KR101530318B1 - Deposition unit and Apparatus for deposition - Google Patents

Abstract

Disclosed are a deposition unit and a deposition apparatus. According to an aspect of the present invention, a deposition source unit which is arranged in a deposition chamber and performs deposition on a substrate, includes a lower case of which upper end is open; a tube-shaped heating part which is located in the lower case and moves vertically; a rail part which is horizontally combined with the upper end of the lower case and guides a straight motion; an upper case which has an open lower end, is installed to the rail part, moves along the rail part to be combined with the lower case or separated from it; and a crucible which is located in the upper case and enters or exits from the heating part according to the vertical movement of the heating part.

Description

[0001] DESCRIPTION [0002] Deposition unit and apparatus for deposition [0003]

The present invention relates to an evaporation source unit and a deposition apparatus. More particularly, the present invention relates to an evaporation source unit and a deposition apparatus that can reduce the charging time when the evaporation material is refilled with the evaporation material.

Organic Luminescence Emitting Device (OLED) is a self-luminous self-luminous device that uses an electroluminescent phenomenon that emits light when a current flows through a fluorescent organic compound, and does not require a backlight for applying light to a non- Therefore, a lightweight thin flat panel display device can be manufactured.

A flat panel display device using such an organic electroluminescent device has a fast response speed and a wide viewing angle, and is emerging as a next generation display device.

In particular, since the manufacturing process is simple, it is advantageous in that the production cost can be saved more than the conventional liquid crystal display device.

The organic electroluminescent device comprises an organic thin film such as a hole injecting layer, a hole transporting layer, a light emitting layer, an electron transporting layer, and an electron injecting layer which are the remaining constituent layers except for the anode and the cathode. .

In the vacuum thermal deposition method, a substrate is transferred into a vacuum chamber, a shadow mask having a predetermined pattern is aligned on the transferred substrate, heat is applied to the crucible containing the organic material, and the organic material sublimated in the crucible is transferred onto the substrate As shown in FIG.

Recently, as the size of the substrate is increased, a method of performing evaporation on the entire surface of the substrate while moving the evaporation source relative to the substrate is being developed.

When the evaporation source is moved to perform evaporation on the substrate, if the evaporation material of the evaporation source is exhausted during the evaporation process, the evaporation source is separated from the evaporation chamber, the evaporation material is recharged, and the evaporation source is reassembled in the evaporation chamber .

However, since the charging method according to the related art is performed by a human force, it takes a long time to charge the evaporation material, thereby increasing the overall process time.

In the vacuum thermal deposition method according to the related art, since the deposition process is performed for one substrate in one chamber, the deposition process for the substrate is interrupted during the substrate transfer process and the shadow mask align process, time is increased.

In addition, there is a problem that the evaporation material is constantly being sublimated in the crucible even during the transferring process of the substrate and the shadow mask aligning process, and the evaporation material is lost.

Korean Patent Registration No. 10-0965416 (published on June 25, 2010)

The present invention provides an evaporation source unit and a deposition apparatus that can reduce the charging time when the evaporation material is refilled with the evaporation material.

The present invention also provides a method of manufacturing a semiconductor device, which is capable of performing a deposition process on a plurality of substrates in one chamber, and performing a transfer process or an align process with respect to another substrate during a deposition process of one substrate to reduce a tact time And an evaporation source unit and a deposition apparatus that can reduce the loss of evaporation material generated during the transferring process or the aligning process with respect to the substrate.

According to an aspect of the present invention, there is provided an evaporation source unit disposed in a deposition chamber and performing deposition on a substrate, the evaporation source unit comprising: A tubular heating part which is located in the lower case and ascends and descends; A lower part coupled to the upper end of the lower case in a lateral direction and guiding a linear movement; An upper case which is opened at a lower end and which is mounted on the rail portion and is combined with or separated from the lower case as it moves along the rail portion; And a crucible which is located in the upper case and draws in and out of the heating unit when the heating unit is lifted or lowered.

A door may be provided on one side of the deposition chamber. In this case, the upper case having the crucible may be pulled out into the door as the rail moves linearly along the rail.

The evaporation source unit includes: a conveyance guide disposed in the upper case in the lower case; And a support table which is moved up and down along the transport guide and on which the heating unit is mounted.

The rail portion includes a first rail coupled laterally to an upper end of the lower case; A second rail slidable along a longitudinal direction of the first rail; And a third rail coupled to a lower end of the upper case and slidable along a longitudinal direction of the second rail.

The evaporation source unit may further include a transfer tube coupled to an upper end of the crucible and a nozzle unit including a diffusion tube coupled to the transfer tube in a lateral direction and having a plurality of injection nozzles formed along the longitudinal direction, .

