TWI586019B - Cluster type evaporation device for manufacturing of oled - Google Patents

Cluster type evaporation device for manufacturing of oled Download PDF

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TWI586019B
TWI586019B TW105100878A TW105100878A TWI586019B TW I586019 B TWI586019 B TW I586019B TW 105100878 A TW105100878 A TW 105100878A TW 105100878 A TW105100878 A TW 105100878A TW I586019 B TWI586019 B TW I586019B
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substrate
chamber
transfer
end portion
rotation
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TW105100878A
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TW201626617A (en
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李在鎭
朴喜載
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史那精密股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)

Description

有機發光元件製造用群集型沉積裝置Cluster type deposition device for manufacturing organic light emitting element

本發明涉及一種有機發光元件製造用群集型沉積裝置,更為詳細地,涉及一種在一個搬送腔室的周圍配設有多個製程腔室、緩衝腔室及堆疊腔室,以縮短有機發光元件製造用製程裝備的整體長度的有機發光元件製造用群集型沉積裝置。The present invention relates to a cluster type deposition apparatus for manufacturing an organic light emitting element, and more particularly to a method of disposing a plurality of process chambers, a buffer chamber, and a stacking chamber around a transfer chamber to shorten the organic light emitting element A cluster type deposition apparatus for manufacturing an organic light-emitting element having an overall length of a manufacturing process equipment.

有機電致發光顯示器是自發光型顯示器,不僅視角寬廣、對比度優秀,且回應速度快,因此,作為下一代顯示器備受注目。The organic electroluminescence display is a self-luminous type display, and has a wide viewing angle, excellent contrast, and fast response speed, and therefore has attracted attention as a next-generation display.

如廣為所知,有機電致發光顯示器中具備的有機電致發光元件由相互對向的第一、第二電極(陽極電極及陰極電極)及在該電極之間形成的中間層構成,該中間層裏可具備多種層,例如由空穴注入層、空穴傳輸層、發光層、電子傳輸層、電子注入層等構成。As is widely known, an organic electroluminescence device provided in an organic electroluminescence display is composed of first and second electrodes (anode electrodes and cathode electrodes) opposed to each other and an intermediate layer formed between the electrodes. The intermediate layer may be provided with a plurality of layers, for example, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer, and the like.

製造具有如上結構的有機電致發光元件時,基板上形成的該空穴注入層、空穴傳輸層、發光層、電子傳輸層及電子注入層等的有機薄膜或者電極可透過利用沉積裝置的沉積方法形成。When the organic electroluminescent element having the above structure is produced, an organic thin film or an electrode such as the hole injecting layer, the hole transporting layer, the light emitting layer, the electron transporting layer, and the electron injecting layer formed on the substrate can be deposited by deposition using a deposition device The method is formed.

該有機物沉積方法通常在真空腔室內安裝基板之後,加熱裝有要沉積的物質的加熱容器,以蒸發或者升化其內部要蒸發的物質而實現。即,在基板前面排列具有與在基板上所要形成的有機物圖案的形狀相同的開口部的掩模,在該基板上蒸發或者升化有機物質,以在該基板上沉積有機薄膜等。The organic matter deposition method is usually carried out by heating a heating vessel containing a substance to be deposited after mounting a substrate in a vacuum chamber to evaporate or raise a substance to be evaporated inside. That is, a mask having an opening portion having the same shape as that of the organic substance pattern to be formed on the substrate is arranged in front of the substrate, and an organic substance is evaporated or raised on the substrate to deposit an organic thin film or the like on the substrate.

如上所述,為了對基板進行有機物沉積製程,需要有機物沉積系統,其由對於基板進行有機物沉積製程的製程腔室、用於向該製程腔室移送及從中搬出基板的搬送腔室、及用於向該搬送腔室加載或者從中卸載基板的加載/卸載腔室或者加載互鎖腔室構成。As described above, in order to perform an organic substance deposition process on a substrate, an organic substance deposition system is required, which is a process chamber for performing an organic substance deposition process on the substrate, a transfer chamber for transferring the substrate to and from the process chamber, and A load/unload chamber or a load lock chamber that loads or unloads the substrate from the transfer chamber.

另外,最近努力進行該製程腔室內加載兩個基板,對該兩個基板同時或者依次進行有機物沉積製程,以增加對基板的有機物沉積收率的研究。In addition, recent efforts have been made to load two substrates in the process chamber, and the organic substrate deposition process is performed simultaneously or sequentially on the two substrates to increase the research on the organic matter deposition yield of the substrate.

第1圖是表示常規有機物沉積系統的俯視圖,第2圖是用於對兩個基板進行有機物沉積製程的製程腔室的主視圖,第3圖是表示習知製程腔室的基板排列過程的作用圖。1 is a plan view showing a conventional organic substance deposition system, FIG. 2 is a front view of a process chamber for performing an organic substance deposition process on two substrates, and FIG. 3 is a view showing a substrate arrangement process of a conventional process chamber. Figure.

