JP2017117944A - 光半導体装置の製造方法 - Google Patents
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- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2222—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special electric properties
- H01S5/2224—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special electric properties semi-insulating semiconductors
Abstract
Description
図1は、本発明の実施の形態1に係る光半導体装置の製造方法のフローチャートである。図2から図15は、本発明の実施の形態1に係る光半導体装置の製造方法を示す断面図である。ただし、図2〜9,13は共振器方向に沿った断面図であり、図10〜12,14は共振器方向に垂直な断面図である。図16は、本発明の実施の形態1に係る光半導体装置を示す斜視図である。図17は、本発明の実施の形態1に係る光半導体装置の内部を透視した斜視図である。これらの図を参照しながら本実施の形態に係る光半導体装置の製造方法を説明する。
図21は、本発明の実施の形態2に係る光半導体装置の製造方法を示す断面図である。実施の形態1では光半導体素子5の屈折率分布中心に対して光導波路12の屈折率分布中心が偏心している。これを補正するため、本実施の形態では光導波路層8の膜厚を活性層3の膜厚よりも薄くして、光半導体素子5の屈折率分布中心に対して光導波路12の屈折率分布中心が偏心しないようにする。なお、活性層3にAlGaInAs材料を使用し、屈折率調整層10をエッチングする際に活性層3がエッチングされないようにする。その他の構成及び効果は実施の形態1と同様である。
図22〜24は、本発明の実施の形態3に係る光半導体装置の製造方法を示す断面図である。
図25は、本発明の実施の形態4に係る光半導体装置の製造方法を示す断面図である。実施の形態3では光半導体素子5の屈折率分布中心に対して光導波路12の屈折率分布中心が偏心している。これを補正するため、本実施の形態では光導波路層8の膜厚を活性層3の膜厚よりも薄くして、光半導体素子5の屈折率分布中心に対して光導波路12の屈折率分布中心が偏心しないようにする。なお、活性層3にAlGaInAs材料を使用し、屈折率調整層21をエッチングする際に活性層3がエッチングされないようにする。その他の構成及び効果は実施の形態3と同様である。
Claims (5)
- 半導体基板上に第1のクラッド層、活性層、及び第2のクラッド層を順に積層して光半導体素子を形成する工程と、
フォトルミネセンス検査により前記活性層の屈折率を求めて前記光半導体素子の等価屈折率を算出する工程と、
前記半導体基板上に第3のクラッド層、前記活性層に接合され前記活性層の屈折率よりも小さい屈折率を有する光導波路層、及び屈折率調整層を順に積層して光導波路を形成する工程と、
フォトルミネセンス検査により前記光導波路層の屈折率を求めて前記光導波路の等価屈折率を算出する工程と、
前記屈折率調整層をエッチングして、前記光半導体素子の等価屈折率と前記光導波路の等価屈折率が整合するように前記屈折率調整層の膜厚を調整する工程と、
前記屈折率調整層の膜厚を調整した後に、前記第2のクラッド層及び前記屈折率調整層上にコンタクト層を形成する工程とを備え、
前記光導波路は、電界が印加されず電流が注入されないパッシブ導波路であることを特徴とする光半導体装置の製造方法。 - 前記屈折率調整層は、前記光導波路層から遠ざかるほど低屈折率となる積層された複数の半導体層を有することを特徴とする請求項1に記載の光半導体装置の製造方法。
- 前記屈折率調整層は、異なる2種類の半導体層を交互に積層したものであることを特徴とする請求項1に記載の光半導体装置の製造方法。
- 前記光導波路層の膜厚を前記活性層の膜厚よりも薄くして、前記光半導体素子の屈折率分布中心に対して前記光導波路の屈折率分布中心が偏心しないようにすることを特徴とする請求項1〜3の何れか1項に記載の光半導体装置の製造方法。
- 前記屈折率調整層をエッチングする際に前記活性層がエッチングされないようにすることを特徴とする請求項4に記載の光半導体装置の製造方法。
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US20150236473A1 (en) * | 2014-02-17 | 2015-08-20 | Electronics And Telecommunications Research Institute | Reflective optical source device |
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