JP2017156465A - 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法 - Google Patents

駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法 Download PDF

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Publication number
JP2017156465A
JP2017156465A JP2016038128A JP2016038128A JP2017156465A JP 2017156465 A JP2017156465 A JP 2017156465A JP 2016038128 A JP2016038128 A JP 2016038128A JP 2016038128 A JP2016038128 A JP 2016038128A JP 2017156465 A JP2017156465 A JP 2017156465A
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JP
Japan
Prior art keywords
refrigerant
coil
state
housing
condensing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016038128A
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English (en)
Japanese (ja)
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JP2017156465A5 (enExample
Inventor
野元　誠
Makoto Nomoto
誠 野元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016038128A priority Critical patent/JP2017156465A/ja
Priority to EP17759709.3A priority patent/EP3425452A4/en
Priority to KR1020187026795A priority patent/KR102190676B1/ko
Priority to CN201780013965.6A priority patent/CN108700831B/zh
Priority to PCT/JP2017/006096 priority patent/WO2017150243A1/ja
Priority to TW106105601A priority patent/TWI635694B/zh
Publication of JP2017156465A publication Critical patent/JP2017156465A/ja
Priority to US16/112,336 priority patent/US20180364593A1/en
Publication of JP2017156465A5 publication Critical patent/JP2017156465A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K9/00—Arrangements for cooling or ventilating
    • H02K9/19—Arrangements for cooling or ventilating for machines with closed casing and closed-circuit cooling using a liquid cooling medium, e.g. oil
    • H02K9/20—Arrangements for cooling or ventilating for machines with closed casing and closed-circuit cooling using a liquid cooling medium, e.g. oil wherein the cooling medium vaporises within the machine casing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Motor Or Generator Cooling System (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2016038128A 2016-02-29 2016-02-29 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法 Pending JP2017156465A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2016038128A JP2017156465A (ja) 2016-02-29 2016-02-29 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法
EP17759709.3A EP3425452A4 (en) 2016-02-29 2017-02-20 Drive device, lithography device, cooling method, and method for manufacturing article
KR1020187026795A KR102190676B1 (ko) 2016-02-29 2017-02-20 구동 장치, 리소그래피 장치, 냉각 방법 및 물품의 제조 방법
CN201780013965.6A CN108700831B (zh) 2016-02-29 2017-02-20 驱动单元、光刻设备、冷却方法和物品的制造方法
PCT/JP2017/006096 WO2017150243A1 (ja) 2016-02-29 2017-02-20 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法
TW106105601A TWI635694B (zh) 2016-02-29 2017-02-20 驅動裝置、光刻裝置、冷卻方法、及物品之製造方法
US16/112,336 US20180364593A1 (en) 2016-02-29 2018-08-24 Drive unit, lithography apparatus, cooling method, and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016038128A JP2017156465A (ja) 2016-02-29 2016-02-29 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法

Publications (2)

Publication Number Publication Date
JP2017156465A true JP2017156465A (ja) 2017-09-07
JP2017156465A5 JP2017156465A5 (enExample) 2019-04-11

Family

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JP2016038128A Pending JP2017156465A (ja) 2016-02-29 2016-02-29 駆動装置、リソグラフィ装置、冷却方法、および物品の製造方法

Country Status (7)

Country Link
US (1) US20180364593A1 (enExample)
EP (1) EP3425452A4 (enExample)
JP (1) JP2017156465A (enExample)
KR (1) KR102190676B1 (enExample)
CN (1) CN108700831B (enExample)
TW (1) TWI635694B (enExample)
WO (1) WO2017150243A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020071321A (ja) * 2018-10-30 2020-05-07 キヤノン株式会社 冷却装置、光源装置、露光装置及び物品の製造方法
JP2021037106A (ja) * 2019-09-03 2021-03-11 富士フイルム株式会社 電子カセッテ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7025256B2 (ja) * 2018-03-16 2022-02-24 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
CN108390511B (zh) * 2018-04-26 2023-07-28 北京建筑大学 一种开关磁阻电机及其控制方法、装置和系统
JP7483397B2 (ja) 2020-02-07 2024-05-15 キヤノン株式会社 搬送システム