According to another aspect of the present invention, there is provided a deposition apparatus including: a deposition chamber in which a substrate is drawn out; A substrate loading unit positioned in the deposition chamber and on which the substrate is placed; An evaporation source unit arranged to face the substrate and ejecting evaporation particles toward the substrate; And source moving means for moving the evaporation source unit along the surface of the substrate on which the evaporation source unit is mounted.

A door may be provided on one side of the deposition chamber. In this case, the upper case having the crucible may be pulled out to the door as the rail moves linearly along the rail.

According to another aspect of the present invention, there is provided a plasma processing apparatus comprising: a plasma processing chamber in which a first substrate is divided into a first deposition region and a second deposition region, A deposition chamber in which a second substrate is radially introduced into and out of the second deposition region; A first substrate loading part for loading and seating the first substrate in the first radiation direction; A second substrate loading portion on which the second substrate is loaded and seated in the second radiation direction; The evaporation source unit including a linear nozzle portion for linearly spraying evaporation particles; and an evaporation source unit on which the evaporation source unit is mounted and on which the evaporation source unit is mounted so that evaporation particles are sprayed onto the surface of the first substrate or the second substrate. And a rotating means for rotating the source moving means such that the linear nozzle unit is parallel to one side of the first substrate or the second substrate, scanner; And scanner moving means for reciprocating the scanner such that the scanner is located in the first deposition region or the second deposition region.

Wherein the scanner moving means includes a pair of scanner guide portions arranged in parallel with each other across the first deposition region and the second deposition region and the source moving means moves the substrate A support frame disposed parallel to the support frame; And a source guide portion disposed in the support frame in the longitudinal direction so that the evaporation source unit is mounted and moved in the longitudinal direction of the support frame.

The rotation unit includes a rotation guide unit coupled to any one of the pair of scanner guide units and guiding rotation of the support frame; And a rotating unit coupled to the other one of the pair of scanner guide units and rotatably coupled to the supporting frame.

A door may be provided at one side of the deposition chamber. In this case, the scanner is moved by the scanner moving means so as to face the door, and after the evaporation source unit approaches the door by the source moving means, And the upper case having the crucible can be pulled out into the door as it moves linearly along the rail portion.

The evaporation source unit and the evaporation apparatus according to the embodiment of the present invention can reduce the charging time when the evaporation material is refilled with evaporation material.

Further, it is possible to perform a deposition process for a plurality of substrates in one chamber, reduce the tact time by carrying out a transfer process or an align process for another substrate during a deposition process of one substrate, It is possible to reduce the loss of the organic material occurring during the transferring process or the aligning process.

1 is a perspective view for explaining a configuration of an evaporation source unit according to an embodiment of the present invention;
FIG. 2 and FIG. 3 are views for explaining a process of operating the evaporation source unit according to an embodiment of the present invention; FIG.
4 is a view for explaining a configuration of a deposition apparatus according to another embodiment of the present invention.
5 is a use state diagram of a deposition apparatus according to another embodiment of the present invention.
6 is a view for explaining a deposition apparatus according to another embodiment of the present invention.
7 is a view for explaining a scanner and a scanner moving means of a deposition apparatus according to another embodiment of the present invention.
8 is a use state diagram of a deposition apparatus according to another embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The present invention is capable of various modifications and various embodiments, and specific embodiments are illustrated in the drawings and described in detail in the detailed description. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

Hereinafter, an evaporation source unit and a deposition apparatus according to the present invention will be described in detail with reference to the accompanying drawings. Referring to the accompanying drawings, the same or corresponding components are denoted by the same reference numerals, Is omitted.

FIG. 1 is a perspective view for explaining a configuration of an evaporation source unit according to an embodiment of the present invention, and FIGS. 2 and 3 are views for explaining an operation process of an evaporation source unit according to an embodiment of the present invention.

1 to 3 show an evaporation source unit 10, a lower case 12, a heating unit 14, a support 16, a conveyance guide 18, a rail 20, a first rail 22, The second rail 24, the third rail 26, the upper case 28, the nozzle unit 30, the transfer pipe 32, the diffusion pipe 34, the injection nozzle 36 and the crucible 38 are shown have.

The evaporation source unit 10 according to the present embodiment includes an evaporation source unit 10 disposed in a deposition chamber and performing evaporation on a substrate, the evaporation source unit 10 having a lower case 12 with an open upper end; A tubular heating part 14 located in the lower case 12 and lifting and lowering; A rail part 20 transversely coupled to an upper end of the lower case 12 and guiding linear movement; An upper case 28 mounted on the rail part 20 and joined or separated with the lower case 12 as it moves along the rail part 20; And a crucible 38 which is positioned in the upper case 28 and is drawn into and out of the heating unit 14 as the heating unit 14 is lifted or lowered.