如第1圖和第2圖所示,習知的常規有機物沉積系統由配設在製造製程的兩端部且用於加載或者從中卸載基板P的加載/卸載腔室1a、1b和一列配設在該加載腔室1a和卸載腔室1b之間的多個群集2構成。各個群集2由對兩個基板進行有機物沉積製程的製程腔室120和向該製程腔室120搬入/搬出基板P的搬送腔室130構成。As shown in FIGS. 1 and 2, a conventional conventional organic deposition system is provided by loading/unloading chambers 1a, 1b and a column disposed at both ends of a manufacturing process for loading or unloading the substrate P therefrom. A plurality of clusters 2 are formed between the loading chamber 1a and the unloading chamber 1b. Each cluster 2 is composed of a process chamber 120 that performs an organic material deposition process on two substrates, and a transfer chamber 130 that carries in/out the substrate P into the process chamber 120.

另外,該加載/卸載腔室1a、1b和搬送腔室130之間具備開閉門,搬送腔室130和製程腔室120之間也具備開閉門,以在維持真空的狀態下能夠移送基板P。Further, an opening/closing door is provided between the loading/unloading chambers 1a and 1b and the transfer chamber 130, and an opening and closing door is also provided between the transfer chamber 130 and the processing chamber 120 to transfer the substrate P while maintaining a vacuum.

該製程腔室120的內部兩側分別配設有用於支撐基板P的基板支撐架121a、121b,內底面上設置有為了在該基板P上沉積有機物而往返移動於兩側基板支撐架121a、121b的下部區域的沉積源122,該沉積源122透過移送裝置123在兩側基板支撐架121a、121b的下部區域沿水準方向往返移動。A substrate support frame 121a, 121b for supporting the substrate P is disposed on both sides of the processing chamber 120, and the inner bottom surface is provided with a reciprocating movement on both side substrate support frames 121a, 121b for depositing organic substances on the substrate P. The deposition source 122 of the lower region is reciprocated in the horizontal direction by the transfer device 123 in the lower region of the substrate support frames 121a, 121b.

移送到如上構成的該製程腔室120內的兩個基板P上沉積從配設在該製程腔室120的底板側的有機物沉積源122中蒸發的有機物。The organic matter evaporated from the organic substance deposition source 122 disposed on the bottom side of the processing chamber 120 is deposited on the two substrates P transferred into the processing chamber 120 constructed as above.

因此,由配設在該製程腔室120內的一側及另一側上部的基板支撐架121a、121b所支撐的兩個基板P上可同時或者依次沉積有機薄膜。Therefore, the organic thin film can be deposited simultaneously or sequentially on the two substrates P supported by the substrate supporting frames 121a and 121b disposed on one side and the other upper portion of the processing chamber 120.

另外,移送到該製程腔室120內的兩個基板P由配設在該搬送腔室130內部的移送單元140移送,該移送單元140的後端部141能夠旋轉地設置在該搬送腔室130的中央,透過使關節部142折疊來將前端部143的基板支架144從搬送腔室130的中心點C1前進或後退。因此,由移送單元140移送的基板P,從搬送腔室130的中心點C1放射狀地前後移動。In addition, the two substrates P transferred into the processing chamber 120 are transferred by a transfer unit 140 disposed inside the transfer chamber 130, and the rear end portion 141 of the transfer unit 140 is rotatably disposed in the transfer chamber 130. At the center, the substrate holder 144 of the distal end portion 143 is advanced or retracted from the center point C1 of the transfer chamber 130 by folding the joint portion 142. Therefore, the substrate P transferred by the transfer unit 140 is radially moved forward and backward from the center point C1 of the transfer chamber 130.

因此,在該製程腔室120的內部配設有用於使基板支撐架121a、121b轉動的旋轉單元124,以使基板P透過移送單元140的前後移動而與搬入及搬出的方向並列配設,或者沿與沉積源122的移動方向並列的方向配設。Therefore, a rotation unit 124 for rotating the substrate support frames 121a and 121b is disposed inside the processing chamber 120 so that the substrate P passes through the transfer unit 140 to move forward and backward in parallel with the direction of loading and unloading, or Arranged in a direction juxtaposed with the moving direction of the deposition source 122.

即,習知沉積裝置在向製程腔室120搬入或者從中搬出基板P的過程中,每次利用轉動單元124,以使基板P與沉積源122移動的方向A1並列旋轉,或者與機械臂前後移動的方向A2並列旋轉。因此,製程裝備及製程控制複雜,並且需要在實現沉積的製程腔室120內設置用於使基板支撐架121a、121b旋轉的轉動單元124,因此,不僅需要額外地具備防止沉積物質沉積到轉動單元124的結構,還會增加維護項目。That is, in the process of loading or unloading the substrate P into the process chamber 120, the conventional deposition device rotates in parallel with the direction A1 in which the substrate P and the deposition source 122 move, or moves back and forth with the mechanical arm. The direction A2 rotates side by side. Therefore, the process equipment and the process control are complicated, and it is necessary to provide the rotating unit 124 for rotating the substrate supporting frames 121a, 121b in the processing chamber 120 for realizing deposition, and therefore, it is necessary to additionally not only have the deposition preventing deposition substance to be transferred to the rotating unit. The structure of 124 will also add maintenance items.

因此,本發明是鑒於上述問題而提出的,其目的在於提供一種有機發光元件製造用群集型沉積裝置,該裝置在一個搬送腔室的周圍配設有多個製程腔室、緩衝腔室及堆疊腔室,能夠縮短有機發光元件製造用製程裝備的整體長度。Accordingly, the present invention has been made in view of the above problems, and an object thereof is to provide a cluster type deposition apparatus for manufacturing an organic light-emitting element, which is provided with a plurality of process chambers, a buffer chamber, and a stack around a transfer chamber. The chamber can shorten the overall length of the process equipment for manufacturing the organic light emitting element.

