JP2017066034A - ジフェニルエチル基及びメトキシシリル基を有する有機ケイ素化合物並びにその製造方法 - Google Patents
ジフェニルエチル基及びメトキシシリル基を有する有機ケイ素化合物並びにその製造方法 Download PDFInfo
- Publication number
- JP2017066034A JP2017066034A JP2015189154A JP2015189154A JP2017066034A JP 2017066034 A JP2017066034 A JP 2017066034A JP 2015189154 A JP2015189154 A JP 2015189154A JP 2015189154 A JP2015189154 A JP 2015189154A JP 2017066034 A JP2017066034 A JP 2017066034A
- Authority
- JP
- Japan
- Prior art keywords
- group
- diphenylethyl
- general formula
- methoxysilyl
- silicon compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- -1 diphenylethyl group Chemical group 0.000 title claims abstract description 55
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 150000003377 silicon compounds Chemical class 0.000 title abstract 5
- 150000001875 compounds Chemical class 0.000 claims description 22
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 21
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 claims description 15
- 150000002430 hydrocarbons Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 45
- 239000002904 solvent Substances 0.000 description 13
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 238000002329 infrared spectrum Methods 0.000 description 9
- 238000001819 mass spectrum Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 9
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- XBGQMGSQCBHPJP-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OC)(OC)OC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OC)(OC)OC)C1=CC=CC=C1 XBGQMGSQCBHPJP-UHFFFAOYSA-N 0.000 description 5
- WBNFOMGPQBIAGF-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OCC)(OCC)OCC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OCC)(OCC)OCC)C1=CC=CC=C1 WBNFOMGPQBIAGF-UHFFFAOYSA-N 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Natural products CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- CAIWDWJZVLBZBY-UHFFFAOYSA-N (1,2-dichloro-1-phenylethyl)benzene Chemical compound C=1C=CC=CC=1C(Cl)(CCl)C1=CC=CC=C1 CAIWDWJZVLBZBY-UHFFFAOYSA-N 0.000 description 3
- 125000000579 2,2-diphenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(C1=C([H])C([H])=C([H])C([H])=C1[H])C([H])([H])* 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WJCVKIPCRFOGGZ-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OC)(C)C)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OC)(C)C)C1=CC=CC=C1 WJCVKIPCRFOGGZ-UHFFFAOYSA-N 0.000 description 3
- LDWUBYLLARVQAC-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OC)(OC)C)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OC)(OC)C)C1=CC=CC=C1 LDWUBYLLARVQAC-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 150000003058 platinum compounds Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 3
- 239000005052 trichlorosilane Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 2
- PJDRLEMKVQKSIN-UHFFFAOYSA-N diethyl(fluoro)silane Chemical compound CC[SiH](F)CC PJDRLEMKVQKSIN-UHFFFAOYSA-N 0.000 description 2