The evaporation source unit 10 according to the present embodiment can reduce the charging time when the evaporation source unit 10 is refilled with the evaporation material.

When the upper case 28 and the lower case 12 are combined with each other, evaporation particles can be prevented from being parasitically deposited on the respective constituents disposed inside the upper case 28 and the lower case 12 during the deposition process.

The lower case 12 has an open upper end and the upper case 28 has a lower end opened. The lower case 12 and the upper case 28 are combined to form a single case, The evaporation particles are prevented from being parasitically deposited on the crucible 38, the heating part 14, and the like.

The lower case 12 and the upper case 28 may be formed in a box shape, or may be formed by forming a frame and joining the panels to the outside of the frame.

The tubular heating portion 14 is located in the lower case 12 and is lifted up and down. The crucible 38 is drawn in or drawn out into the tubular heating portion 14 as the heating portion 14 is lifted or lowered. That is, when the tubular heating portion 14 rises, the crucible 38 located at the upper end thereof is inserted into the heating portion 14, and when the heating portion 14 is lowered, the crucible 38 is heated (14).

The rail portion 20 is laterally coupled to the upper end of the lower case 12 and guides the linear movement of the upper case 28. The upper case 28 is mounted on the rail part 20 and the upper case 28 and the lower case 12 are combined or separated as the upper case 28 moves with respect to the lower case 12. [ That is, when the upper case 28 moves to the upper end of the lower case 12 along the rail part 20, the upper case 28 and the lower case 12 are combined together, When separated, they are separated from each other.

The rail portion 20 according to the present embodiment has a multi-stage structure for stably supporting the upper case 28 and securing a moving distance of the upper case 28. [ A second rail 24 slidable along the longitudinal direction of the first rail 22 and a second rail 22 slidable along the longitudinal direction of the first rail 22. The first rail 22 is coupled to the upper end of the lower case 12 in a lateral direction, And a third rail 26 coupled to the lower end of the second rail 24 and sliding along the longitudinal direction of the second rail 24.

The lower case of the upper case 28 is opened and mounted on the rail part 20 and moved or separated by the lower part 12 as the rail part 20 moves. When the upper case 28 moves to the upper end of the lower case 12 along the rail portion 20 as described above, the upper case 28 is joined to the lower case 12 along the rail portion 20, (12).

The lower case 12 and the upper case 28 are separated as the rail 20 composed of the first rail 22, the second rail 24 and the third rail 26 is extended And the lower case 12 and the upper case 28 are combined as the rail 20 is reduced.

The crucible 38 is located in the upper case 28 and is drawn into or drawn out from the heating section 14 as the heating section 14 is raised or lowered. The crucible 38 can be attached to and detached from the upper case 28 so that the crucible 38 is separated from the upper case 28 to fill the evaporation material when the evaporation material in the furnace 38 is exhausted, The crucible 38 may be coupled to the upper case 28 again.

As described above, when the tubular heating portion 14 of the lower case 12 is raised after the upper case 28 and the lower case 12 are combined, the crucible 38 is heated in the heating portion 14 When the heating unit 14 is lowered, the crucible 38 is drawn out from the heating unit 14.

The evaporation source unit 10 according to the present embodiment for lifting and lowering the heating section 14 includes a conveyance guide 18 arranged in the vertical direction in the lower case 12, And a support 16 on which the heating unit 14 is mounted.

A conveying guide 18 is disposed in the vertical direction inside the lower case 12 and a support table 16 on which the heating unit 14 is mounted is coupled to the conveying guide 18, And is lifted up and down by the guide 18. As the support table 16 is lifted and lowered by the conveyance guide 18, the tubular heating section 14 mounted on the support table 16 is lifted and lowered so that the crucible 38 is drawn into or withdrawn from the heating section 14 do.

The evaporation source unit 10 according to the present embodiment includes a conveyance pipe 32 coupled to an upper end of a crucible 38 and a conveyance pipe 32 coupled to the conveyance pipe 32 in a lateral direction, And a nozzle portion 30 having a diffusion tube 34 in which a plurality of injection nozzles 36 are formed along the direction of the nozzle.

The transfer pipe 32 is connected to the upper end of the crucible 38 so that the lower end thereof is communicated with the crucible 38 and the diffusion pipe 34 is connected to the upper end of the transfer pipe 32 in the lateral direction Lt; / RTI > The transfer tube 32 and the diffusion tube 34 coupled to each other have a substantially T shape.

The transfer tube 32 is in the form of a tube and the lower end thereof is connected to be connected to the open upper end of the crucible 38. The evaporated particles that are evaporated and ejected from the crucible 38 in accordance with the heating of the heating unit 14 Is guided to the diffusion pipe (34) through the transfer pipe (32).