而且,其目的在於提供一種有機發光元件製造用群集型沉積裝置,該裝置無需使製程腔室的基板搬入/搬出方向朝向移送單元的中心,能夠自由設計構成製程裝備的群集。Further, an object of the invention is to provide a cluster type deposition apparatus for manufacturing an organic light-emitting element, which can freely design a cluster constituting a process equipment without moving the substrate loading/unloading direction of the processing chamber toward the center of the transfer unit.

而且,其目的在於提供一種有機發光元件製造用群集型沉積裝置,該裝置可以省略如以往那樣用於在製程腔室內排列移送單元的移動方向和基板的搬入/搬出方向的結構,因此能夠簡化製程及製程控制,並能最大限度地減少停止整體製造製程線並且解除製程腔室真空的維護項目。Further, an object of the present invention is to provide a cluster type deposition apparatus for manufacturing an organic light-emitting element, which can omit a structure for arranging a moving direction of a transfer unit and a loading/unloading direction of a substrate in a process chamber as in the related art, thereby simplifying the process And process control, and can minimize maintenance projects that stop the overall manufacturing process line and release the process chamber vacuum.

為了達到上述目的,本發明提供一種有機發光元件製造用群集型沉積裝置,其特徵在於,包括:加載腔室,用於供應有機發光元件用基板;多個群集,分別具備:具有基板移送用移送單元的搬送腔室;和配設在該搬送腔室的周圍的製程腔室,該製程腔室從該加載腔室接收基板並進行沉積,該多個群集連接於搬送及旋轉基板的緩衝腔室,該製程腔室內部的兩側具備分別支撐基板的基板支撐架,該製程腔室內部的底面上具備為了在該基板上沉積有機物而往返移動於兩側基板支撐架的下部區域的沉積源,該移送單元包括:基板支架;前後移動用多關節連杆,其前端部連接於該基板支架;及轉動連杆,其一端部連接於該搬送腔室的中央,另一端部連接於該多關節連杆的後端部,使得多關節連杆的前端部和後端部配設於從基板支撐架的正面中央與沉積源的移動方向正交的基板移送線上。In order to achieve the above object, the present invention provides a cluster type deposition apparatus for manufacturing an organic light emitting element, comprising: a loading chamber for supplying a substrate for an organic light emitting element; and a plurality of clusters each having a substrate transfer transfer a transfer chamber of the unit; and a process chamber disposed around the transfer chamber, the process chamber receives a substrate from the load chamber and deposits the plurality of clusters connected to a buffer chamber for transporting and rotating the substrate Providing a substrate support frame for supporting the substrate on both sides of the processing chamber, the bottom surface of the processing chamber is provided with a deposition source for reciprocating the lower portion of the substrate support frame on both sides of the substrate for depositing organic substances on the substrate. The transfer unit includes: a substrate holder; a multi-joint link for moving forward and backward, the front end portion of which is connected to the substrate holder; and a rotation link having one end connected to the center of the transfer chamber and the other end connected to the multi-joint a rear end portion of the connecting rod such that the front end portion and the rear end portion of the multi-joint link are disposed from the front center of the substrate support frame and the deposition source Direction orthogonal to the substrate transfer line.

在此,該多關節連杆的後端部對於轉動連杆的一端部的旋轉,向與轉動連杆的旋轉方向相反的方向進行旋轉,多關節連杆的後端部的旋轉角度較佳旋轉為與轉動連杆的旋轉角度相同的角度。Here, the rear end portion of the multi-joint link rotates in a direction opposite to the rotation direction of the rotation link with respect to the rotation of one end portion of the rotation link, and the rotation angle of the rear end portion of the multi-joint link is preferably rotated. It is at the same angle as the rotation angle of the rotating link.

而且,沿著該搬送腔室的周圍較佳配設有多個該製程腔室,並且可進一步包括沿著該搬送腔室的周圍配設的多個堆疊腔室。Moreover, a plurality of the process chambers are preferably disposed along the circumference of the transfer chamber, and may further include a plurality of stacking chambers disposed along the circumference of the transfer chamber.

根據本發明,提供一種有機發光元件製造用群集型沉積裝置,該裝置在一個搬送腔室的周圍配設有多個製程腔室、緩衝腔室及堆疊腔室,能夠縮短有機發光元件製造用製程裝備的整體長度。According to the present invention, there is provided a cluster type deposition apparatus for manufacturing an organic light-emitting element, which is provided with a plurality of process chambers, a buffer chamber, and a stacking chamber around a transfer chamber, which can shorten the manufacturing process of the organic light-emitting element The overall length of the equipment.

而且,提供一種有機發光元件製造用群集型沉積裝置,該裝置可透過轉動連杆使移送單元的多關節連杆從搬送腔室的中心移動後分別配設在製程腔室的兩側基板支撐架的正面,從而無需使製程腔室的基板搬入/搬出方向朝向移送單元的中心,由此能夠自由設計構成製程裝備的群集。Further, there is provided a cluster type deposition apparatus for manufacturing an organic light-emitting element, which is capable of moving a multi-joint link of a transfer unit from a center of a transfer chamber through a rotary link, and respectively disposed on both side substrate support frames of the process chamber The front side eliminates the need to move the substrate loading/unloading direction of the process chamber toward the center of the transfer unit, thereby making it possible to freely design a cluster constituting the process equipment.

