CN108330438B - OLED evaporation coating device and system - Google Patents

OLED evaporation coating device and system Download PDF

Info

Publication number
CN108330438B
CN108330438B CN201810226892.5A CN201810226892A CN108330438B CN 108330438 B CN108330438 B CN 108330438B CN 201810226892 A CN201810226892 A CN 201810226892A CN 108330438 B CN108330438 B CN 108330438B
Authority
CN
China
Prior art keywords
chamber
evaporated
vapor deposition
evaporation coating
coating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201810226892.5A
Other languages
Chinese (zh)
Other versions
CN108330438A (en
Inventor
焦浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan Guoxian Photoelectric Co Ltd
Original Assignee
Kunshan Guoxian Photoelectric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan Guoxian Photoelectric Co Ltd filed Critical Kunshan Guoxian Photoelectric Co Ltd
Priority to CN201810226892.5A priority Critical patent/CN108330438B/en
Publication of CN108330438A publication Critical patent/CN108330438A/en
Application granted granted Critical
Publication of CN108330438B publication Critical patent/CN108330438B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The present invention relates to a kind of OLED evaporation coating device and system, OLED evaporation coating device is electrically connected with control device.OLED evaporation coating device includes cavity and is set to two or more intracorporal evaporated devices of the chamber.Two or more are equipped in cavity can accommodate the chamber of evaporated device, and each chamber respectively corresponds the vapor deposition process different stage, and each evaporated device completes that process once is deposited after all chambers.It further include mobile mechanism in cavity.Control device is used to control different evaporated devices by mobile mechanism while entering different chambers, and controls each evaporated device circulation and execute the movement for sequentially entering each chamber.The OLED evaporation coating device and system allow multiple evaporated devices to run simultaneously, so that after the organic material being currently in the evaporated device of evaporation state exhausts, the next evaporated device of replacement can be automatically continued to be deposited, to improve the efficiency of OLED mass production.