The diffusion tube 34 is in the shape of a tube with both ends closed and the injection nozzle 36 is formed at the upper end of the diffusion tube 34 in the longitudinal direction of the diffusion tube 34.

The injection nozzle 36 may be formed in a shape in which a plurality of nozzle holes are spaced apart in the longitudinal direction of the diffusion tube 34 or in the form of a long slit formed in the longitudinal direction of the diffusion tube 34. In this embodiment, a plurality of nozzle holes are formed along the longitudinal direction of the diffusion tube 34 as the injection nozzle 36.

The evaporation particles ejected from the crucible 38 are transferred to the diffusion tube 34 through the transfer tube 32 and evaporated through the injection nozzle 36 arranged linearly while the evaporation particles are diffused along the diffusion tube 34 The particles are ejected linearly.

The evaporation source unit 10 in which the evaporation particles are linearly ejected is moved along the surface of the substrate to perform the deposition on the entire substrate.

Referring to FIGS. 2 and 3, the operation of the evaporation source unit 10 according to the present embodiment will be described. When the upper case 28 moves along the rail portion 20 and the lower case 12 is incorporated, The heating unit 14 rises and the crucible 38 is drawn into the heating unit 14 while the support table 16 is lifted by the conveyance guide 18 as shown in Fig. When the crucible 38 is heated by the heating unit 14 in this state, the evaporation material in the crucible 38 is evaporated and the evaporation particles are ejected toward the substrate through the nozzle unit 30. [

3, when the evaporation material in the crucible 38 is exhausted or the crucible 38 is to be separated for maintenance of the evaporation source unit 10, To lower the crucible 38 and the heating unit 14. [ Next, the upper case 28 is moved along the rail part 20 so that the upper case 28 is separated from the lower case 12, and the crucible 38 is separated from the lower end of the upper case 28, Or the crucible 38 is maintained.

FIG. 4 is a view for explaining a configuration of a deposition apparatus according to another embodiment of the present invention, and FIG. 5 is a use state diagram of a deposition apparatus according to another embodiment of the present invention.

4 and 5 show an evaporation source unit 10, a substrate 11, a lower case 12, a rail part 20, an upper case 28, a deposition chamber 40, a substrate loading part 42, The moving means 44, and the door 46 are shown.

The deposition apparatus according to the present embodiment includes a deposition chamber 40 in which a substrate 11 is drawn out and in, a substrate loading section 42 in which the substrate 11 is placed and which is located in the deposition chamber 40, And a source moving means (not shown) for moving the evaporation source unit 10 along the surface of the substrate 11, wherein the evaporation source unit 10 is mounted on the evaporation source unit 10, 44).

The deposition chamber 40 can be maintained in a vacuum state by a vacuum pump, in which evaporation particles are deposited with respect to the substrate 11 within the deposition chamber 40. It is also possible that the interior is kept at atmospheric pressure when evaporation particles are deposited at atmospheric pressure.

The substrate loading section 42 is loaded with the substrate 11 on the outside of the deposition chamber 40. The substrate loading section 42 is located at the top in the deposition chamber 40 and the substrate 11 is placed on the substrate 11 so that the evaporation particles in the evaporation source unit 10 can be injected upward and deposited on the substrate 11. [ And is attached to the lower portion of the loading section 42.

When the substrate 11 is loaded on the substrate loading section 42 and is loaded thereon, a shadow mask is disposed on the surface of the substrate 11 in the substrate loading section 42, and the substrate 11 and the shadow mask are aligned with each other have.

The evaporation source unit 10 is mounted on the source moving means 44 and the source moving means 44 moves the evaporation source unit 10 along the surface of the substrate 11. The source moving means 44 is located at the lower end of the deposition chamber 40 so as to face the substrate 11 and moves the evaporation source unit 10 in the direction of the other side in the one side of the substrate 11. During the movement of the evaporation source unit 10, evaporated particles are ejected from the evaporation source unit 10 to evaporate evaporation particles to the entire substrate 11.

The source moving means 44 may include a linear motor (LM) guide for guiding linear movement.

The door 46 may be provided on one side of the deposition chamber 40. The upper case 28 having the crucible with the door 46 opened linearly along the rail 20, 46, respectively.

5, a door 46 is provided opposite to the end of the source moving means 44, and the evaporation source unit 10 opens the door 46 with the source moving means 44 being moved to the end , The upper case 28 can be moved along the rail portion 20 and drawn out to the outside of the door 46.