而且,提供一種有機發光元件製造用群集型沉積裝置,該裝置可以省略如以往那樣用於在製程腔室內排列移送單元的移動方向和基板的搬入/搬出方向的結構,因此能夠簡化製程及製程控制,並能最大限度地減少停止整體製造製程線並且解除製程腔室的真空的維護項目。Further, there is provided a cluster type deposition apparatus for manufacturing an organic light-emitting element, which can omit a structure for arranging a moving direction of a transfer unit and a loading/unloading direction of a substrate in a process chamber as in the related art, thereby simplifying process and process control And can minimize the maintenance project that stops the overall manufacturing process line and releases the vacuum of the process chamber.

10a、10b‧‧‧加載/卸載腔室10a, 10b‧‧‧ loading/unloading chamber

20‧‧‧群集20‧‧‧ cluster

21‧‧‧搬送腔室21‧‧‧Transport chamber

22‧‧‧製程腔室22‧‧‧Processing chamber

23‧‧‧堆疊腔室23‧‧‧Stacking chamber

24‧‧‧緩衝腔室24‧‧‧buffer chamber

25‧‧‧移送單元25‧‧‧Transfer unit

221a、221b‧‧‧基板支撐架221a, 221b‧‧‧ substrate support

222‧‧‧沉積源222‧‧‧Sedimentary source

223‧‧‧移送裝置223‧‧‧Transfer device

251‧‧‧基板支架251‧‧‧Substrate support

252‧‧‧多關節連杆252‧‧‧Multi-joint linkage

252a‧‧‧前端部252a‧‧‧ front end

252b‧‧‧後端部252b‧‧‧ back end

252c‧‧‧中間關節部252c‧‧‧Intermediate joint

253‧‧‧轉動連杆253‧‧‧Rotary link

253a‧‧‧一端部253a‧‧‧ one end

253b‧‧‧另一端部253b‧‧‧Other end

L1、L2‧‧‧基板移送線L1, L2‧‧‧ substrate transfer line

P‧‧‧基板P‧‧‧Substrate

第1圖是習知常規有機物沉積系統的俯視圖。Figure 1 is a top plan view of a conventional conventional organic deposition system.

第2圖是用於對兩個基板進行有機物沉積製程的製程腔室的主視結構圖。Figure 2 is a front elevational view of a process chamber for performing an organic deposition process on two substrates.

第3圖是表示習知製程腔室的基板排列過程的作用圖。Fig. 3 is a view showing the action of the substrate array process of the conventional process chamber.

第4圖是本發明的有機發光元件製造用群集型沉積裝置的俯視圖。Fig. 4 is a plan view showing a cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention.

第5圖是本發明的有機發光元件製造用群集型沉積裝置中製程腔室的主視結構圖。Fig. 5 is a front structural view showing a process chamber in a cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention.

第6圖是本發明的有機發光元件製造用群集型沉積裝置中的群集的放大圖。Fig. 6 is an enlarged view showing a cluster in the cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention.

第7圖至第10圖是表示本發明的有機發光元件製造用群集型沉積裝置中製程腔室的搬入/搬出過程的作用圖。7 to 10 are views showing the action of the loading/unloading process of the process chamber in the cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention.

在對本發明進行說明之前需要說明的是,在多個實施例中對於具有相同結構的結構要素使用相同的符號在第一實施例中進行代表性的說明,而在其他實施例中僅說明不同於第一實施例的結構。Before explaining the present invention, it should be noted that, in the various embodiments, structural elements having the same structure are collectively described in the first embodiment using the same reference numerals, and in other embodiments, only different descriptions are used. The structure of the first embodiment.

下面,參照附圖詳細說明本發明的第一實施例的有機發光元件製造用群集型沉積裝置。Hereinafter, a cluster type deposition apparatus for manufacturing an organic light-emitting element according to a first embodiment of the present invention will be described in detail with reference to the accompanying drawings.

附圖中,第4圖是本發明的有機發光元件製造用群集型沉積裝置的俯視圖,第5圖是本發明的有機發光元件製造用群集型沉積裝置中的製程腔室的主視結構圖,第6圖是本發明的有機發光元件製造用群集型沉積裝置中的群集的放大圖。4 is a plan view of a cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention, and FIG. 5 is a front view of a process chamber of the cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention. Fig. 6 is an enlarged view showing a cluster in the cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention.

本發明的沉積裝置如第4圖所示,包括:加載/卸載腔室10a、10b,其配設在該沉積裝置的兩端部,以供應及回收用於製造有機發光元件的基板P;多個群集20,其配設在加載/卸載腔室10a、10b之間,按各個製造製程加工處理從加載腔室10a供應的基板P。第4圖中圖式配設有四個群集20,但是群集20的數量可根據需要適當地進行加減。The deposition apparatus of the present invention, as shown in FIG. 4, includes: loading/unloading chambers 10a, 10b disposed at both ends of the deposition apparatus to supply and recover the substrate P for manufacturing the organic light-emitting element; A cluster 20, which is disposed between the loading/unloading chambers 10a, 10b, processes the substrate P supplied from the loading chamber 10a in a respective manufacturing process. The diagram in Fig. 4 is provided with four clusters 20, but the number of clusters 20 can be appropriately added and subtracted as needed.

