight section is formed in the second deposition region 16. The straight section of the first deposition region 14 is perpendicular to the first radiation direction 20, and the straight section of the second deposition region 16 is perpendicular to the second radiation direction 22. As a result, the straight section of the first deposition region 14 and the straight section of the second deposition region 16 are deviated by an angle formed by the first radiation direction 20, the center point 18, and the second radiation direction 22. Therefore, a curved section for connecting the straight sections is required. That is, the first rail 42 and the second rail 44 of the lower rail 36 are connected to the curved third rail 46, and the fourth rail 48 and the fifth rail 50 of the upper rail 38 are connected to the curved sixth rail 52. become. At this time, due to the separation distance between the lower rail 36 and the upper rail 38, the sixth rail 52 connects the fourth rail 48 and the fifth rail 50 with a larger radius of curvature than the third rail 46.

  Here, the vertical meaning does not mean a geometrical or mathematical vertical, but means a substantial vertical considering a processing error or a transfer error.

  The transfer unit 54 reciprocates along the lower rail 36 and the upper rail 38, but a linear evaporation source 40 is coupled to the transfer unit 54 so that the lower rail 36 and the upper rail 38 are vertical. Therefore, if the linear evaporation source 40 moves along the straight section in a state coupled to the transfer unit 54 so as to be perpendicular to the straight section, the entire substrate is moved while moving from one side direction of the substrate to the opposite side direction. Is deposited.

  The transfer unit 54 moves in a straight section between the lower rail 36 and the upper rail 38 of the first deposition region 14, passes through the curved section of the lower rail 36 and the upper rail 38, and then moves to the lower side of the second deposition region 16. The straight section of the rail 36 and the upper rail 38 is moved. Further, after moving in the opposite direction in the straight section of the lower rail 36 and the upper rail 38 of the second deposition region 16 and passing through the curved section of the lower rail 36 and the upper rail 38, the lower side of the first deposition region 14 The straight section of the rail 36 and the upper rail 38 is moved. Thus, the transfer part 54 repeats reciprocating motion along the lower rail 36 and the upper rail 38.

  Each configuration of the evaporation source transfer unit 10 will be described in detail below.

  The vapor deposition process of the evaporation material on the substrate using the above vapor deposition apparatus will be described. First, the transfer unit 54 is moved to the ends of the upper rail 38 and the lower rail 36 in the first vapor deposition region 14. As the transfer unit 54 moves from the first vapor deposition region 14 to the second vapor deposition region 16, vapor deposition is performed on the substrate, so that the transfer unit 54 is moved to the end portions of the upper rail 38 and the lower rail 36 of the first vapor deposition region 14 ( Referring to FIG. 3, it is moved to the right end portion of the first vapor deposition region 14.

  Next, the first substrate 32 is loaded in the first radial direction 20 and is seated on the first substrate loading unit 28. When the first substrate 32 is seated on the first substrate loading unit 28 of the deposition chamber 12 by the robot arm 26, the first substrate 20 in the first radial direction 20 with respect to the rotation center of the robot arm 26 constituting the center point 18. 32 is seated on the first substrate loading unit 28. When the first substrate 32 is seated on the first substrate loading unit 28 at this stage, the mask 33 is placed on the surface of the first substrate 32 and the first substrate 32 and the shadow mask 33 are aligned. It is also possible to move the transfer unit 54 to the end portions of the upper rail 38 and the lower rail 36 in the first deposition region 14 during the loading process of the first substrate 32.

  Next, the transfer unit 54 is moved along the first rail 42 and the third rail 46 to evaporate the evaporation material on the first substrate 32. The linear evaporation source 40 arranged perpendicular to the straight section is moved along the straight section of the lower rail 36 and the upper rail 38 of the first vapor deposition region 14, thereby facing the other side of the first substrate 32 from one side. The entire substrate is deposited while moving in the side direction.

  When vapor deposition of the evaporation material on the first substrate 32 is completed, the first substrate 32 that has been vapor deposited is pulled out of the deposition chamber 12 and a new first substrate 32 is loaded in the first radial direction 20 to load the first substrate. Attached to part 28.