It is necessary to separate the crucible for the maintenance of the evaporation source unit 10. Referring to FIG. 5, first, the evaporation source unit 10 is moved to the source moving means 44, So as to be positioned close to the door 46, and the heating unit is lowered to separate the crucible and the heating unit. Next, the upper case 28 is moved along the rail portion 20 so that the door 46 is opened and the upper case 28 is separated from the lower case 12, And is drawn out to the outside of the deposition chamber 40. Next, the crucible is separated from the lower end of the upper case 28 to charge the evaporation material or to fix the crucible. The crucible is coupled to the upper case 28 and the upper case 28 is moved along the rail portion 20 through the door 46 to move the lower case 12, . Subsequently, the coalesced evaporation source unit 10 is moved along the source moving means 44 to perform deposition on the substrate 11.

FIG. 6 is a view for explaining a deposition apparatus according to another embodiment of the present invention, and FIG. 7 is a view for explaining a scanner and a scanner moving means of a deposition apparatus according to another embodiment of the present invention. 8 is a use state diagram of a deposition apparatus according to another embodiment of the present invention.

6 to 8 show an evaporation source unit 10, a lower case 12, a rail part 20, an upper case 28, a heating part 14, a nozzle part 30, a deposition chamber 40, A first substrate 52, a first substrate 54, a second substrate 56, a second substrate 58, a first deposition area 46, a center point 48, a robot arm 50, a first radiation direction 52, a second radiation direction 54, The second substrate loading unit 70, the scanner 72, the scanner moving means 70, the first substrate loading unit 70, the second deposition area 62, the source moving unit 64, the rotating unit 66, the first substrate loading unit 68, The guide frame 82 and the LM guides 84, 94, and 98, the moving blocks 86 and 96, the rotation guide portion 88, the rotation portion 90, A scanner guide portion 92, a supporting portion 102, a rotating shaft 104, and a boss 106 (boss) are shown.

In this embodiment, the deposition apparatus is divided into a first deposition region 60 and a second deposition region 62, and the first substrate 56 in the first radiation direction 52 at one central point 48 And a deposition chamber 40 in which the second substrate 58 is drawn into and out of the first deposition region 60 and the second substrate 58 in the second radiation direction 54 from the center point 48, Wow; A first substrate loading portion (68) on which the first substrate (56) is loaded and seated in the first radiation direction (52); A second substrate loading portion (70) on which the second substrate (58) is loaded and seated in the second radiation direction (54); The evaporation source unit 10 according to the embodiment including the linear nozzle unit 30 for linearly spraying the evaporation particles and the evaporation source unit 10 on which the evaporation source unit 10 is mounted and the first substrate 56 or the second A source moving means 64 for linearly moving the evaporation source unit 10 along the surface of the first substrate 56 or the second substrate 58 so that evaporation particles are sprayed onto the surface of the substrate 58, And a rotating means (66) for rotating the source moving means (64) so that the linear nozzle portion (30) is parallel to the first substrate (56) or one side of the second substrate (58) a scanner; And scanner moving means 74 for reciprocating the scanner 72 such that the scanner 72 is located in the first deposition region 60 or the second deposition region 62.

In the deposition apparatus according to the present embodiment, a deposition process is performed on a plurality of substrates in one chamber, and a transfer process or an alignment process is performed on another substrate during a deposition process of one substrate, ) Can be reduced, and the loss of evaporation material occurring during the transferring process or the alignment process with respect to the substrate can be reduced.

Further, the charging time can be reduced when the evaporation source unit 10 is refilled with the evaporation material.

The deposition chamber 40 is partitioned into a first deposition region 60 and a second deposition region 62 and the first substrate 56 in a first radiation direction 52 at one central point 48 is divided into a first deposition region 60, And the second substrate 58 is drawn into and out of the second deposition area 62 at the center point 48 and in the second radiation direction 54. [

The deposition chamber 40 has a plurality of deposition areas 40 so that the deposition can be performed on a plurality of substrates in one deposition chamber 40 where evaporation particles are deposited on the substrate within the deposition chamber 40. [ (60, 62).

The deposition regions 60 and 62 refer to a virtual space in which evaporation particles can be deposited on one substrate in accordance with the movement of the evaporation source unit 10. Referring to Figure 6, The deposition chamber 40 can be partitioned into the first deposition region 60 and the second deposition region 62 by the center line of the deposition chamber 40 indicated by the chain line. Evaporation particles are deposited on the first substrate 56 in the first deposition region 60 and evaporation particles are deposited on the second substrate 58 in the second deposition region 62 adjacent to the first deposition region 60. [ Is deposited.

The first substrate 56 is drawn or drawn into the first deposition region 60 of the deposition chamber 40 at one central point 48 in the first radiation direction 52 and the second substrate 58 is moved (62) of the deposition chamber (40) in the second radial direction (54) from the first deposition direction (48). That is, the first substrate 56 and the second substrate 58 are drawn or drawn in the deposition chamber 40 with a predetermined inclination.

