JP2017017315A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2017017315A5 JP2017017315A5 JP2016100362A JP2016100362A JP2017017315A5 JP 2017017315 A5 JP2017017315 A5 JP 2017017315A5 JP 2016100362 A JP2016100362 A JP 2016100362A JP 2016100362 A JP2016100362 A JP 2016100362A JP 2017017315 A5 JP2017017315 A5 JP 2017017315A5
- Authority
- JP
- Japan
- Prior art keywords
- suction
- reservoir
- liquid
- processing
- path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 5
- 238000003672 processing method Methods 0.000 claims 2
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105118585A TWI615208B (zh) | 2015-07-06 | 2016-06-14 | 水刀、基板處理裝置及基板處理方法 |
| CN201610525373.XA CN106340473B (zh) | 2015-07-06 | 2016-07-06 | 基板处理装置及基板处理方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015135159 | 2015-07-06 | ||
| JP2015135159 | 2015-07-06 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017017315A JP2017017315A (ja) | 2017-01-19 |
| JP2017017315A5 true JP2017017315A5 (enExample) | 2017-02-23 |
| JP6235070B2 JP6235070B2 (ja) | 2017-11-22 |
Family
ID=57831313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016100362A Active JP6235070B2 (ja) | 2015-07-06 | 2016-05-19 | 基板処理装置および基板処理方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6235070B2 (enExample) |
| TW (1) | TWI615208B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7690324B2 (ja) * | 2021-05-28 | 2025-06-10 | 株式会社ディスコ | 混合液製造装置 |
| KR102654631B1 (ko) * | 2022-03-18 | 2024-04-03 | 시바우라 메카트로닉스 가부시끼가이샤 | 기판 처리 장치 |
| CN115995409B (zh) * | 2023-01-31 | 2024-02-27 | 北京北方华创微电子装备有限公司 | 清洗装置 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004288746A (ja) * | 2003-03-19 | 2004-10-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
| TWI275141B (en) * | 2004-07-01 | 2007-03-01 | Future Vision Inc | Substrate processor |
| JP2006269714A (ja) * | 2005-03-24 | 2006-10-05 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| CN100437921C (zh) * | 2005-03-31 | 2008-11-26 | 弘塑科技股份有限公司 | 晶片清洗及干燥装置 |
| JP4752492B2 (ja) * | 2005-12-22 | 2011-08-17 | 凸版印刷株式会社 | ダイ塗工ヘッド |
| CN100522486C (zh) * | 2006-06-02 | 2009-08-05 | 刘永钦 | 一种防止水从喷水嘴处回流到水刀切割机用砂阀上的装置 |
| TW200829340A (en) * | 2007-01-10 | 2008-07-16 | Awin Diamond Technology Corp | Ultra-high pressure fluid jet structure in cutting for preventing water-sand backflow |
| JP4889565B2 (ja) * | 2007-05-15 | 2012-03-07 | 株式会社日立ハイテクノロジーズ | 洗浄装置、フラットパネルディスプレイの製造装置及びフラットパネルディスプレイ |
| JP5278646B2 (ja) * | 2007-11-30 | 2013-09-04 | 凸版印刷株式会社 | スリットコータおよび塗工方法 |
| CN101229629B (zh) * | 2008-02-22 | 2010-06-02 | 刘永钦 | 一种水刀用供砂方法及装置 |
| CN201394785Y (zh) * | 2009-03-31 | 2010-02-03 | 厦门喜儿工贸有限公司 | 一种水刀 |
| TWI397735B (zh) * | 2009-08-04 | 2013-06-01 | Au Optronics Corp | 可清潔水刀或風刀出口的光學製程設備 |
| JP5656245B2 (ja) * | 2010-06-17 | 2015-01-21 | 芝浦メカトロニクス株式会社 | 洗浄方法及び洗浄装置 |
| JP5775851B2 (ja) * | 2012-06-27 | 2015-09-09 | 東京エレクトロン株式会社 | 塗布装置および塗布液充填方法 |
| TW201420221A (zh) * | 2012-11-20 | 2014-06-01 | Tzu-Yang Lin | 清潔設備 |
| CN203696783U (zh) * | 2014-03-11 | 2014-07-09 | 佛山市能博机电有限公司 | 四轴数控水刀切口倾角控制机构 |
-
2016
- 2016-05-19 JP JP2016100362A patent/JP6235070B2/ja active Active
- 2016-06-14 TW TW105118585A patent/TWI615208B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2017017315A5 (enExample) | ||
| JP6761081B2 (ja) | 基板処理装置 | |
| JP2019186565A5 (enExample) | ||
| JP2013251409A5 (enExample) | ||
| WO2018022660A3 (en) | Air treatment appliance | |
| JP2015029041A5 (enExample) | ||
| JP2014151226A5 (enExample) | ||
| JP2015092538A5 (enExample) | ||
| JP2019037443A5 (enExample) | ||
| JP2014207437A5 (enExample) | ||
| JP2014005151A5 (enExample) | ||
| KR101485980B1 (ko) | 코팅 장치 | |
| JP2016072260A5 (enExample) | ||
| WO2016020061A3 (de) | Verfahren zum auswaschen von gasblasen in einem extrakorporalen blutkreislauf | |
| CN106340473B (zh) | 基板处理装置及基板处理方法 | |
| JP2016123863A5 (enExample) | ||
| WO2016147440A1 (ja) | ノズルおよび液体供給装置 | |
| JP2015056431A5 (enExample) | ||
| JP2012250212A (ja) | 洗浄装置 | |
| JP2019075520A5 (enExample) | ||
| CN201381279Y (zh) | 蚀刻设备 | |
| JP6520088B2 (ja) | 容器内部乾燥装置及び容器内部乾燥方法 | |
| JP2015066482A (ja) | 塗布装置および塗布方法 | |
| JP2019166522A5 (enExample) | ||
| JP2020174081A5 (enExample) |