JP2017178736A5 - - Google Patents
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- JP2017178736A5 JP2017178736A5 JP2016071572A JP2016071572A JP2017178736A5 JP 2017178736 A5 JP2017178736 A5 JP 2017178736A5 JP 2016071572 A JP2016071572 A JP 2016071572A JP 2016071572 A JP2016071572 A JP 2016071572A JP 2017178736 A5 JP2017178736 A5 JP 2017178736A5
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- metal oxide
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- 229910044991 metal oxide Inorganic materials 0.000 claims description 45
- 150000004706 metal oxides Chemical class 0.000 claims description 45
- 239000002245 particle Substances 0.000 claims description 36
- 150000003377 silicon compounds Chemical class 0.000 claims description 15
- -1 acryl group Chemical group 0.000 claims description 12
- 125000005641 methacryl group Chemical group 0.000 claims description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 9
- 239000002612 dispersion media Substances 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 12
- 239000000377 silicon dioxide Substances 0.000 claims 6
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 239000011734 sodium Substances 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N AI2O3 Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000011135 tin Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- SLDXSSRFNABVCN-UHFFFAOYSA-N 3-diethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[SiH](OCC)CCCOC(=O)C(C)=C SLDXSSRFNABVCN-UHFFFAOYSA-N 0.000 description 1
- BZCWFJMZVXHYQA-UHFFFAOYSA-N 3-dimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[SiH](OC)CCCOC(=O)C(C)=C BZCWFJMZVXHYQA-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Description
これらの課題と、上述のレジスト材への要求を実現するために、本発明においては、レジスト材の成分として使用可能な表面処理金属酸化物粒子を提供する。具体的には、チタニアをＴｉＯ２として５０質量％以上含む金属酸化物粒子の表面に、（メタ）アクリル基を含む有機珪素化合物がＲ１ ｎ −ＳｉＯ（ ４ − ｎ ） ／ ２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜６０質量部設けられている表面処理金属酸化物と、分散媒とを含む表面処理金属酸化物ゾルを提供する。 In order to realize these problems and the above-described requirements for the resist material, the present invention provides surface-treated metal oxide particles that can be used as a component of the resist material. Specifically, an organic silicon compound containing a (meth) acrylic group on the surface of a metal oxide particle containing 50% by mass or more of titania as TiO 2 is R 1 n -SiO (4-n) / 2 (where R is 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same as or different from each other, n is an integer of 1 to 3. 0.1 to 60 parts by mass is provided as Provided is a surface-treated metal oxide sol comprising a surface-treated metal oxide and a dispersion medium.
本発明の表面処理金属酸化物ゾルは、金属酸化物粒子の表面に（メタ）アクリル基を含む有機珪素化合物が設けられた表面処理金属酸化物粒子と、分散媒とを含む。この金属酸化物粒子は、チタニアをＴｉＯ２として５０質量％以上含む粒子である。表面処理金属酸化物粒子は、この金属酸化物粒子１００質量部に対し、式（１）で表される上述の有機珪素化合物が、Ｒ１ ｎ − ＳｉＯ（ ４ − ｎ ） ／ ２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜６０質量部設けられている。
Ｒ１ ｎ − ＳｉＸ １ （ ４ − ｎ ） （１）
（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。Ｘ１ はアルコキシ基。）
このような構成の表面処理金属酸化物ゾルについて、以下にその詳細を説明する。
The surface-treated metal oxide sol of the present invention comprises a surface-treated metal oxide particle in which an organosilicon compound containing a (meth) acrylic group is provided on the surface of a metal oxide particle, and a dispersion medium. The metal oxide particles are particles containing 50% by mass or more of titania as TiO 2 . In the surface-treated metal oxide particles, the above-mentioned organic silicon compound represented by the formula (1) is R 1 n -SiO (4-n) / 2 ( where R is an amount per 100 parts by mass of the metal oxide particles ). 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same as or different from each other, n is an integer of 1 to 3. 0.1 to 60 parts by mass is provided as There is.
R 1 n − SiX 1 (4 − n) (1)
(However, R 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same or different from each other. N is an integer of 1 to 3. X 1 is an alkoxy group.)
Details of the surface-treated metal oxide sol having such a configuration will be described below.