各個群集20由搬送腔室21、製程腔室22、堆疊腔室23及緩衝腔室24構成。Each cluster 20 is composed of a transfer chamber 21, a process chamber 22, a stacking chamber 23, and a buffer chamber 24.

搬送腔室21位於群集20的中央部分,透過緩衝腔室24連接於加載/卸載腔室10a、10b或者相鄰的群集20。基板P透過配設在搬送腔室21的中央的移送單元25經由配設在搬送腔室21的周圍的多個製程腔室22依次沉積構成有機發光元件的多個薄膜。The transfer chamber 21 is located at a central portion of the cluster 20 and is connected to the loading/unloading chambers 10a, 10b or adjacent clusters 20 through the buffer chamber 24. The substrate P passes through the transfer unit 25 disposed at the center of the transfer chamber 21, and sequentially deposits a plurality of thin films constituting the organic light-emitting element via a plurality of process chambers 22 disposed around the transfer chamber 21.

製程腔室22在每個群集中存在一個以上,位於搬送腔室21的周圍。在各個製程腔室22中具備不同類型的沉積源,以在基板P上沉積互不相同的沉積層。The process chamber 22 is present in more than one of each cluster, located around the transfer chamber 21. Different types of deposition sources are provided in each of the process chambers 22 to deposit mutually different deposition layers on the substrate P.

該製程腔室22的內部維持真空狀態,內部兩側分別具備支撐基板P的基板支撐架221a、221b,該製程腔室22的內部底面上具備沉積源222,該沉積源222為了在該基板P上沉積有機物,在兩側基板支撐架221a、221b的下部區域中透過驅動裝置223沿水準方向往返移動。The inside of the processing chamber 22 is maintained in a vacuum state, and the two sides of the processing chamber are respectively provided with substrate supporting frames 221a and 221b for supporting the substrate P. The internal surface of the processing chamber 22 is provided with a deposition source 222 for the substrate P. The deposited organic matter moves back and forth in the horizontal direction through the driving device 223 in the lower region of the side substrate support frames 221a, 221b.

根據如上所述本發明的有機發光元件製造用群集型沉積裝置,在一個搬送腔室21的周圍配設有多個製程腔室22、緩衝腔室24及堆疊腔室23,能夠縮短整體製程裝備的長度。According to the cluster type deposition apparatus for manufacturing an organic light-emitting element of the present invention as described above, a plurality of process chambers 22, buffer chambers 24, and stacking chambers 23 are disposed around one transfer chamber 21, which can shorten the overall process equipment. length.

但是,由於在製程腔室22的內底面上,沉積源222設置成沿著與製程腔室的法線方向往返移動,並且內部兩側的基板支撐架221a、221b設置成基板P的一側邊與沉積源222的移動方向並排配設,因此向這樣的基板支撐架221a、221b的正面搬入/搬出基板P時,基板P的移送方向會脫離搬送腔室21的中心。However, since on the inner bottom surface of the process chamber 22, the deposition source 222 is disposed to reciprocate along the normal direction with the process chamber, and the substrate support frames 221a, 221b on the inner sides are disposed as one side of the substrate P Since the direction in which the deposition source 222 moves is arranged in parallel, when the substrate P is carried in and out of the front surface of the substrate support frames 221a and 221b, the transfer direction of the substrate P is separated from the center of the transfer chamber 21.

更為具體地,用於向兩側基板支撐架221a、221b搬入或者從中搬出基板P的移送線,由從一側基板支撐架221a的正面中央與沉積源222的移送方向正交的基板P的移送線(下稱“一側基板支撐架221a的基板移送線L1”)和從另一側基板支撐架221b的正面中央與沉積源222的移送方向正交的基板移送線(下稱“另一側基板支撐架221b的基板移送線L2”)構成。這樣的一側基板支撐架221a的基板移送線L1和另一側基板支撐架221b的基板移送線L2以搬送腔室21的中心為基準並排配設在兩側。More specifically, the transfer line for loading or unloading the substrate P to the both side substrate support frames 221a and 221b is made of the substrate P which is orthogonal to the transfer direction of the deposition source 222 from the center of the front surface of the one side substrate support frame 221a. A transfer line (hereinafter referred to as "substrate transfer line L1 of one side substrate support frame 221a") and a substrate transfer line orthogonal to the transfer direction of the deposition source 222 from the front center of the other side substrate support frame 221b (hereinafter referred to as "another The substrate transfer line L2") of the side substrate support frame 221b is configured. The substrate transfer line L1 of the one-side substrate support frame 221a and the substrate transfer line L2 of the other-side substrate support frame 221b are arranged side by side on the basis of the center of the transfer chamber 21.

而且,在與製程腔室22一起設置在搬送腔室21的周圍的緩衝腔室24及堆疊腔室23中,用於基板P的搬入/搬出的基板P的移送方向與搬送腔室21的中心點C1交叉。Further, in the buffer chamber 24 and the stacking chamber 23 provided around the transfer chamber 21 together with the processing chamber 22, the transfer direction of the substrate P for loading/unloading the substrate P and the center of the transfer chamber 21 are provided. Point C1 crosses.