In a cluster type deposition system, a substrate can be drawn into or drawn out of the deposition chamber 40 by a robot arm 50 provided in a transfer chamber connected to the deposition chamber 40, The substrate is drawn out into the deposition chamber 40 at a predetermined inclination since the substrate is drawn into the deposition chamber 40 in the radial direction at the rotation center of the deposition chamber 40.

Therefore, when the first substrate 56 and the second substrate 58 are drawn into and out of the deposition chamber 40 by the robot arm 50, the rotation center of the robot arm 50 constituting the center point 48 The first substrate 56 is drawn into and out of the deposition chamber 40 in the first radiation direction 52 relative to the center of rotation of the robot arm 50 constituting the center point 48 And may be drawn into the deposition chamber 40 in a second radiation direction 54 different from the first radiation direction 52.

The first substrate 56 and the second substrate 58 are not limited to being drawn and received by the robot arm 50 into the deposition chamber 40. The first substrate 56 and the second substrate 58 may be provided in the deposition chamber 40, The deposition apparatus according to the present embodiment can be applied to the case where the second substrate 58 is pulled in and out with mutual inclination. For example, when the first substrate 56 and the second substrate 58 are drawn into and out of the deposition chamber 40 by the two robot arms 50, the rotation center of the robot arm 50 is moved to the above- The center point 48 constitutes a point at which two imaginary sloping lines formed by the inclined directions of the first substrate 56 and the second substrate 58 meet.

The first substrate loading portion 68 and the second substrate loading portion 70 are loaded with a first substrate 56 and a second substrate 58, respectively. The first substrate loading unit 68 and the second substrate loading unit 70 are provided on the lower surfaces of the first substrate loading unit 68 and the second substrate loading unit 70 so that the evaporation particles are injected upward in the evaporation source unit 10, The upper surface of the substrate 56 and the upper surface of the second substrate 58 are respectively attached.

When the first substrate 56 and the second substrate 58 are loaded and placed on the first substrate loading part 68 and the second substrate loading part 70, the shadow mask is placed on the surface of the substrate in each substrate loading part And the substrate and the shadow mask 36 can be aligned with each other.

The scanner 72 includes an evaporation source unit 10 including a linear nozzle unit 30 for linearly ejecting evaporation particles and a second substrate 56 on which the evaporation source unit 10 is mounted, Source moving means 64 for linearly moving the evaporation source unit 10 along the surface of the first substrate 56 or the second substrate 58 so that evaporation particles are sprayed onto the surface of the second substrate 58; And a rotating means 66 for rotating the source moving means 64 such that the linear nozzle unit 30 is parallel to one side of the first substrate 56 or the second substrate 58.

The scanner 72 linearly reciprocates the evaporation source unit 10 along the surface of the substrate so that the evaporation particles ejected from the evaporation source unit 10 are deposited on the surface of the substrate.

The evaporation source unit 10 including the linear nozzle unit 30 ejects evaporation particles onto the surfaces of the first substrate 56 or the second substrate 58. [ The evaporation source unit 10 linearly moves in a direction opposite to the one side of the substrate and evaporates the evaporation particles on the substrate. The evaporation source unit 10 has a linear nozzle unit 30 corresponding to the width of the substrate.

The linear nozzle unit 30 according to the present embodiment includes a conveyance pipe coupled to an upper end of a crucible, a diffusion pipe connected to the conveyance pipe in a lateral direction and having a plurality of injection nozzles formed along the longitudinal direction, To eject the evaporated particles linearly.

In this embodiment, the diffusion tube of the nozzle unit 30 is arranged so as to be in parallel with the first substrate 56 or one side of the second substrate 58.

The source moving means 64 moves the evaporation source unit 10 to the surface of the first substrate 56 or the second substrate 58 so that evaporation particles are sprayed onto the surfaces of the first substrate 56 or the second substrate 58. [ As shown in FIG. As described above, since the evaporation source unit 10 linearly moves in the direction of the opposite side facing the one side of the substrate to vaporize the evaporation particles on the substrate, the evaporation source unit 10 is linearly moved using the source moving means 64 .

The scanner moving means 74 reciprocates the scanner 72 such that the scanner 72 is located in the first deposition region 60 or the second deposition region 62. When the deposition on the first substrate 56 is completed, the deposition of the second substrate 58 should be performed. The scanner moving means 74 moves the scanner 72, which has completed the deposition process in the first deposition region 60, To the second deposition region (62). The scanner moving means 74 reciprocates between the first deposition region 60 and the second deposition region 62 to allow the scanner 72 to perform the deposition process on the substrate placed in each deposition region. In this embodiment, the scanner moving means 74 is configured so that the scanner 72 can linearly reciprocate between the first deposition region 60 and the second deposition region 62.

7 shows the scanner 72 and the scanner moving means 74 of the deposition apparatus according to the present embodiment and the scanner moving means 74 moves the first deposition region 60 and the second deposition region 62 And a pair of scanner guide portions 92 disposed in parallel with each other.

The source moving means 64 includes a support frame 80 disposed parallel to the substrate as the rotation means 66 rotates and a support frame 80 on which the evaporation source unit 10 is mounted, And a source guide portion 82 arranged in the longitudinal direction of the support frame 80 so as to move in the direction of the arrow.

The source guide portion 82 includes a moving block 86 which moves along the LM guide 84 and the LM guide 84 disposed in the longitudinal direction of the support frame 80 and to which the evaporation source unit 10 is coupled . The moving block 86 moves along the LM guide 84 to move the evaporation source unit 10 along the supporting frame 80 in the longitudinal direction.

The rotation means 66 includes a rotation guide portion 88 coupled to any one of the pair of scanner guide portions 92 and guiding the rotation of the support frame 80 and a pair of scanner guide portions 92 And a pivot portion 90 to which the support frame 80 is rotatably coupled.

7, a pair of scanner guide portions 92 are arranged in parallel with each other across the first deposition region 60 and the second deposition region 62 at the upper and lower ends of the deposition chamber 40, (80) is coupled to the scanner guide portion (92) so that both ends thereof are respectively supported by the pair of scanner guide portions (92). A rotation guide portion 88 is interposed between the lower scanner guide portion 92 and the support frame 80 and the upper scanner guide portion 92 and the support frame 80, A rotary unit 90 to which the support frame 80 is rotatably engaged is coupled.

In this embodiment, a normal LM (Linear Motor) guide is used as the source guide portion 82 and the scanner guide portion 92. [

6 and 7, the scanner 72 includes a LM guide 94 (see FIG. 6) disposed at the upper and lower ends of the deposition chamber 40, To the first deposition region 60 on the right side from the second deposition region 62 on the left side. When the scanner 72 reaches the first deposition area 60 and reaches the predetermined position, the movement block 96 of the lower LM guide 94 is stopped to stop the movement of the lower end of the support frame 80 When the upper end portion of the support frame 80 continues to be moved while the movement block 96 of the upper LM guide 94 continues to be moved, the lower end of the support frame 80 is guided by the rotation guide portion 88, And the support frame 80 can be rotated so as to have an inclination.

The first substrate 56 is loaded on the first substrate loading portion 68 with a tilt in the deposition chamber 40 in the first radiation direction 52 and the first substrate 56 is mounted on the first substrate loading portion 68, The evaporation source unit 10 is linearly moved in the direction of the first substrate 56 by the source moving means 64 in the state in which the rotating means 66 rotates the source moving means 64 so that the longitudinal direction of the evaporation source unit 30 is parallel to the longitudinal direction of the first substrate 56, And evaporated particles are deposited on the surface of the first substrate 56.

The rotary part 90 includes a pair of LM guides 98 extending vertically in the LM guide 94 of the upper scanner guide part 92 and a pair of LM guides 98 And a boss 106 (boss) extending vertically in the support portion 102. The boss 106 may be a boss, A rotating shaft 104 protrudes from the support frame 80 and is inserted into the boss 106. The rotation shaft 104 is rotated in the boss 106 in accordance with the movement of the upper end of the support frame 80. The stop position of the lower end of the support frame 80 and the movement position of the upper end of the support frame 80 can be determined according to the inclination of the substrate.

It is necessary to remove the evaporation material in the crucible or to separate the crucible for maintenance of the evaporation source unit 10. Referring to FIG. 8, this process will be described with reference to FIG.

First, the scanner 72 is moved by the scanner moving means 74 so as to face the door 46. The scanner 72 is moved along the scanner guide portion 92 so that the evaporation source unit 10 of the scanner 72 is opposed to the door 46. [ Next, the evaporation source unit 10 is moved by the source moving means 74 to come close to the door 46. Next, the heating portion in the lower case is lowered to separate the crucible and the heating portion. Next, the upper case 28 is moved along the rail portion 20 so that the door 46 is opened and the upper case 28 is separated from the lower case 12, And is drawn out to the outside of the deposition chamber 40. Next, the crucible is separated from the lower end of the upper case 28 to charge the evaporation material or to fix the crucible. The crucible is coupled to the upper case 28 and the upper case 28 is moved along the rail portion 20 through the door 46 to move the lower case 12, . Subsequently, the coalesced evaporation source unit 10 is moved along the source moving means 44 to perform deposition on the substrate 11.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as set forth in the following claims It will be understood that the invention may be modified and varied without departing from the scope of the invention.