Description

OLED evaporation coating device and system
Technical field
The present invention relates to display screen technology fields, more particularly to a kind of OLED evaporation coating device and system.
Background technique
Organic luminous layer in OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) display screen When being prepared, vacuum evaporation technology is generallyd use, i.e., in vacuum chamber, is vapor-deposited with by heating heating source to glass substrate Machine material, and film thickness is controlled using crystal oscillator.Glass substrate is placed on sample carrier, the FMM (Fine placed below Metal Mask, high-precision metal mask plate) control vapor deposition pattern.
However, in traditional evaporation process, because of the limited volume of crucible, needs to be deposited after vapor deposition 144 hours and set It is standby to begin to speak, along with replacement crystal oscillator, more changeable liner, heating etc., to need extra consumption 48 hours to add organic material into crucible, Can just continue that process is deposited next time, it is lower so as to cause the efficiency of mass production.
Summary of the invention
Based on this, it is necessary to for the lower problem of the efficiency of traditional OLED mass production, provide a kind of OLED vapor deposition Apparatus and system.
A kind of OLED evaporation coating device, is electrically connected with control device;The OLED evaporation coating device includes cavity and is set to institute State two or more intracorporal evaporated devices of chamber;Two or more are equipped in the cavity can accommodate the vapor deposition The chamber of equipment, each chamber respectively corresponds the vapor deposition process different stage, and each evaporated device passes through all institutes Primary vapor deposition process is completed after stating chamber;It further include mobile mechanism in the cavity;The control device is for passing through the shifting The different evaporated device of dynamic mechanism controls enters the different chambers simultaneously, and controls each evaporated device circulation and hold Row sequentially enters the movement of each chamber.
It in one of the embodiments, include the vapor deposition for being deposited for the evaporated device in all chambers Chamber.
It in one of the embodiments, further include for replacing organic material in the evaporated device in all chambers The charging chamber of material.
It in one of the embodiments, further include heating chamber in all chambers;The heating chamber is located at described It feeds between the outlet of chamber and the entrance of the vapor deposition chamber;The control device is used to control adding in the evaporated device Heat source heats up in the heating chamber.
It in one of the embodiments, further include cooling chamber in all chambers;The cooling chamber is located at described It is deposited between the outlet of chamber and the entrance of the charging chamber;The control device is used to control adding in the evaporated device Heat source cools down in the cooling chamber.
The adjacent two chamber connections in one of the embodiments,.
It is separated between two adjacent chambers by door body assembly in one of the embodiments,.
The door body assembly includes slide valve in one of the embodiments,.
In one of the embodiments, between organic material and high-precision metal mask plate in the evaporated device Position be equipped with baffle plate assembly;The baffle plate assembly is used to be opened so that organic material can be deposited to glass base in vapor deposition On plate, and it is closed so that the organic material for continuing to evaporate after the completion of vapor deposition is deposited to the baffle group after the completion of vapor deposition On part.
A kind of OLED deposition system, including control device and the OLED evaporation coating device.
Multiple chambers corresponding with vapor deposition process different phase are equipped in above-mentioned OLED evaporation coating device and system, in cavity, And different evaporated devices under control of the control means, can be made while entering different chambers, and control each vapor deposition Equipment circulation executes the movement for sequentially entering each chamber, therefore the OLED evaporation coating device and system allow multiple evaporated devices It runs simultaneously, such as while one of evaporated device is deposited in a chamber, can control another vapor deposition and set The standby more conversion materials in another chamber, so that the organic material consumption being currently in the evaporated device of evaporation state After to the greatest extent, the next evaporated device of replacement can be automatically continued and be deposited, to improve the efficiency of OLED mass production.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with The attached drawing of other embodiments is obtained according to these attached drawings.
Fig. 1 is the structural schematic diagram for the OLED evaporation coating device that an embodiment provides;
Fig. 2 is the circuit block diagram of dependency structure and control device in the OLED evaporation coating device of Fig. 1 illustrated embodiment.
Specific embodiment
To facilitate the understanding of the present invention, a more comprehensive description of the invention is given in the following sections with reference to the relevant attached drawings.In attached drawing Give presently preferred embodiments of the present invention.But the invention can be realized in many different forms, however it is not limited to this paper institute The embodiment of description.On the contrary, purpose of providing these embodiments is keeps the understanding to the disclosure more thorough Comprehensively.
Unless otherwise defined, the skill of all technical and scientific terms used herein and the technical field for belonging to invention The normally understood meaning of art personnel is identical.It is specific that description is intended merely in the term used in the description of invention herein The purpose of embodiment, it is not intended that the limitation present invention.Term as used herein "and/or" includes one or more relevant institutes Any and all combinations of list of items.
