JP2017178736A5 - - Google Patents
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- Publication number
- JP2017178736A5 JP2017178736A5 JP2016071572A JP2016071572A JP2017178736A5 JP 2017178736 A5 JP2017178736 A5 JP 2017178736A5 JP 2016071572 A JP2016071572 A JP 2016071572A JP 2016071572 A JP2016071572 A JP 2016071572A JP 2017178736 A5 JP2017178736 A5 JP 2017178736A5
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- mass
- group
- treated metal
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229910044991 metal oxide Inorganic materials 0.000 claims description 45
- 150000004706 metal oxides Chemical class 0.000 claims description 45
- 239000002245 particle Substances 0.000 claims description 36
- 150000003377 silicon compounds Chemical class 0.000 claims description 15
- -1 acryl group Chemical group 0.000 claims description 12
- 125000005641 methacryl group Chemical group 0.000 claims description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 9
- 239000002612 dispersion media Substances 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 12
- 239000000377 silicon dioxide Substances 0.000 claims 6
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 239000011734 sodium Substances 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N AI2O3 Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000011135 tin Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- SLDXSSRFNABVCN-UHFFFAOYSA-N 3-diethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[SiH](OCC)CCCOC(=O)C(C)=C SLDXSSRFNABVCN-UHFFFAOYSA-N 0.000 description 1
- BZCWFJMZVXHYQA-UHFFFAOYSA-N 3-dimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[SiH](OC)CCCOC(=O)C(C)=C BZCWFJMZVXHYQA-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016071572A JP6713320B2 (ja) | 2016-03-31 | 2016-03-31 | 表面処理金属酸化物ゾル |
| TW106105884A TWI720136B (zh) | 2016-03-31 | 2017-02-22 | 表面處理金屬氧化物溶膠 |
| KR1020170037644A KR102371414B1 (ko) | 2016-03-31 | 2017-03-24 | 표면 처리 금속 산화물 졸 |
| CN201710201624.3A CN107272333B (zh) | 2016-03-31 | 2017-03-29 | 表面处理金属氧化物溶胶 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016071572A JP6713320B2 (ja) | 2016-03-31 | 2016-03-31 | 表面処理金属酸化物ゾル |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017178736A JP2017178736A (ja) | 2017-10-05 |
| JP2017178736A5 true JP2017178736A5 (he) | 2019-05-09 |
| JP6713320B2 JP6713320B2 (ja) | 2020-06-24 |
Family
ID=60009205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016071572A Active JP6713320B2 (ja) | 2016-03-31 | 2016-03-31 | 表面処理金属酸化物ゾル |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6713320B2 (he) |
| KR (1) | KR102371414B1 (he) |
| CN (1) | CN107272333B (he) |
| TW (1) | TWI720136B (he) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7430985B2 (ja) * | 2019-03-29 | 2024-02-14 | 日揮触媒化成株式会社 | 表面処理粒子の分散液および該分散液を含む硬化性の組成物 |
| CN111826002A (zh) * | 2019-09-23 | 2020-10-27 | 法国圣戈班玻璃公司 | 一种涂料分散液，其制备方法及应用 |
| JP7399599B2 (ja) * | 2020-03-26 | 2023-12-18 | テイカ株式会社 | ルチル型酸化チタンオルガノゾルおよびルチル型酸化チタンオルガノゾルの製造方法並びにこのルチル型酸化チタンオルガノゾルを用いた高屈折率被膜形成用組成物および光学素子 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05173319A (ja) | 1991-12-13 | 1993-07-13 | Ishihara Sangyo Kaisha Ltd | フォトレジスト用組成物 |
| JP4792320B2 (ja) * | 2006-03-31 | 2011-10-12 | 三井化学株式会社 | 高屈折率硬化膜 |
| KR100911889B1 (ko) | 2007-07-16 | 2009-08-11 | 한국전기연구원 | 유무기 하이브리드 감광성 수지 조성물 및 이의 경화체를이용한 액정표시소자 |
| KR20100046363A (ko) * | 2008-10-27 | 2010-05-07 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 |
| JP5754884B2 (ja) * | 2009-12-28 | 2015-07-29 | 日揮触媒化成株式会社 | リン酸（ただし、リン酸の塩を除く）処理金属酸化物微粒子およびその製造方法、該リン酸（ただし、リン酸の塩を除く）処理金属酸化物微粒子を含む透明被膜形成用塗布液ならびに透明被膜付基材 |
| CN103717535B (zh) * | 2011-06-03 | 2016-02-10 | 日产化学工业株式会社 | 含有二氧化硅-二氧化锡复合氧化物被覆二氧化钛的金属氧化物粒子 |
| JP6080583B2 (ja) | 2013-02-07 | 2017-02-15 | 日揮触媒化成株式会社 | 表面改質無機複合酸化物微粒子、その製造方法、該微粒子を含む分散液、光学基材用塗布液、光学基材用塗膜および塗膜付基材 |
| JP2014196216A (ja) * | 2013-03-29 | 2014-10-16 | 日揮触媒化成株式会社 | 改質金属酸化物微粒子粉末、改質金属酸化物微粒子分散体およびその製造方法 |
-
2016
- 2016-03-31 JP JP2016071572A patent/JP6713320B2/ja active Active
-
2017
- 2017-02-22 TW TW106105884A patent/TWI720136B/zh active
- 2017-03-24 KR KR1020170037644A patent/KR102371414B1/ko active IP Right Grant
- 2017-03-29 CN CN201710201624.3A patent/CN107272333B/zh active Active
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