因此,如第6圖所示,該移送單元25沿著製程腔室22的一側基板支撐架221a及另一側基板支撐架221b的基板移送線L1、L2和緩沖腔室24及堆疊腔室23的基板移送線而前後移動,該移送單元25包括:基板支架251;前後移動用多關節連杆252,其前端部252a連接於該基板支架251;及轉動連杆253,其一端部253a連接於該搬送腔室21的中央,另一端部253b連接於該多關節連杆252的後端部252b,該轉動連杆253使多關節連杆252配設在從基板支撐架221a、221b的正面中央與沉積源222的移動方向正交的線上。Therefore, as shown in FIG. 6, the transfer unit 25 is along the substrate transfer line L1, L2 of the one side substrate support frame 221a and the other side substrate support frame 221b of the process chamber 22, and the buffer chamber 24 and the stacking chamber. The substrate transfer line of 23 moves forward and backward. The transfer unit 25 includes a substrate holder 251, a multi-joint link 252 for moving forward and backward, a front end portion 252a connected to the substrate holder 251, and a rotation link 253 whose one end portion 253a is connected. In the center of the transfer chamber 21, the other end portion 253b is connected to the rear end portion 252b of the multi-joint link 252, and the rotation link 253 causes the multi-joint link 252 to be disposed on the front side of the substrate support frames 221a, 221b. The center is on a line orthogonal to the direction of movement of the deposition source 222.

利用這樣的移送單元25向製程腔室22搬入或者從中搬出基板P的過程如下。The process of loading or unloading the substrate P into the process chamber 22 by such a transfer unit 25 is as follows.

附圖中,第7圖至第10圖是表示針對本發明的有機發光元件製造用群集型沉積裝置的製程腔室22進行基板P的搬入/搬出過程的作用圖。In the drawings, FIG. 7 to FIG. 10 are views showing the operation of the process chamber 22 in which the process chamber 22 of the cluster type deposition apparatus for manufacturing an organic light-emitting device of the present invention is carried in and out.

首先,如第7圖所示,該多關節連杆252在前端部252a和後端部252b配設在一側基板支撐架221a的基板移送線L1上的狀態下,透過中間關節部252c的旋轉,前端部252a的基板支架251沿著基板移送線L1從搬送腔室21的內部空間前進至製程腔室22內部的基板支撐架221a,或者前端部252a的基板支架251從製程腔室22內部的基板支撐架221a後退到搬送腔室21的內部空間。First, as shown in Fig. 7, the multi-joint link 252 is rotated through the intermediate joint portion 252c in a state where the distal end portion 252a and the rear end portion 252b are disposed on the substrate transfer line L1 of the one substrate support frame 221a. The substrate holder 251 of the front end portion 252a advances from the internal space of the transfer chamber 21 to the substrate support frame 221a inside the process chamber 22 along the substrate transfer line L1, or the substrate holder 251 of the front end portion 252a from the inside of the process chamber 22 The substrate support frame 221a is retracted to the internal space of the transfer chamber 21.

接著,如第8圖所示,為了向製程腔室22的另一側基板支撐架221b搬入或者從中搬出基板P,該移送單元25的轉動連杆253從製程腔室22的一側基板支撐架221a向另一側基板支撐架221b旋轉時,多關節連杆252與轉動連杆253一起在搬送腔室21內部空間裏旋轉。此時,該轉動連杆253的旋轉角A被設定為與多關節連杆252的後端部252連接的轉動連杆253的另一端部253b從與一側基板支撐架221a的基板移送線L1交叉的地點到另一側基板支撐架221b的基板移送線L2交叉的地點的角度。Next, as shown in FIG. 8, in order to carry in or out the substrate P to the other substrate support frame 221b of the process chamber 22, the rotation link 253 of the transfer unit 25 is supported from the substrate support frame of the process chamber 22 When the 221a rotates toward the other substrate support frame 221b, the multi-joint link 252 rotates together with the rotation link 253 in the internal space of the transfer chamber 21. At this time, the rotation angle A of the rotation link 253 is set to the other end portion 253b of the rotation link 253 connected to the rear end portion 252 of the multi-joint link 252 from the substrate transfer line L1 with the one side substrate support frame 221a. The angle of the intersection to the point where the substrate transfer line L2 of the other substrate support frame 221b intersects.

而且,如第9圖所示,與轉動連杆253的另一端部253b連接的多關節連杆252的後端部252b向與轉動連杆253相反的方向旋轉,以使多關節連杆252配設在另一側基板支撐架221b的基板移送線L2上。此時,與該轉動連杆253的另一端部253連接的多關節連杆252的後端部252b的旋轉角A被設定為與該轉動連杆253的一端部253a的旋轉角A相同。如上所述,當連接於轉動連杆253的另一端部253b的多關節連杆252的後端部252b向與轉動連杆253的一端部253相反的方向旋轉時,多關節連杆252的前端部252a和後端部252b的旋轉中心分別配設在另一側基板支撐架221b的基板移送線L2上。Further, as shown in Fig. 9, the rear end portion 252b of the multi-joint link 252 connected to the other end portion 253b of the rotation link 253 is rotated in the opposite direction to the rotation link 253 to match the multi-joint link 252 It is provided on the substrate transfer line L2 of the other substrate support frame 221b. At this time, the rotation angle A of the rear end portion 252b of the multi-joint link 252 connected to the other end portion 253 of the rotation link 253 is set to be the same as the rotation angle A of the one end portion 253a of the rotation link 253. As described above, when the rear end portion 252b of the multi-joint link 252 connected to the other end portion 253b of the rotation link 253 is rotated in the opposite direction to the one end portion 253 of the rotation link 253, the front end of the multi-joint link 252 The rotation centers of the portion 252a and the rear end portion 252b are respectively disposed on the substrate transfer line L2 of the other substrate support frame 221b.