One embodiment provides a kind of OLED evaporation coating device, for preparing OLED display screen using vacuum evaporation technology In organic luminous layer.Fig. 1, Fig. 2 are please referred to, which is electrically connected with control device 200.Control device 200 is used In control OLED evaporation coating device operation.Specifically, control device 200 may include one or more controllers.Wherein, it controls Device processed is, for example, PLC (Programmable Logic Controller, programmable logic controller (PLC)).It should be noted that this In embodiment, mechanism operation all in OLED evaporation coating device can be controlled by a controller, or by different controls Device processed controls mechanism operation different in OLED evaporation coating device respectively, and can be in communication with each other between each controller.
OLED evaporation coating device includes cavity 110 and two or more evaporated devices 120 being set in cavity 110. Evaporated device 120 includes a closed shell, for example equipped with sample carrier, the high-precision gold for being placed with glass substrate in shell Belong to mask plate, the crucible for holding organic material, heating source and crystal oscillator.Wherein, glass substrate, high-precision metal mask plate, organic Material is placed according to sequence from top to bottom.Also, positioning mechanism can also be set, for glass substrate and high-precision metal Mask plate is aligned.In vapor deposition, heating source heats crucible, so that organic material passes through high-precision metal mask Plate is deposited to glass substrate.Further, the cavity wall and/or positioning mechanism in evaporated device 120 towards organic material one Liner can be set in side, so that extra organic material deposits to interior lining, as long as then more changeable liner can be deposited Equipment continues to use.Specifically, liner can choose material resistant to high temperature, such as stainless steel.Also, the surface of liner can have There is frosted, to improve the adhesive force of organic material.
Two or more are equipped in cavity 110 can accommodate the chamber of evaporated device 120.Therefore, each chamber Volume of 120 volume at least more than an evaporated device 120.Specifically, it is established very in each chamber using traditional mode Altitude, such as vacuum environment is established by vacuum pump.In addition, each chamber respectively corresponds the vapor deposition process different stage, change Yan Zhi, evaporated device 120 execute the operation of different phase during vapor deposition in different chambers.Each evaporated device 120 passes through Primary vapor deposition process is completed after crossing all chambers.Wherein, vapor deposition process is heated up for example including heating source, organic material is deposited Cooled down to glass substrate, heating source, replace the processes such as organic material.
In addition, further including mobile mechanism 130 in cavity 110.Mobile mechanism 130 can be such that evaporated device 120 steams in OLED It is moved in plating appts, also, mobile mechanism 130 can enable evaporated device 120 be moved in different chambers.Specifically Ground, all chambers are distributed in a ring.Mobile mechanism 130 can design with reference to traditional ring-shaped guide rail automatic cycle line, such as: Mobile mechanism 130 includes servo motor, synchronous belt, the multiple slides being mounted on synchronous belt, wherein servo motor and control fill 200 electrical connections are set, each evaporated device 120 is mounted on corresponding slide, in this way, under the control of control device 200, servo electricity Machine controls synchronous belt operation, and then drives evaporated device 120 to be moved by the slide on synchronous belt.
Control device 200 is used to control different evaporated devices 120 by mobile mechanism 130 while entering different chambers Room, and control each circulation of evaporated device 120 and execute the movement for sequentially entering each chamber.In other words, in the control of control device 200 Under, allow each evaporated device 120 to sequentially enter each chamber, to complete primary vapor deposition process, and continue according to It is secondary to enter each chamber, to complete that process is deposited next time, circuit sequentially.Meanwhile different evaporated devices 120 is same Period is respectively in different chambers, and in other words, different evaporated devices 120 intersects in OLED evaporation coating device to be staggered, Such as: an evaporated device 120 is in execute in a chamber and organic material is deposited to the process of glass substrate, and another During a evaporated device 120 is in another chamber and is in replacement organic material.
In conclusion the above-mentioned OLED evaporation coating device that present embodiment provides, is equivalent to and establishes a circulation vapor deposition system System, after the organic material in the evaporated device for being currently at evaporation state 120 can be made to exhaust, can continue to replace next steaming Coating apparatus 120 is deposited, to improve the efficiency of OLED mass production.
In one of the embodiments, with continued reference to FIG. 1, including for being carried out for evaporated device 120 in all chambers The vapor deposition chamber 111 of vapor deposition.In other words, after evaporated device 120 enters in vapor deposition chamber 111, in the heat effect of heating source Under, organic material will be deposited to glass substrate.Specifically, in order to improve efficiency, control device 200 can control vapor deposition and set When having just enter into vapor deposition chamber 111 for 120, organic material just starts vapor deposition to glass substrate just.Control device 200 can be with When control evaporated device 120 is removed from vapor deposition chamber 111, organic material exhausts just.In specific control, control device 200 can control the time of the into and out vapor deposition chamber 111 of evaporated device 120 according to preset time value.Alternatively, steaming Setting is able to detect the senser element of organic material real time status, the information which will test in real time in coating apparatus 120 It is sent to control device 200, so that control device 200 is controlled according to the real time status of organic material by mobile mechanism 130 Evaporated device 120 processed is run.
Further, with continued reference to FIG. 1, further including for replacing organic material in evaporated device 120 in all chambers The charging chamber 112 of material.The chamber 112 that feeds is, for example, PM (Preventative Maintenance, preventive maintenance maintenance) Chamber can be opened, so that user carries out corresponding operating.For example, after evaporated device 120 is moved in charging chamber 112, User can replace organic material, crystal oscillator and liner, after replacement, begin setting up vacuum environment in evaporated device 120.