- RSBKBJPYFCHOAJ-UHFFFAOYSA-N difluoro(phenyl)silane Chemical compound F[SiH](F)C1=CC=CC=C1 RSBKBJPYFCHOAJ-UHFFFAOYSA-N 0.000 description 2
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 2
- 239000003759 ester based solvent Substances 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000005048 methyldichlorosilane Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- WFXGLPBYWJMKMH-UHFFFAOYSA-N trichloro(2,2-diphenylethyl)silane Chemical compound C=1C=CC=CC=1C(C[Si](Cl)(Cl)Cl)C1=CC=CC=C1 WFXGLPBYWJMKMH-UHFFFAOYSA-N 0.000 description 2
- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 2
- HDPNBNXLBDFELL-UHFFFAOYSA-N 1,1,1-trimethoxyethane Chemical compound COC(C)(OC)OC HDPNBNXLBDFELL-UHFFFAOYSA-N 0.000 description 1
- VCUXFDRVGAOPHR-UHFFFAOYSA-N 2,2-diphenylethyl(trifluoro)silane Chemical compound C=1C=CC=CC=1C(C[Si](F)(F)F)C1=CC=CC=C1 VCUXFDRVGAOPHR-UHFFFAOYSA-N 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- JJDWYZXWOMMFNA-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](Cl)(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](Cl)(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 JJDWYZXWOMMFNA-UHFFFAOYSA-N 0.000 description 1
- IBJLDUKNLNWQCT-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](Cl)(CC)CC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](Cl)(CC)CC)C1=CC=CC=C1 IBJLDUKNLNWQCT-UHFFFAOYSA-N 0.000 description 1
- PXQLEKCSMBLPAF-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](Cl)(Cl)C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](Cl)(Cl)C1=CC=CC=C1)C1=CC=CC=C1 PXQLEKCSMBLPAF-UHFFFAOYSA-N 0.000 description 1
- ZETHAHNZBAANMV-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](Cl)(Cl)CC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](Cl)(Cl)CC)C1=CC=CC=C1 ZETHAHNZBAANMV-UHFFFAOYSA-N 0.000 description 1
- BIEOQKAGMPLQCN-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](F)(C)C)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](F)(C)C)C1=CC=CC=C1 BIEOQKAGMPLQCN-UHFFFAOYSA-N 0.000 description 1
- LUPFFXJGUYDKAX-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](F)(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](F)(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 LUPFFXJGUYDKAX-UHFFFAOYSA-N 0.000 description 1
- KARULCQFPDZQRE-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](F)(F)C)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](F)(F)C)C1=CC=CC=C1 KARULCQFPDZQRE-UHFFFAOYSA-N 0.000 description 1
- QUMAVBMILFWBSS-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](F)(F)CC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](F)(F)CC)C1=CC=CC=C1 QUMAVBMILFWBSS-UHFFFAOYSA-N 0.000 description 1
- CZMKPYVMZZSYOG-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OC)(CC)CC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OC)(CC)CC)C1=CC=CC=C1 CZMKPYVMZZSYOG-UHFFFAOYSA-N 0.000 description 1
- AKOOXOUDLRPEJN-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OC)(OC)C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OC)(OC)C1=CC=CC=C1)C1=CC=CC=C1 AKOOXOUDLRPEJN-UHFFFAOYSA-N 0.000 description 1