〈表面処理金属酸化物粒子〉
《（メタ）アクリル基を含む有機珪素化合物の層》
金属酸化物粒子の表面には、表面処理剤として、式（１）で表される（メタ）アクリル基を含む有機珪素化合物が被覆されている。
Ｒ１ ｎ−ＳｉＸ１ （４−ｎ） （１）
（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。Ｘ１はアルコキシ基。）
この（メタ）アクリル基を含む有機珪素化合物は、金属酸化物粒子１００質量部に対して、Ｒ１ ｎ − ＳｉＯ （ ４ − ｎ ）／２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一種を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜６０質量部設けられている。金属酸化物粒子表面に（メタ）アクリル基を含む有機珪素化合物を設けることで、表面処理金属酸化物粒子とレジスト材中の樹脂との分散性や結合性が向上する。ここで、有機珪素化合物の量が０．１質量部よりも少ないと、樹脂との相溶性が不足し、粒子の凝集が発生し、ヘーズの上昇、全光線透過率が低下することがある。また、露光、現像時の感度、残膜率が不足することがある。逆に、粒子の表面積上、６０質量部よりも多く被覆させることはできない。好ましい有機珪素化合物の量は、１〜５０質量部、より好ましくは３〜３０質量部である。
Surface-treated metal oxide particles
<< Layer of organosilicon compound containing (meth) acrylic group >>
The surface of the metal oxide particles is coated with an organosilicon compound containing a (meth) acrylic group represented by Formula (1) as a surface treatment agent.
R 1 n -SiX 1 (4-n) (1)
(However, R 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same or different from each other. N is an integer of 1 to 3. X 1 is an alkoxy group.)
The organic silicon compound containing this (meth) acrylic group is selected from R 1 n -SiO (4-n) / 2 (wherein R 1 is a methacrylic group and an acrylic group ) relative to 100 parts by mass of metal oxide particles. The group containing at least one kind may be identical to or different from each other, and n is an integer of 1 to 3. 0.1 to 60 parts by mass is provided. By providing the organosilicon compound containing a (meth) acrylic group on the surface of the metal oxide particle, the dispersibility and bonding between the surface-treated metal oxide particle and the resin in the resist material are improved. Here, if the amount of the organic silicon compound is less than 0.1 parts by mass, the compatibility with the resin may be insufficient, aggregation of particles may occur, haze may increase, and the total light transmittance may decrease. In addition, the sensitivity during exposure and development and the residual film ratio may be insufficient. Conversely, due to the surface area of the particles, it can not be coated more than 60 parts by weight. The amount of the organosilicon compound is preferably 1 to 50 parts by mass, more preferably 3 to 30 parts by mass.
ところで、金属酸化物粒子表面に設けられた有機珪素化合物以外にも式（１）をみたす有機珪素化合物が、ゾル中に表面処理されていない未反応物としてフリーに存在していても構わない。その量は、金属酸化物粒子１００質量部に対して、Ｒ１ ｎ − ＳｉＯ（ ４ − ｎ ） ／ ２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、９９．９質量部以下である。フリーの有機珪素化合物が０質量部の時、金属酸化物表面に設けられた有機珪素化合物のみである。また、９９．９質量部より多く存在しても分散性の向上は望めず、膜の屈折率も低下する。すなわち、（メタ）アクリル基を含む有機珪素化合物の量は、金属酸化物粒子の表面に設けられたものと、それ以外にゾル中にフリーに存在するものとを合算して、金属酸化物粒子１００質量部に対して、Ｒ１ ｎ − ＳｉＯ（ ４ − ｎ ） ／ ２ （ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜１００質量部であることが好ましい。ここで、有機珪素化合物の量が０．１質量部よりも少ないと、表面処理の効果が得られない。逆に、１００質量部よりも多いと、膜の屈折率が低下する場合がある。より好ましい有機珪素化合物の量は１〜７０質量部、さらに好ましくは５〜４０質量部である。 Incidentally, in addition to the organic silicon compound provided on the metal oxide particle surface, an organic silicon compound satisfying the formula (1) may be freely present in the sol as a non-reacted substance which is not surface-treated. The amount thereof is R 1 n -SiO (4-n) / 2 (wherein R 1 is a group containing at least one selected from a methacryl group and an acryl group ) with respect to 100 parts by mass of the metal oxide particles. N may be different, and n is an integer of 1 to 3.)) is 99.9 parts by mass or less. When the free organic silicon compound is 0 parts by mass, it is only the organic silicon compound provided on the surface of the metal oxide. Further, even if the amount is more than 99.9 parts by mass, the improvement of the dispersibility can not be expected, and the refractive index of the film also decreases. That is, the amount of the organic silicon compound containing a (meth) acrylic group is the metal oxide particle obtained by adding the one provided on the surface of the metal oxide particle and the other one free in the sol. R 1 n -SiO (4-n) / 2 (wherein R 1 is a group containing at least one selected from a methacryl group and an acryl group with respect to 100 parts by mass, and they may be the same or different from each other) N is preferably an integer of 1 to 3.), preferably 0.1 to 100 parts by mass. Here, if the amount of the organosilicon compound is less than 0.1 parts by mass, the effect of the surface treatment can not be obtained. Conversely, if the amount is more than 100 parts by mass, the refractive index of the film may decrease. The amount of the organic silicon compound is more preferably 1 to 70 parts by mass, and still more preferably 5 to 40 parts by mass.