Many embodiments other than the above-described embodiments are within the scope of the claims of the present invention.

10: evaporation source unit 12: lower case
14: heating section 16:
18: transport guide 20: rail part
22: first rail 24: second rail
26: third rail 28: upper case
30: nozzle unit 32: conveying pipe
34: diffusion tube 36: injection nozzle
38: crucible 40: deposition chamber
42, 68, 70: substrate loading section 44: source moving means
46: Door 48: Center point
50: robot arm 52: first radiation direction
54: second radiation direction 11, 56, 58:
60: first deposition area 62: second deposition area
64: source moving means 66: rotating means
72: scanner 74: scanner moving means
80: Support frame 82: Source guide part
84, 94, 98: LM guides 86, 96, 100: Moving block
88: rotation guide portion 90:
92: scanner guide portion 102: support portion
104: rotating shaft 106: boss

Claims (11)

An evaporation source unit disposed in the deposition chamber to perform deposition on the substrate,
A lower case having an upper opening;
A tubular heating part which is located in the lower case and ascends and descends;
A lower part coupled to the upper end of the lower case in a lateral direction and guiding a linear movement;
An upper case which is opened at a lower end and which is mounted on the rail portion and is combined with or separated from the lower case as it moves along the rail portion;
And a crucible which is located in the upper case and which is pulled into and out of the heating unit when the heating unit is lifted or lowered.
The method according to claim 1,
A door is provided at one side of the deposition chamber,
And the upper case having the crucible is pulled out into the door as it moves linearly along the rail portion.
The method according to claim 1,
A conveyance guide disposed in the upper case in the lower case;
Further comprising a support table which is moved up and down along the conveyance guide and on which the heating section is mounted.
The method according to claim 1,
The rail portion
A first rail transversely coupled to an upper end of the lower case;
A second rail slidable along a longitudinal direction of the first rail;
And a third rail coupled to a lower end of the upper case and slidable along a longitudinal direction of the second rail.
The method according to claim 1,
And a nozzle unit including a transfer tube coupled to an upper end of the crucible and a diffusion tube coupled to the transfer tube in a lateral direction so as to communicate with the transfer tube and having a plurality of injection nozzles formed along the longitudinal direction, .
A deposition chamber in which a substrate is drawn out;
A substrate loading unit positioned in the deposition chamber and on which the substrate is placed; The evaporation source unit according to any one of claims 1 to 5, which is arranged to face the substrate and ejects evaporation particles toward the substrate;
And source moving means for moving the evaporation source unit along the surface of the substrate on which the evaporation source unit is mounted.
The method according to claim 6,
A door is provided on one side of the deposition chamber,
And the upper case having the crucible is pulled out into the door as it moves linearly along the rail portion.
Wherein the first substrate is divided into a first deposition region and a second deposition region and the first substrate is drawn into and out of the first deposition region in a first radial direction from one central point, 2 evaporation chamber;
A first substrate loading part for loading and seating the first substrate in the first radiation direction;
A second substrate loading portion on which the second substrate is loaded and seated in the second radiation direction;
The evaporation source unit according to any one of claims 1 to 5, comprising a linear nozzle portion for linearly spraying the evaporation particles, and a second evaporation source unit on which the evaporation source unit is mounted, A source moving means for linearly moving the evaporation source unit along the surface of the first substrate or the second substrate so as to cause the linear nozzle to be parallel to the one side of the first substrate or the second substrate, A scanner including a rotating means for rotating the moving means;
And scanner moving means for reciprocating the scanner such that the scanner is located in the first deposition region or the second deposition region.
9. The method of claim 8,
Wherein the scanner moving means comprises:
And a pair of scanner guide portions disposed in parallel with each other across the first deposition region and the second deposition region,
Wherein said source moving means comprises:
A support frame disposed parallel to the substrate as the rotating means rotates;
And a source guide portion disposed in the support frame in the longitudinal direction so that the evaporation source unit is mounted and moved in the longitudinal direction of the support frame.
10. The method of claim 9,
Wherein,
A rotation guide part coupled to any one of the pair of scanner guide parts and guiding rotation of the support frame;
And a rotating unit coupled to the other one of the pair of scanner guide units and rotatably coupled to the supporting frame.
9. The method of claim 8,
A door is provided on one side of the deposition chamber,
The scanner is moved by the scanner moving means so as to face the door and the evaporation source unit moves closer to the door by the source moving means and moves linearly along the rail portion so that the upper case including the crucible And the substrate is drawn out into the door.

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