- LATIHTXGTONLDI-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[Si](OC)(OC)CC)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[Si](OC)(OC)CC)C1=CC=CC=C1 LATIHTXGTONLDI-UHFFFAOYSA-N 0.000 description 1
- ZEJIZDJXOUZFMP-UHFFFAOYSA-N C1(=CC=CC=C1)C1(CC(C1)(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C1(CC(C1)(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 ZEJIZDJXOUZFMP-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- FNIUGHSZXXYXER-UHFFFAOYSA-N [Pt].ClC1=C(Cl)C=CCCCC1 Chemical compound [Pt].ClC1=C(Cl)C=CCCCC1 FNIUGHSZXXYXER-UHFFFAOYSA-N 0.000 description 1
- PQLVXDKIJBQVDF-UHFFFAOYSA-N acetic acid;hydrate Chemical compound O.CC(O)=O PQLVXDKIJBQVDF-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- WSUHYUNONYKMFY-UHFFFAOYSA-N benzhydryloxy(2,2-diphenylethyl)silane Chemical compound C1(=CC=CC=C1)C(C[SiH2]OC(C1=CC=CC=C1)C1=CC=CC=C1)C1=CC=CC=C1 WSUHYUNONYKMFY-UHFFFAOYSA-N 0.000 description 1
- LJWBIAMZBJWAOW-UHFFFAOYSA-N benzhydryloxysilane Chemical compound C=1C=CC=CC=1C(O[SiH3])C1=CC=CC=C1 LJWBIAMZBJWAOW-UHFFFAOYSA-N 0.000 description 1
- TUOJAZRQYMQJER-UHFFFAOYSA-N benzonitrile;platinum Chemical compound [Pt].N#CC1=CC=CC=C1 TUOJAZRQYMQJER-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- SOYVLBDERBHIME-UHFFFAOYSA-N chloro(diethyl)silicon Chemical compound CC[Si](Cl)CC SOYVLBDERBHIME-UHFFFAOYSA-N 0.000 description 1
- YCITZMJNBYYMJO-UHFFFAOYSA-N chloro(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](Cl)C1=CC=CC=C1 YCITZMJNBYYMJO-UHFFFAOYSA-N 0.000 description 1
- KKWAPKMFNZDDIE-UHFFFAOYSA-N chloro-(2,2-diphenylethyl)-dimethylsilane Chemical compound C=1C=CC=CC=1C(C[Si](C)(Cl)C)C1=CC=CC=C1 KKWAPKMFNZDDIE-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- XICPMMBDLCZZCL-UHFFFAOYSA-N dichloro-(2,2-diphenylethyl)-methylsilane Chemical compound C=1C=CC=CC=1C(C[Si](Cl)(Cl)C)C1=CC=CC=C1 XICPMMBDLCZZCL-UHFFFAOYSA-N 0.000 description 1
- DGXPASZXUJQWLQ-UHFFFAOYSA-N diethyl(methoxy)silane Chemical compound CC[SiH](CC)OC DGXPASZXUJQWLQ-UHFFFAOYSA-N 0.000 description 1
- HBDHEULZOVVYQR-UHFFFAOYSA-N difluoro(methyl)silicon Chemical compound C[Si](F)F HBDHEULZOVVYQR-UHFFFAOYSA-N 0.000 description 1
- 238000006471 dimerization reaction Methods 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- CIQDYIQMZXESRD-UHFFFAOYSA-N dimethoxy(phenyl)silane Chemical compound CO[SiH](OC)C1=CC=CC=C1 CIQDYIQMZXESRD-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- ZUBAIVQCZYOVOJ-UHFFFAOYSA-N ethyl(difluoro)silane Chemical compound CC[SiH](F)F ZUBAIVQCZYOVOJ-UHFFFAOYSA-N 0.000 description 1
- YSLVSGVAVRTLAV-UHFFFAOYSA-N ethyl(dimethoxy)silane Chemical compound CC[SiH](OC)OC YSLVSGVAVRTLAV-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- JMEWTHPANUTEHG-UHFFFAOYSA-N fluoro(dimethyl)silicon Chemical compound C[Si](C)F JMEWTHPANUTEHG-UHFFFAOYSA-N 0.000 description 1
- BUFRPMIIXBOSDW-UHFFFAOYSA-N fluoro(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](F)C1=CC=CC=C1 BUFRPMIIXBOSDW-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 150000002504 iridium compounds Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003284 rhodium compounds Chemical class 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- WPPVEXTUHHUEIV-UHFFFAOYSA-N trifluorosilane Chemical compound F[SiH](F)F WPPVEXTUHHUEIV-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1876—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
Description
[1]
下記一般式(1)
で示されるジフェニルエチル基及びメトキシシリル基を有する有機ケイ素化合物。
[2]
下記一般式(2)
で示されるハイドロジェンハロシラン化合物をヒドロシリル化し、得られた下記一般式(4)
で示されるジフェニルエチルハロシラン化合物をメチルエステル化することを特徴とする[1]記載のジフェニルエチル基及びメトキシシリル基を有する有機ケイ素化合物の製造方法。
[3]
反応温度60〜90℃でヒドロシリル化することを特徴とする[2]記載のジフェニルエチル基及びメトキシシリル基を有する有機ケイ素化合物の製造方法。
で示されるものである。
で示されるハイドロジェンハロシラン化合物をヒドロシリル化し、得られた下記一般式(4)
で示されるジフェニルエチルハロシラン化合物をメチルエステル化する方法又は下記一般式(2)
で示されるハイドロジェンオルガノキシシラン化合物をヒドロシリル化する方法が挙げられる。
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、1,1−ジフェニルエチレン180g(1.0モル)、塩化白金酸の2−エチルヘキサノール溶液(1,1−ジフェニルエチレン1モル当たり1.0×10-4モルの白金を含む)を仕込み、トリクロロシラン136g(1.0モル)を内温80〜90℃で8時間かけて滴下し、その温度で1時間撹拌した。
質量スペクトル
m/z 302、270、238、167、121
以上の結果より、得られた留分は(2,2−ジフェニルエチル)トリメトキシシランであることを確認した。なお、25℃での屈折率は1.528だった。
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、1,1−ジフェニルエチレン90g(0.5モル)、塩化白金酸の2−エチルヘキサノール溶液(1,1−ジフェニルエチレン1モル当たり1.0×10-4モルの白金を含む)を仕込み、メチルジクロロシラン58g(0.5モル)を内温60〜70℃で8時間かけて滴下し、その温度で1時間撹拌した。
質量スペクトル
m/z 286、254、222、167、105
以上の結果より、得られた留分は(2,2−ジフェニルエチル)メチルジメトキシシランであることを確認した。
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、1,1−ジフェニルエチレン90g(0.5モル)、塩化白金酸の2−エチルヘキサノール溶液(1,1−ジフェニルエチレン1モル当たり1.0×10-4モルの白金を含む)を仕込み、ジメチルクロロシラン57g(0.6モル)を内温80〜90℃で12時間かけて滴下し、その温度で1時間撹拌した。
質量スペクトル
m/z 270、238、222、151、89
以上の結果より、得られた留分は(2,2−ジフェニルエチル)ジメチルメトキシシランであることを確認した。
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、1,1−ジフェニルエチレン36g(0.2モル)、塩化白金酸の2−エチルヘキサノール溶液(1,1−ジフェニルエチレン1モル当たり1.0×10-4モルの白金を含む)を仕込み、トリクロロシラン27g(0.2モル)を内温50〜60℃で8時間かけて滴下し、その温度で1時間撹拌した。1,1−ジフェニルエチレンの2量体(1,1,3,3−テトラフェニルシクロブタン)が1,1−ジフェニルエチレンに対し30%以上生成した。
実施例1において、メタノールの代わりにエタノールを使用し、ナトリウムメトキシドの代わりにナトリウムエトキシドを使用することで、沸点158〜160℃/0.1kPaで(2,2−ジフェニルエチル)トリエトキシシランを得た。
実施例1及び合成例1にて合成した(2,2−ジフェニルエチル)トリメトキシシラン及び(2,2−ジフェニルエチル)トリエトキシシランの加水分解性試験を行った結果を表1に示す。実施例4は(2,2−ジフェニルエチル)トリメトキシシラン、比較例1は(2,2−ジフェニルエチル)トリエトキシシランを用いた結果である。なお、試験条件は1%酢酸水:メタノール=70:30の溶液中にシラン1wt%を添加して室温で撹拌し、所定時間後の状態を確認した。
Claims (3)
- 反応温度60〜90℃でヒドロシリル化することを特徴とする請求項2記載のジフェニルエチル基及びメトキシシリル基を有する有機ケイ素化合物の製造方法。
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US15/262,757 US9862735B2 (en) | 2015-09-28 | 2016-09-12 | Organosilicon compound having diphenylethyl and methoxysilyl and making method |
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Non-Patent Citations (4)
Title |
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JOURNAL OF MATERIALS SCIENCE LETTERS, vol. 12, no. 10, JPN6018017040, 1993, pages 724 - 727 * |
PROC 38TH ANNU TECH CONF, JPN6018017039, 1983, pages 1 - 5 * |
RUSSIAN JOURNAL OF GENERAL CHEMISTRY, vol. 70, no. 10, JPN6018017038, 2000, pages 1555 - 1556 * |
東亞合成研究年報, vol. Vol.2, JPN7018001510, 1999, pages 45 - 49 * |
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