  Next, the second substrate 34 is loaded in the second radiation direction 22 at the same time as the evaporation particles are vapor-deposited on the first substrate 32, and is settled on the second substrate loading unit 30. The second substrate 34 can be seated on the second substrate loading unit 30 during the deposition process for the first substrate 32 to reduce the tact time, and the second substrate 34 is loaded during the deposition process for the first substrate 32. The loss of evaporative material can be reduced. If the second substrate 34 is seated on the second substrate loading unit 30 at this stage, the mask 33 is disposed on the surface of the second substrate 34 and the alignment of the second substrate 34 and the mask 33 is performed.

  The meaning of “simultaneously” in the present embodiment includes not only the meaning of being temporally the same, but also the meaning that the deposition process for the first substrate 32 and the loading process for the second substrate 34 overlap.

  Next, the transfer unit 54 passes through the curved third rail 46 and the fifth rail 50 and is moved along the second rail 44 and the fourth rail 48 to evaporate evaporated particles on the second substrate 34. The transfer unit 54 passes through the straight section of the first deposition region 14 and enters the straight section of the second deposition region 16 while passing through the curved section. The transfer unit 54 that has entered the second deposition section 16 moves to the second deposition region 16. By moving along the straight section between the lower rail 36 and the upper rail 38, the entire substrate is deposited while moving from one side direction of the second substrate 34 to the opposite side direction.

  When the deposition process on the second substrate 34 is completed, the second substrate 34 on which the evaporation of the evaporation substance is completed is pulled out from the deposition chamber 12 in the second radiation direction 22, and a new second substrate 34 is extracted from the second substrate loading unit 30. To be loaded and seated. When the new second substrate 34 is seated on the second substrate loading unit 30, it is aligned with the mask 33 and waits for the next deposition process.

  By the above-described method, the deposition process is performed on a plurality of substrates in one chamber, but the tact time is increased by performing the transfer process or alignment process on another substrate during the deposition process of one substrate. This can reduce the loss of evaporant material that occurs during the transfer or alignment process to the substrate.

  Below, each structure of the evaporation source transfer unit 10 is demonstrated. 4 is an enlarged view of portion A of FIG. 2, FIG. 5 is a side view briefly showing the evaporation source transfer unit 10 according to an embodiment of the present invention, and FIGS. 4 is a diagram for explaining an operation process of the evaporation source transfer unit 10 according to the embodiment.

  4 to 8, the lower rail 36, the upper rail 38, the first rail 42, the second rail 44, the third rail 46, the fourth rail 48, the fifth rail 50, the sixth rail 52, the transfer unit 54, A first slider 56, a second slider 58, a source support base 60, moving blocks 62 and 68, rotating blocks 64 and 70, a sliding bar 66, a rack rail 72, a pinion 74, and a motor unit 76 are illustrated.

  The lower rail 36 has a linear first rail 42 perpendicular to a virtual first radiation direction 20 that traverses the deposition chamber 12 at one central point 18 and a virtual second radiation that traverses the deposition chamber 12 at the central point 18. A linear second rail 44 perpendicular to the direction 22 and a curved third rail 46 connecting the first rail 42 and the second rail 44 are configured.

  The upper rail 38 is spaced apart from and parallel to the first rail 42, the linear fourth rail 48 is spaced apart from and parallel to the second rail 44, and the fourth rail 48 and fifth It is composed of a curved sixth rail 52 connecting the rails 50.

  The first rail 42 of the lower rail 36 and the fourth rail 48 of the upper rail 38 form a straight section, and the second rail 44 of the lower rail 36 and the fifth rail 50 of the upper rail 38 are in the second deposition region 16. A straight section is formed.