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51141463U (enExample) * 1975-05-07 1976-11-15
JPS58145855A (ja) * 1982-02-23 1983-08-31 株式会社鷺宮製作所 冷媒流量制御装置
JPS63173716A (ja) * 1987-01-10 1988-07-18 Sanden Corp 冷房装置
JPH05243438A (ja) * 1992-02-15 1993-09-21 Fuji Electric Co Ltd 電子機器の冷却装置
JP2001168564A (ja) * 1999-12-13 2001-06-22 Yaskawa Electric Corp 電子機器筐体の熱交換器
JP2002078314A (ja) * 2000-08-24 2002-03-15 Nikon Corp 電機子ユニット、電磁アクチュエータ、ステージ装置、露光装置及びこれを用いたデバイスの製造方法
JP2002291219A (ja) * 2001-03-29 2002-10-04 Canon Inc 電磁アクチュエータ、リニアモータ、露光装置、半導体デバイス製造方法、半導体製造工場および露光装置の保守方法
JP2003133211A (ja) * 2001-10-26 2003-05-09 Canon Inc デバイス製造装置およびその温調制御方法
JP2003214733A (ja) * 2002-01-25 2003-07-30 Daikin Ind Ltd 冷凍装置
JP2004031673A (ja) * 2002-06-26 2004-01-29 Nikon Corp リニアモータ装置及びステージ装置並びに露光装置
JP2005064391A (ja) * 2003-08-19 2005-03-10 Canon Inc 光学部材の冷却方法、冷却装置、露光装置、及び、デバイスの製造方法
JP2005142283A (ja) * 2003-11-05 2005-06-02 Nikon Corp 温調装置及び温調方法、露光装置、並びにデバイス製造方法
JP2011096983A (ja) * 2009-11-02 2011-05-12 Furukawa Electric Co Ltd:The 冷却装置
JP2013105815A (ja) * 2011-11-11 2013-05-30 Nikon Corp 移動体装置及び露光装置
JP2015191959A (ja) * 2014-03-27 2015-11-02 日立アプライアンス株式会社 冷却装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040244963A1 (en) * 2003-06-05 2004-12-09 Nikon Corporation Heat pipe with temperature control
JP2006006050A (ja) 2004-06-18 2006-01-05 Nikon Corp 電機子ユニット、電磁アクチュエータ、ステージ装置、及び露光装置
JP2009060773A (ja) * 2007-09-04 2009-03-19 Canon Inc 駆動装置およびそれを用いた平面モータおよびそれを用いた露光装置

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51141463U (enExample) * 1975-05-07 1976-11-15
JPS58145855A (ja) * 1982-02-23 1983-08-31 株式会社鷺宮製作所 冷媒流量制御装置
JPS63173716A (ja) * 1987-01-10 1988-07-18 Sanden Corp 冷房装置
JPH05243438A (ja) * 1992-02-15 1993-09-21 Fuji Electric Co Ltd 電子機器の冷却装置
JP2001168564A (ja) * 1999-12-13 2001-06-22 Yaskawa Electric Corp 電子機器筐体の熱交換器
JP2002078314A (ja) * 2000-08-24 2002-03-15 Nikon Corp 電機子ユニット、電磁アクチュエータ、ステージ装置、露光装置及びこれを用いたデバイスの製造方法
JP2002291219A (ja) * 2001-03-29 2002-10-04 Canon Inc 電磁アクチュエータ、リニアモータ、露光装置、半導体デバイス製造方法、半導体製造工場および露光装置の保守方法
JP2003133211A (ja) * 2001-10-26 2003-05-09 Canon Inc デバイス製造装置およびその温調制御方法
JP2003214733A (ja) * 2002-01-25 2003-07-30 Daikin Ind Ltd 冷凍装置
JP2004031673A (ja) * 2002-06-26 2004-01-29 Nikon Corp リニアモータ装置及びステージ装置並びに露光装置
JP2005064391A (ja) * 2003-08-19 2005-03-10 Canon Inc 光学部材の冷却方法、冷却装置、露光装置、及び、デバイスの製造方法
JP2005142283A (ja) * 2003-11-05 2005-06-02 Nikon Corp 温調装置及び温調方法、露光装置、並びにデバイス製造方法
JP2011096983A (ja) * 2009-11-02 2011-05-12 Furukawa Electric Co Ltd:The 冷却装置
JP2013105815A (ja) * 2011-11-11 2013-05-30 Nikon Corp 移動体装置及び露光装置
JP2015191959A (ja) * 2014-03-27 2015-11-02 日立アプライアンス株式会社 冷却装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020071321A (ja) * 2018-10-30 2020-05-07 キヤノン株式会社 冷却装置、光源装置、露光装置及び物品の製造方法
JP7202142B2 (ja) 2018-10-30 2023-01-11 キヤノン株式会社 冷却装置、光源装置、露光装置及び物品の製造方法
JP2021037106A (ja) * 2019-09-03 2021-03-11 富士フイルム株式会社 電子カセッテ
JP7280152B2 (ja) 2019-09-03 2023-05-23 富士フイルム株式会社 電子カセッテ

Also Published As

Publication number Publication date
TW201735508A (zh) 2017-10-01
EP3425452A4 (en) 2019-10-23
US20180364593A1 (en) 2018-12-20
KR20180115292A (ko) 2018-10-22
CN108700831A (zh) 2018-10-23
WO2017150243A1 (ja) 2017-09-08
KR102190676B1 (ko) 2020-12-14
EP3425452A1 (en) 2019-01-09
TWI635694B (zh) 2018-09-11
CN108700831B (zh) 2021-08-10

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