Further, with continued reference to FIG. 1, further including heating chamber 113 in all chambers.The chamber 113 that heats up, which is located at, to be added Expect between the outlet of chamber 112 and the entrance of vapor deposition chamber 111.Therefore, evaporated device 120 will after feeding chamber 112 out It is moved to heating chamber 113, then is moved in vapor deposition chamber 111.Wherein, control device 200 is for controlling in evaporated device 120 Heating source heating chamber 113 in heat up, to carry out the preparation of vapor deposition.
Further, with continued reference to FIG. 1, further including cooling chamber 114 in all chambers.The chamber 114 that cools down, which is located at, to be steamed It plates between the outlet of chamber 111 and the entrance of charging chamber 112.Wherein, control device 200 is for controlling evaporated device 120 Heating source cools down in cooling chamber 114.
Therefore, above-mentioned charging chamber 112, heating chamber 113, vapor deposition chamber 111, cooling chamber 114 collectively form one The circulatory system is deposited, each evaporated device 120 is recycled and executes vapor deposition process.Wherein, evaporated device 120 is once being deposited Operation logic in the process is for example are as follows: control device 200 controls evaporated device 120 according to setting time value into or out of each The time of chamber, wherein under the control of control device 200, evaporated device 120 is moved to more conversion materials in charging chamber 112 After finishing and establishing vacuum, it is moved to heating chamber 113, heating source is heated in heating chamber 113.Later, vapor deposition is set Standby 120 are moved to again in vapor deposition chamber 111, will be deposited in vapor deposition chamber 111, and after vapor deposition, evaporated device 120 is moved It moves to cooling chamber 114,114 heating sources cool down in cooling chamber, and after cooling, evaporated device 120 moves again It is circuited sequentially later to charging chamber 112 with more conversion materials of beginning to speak.
Specifically, adjacent two chambers connection.That is, above-mentioned charging chamber 112, heating chamber 113, vapor deposition chamber 111, Cooling chamber 114 is sequentially connected, and so as to shorten the mobile time of evaporated device 120, further increases the efficiency of vapor deposition.
Further, it is separated between adjacent two chambers by door body assembly 140, so that it is independent for guaranteeing each chamber all Enclosure space, so as to independently establish vacuum environment, with reduce pollution.Further, control device 200 is for controlling door Body component 140 opens or closes.After door body assembly 140 is opened, evaporated device 120 can be by the chamber of 140 side of door body assembly Room is moved to the chamber of 140 other side of door body assembly.After door body assembly 140 is closed, the chamber of 140 two sides of door body assembly then phase Mutually separate.
Specifically, door body assembly 140 is for example including slide valve.Slide valve can be realized under the control of control device 200 Open and close function.Alternatively, door body assembly 140 can also use other mechanical groups traditional for capable of being automatically opened or closed Part realizes that for example including driving device, transmission device and door body, also, control device 200 makes by controlling driving device Transmission device drives door body to open or close.
It is understood that the set-up mode of each chamber is not limited to above situation in cavity 110, as long as making evaporated device 120 can complete primary vapor deposition process after all chambers, such as: heating chamber 113 can with charging chamber 112 or Vapor deposition chamber 111 merges into a chamber;Alternatively, cooling chamber 114 can merge with charging chamber 112 or vapor deposition chamber 111 For a chamber.
In one of the embodiments, between organic material and high-precision metal mask plate in evaporated device 120 Position be equipped with 121 (not shown in figure 1) of baffle plate assembly.Baffle plate assembly 121 is used to be opened so that organic material in vapor deposition It can be deposited to glass substrate, and be closed so that after the completion of vapor deposition the organic material deposition for continuing evaporation after the completion of vapor deposition To baffle plate assembly 121.Wherein, baffle plate assembly 121 can be controlled by control device 200.Such as: when evaporated device 120 enters Chamber 111 is deposited and glass substrate is with after the completion of the contraposition of high-precision metal mask plate, control device 200 controls baffle plate assembly 121 It opens, at this moment organic material can be deposited by high-precision metal mask plate to glass substrate.Alternatively, baffle plate assembly 121 It can be controlled by positioning mechanism, control signal be sent to baffle plate assembly 121 after positioning mechanism contraposition is completed, to control baffle group Part 121 is opened.After the completion of organic material vapor deposition, after evaporated device 120 is moved in cooling chamber 114, control device 200 is controlled Baffle plate assembly 121 processed is closed, and at this moment since the temperature of heating source is still higher, is had a small amount of organic material and is continued to evaporate, but It is the presence due to baffle plate assembly 121, so that the organic material evaporated later will deposit on baffle plate assembly 121, to subtract The organic material for depositing to interior lining is lacked, it is possible to reduce the number of more changeable liner.
Specifically, baffle plate assembly 121 can be realized using the mechanical component that tradition can be automatically opened or closed, example Such as: baffle plate assembly 121 may include driving device, transmission device and baffle, wherein driving device is electrically connected with control device 200 It connects, control device drives baffle open or close by control driving device, and then by transmission device.
Another embodiment provides a kind of OLED deposition system, provides including control device and a upper embodiment OLED evaporation coating device.
It should be noted that present embodiment provide control device, OLED evaporation coating device respectively with a upper embodiment In control device 200, the principle of OLED evaporation coating device it is identical, just repeat no more here.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.