有機珪素化合物としては、Ｒ１ ｎ − ＳｉＯ（ ４ − ｎ ） ／ ２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一種を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）を満足すれば特に指定は無いが、中でも３−メタクリロキシプロピルジメトキシシラン、３−メタクリロキシプロピルトリメトキシシラン、３−メタクリロキシプロピルトリエトキシシラン、３−アクリロキシプロピルトリメトキシシラン、３−メタクリロキシプロピルジエトキシシラン、３−アクリロキシプロピルトリエトキシシラン等が挙げられる。この中でも特に３−メタクリロキシプロピルトリメトキシシランが好ましい。
これらの有機珪素化合物は、モノマーの状態で使用しても良いし、これらの有機珪素化合物から選ばれる１種の重合体または複数種の重合体、あるいはこれらの混合物でも良い。
As the organic silicon compound, R 1 n -SiO (4-n) / 2 (wherein R 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same or different from each other) And n is an integer of 1 to 3. There is no particular limitation if n is an integer of 1 to 3, but among them, 3-methacryloxypropyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryl. Roxypropyltrimethoxysilane, 3-methacryloxypropyldiethoxysilane, 3-acryloxypropyltriethoxysilane and the like can be mentioned. Among these, 3-methacryloxypropyltrimethoxysilane is particularly preferable.
These organic silicon compounds may be used in the form of a monomer, or may be one or a plurality of polymers selected from these organic silicon compounds, or a mixture thereof.
この（メタ）アクリル基を含む有機珪素化合物の添加量は、金属酸化物粒子の表面に金属酸化物粒子１００質量部に対して、Ｒ１ ｎ − ＳｉＯ（ ４ − ｎ ） ／ ２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜６０質量部で、且つこの金属酸化物粒子の表面に設けられたものと、それ以外にゾル中にフリーに存在するものとを合算して、金属酸化物粒子１００質量部に対して、Ｒ１ ｎ − ＳｉＯ（ ４ − ｎ ） ／ ２ （ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一種を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜１００質量部設けられる分だけ添加する。好ましい有機珪素化合物の量は１〜７０質量部、より好ましくは５〜４０質量部である。 The addition amount of this (meth) acrylic group-containing organic silicon compound is such that R 1 n -SiO (4-n) / 2 (where R is an amount per 100 parts by mass of metal oxide particles) on the surface of the metal oxide particles. 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same as or different from each other, n is an integer of 1 to 3) in an amount of 0.1 to 60 parts by mass, and What is provided on the surface of this metal oxide particle and the one that is otherwise free in the sol are added together, and 100 parts by mass of the metal oxide particle is obtained by adding R 1 n -SiO ( 4- n) / 2 (wherein, R 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same as or different from each other. n is an integer of 1 to 3.), 0. 1 to 100 parts by mass It added only be minute. The amount of the organosilicon compound is preferably 1 to 70 parts by mass, more preferably 5 to 40 parts by mass.