在這種狀態下,如第10圖所示,多關節連杆252的中間關節部252c旋轉驅動時,連接於多關節連杆252的前端部252a的基板支架251在另一側基板支撐架221b的基板移送線L2上前進或者後退,從而能夠向另一側基板支撐架221b搬入或者從中搬出基板P。In this state, as shown in Fig. 10, when the intermediate joint portion 252c of the multi-joint link 252 is rotationally driven, the substrate holder 251 connected to the front end portion 252a of the multi-joint link 252 is on the other side substrate support frame 221b. The substrate transfer line L2 is advanced or retracted, so that the substrate P can be carried in or removed from the other substrate support frame 221b.

另外,第8圖及第9圖中為了便於理解轉動連杆253的驅動,說明了轉動連杆253的一端部253a的旋轉和多關節連杆252的後端部252b的旋轉依次進行。但是,較佳設定連接於搬送腔室21中央的轉動連杆253的一端部253a和多關節連杆252的後端部252b同時旋轉。In addition, in order to facilitate understanding of the driving of the rotation link 253 in FIGS. 8 and 9, the rotation of the one end portion 253a of the rotation link 253 and the rotation of the rear end portion 252b of the multi-joint link 252 are sequentially performed. However, it is preferable to simultaneously rotate the one end portion 253a of the rotation link 253 connected to the center of the transfer chamber 21 and the rear end portion 252b of the multi-joint link 252.

而且,本實施例中以移送單元25在從位於製程腔室22的一側基板支撐架221a的基板移送方向L1的狀態下立即向另一側基板支撐架221b的基板移送方向L2移動為例進行了說明,但這只不過是為了說明移送單元25的作用而舉例說明的,並不限定這樣的驅動順序。即,為了沉積製程的順利進行,可按如下方式控制驅動:從位於一側的緩衝腔室24向搬送腔室21內部搬入基板P,並向製程腔室22的一側基板支撐架221a傳遞基板P,再從一側的緩衝腔室24向搬送腔室21內部搬入基板P,並向製程腔室22的另一側基板支撐架221b傳遞基板P,當在該製程腔室22內中結束沉積後,從一側基板支撐架221a搬出基板P,並向另一側緩衝腔室24傳遞基板P,再從另一側基板支撐架221b搬出基板P,並向另一側緩衝腔室24傳遞基板P。Further, in the present embodiment, the transfer unit 25 is moved to the substrate transfer direction L2 of the other substrate support frame 221b in the state of the substrate transfer direction L1 from the substrate support frame 221a of the process chamber 22 as an example. Although this is merely an example for explaining the action of the transfer unit 25, such a drive sequence is not limited. That is, in order to smoothly perform the deposition process, the driving can be controlled by moving the substrate P from the buffer chamber 24 located on one side to the inside of the transfer chamber 21, and transferring the substrate to the substrate support frame 221a of one side of the process chamber 22. P, the substrate P is carried into the transfer chamber 21 from the buffer chamber 24 on one side, and the substrate P is transferred to the other substrate support frame 221b of the process chamber 22, and the deposition is ended in the process chamber 22 Thereafter, the substrate P is carried out from the one substrate support frame 221a, the substrate P is transferred to the other buffer chamber 24, and the substrate P is carried out from the other substrate support frame 221b, and the substrate is transferred to the other buffer chamber 24. P.

同樣地,在需要更換配設在製程腔室22內部的掩模時,也可按如下方式進行驅動:利用移送單元25從位於搬送腔室21一側的堆疊腔室23取出掩模,並向該製程腔室22的基板支撐架221a、221b側搬入,或者相反地取出製程腔室22內的掩模後傳遞到堆疊腔室23。Similarly, when it is necessary to replace the mask disposed inside the processing chamber 22, it can also be driven as follows: the mask is taken out from the stacking chamber 23 on the side of the transfer chamber 21 by the transfer unit 25, and The substrate support frame 221a, 221b side of the process chamber 22 is carried in, or the mask in the process chamber 22 is reversely taken out and transferred to the stacking chamber 23.

根據本實施例,在如上所述之基板P的沉積製程及掩模的更換過程中,可利用一個移送單元25移送基板P或者掩模,因此能夠簡化製程裝備。According to the present embodiment, in the deposition process of the substrate P and the replacement of the mask as described above, the substrate P or the mask can be transferred by one transfer unit 25, so that the process equipment can be simplified.

特別是,可透過轉動連杆253將移送單元25的多關節連杆252從搬送腔室21的中心移動而分別配設在製程腔室的兩側基板支撐架221a、221b的正面,因此,無需使製程腔室22的基板P的搬入/搬出方向朝向移送單元的中心。因此,能夠自由設計構成製程裝備的群集20,並且可以省略如以往那樣用於在製程腔室內排列移送單元的移動方向和基板的搬入/搬出方向的旋轉單元,因此能夠最大限度地減少停止整體製造製程線並且解除製程腔室22的真空的維護項目。In particular, the multi-joint link 252 of the transfer unit 25 can be moved from the center of the transfer chamber 21 through the rotation link 253 to be disposed on the front sides of the substrate support frames 221a and 221b on both sides of the process chamber, respectively. The loading/unloading direction of the substrate P of the processing chamber 22 is directed toward the center of the transfer unit. Therefore, the cluster 20 constituting the process equipment can be freely designed, and the rotation unit for arranging the moving direction of the transfer unit and the loading/unloading direction of the substrate in the processing chamber as in the related art can be omitted, so that the overall manufacturing can be minimized. The process line and the maintenance of the vacuum of the process chamber 22 are released.