Claims (9)

1. a kind of OLED evaporation coating device, which is characterized in that be electrically connected with control device;The OLED evaporation coating device include cavity and It is set to two or more intracorporal evaporated devices of the chamber;Two or more are equipped in the cavity to accommodate The chamber of the evaporated device, each chamber respectively correspond vapor deposition process different stage, and each evaporated device warp Primary vapor deposition process is completed after crossing all chambers;It include for replacing having in the evaporated device in all chambers The charging chamber of machine material;It further include mobile mechanism in the cavity;The control device by the mobile mechanism for being controlled Make the different evaporated devices while entering the different chambers, and control each evaporated device circulation execute successively into Enter the movement of each chamber.
2. OLED evaporation coating device according to claim 1, which is characterized in that further include for for institute in all chambers State the vapor deposition chamber that evaporated device is deposited.
3. OLED evaporation coating device according to claim 2, which is characterized in that further include heating chamber in all chambers Room;The heating chamber is located between the outlet of the charging chamber and the entrance of the vapor deposition chamber;The control device is used It heats up in the heating chamber in the heating source controlled in the evaporated device.
4. OLED evaporation coating device according to claim 2, which is characterized in that further include cooling chamber in all chambers Room;The cooling chamber is located between the outlet of the vapor deposition chamber and the entrance of the charging chamber;The control device is used Cool down in the cooling chamber in the heating source controlled in the evaporated device.
5. according to claim 1 to OLED evaporation coating device described in any one of 4 claims, which is characterized in that adjacent two A chamber connection.
6. OLED evaporation coating device according to claim 5, which is characterized in that pass through door between two adjacent chambers Body component separates.
7. OLED evaporation coating device according to claim 6, which is characterized in that the door body assembly includes slide valve.
8. according to claim 1 to OLED evaporation coating device described in any one of 4 claims, which is characterized in that the vapor deposition Baffle plate assembly is equipped in the position between organic material and high-precision metal mask plate in equipment;The baffle plate assembly is used for It is opened so that organic material can be deposited to glass substrate in vapor deposition, and is closed so that and has been deposited after the completion of vapor deposition It deposits at the rear organic material for continuing evaporation to the baffle plate assembly.
9. a kind of OLED deposition system, which is characterized in that including control device and any one of claims 1 to 8 claim The OLED evaporation coating device.
CN201810226892.5A 2018-03-12 2018-03-12 OLED evaporation coating device and system Active CN108330438B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810226892.5A CN108330438B (en) 2018-03-12 2018-03-12 OLED evaporation coating device and system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810226892.5A CN108330438B (en) 2018-03-12 2018-03-12 OLED evaporation coating device and system