  The straight section formed by the first rail 42 and the fourth rail 48 is perpendicular to the virtual first radiation direction 20, and the straight section formed by the second rail 44 and the fifth rail 50 is a virtual second radiation. Perpendicular to direction 22. Thereby, the straight section perpendicular to the first radiation direction 20 and the straight section perpendicular to the second radiation direction 22 are deviated by an angle formed by the first radiation direction 20, the center point 18, and the second radiation direction 22. It becomes like this. Therefore, a curved section for connecting the straight sections is required. That is, the first rail 42 and the second rail 44 of the lower rail 36 are connected to the curved third rail 46, and the fourth rail 48 and the fifth rail 50 of the upper rail 38 are connected to the curved sixth rail 52. become. At this time, due to the separation distance between the lower rail 36 and the upper rail 38, the sixth rail 52 connects the fourth rail 48 and the fifth rail 50 with a larger radius of curvature than the third rail 46.

  The curved third rail 46 and the sixth rail 52 may be completely curved rails, or may be arranged in a curved shape by sequentially connecting several straight rails.

  The transfer unit 54 reciprocates along a straight section perpendicular to the first radial direction 20 of the lower rail 36 and the upper rail 38, a curved section, and a straight section perpendicular to the second radial direction 22.

  The transfer unit 54 includes a pair of first sliders 56 coupled to face the lower rail 36 and the upper rail 38 so as to move along the lower rail 36 and the upper rail 38, and a pair of first sliders. 56, and a pair of second sliders 58 coupled to each of the lower rail 36 and the upper rail 38 so as to move along the lower rail 36 and the upper rail 38, respectively.

  The first slider 56 includes a moving block 68 that moves along the lower rail 36 or the upper rail 38, and a rotating block 70 that is coupled to the upper side of the moving block 68 so as to be horizontally rotatable. Slides relative to the rotating block 64, a moving block 62 that moves along the lower rail 36 or the upper rail 38, a rotating block 64 that is coupled to the upper side of the moving block 62 so as to be horizontally rotatable. A sliding bar 66 coupled to the rotating block 64 is included.

  In the present embodiment, as shown in FIG. 3, a configuration is shown in which two second sliders 58 are arranged on both sides around the first slider 56 for each rail.

  The moving blocks 62 and 68 of the first slider 56 and the second slider 58 are coupled to the lower rail 36 and the upper rail 38 and move along each rail. A concave groove may be formed in the moving blocks 62 and 68 according to the shape of the rail, and the rails are inserted into the concave grooves of the moving blocks 62 and 68 to prevent the moving blocks 62 and 68 from being detached. it can.

  The rotating block 70 of the first slider 56 is coupled to the upper side of the moving block 68 of the first slider 56 and is rotated in the horizontal direction. A circular bearing is coupled between the moving block 68 and the rotating block 70 so that the rotating block 70 can be smoothly rotated with respect to the moving block 68.

  The rotating block 64 of the second slider 58 is also coupled to the upper side of the moving block 62 of the second slider 58 and rotated in the horizontal direction.

  The sliding bar 66 of the second slider 58 is coupled to the rotating block 64 of the second slider 58, but can reciprocate in the horizontal direction with respect to the rotating block 64. Between the rotating block 64 and the sliding bar 66 sliding relative thereto, a bearing that smoothly guides linear movement in the horizontal direction is interposed, so that stable sliding can be achieved.

  A linear evaporation source 40 is coupled to the first slider 56 and the second slider 58 disposed on the lower rail 36 and the upper rail 38 so as to be perpendicular to the lower rail 36 and the upper rail 38. In this embodiment, a mode in which a separate source support base 60 is provided and the evaporation source 40 is coupled to the source support base 60 is shown. That is, the source support base 60 is coupled to the first slider 56 and the second slider 58 disposed on the lower rail 36 and the upper rail 38, and the linear evaporation source 40 is coupled to the source support base 60.

  On the other hand, the driving units that provide driving force for the movement of the transfer unit 54 are spaced apart from each other by a certain distance outside the lower rail 36 and the upper rail 38, and are arranged along the upper rail 38 and the lower rail 36, respectively. Rack rail 72, a pinion 74 meshed with rack rail 72, and a motor unit 76 that provides rotational force to pinion 74 and is coupled to source support base 60.

  The rack rail 72 is disposed outside the lower rail 36 and the upper rail 38 along the upper rail 38 and the lower rail 36, respectively, and a pinion 74 is engaged with each rack rail 72. A motor unit 76 such as a motor that provides a rotational force to the pinion 74 is coupled to the upper and lower ends of the source support base 60 to provide the rotational force to the pinion 74.

  The driving unit disposed outside the lower rail 36 controls the movement of the lower end of the source support base 60, and the driving unit disposed outside the upper rail 38 controls the movement of the upper end of the source support base 60.

  Referring to FIGS. 6 to 8, the operation process of the evaporation source transfer unit 10 will be described. In the right straight section, the transfer unit 54 moves at the same speed at the lower end and the upper end of the source support base 60. Then, as shown in FIG. 6, the vehicle enters the curved section, but the second slider 58 positioned at the tip of the transfer unit 54 enters the curved section, so that the state-of-the-art second slider 58 rotates. The sliding bar 66 is slid upward with respect to the rotating block 64 while the block 64 is rotated. At this time, the curved section of the lower rail 36 is formed to be short with a small radius of curvature, and the curved section of the upper rail 38 is formed to be long with a large radius of curvature, so that the source support base 60 is lower than the lower end of the source support base 60. The top of the moves at a fast speed. Next, the first slider 56 enters the curved section while the rotary block 70 of the first slider 56 positioned at the rear end of the second most advanced slider 58 is rotated by the continuous movement of the transfer unit 54. FIG. 7 is a diagram illustrating a state in which the transfer unit 54 is located at the center of the curved section, and the second slider 58 at the rearmost end enters the curved section due to the continuous movement of the transfer unit 54. The sliding bar 66 is slid upward with respect to the rotating block 64 while the rotating block 64 of the second slider 58 at the end is rotated. Next, as shown in FIG. 8, the leading edge of the second slider 58 enters the left straight section due to the continuous movement of the transfer unit 54, so that the rotating block 64 of the leading edge of the second slider 58 is moved. It is rotated and the sliding bar 66 returns to the original position while sliding downward with respect to the rotating block 64. Then, the first slider 56 enters the linear section while the rotary block 70 of the first slider 56 positioned at the rear end of the most advanced second slider 58 is rotated by the continuous movement of the transfer unit 54. Then, the second slider 58 at the rearmost end enters the straight section by the continuous movement of the transfer unit 54, and the sliding bar 66 moves relative to the rotary block 64 while the rotary block 64 of the second slider 58 at the rearmost end rotates. It will slide down and return to its original position. When the left straight section is completely entered, the rotary blocks 64 and 70 and the sliding bar 66 are returned to their original positions, and the transfer section 54 is moved along the left straight section. As described above, when the transfer unit 54 passes through the curved section, the moving speed and the moving distance of the lower end and the upper end of the transfer unit 54 must be different from each other. The unit adjusts the moving speed and moving distance of the lower end and the upper end of the transfer unit 54.

  Although the foregoing has been described with reference to specific embodiments of the present invention, those having ordinary knowledge in the art will not depart from the spirit and scope of the present invention as set forth in the claims below. It will be understood that various modifications and changes can be made to the present invention.

  In addition to the embodiments described above, many embodiments are within the scope of the claims of the present invention.

Claims (10)

An evaporation source transfer unit arranged in a deposition chamber for transferring a linear evaporation source,
A linear first rail perpendicular to a virtual first radial direction across the deposition chamber at one central point and a linear second rail perpendicular to a virtual second radial direction across the deposition chamber at the central point. A lower rail including a rail and a curved third rail connecting the first rail and the second rail;
A linear fourth rail spaced apart and parallel to the first rail, a linear fifth rail spaced apart and parallel to the second rail, and a curved line connecting the fourth rail and the fifth rail. An upper rail including six rails;
The evaporation source transfer unit, wherein the linear evaporation source is coupled so as to be perpendicular to the lower rail and the upper rail, and includes a transfer unit that reciprocates along the lower rail and the upper rail. The transfer unit is
A pair of first sliders respectively coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail;
A pair of second sliders that are separated from each other by the pair of first sliders and are respectively coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail;
The first slider is
A moving block that moves along the lower rail or the upper rail, and a rotating block that is coupled to the upper side of the moving block so as to be horizontally rotatable,
The second slider is
A moving block that moves along the lower rail or the upper rail, a rotating block that is coupled to the upper side of the moving block so as to be horizontally rotatable, and the rotating block that slides relative to the rotating block The evaporation source transfer unit according to claim 1, further comprising a sliding bar coupled to the evaporation source. A source support that is supported by the first slider and the second slider;
The evaporation source transfer unit according to claim 2, wherein the evaporation source is coupled to the source support. Rack rails arranged along the upper rail and the lower rail, respectively, spaced apart from each other by a certain distance outside the lower rail and the upper rail;
A pinion meshed with the rack rail;
4. The evaporation source transfer unit according to claim 3, further comprising a motor unit that applies a rotational force to the pinion and is coupled to the source support. The first deposition area and the second deposition area are partitioned, and the first substrate is drawn or drawn into the first deposition area from one central point in the first radial direction. A deposition chamber in which two substrates are drawn or drawn into the second deposition region;
A first substrate loading portion on which the first substrate is loaded and seated in the first radial direction;
A second substrate loading portion on which the second substrate is loaded and seated in the second radial direction;
A linear evaporation source for injecting an evaporating substance to face the first substrate or the second substrate;
An evaporation source transfer unit for transferring the linear evaporation source;
The evaporation source transfer unit includes:
A linear first rail perpendicular to the first radial direction; a linear second rail perpendicular to the second radial direction; and a curved third rail connecting the first rail and the second rail. With the lower rail;
A linear fourth rail spaced apart and parallel to the first rail, a linear fifth rail spaced apart and parallel to the second rail, and a curved sixth rail connecting the fourth rail and the fifth rail An upper rail including:
The deposition apparatus, wherein the linear evaporation source is coupled to be perpendicular to the lower rail and the upper rail, and includes a transfer unit that reciprocates along the lower rail and the upper rail. The transfer unit is
A pair of first sliders respectively coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail;
The pair of second sliders, which are respectively separated from the pair of first sliders and are coupled to face the lower rail and the upper rail so as to move along the lower rail and the upper rail, respectively. ,
The first slider is
A moving block that moves along the lower rail or the upper rail, and a rotating block that is coupled to the upper side of the moving block so as to be horizontally rotatable,
The second slider is
A moving block that moves along the lower rail or the upper rail, a rotating block that is coupled to the upper side of the moving block so as to be able to rotate in a horizontal direction, and sliding in a direction perpendicular to the first radial direction The deposition apparatus of claim 5, further comprising a sliding bar coupled to the rotating block. A source support that is supported by the first slider and the second slider;
The deposition apparatus of claim 6, wherein the evaporation source is coupled to the source support. A rack rail disposed along the upper rail and spaced apart from the upper rail by a certain distance;
A pinion meshed with the rack rail;
8. The deposition apparatus of claim 7, further comprising a motor unit that provides a rotational force to the pinion and is coupled to the source support. A method for depositing an evaporating substance using a deposition apparatus according to claim 5, comprising:
Moving the transfer part to the ends of the upper rail and the lower rail of the first deposition region;
Loading the first substrate in the first radial direction and seating on the first substrate loading unit;
Moving the transfer unit along the first rail and the third rail to deposit the evaporation material on the first substrate;
Vapor deposition of evaporated particles on the first substrate, and simultaneously loading the second substrate in the second radial direction and seating on the second substrate loading portion;
A vapor deposition method comprising: passing the transfer unit through the curved third rail and the fifth rail and moving the transfer unit along the second rail and the fourth rail to deposit vaporized particles on the second substrate. . After depositing an evaporating material on the first substrate,
The method may further include a step of pulling out the first substrate on which deposition has been completed from the deposition chamber and loading a new first substrate in the first radial direction to be seated on the first substrate loading unit. The vapor deposition method according to claim 9.

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