Claims (8)
前記金属酸化物粒子がチタニアをＴｉＯ２として５０質量％以上含み、
前記有機珪素化合物が、前記金属酸化物粒子１００質量部に対し、Ｒ１ ｎ−ＳｉＯ（４−ｎ）／２（ただし、Ｒ１ はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。）として、０．１〜６０質量部設けられることを特徴とする表面処理金属酸化物ゾル。
Ｒ１ ｎ−ＳｉＸ１ （４−ｎ） （１）
（ただし、Ｒ１はメタクリル基およびアクリル基から選ばれる少なくとも一方を含む基で、互いに同一であっても異なっていても良い。ｎは１〜３の整数。Ｘ１はアルコキシ基。） A surface-treated metal oxide sol comprising a surface-treated metal oxide particle obtained by treating the surface of a metal oxide particle with an organosilicon compound containing a (meth) acrylic group represented by the formula (1), and a dispersion medium ,
The metal oxide particles contain 50% by mass or more of titania as TiO 2 ,
R 1 n —SiO 2 (4-n) / 2 (wherein R 1 is a group containing at least one selected from a methacryl group and an acryl group ) with respect to 100 parts by mass of the metal oxide particles, A surface-treated metal oxide sol characterized in that it may be the same as or different from each other, and n is an integer of 1 to 3. 0.1 to 60 parts by mass.
R 1 n -SiX 1 (4-n) (1)
(However, R 1 is a group containing at least one selected from a methacryl group and an acryl group, and may be the same or different from each other. N is an integer of 1 to 3. X 1 is an alkoxy group.)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016071572A JP6713320B2 (en) | 2016-03-31 | 2016-03-31 | Surface-treated metal oxide sol |
| TW106105884A TWI720136B (en) | 2016-03-31 | 2017-02-22 | Surface treatment metal oxide sol |
| KR1020170037644A KR102371414B1 (en) | 2016-03-31 | 2017-03-24 | Surface-treated metal oxide sol |
| CN201710201624.3A CN107272333B (en) | 2016-03-31 | 2017-03-29 | Surface-treated metal oxide sols |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016071572A JP6713320B2 (en) | 2016-03-31 | 2016-03-31 | Surface-treated metal oxide sol |
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| Publication Number | Publication Date |
|---|---|
| JP2017178736A JP2017178736A (en) | 2017-10-05 |
| JP2017178736A5 true JP2017178736A5 (en) | 2019-05-09 |
| JP6713320B2 JP6713320B2 (en) | 2020-06-24 |
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| JP (1) | JP6713320B2 (en) |
| KR (1) | KR102371414B1 (en) |
| CN (1) | CN107272333B (en) |
| TW (1) | TWI720136B (en) |
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| JP7430985B2 (en) * | 2019-03-29 | 2024-02-14 | 日揮触媒化成株式会社 | Dispersion of surface-treated particles and curable composition containing the dispersion |
| CN111826002A (en) * | 2019-09-23 | 2020-10-27 | 法国圣戈班玻璃公司 | Coating dispersion liquid, preparation method and application thereof |
| KR20220145817A (en) | 2020-03-26 | 2022-10-31 | 데이까 가부시끼가이샤 | Rutile-type titanium oxide organosol and method for producing rutile-type titanium oxide organosol, and composition and optical element for forming a high refractive index film using the rutile-type titanium oxide organosol |
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| JPH05173319A (en) | 1991-12-13 | 1993-07-13 | Ishihara Sangyo Kaisha Ltd | Composition for photoresist |
| JP4792320B2 (en) * | 2006-03-31 | 2011-10-12 | 三井化学株式会社 | High refractive index cured film |
| KR100911889B1 (en) | 2007-07-16 | 2009-08-11 | 한국전기연구원 | Photosensitive resin composition with organic~inorganic hybrid and liquid display devices using |
| KR20100046363A (en) * | 2008-10-27 | 2010-05-07 | 주식회사 동진쎄미켐 | Photoresist composition |
| JP5754884B2 (en) * | 2009-12-28 | 2015-07-29 | 日揮触媒化成株式会社 | Phosphoric acid (excluding phosphoric acid salt) -treated metal oxide fine particles and production method thereof, coating solution for forming a transparent film containing the phosphoric acid (excluding phosphoric acid salt) -treated metal oxide fine particles, and transparent Substrate with coating |
| JP5896178B2 (en) * | 2011-06-03 | 2016-03-30 | 日産化学工業株式会社 | Silicon dioxide-stannic oxide composite oxide-coated titanium oxide-containing metal oxide particles |
| JP6080583B2 (en) | 2013-02-07 | 2017-02-15 | 日揮触媒化成株式会社 | Surface-modified inorganic composite oxide fine particles, production method thereof, dispersion containing the fine particles, coating solution for optical substrate, coating film for optical substrate, and coated substrate |
| JP2014196216A (en) * | 2013-03-29 | 2014-10-16 | 日揮触媒化成株式会社 | Modified metal oxide particulate powder, modified metal oxide particulate dispersion and method for producing the same |
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