Publications (2)

Publication Number Publication Date
CN108330438A CN108330438A (en) 2018-07-27
CN108330438B true CN108330438B (en) 2019-11-29

Family

ID=62930993

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810226892.5A Active CN108330438B (en) 2018-03-12 2018-03-12 OLED evaporation coating device and system

Country Status (1)

Country Link
CN (1) CN108330438B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108998764B (en) * 2018-08-20 2020-12-08 深圳市华星光电技术有限公司 Evaporation source device
CN114134465A (en) * 2021-11-24 2022-03-04 成都中建材光电材料有限公司 Method and device for improving utilization rate of evaporation equipment for photovoltaic module

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040123804A1 (en) * 2002-09-20 2004-07-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
JP2012246534A (en) * 2011-05-27 2012-12-13 Nec Corp Vapor deposition apparatus
KR101609185B1 (en) * 2013-12-13 2016-04-05 주식회사 선익시스템 Unit for transferring deposition source, apparatus of deposition having the same and method of deposition
US9899635B2 (en) * 2014-02-04 2018-02-20 Applied Materials, Inc. System for depositing one or more layers on a substrate supported by a carrier and method using the same
KR20180007387A (en) * 2016-07-12 2018-01-23 삼성디스플레이 주식회사 Thin film deposition apparatus
CN107254673B (en) * 2017-06-12 2019-07-19 京东方科技集团股份有限公司 The evaporation coating method of deposition system and deposition system

Also Published As

Publication number Publication date
CN108330438A (en) 2018-07-27

Similar Documents

Publication Publication Date Title
CN108330438B (en) OLED evaporation coating device and system
CN102134707B (en) Deposition source, deposition apparatus having the same, and method of forming thin film
CN104694903B (en) continuous physical vacuum coating equipment
CN105154842B (en) A kind of high flux combined material chip Preparation equipment and preparation method
WO1997037051A1 (en) Method of manufacturing substrate with thin film, and manufacturing apparatus
WO2006001205A1 (en) Evaporator, vapor deposition apparatus, and method of switching evaporator in vapor deposition apparatus
JP2015166492A (en) Method of re-loading evaporation cell
CN109385605A (en) Evaporation source and its control method
KR101128747B1 (en) Process for producing thin organic film
JP2006002226A (en) Vapor deposition apparatus
CN105154831B (en) A kind of vacuum evaporation source apparatus and vacuum evaporation equipment
CN104451554B (en) Vacuum evaporation equipment and vacuum deposition method
CN210796604U (en) Evaporation plating equipment
KR20190002834U (en) In-line coater for the deposition of the thin film coatings in vacuum
CN104862656A (en) Bidirectional deposition coating device and coating method
KR101206162B1 (en) Thermal Induced Sublimation Technology with downward evaporation for large-sized OLED manufacturing
JP5634522B2 (en) Vacuum processing apparatus and organic thin film forming method
CN102703866A (en) Linear evaporation source device and precise evaporation rate control evaporating unit with same
CN100500931C (en) Vacuum coating device
TWI742093B (en) Apparatus and method for depositing organic layer on one or several substrates
CN206467283U (en) One kind is evaporated in vacuo source device and vacuum evaporation equipment
CN112267101A (en) Continuous automatic conveying sputtering film forming device with revolution and rotation structure
KR101238534B1 (en) Apparatus for forming multi coating layer on substrate
CN105928324A (en) Decompression drying apparatus and substrate processing system
KR20050049844A (en) Vertical deposition method of organic electro luminescence element and apparatus thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant