JP2017065028A5 - - Google Patents
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- Publication number
- JP2017065028A5 JP2017065028A5 JP2015192220A JP2015192220A JP2017065028A5 JP 2017065028 A5 JP2017065028 A5 JP 2017065028A5 JP 2015192220 A JP2015192220 A JP 2015192220A JP 2015192220 A JP2015192220 A JP 2015192220A JP 2017065028 A5 JP2017065028 A5 JP 2017065028A5
- Authority
- JP
- Japan
- Prior art keywords
- heating resistor
- semiconductor device
- forming
- oxidation
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 31
- 239000004065 semiconductor Substances 0.000 claims description 18
- 239000010410 layer Substances 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 14
- 230000003647 oxidation Effects 0.000 claims description 13
- 238000007254 oxidation reaction Methods 0.000 claims description 13
- 239000011241 protective layer Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 238000007599 discharging Methods 0.000 claims description 5
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 3
- 230000001629 suppression Effects 0.000 claims 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 238000005530 etching Methods 0.000 claims 3
- 230000002401 inhibitory effect Effects 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 238000009832 plasma treatment Methods 0.000 claims 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 239000011737 fluorine Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 2
- YRGLXIVYESZPLQ-UHFFFAOYSA-I tantalum pentafluoride Chemical compound F[Ta](F)(F)(F)F YRGLXIVYESZPLQ-UHFFFAOYSA-I 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000010937 tungsten Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 claims 1
- HWEYZGSCHQNNEH-UHFFFAOYSA-N silicon tantalum Chemical compound [Si].[Ta] HWEYZGSCHQNNEH-UHFFFAOYSA-N 0.000 claims 1
- WNUPENMBHHEARK-UHFFFAOYSA-N silicon tungsten Chemical compound [Si].[W] WNUPENMBHHEARK-UHFFFAOYSA-N 0.000 claims 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims 1
- -1 tungsten nitride Chemical class 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015192220A JP6655929B2 (ja) | 2015-09-29 | 2015-09-29 | 半導体装置、その製造方法、液体吐出ヘッド、液体吐出カートリッジ及び液体吐出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015192220A JP6655929B2 (ja) | 2015-09-29 | 2015-09-29 | 半導体装置、その製造方法、液体吐出ヘッド、液体吐出カートリッジ及び液体吐出装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017065028A JP2017065028A (ja) | 2017-04-06 |
| JP2017065028A5 true JP2017065028A5 (enExample) | 2018-09-20 |
| JP6655929B2 JP6655929B2 (ja) | 2020-03-04 |
Family
ID=58491295
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015192220A Active JP6655929B2 (ja) | 2015-09-29 | 2015-09-29 | 半導体装置、その製造方法、液体吐出ヘッド、液体吐出カートリッジ及び液体吐出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6655929B2 (enExample) |
-
2015
- 2015-09-29 JP JP2015192220A patent/JP6655929B2/ja active Active
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