本發明並不限於上述實施例,而是在申請專利範圍內可以實現為多種形式的實施例。因此,在不脫離申請專利範圍中所要求保護的本發明精神的範圍內,本領域技術人員所進行的各種變更及修飾均屬於本發明的保護範圍之內。The present invention is not limited to the above embodiments, but can be implemented in various forms within the scope of the patent application. Therefore, various changes and modifications may be made by those skilled in the art without departing from the scope of the invention.

 

20‧‧‧群集 20‧‧‧ cluster

21‧‧‧搬送腔室 21‧‧‧Transport chamber

22‧‧‧製程腔室 22‧‧‧Processing chamber

23‧‧‧堆疊腔室 23‧‧‧Stacking chamber

24‧‧‧緩衝腔室 24‧‧‧buffer chamber

25‧‧‧移送單元 25‧‧‧Transfer unit

221a、221b‧‧‧基板支撐架 221a, 221b‧‧‧ substrate support

222‧‧‧沉積源 222‧‧‧Sedimentary source

223‧‧‧移送裝置 223‧‧‧Transfer device

251‧‧‧基板支架 251‧‧‧Substrate support

252‧‧‧多關節連杆 252‧‧‧Multi-joint linkage

252a‧‧‧前端部 252a‧‧‧ front end

252b‧‧‧後端部 252b‧‧‧ back end

252c‧‧‧中間關節部 252c‧‧‧Intermediate joint

253‧‧‧轉動連杆 253‧‧‧Rotary link

253a‧‧‧一端部 253a‧‧‧ one end

253b‧‧‧另一端部 253b‧‧‧Other end

L1、L2‧‧‧基板移送線 L1, L2‧‧‧ substrate transfer line

P‧‧‧基板 P‧‧‧Substrate

Claims (2)

一種有機發光元件製造用群集型沉積裝置,其特徵在於,包括:加載腔室,用於供應有機發光元件用基板;多個群集,分別具備:具有基板移送用移送單元的搬送腔室;和配設在該搬送腔室的周圍的製程腔室,該製程腔室從該加載腔室接收基板並進行沉積,該多個群集連接於搬送及旋轉基板的緩衝腔室,該製程腔室內部的兩側具備分別支撐基板的基板支撐架,該製程腔室內部的底面上具備為了在該基板上沉積有機物而往返移動於兩側基板支撐架的下部區域的沉積源,該移送單元包括:基板支架;前後移動用多關節連杆,其前端部連接於該基板支架;及轉動連杆,其一端部連接於該搬運腔室的中央,另一端部連接於該多關節連杆的後端部,使得多關節連杆的前端部和後端部配設於從基板支撐架的正面中央與沉積源的移動方向正交的基板移送線上,且該多關節連杆的後端部對於轉動連杆的一端部的旋轉,向與轉動連杆的旋轉方向相反的方向進行旋轉,多關節連杆的後端部的旋轉角度旋轉為與轉動連杆的旋轉角度相同的角度。 A cluster type deposition apparatus for manufacturing an organic light-emitting element, comprising: a loading chamber for supplying a substrate for an organic light-emitting element; and a plurality of clusters each having a transfer chamber having a substrate transfer transfer unit; a processing chamber disposed around the transfer chamber, the processing chamber receiving a substrate from the loading chamber and depositing, the plurality of clusters being connected to a buffer chamber for transporting and rotating the substrate, and two chambers inside the processing chamber The substrate has a substrate support frame respectively supporting the substrate, and a bottom surface of the processing chamber is provided with a deposition source for reciprocating the lower portion of the substrate support frame on both sides of the substrate for depositing organic substances on the substrate, the transfer unit comprising: a substrate holder; a multi-joint link for moving forward and backward, the front end portion of which is connected to the substrate holder; and a rotation link having one end connected to the center of the transfer chamber and the other end connected to the rear end portion of the multi-joint link The front end portion and the rear end portion of the multi-joint link are disposed on a substrate transfer line orthogonal to the moving direction of the deposition source from the center of the front surface of the substrate support frame, and The rear end portion of the multi-joint link rotates in a direction opposite to the rotation direction of the rotation link with respect to the rotation of one end portion of the rotation link, and the rotation angle of the rear end portion of the multi-joint link is rotated to be the rotation link The angle of rotation is the same angle. 如申請專利範圍第1項所述之有機發光元件製造用群集型沉積裝置,其中,沿著該搬送腔室的周圍設置有多個該製程腔室,並且進一步包括沿著該搬送腔室的周圍配設的多個堆疊腔室。 The cluster type deposition apparatus for manufacturing an organic light-emitting element according to claim 1, wherein a plurality of the processing chambers are disposed along a circumference of the transfer chamber, and further including a periphery of the transfer chamber A plurality of stacked chambers are provided.
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