JP2017005191A - 半導体発光装置 - Google Patents
半導体発光装置 Download PDFInfo
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- JP2017005191A JP2017005191A JP2015120275A JP2015120275A JP2017005191A JP 2017005191 A JP2017005191 A JP 2017005191A JP 2015120275 A JP2015120275 A JP 2015120275A JP 2015120275 A JP2015120275 A JP 2015120275A JP 2017005191 A JP2017005191 A JP 2017005191A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 200
- 229910052751 metal Inorganic materials 0.000 claims abstract description 68
- 239000002184 metal Substances 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims description 53
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- 238000009826 distribution Methods 0.000 abstract description 12
- 229910002704 AlGaN Inorganic materials 0.000 description 10
- 230000001902 propagating effect Effects 0.000 description 10
- 230000004888 barrier function Effects 0.000 description 9
- 238000000605 extraction Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000005253 cladding Methods 0.000 description 7
- 229910052814 silicon oxide Inorganic materials 0.000 description 7
- 238000005530 etching Methods 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 150000004767 nitrides Chemical class 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910015363 Au—Sn Inorganic materials 0.000 description 2
- 229910016338 Bi—Sn Inorganic materials 0.000 description 2
- 229910018100 Ni-Sn Inorganic materials 0.000 description 2
- 229910018532 Ni—Sn Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910020816 Sn Pb Inorganic materials 0.000 description 2
- 229910020836 Sn-Ag Inorganic materials 0.000 description 2
- 229910020888 Sn-Cu Inorganic materials 0.000 description 2
- 229910020922 Sn-Pb Inorganic materials 0.000 description 2
- 229910020935 Sn-Sb Inorganic materials 0.000 description 2
- 229910020988 Sn—Ag Inorganic materials 0.000 description 2
- 229910019204 Sn—Cu Inorganic materials 0.000 description 2
- 229910018956 Sn—In Inorganic materials 0.000 description 2
- 229910008783 Sn—Pb Inorganic materials 0.000 description 2
- 229910008757 Sn—Sb Inorganic materials 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 244000025254 Cannabis sativa Species 0.000 description 1
- 229910005887 NiSn Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
Description
図1(a)は、第1実施形態に係る半導体発光装置1を模式的に表す上面図である。図1(b)は、図1(a)中に示すA−A線に沿った半導体発光装置1の模式断面図である。半導体発光装置1は、チップ状の光源であり、例えば、実装基板上にマウントされる。
誘電体膜47は、発光体10の第1面10aおよび側面10cを覆う。誘電体膜47は、例えば、側面10cに露出する発光層15を覆い保護する。また、誘電体膜47は、発光体10と、樹脂と、の間の密着性を向上させる。すなわち、半導体発光装置1の上に蛍光体を含む樹脂を設ける場合に有効である。
誘電体膜41、45、47には、シリコン酸化膜以外に、窒化珪素または酸窒化珪素を用いることができる。また、Al、Zr、Ti、Nb及びHf等の少なくともいずれかの金属の酸化物、上記の少なくともいずれかの金属の窒化物、または、上記の少なくともいずれかの金属の酸窒化物を用いても良い。
図9(a)は、第2実施形態に係る半導体発光装置2を模式的に表す上面図である。図9(b)および(c)は、半導体発光装置2の要部模式断面図である。図9(b)は、図9(a)中に示すD-D線に沿った断面を表し、図9(c)は、図9(a)中に示すE-E線に沿った断面を表している。
図10(a)は、第3実施形態に係る半導体発光装置3を模式的に表す上面図であり、図10(b)は、半導体発光装置3の要部模式断面図である。図10(b)は、図10(a)中に示すF-F線に沿った断面を表している。
図11(a)および(b)に示す例では、発光体10の側面10cと、凹部50と、の間のp形半導体層12は、p電極35に電気的に接続される。このため、発光体10の側面10cを覆う誘電体膜47を設けることが好ましい。
Claims (12)
- 第1導電形の第1半導体層と、第2導電形の第2半導体層と、前記第1半導体層と第2半導体層との間に設けられた発光層と、を含む発光体と、
前記第1半導体層に電気的に接続された第1金属層と、
前記第2半導体層に電気的に接続された第2金属層と、
を備え、
前記発光体は、
前記第1半導体層の表面を含む第1面と、
前記第2半導体の表面を含む第2面と、
前記第1半導体層の外縁を含む側面と、
前記第2面から前記第1半導体層中に至る深さに設けられ、前記側面に対向する内面を有する凹部と、
を有する半導体発光装置。 - 前記側面と前記内面との間隔は、前記発光体の積層方向の厚さの0.2倍以上、10倍以下である請求項1記載の半導体発光装置。
- 前記内面と前記第2面との間において前記側面に向き合う内角は、90度以上である請求項1または2に記載の半導体発光装置。
- 前記内面は、前記発光層を囲む請求項1〜3のいずれか1つに記載の半導体発光装置。
- 前記凹部は、前記第2面に開口を有し、
前記開口の最小幅は、前記発光体の積層方向の幅の0.1倍以上、10倍以下である請求項1〜4のいずれか1つに記載の半導体発光装置。 - 前記第2半導体層は、前記第2金属層に電気的に接続されない第1部分と、前記第2金属層に電気的に接続された第2部分と、を有し、
前記第1部分は、前記側面と前記内面との間に設けられる請求項1〜5のいずれか1つに記載の半導体発光装置。 - 前記側面に沿って配置された複数の前記凹部を有する請求項1〜3のいずれか1つに記載の半導体発光装置。
- 前記凹部を覆う第1誘電体膜をさらに備え、
前記第1金属層は、前記凹部の底面において前記第1半導体層に接し、
前記第2金属層は、前記第2面上において前記第2半導体層に接し、
前記第1誘電体膜は、前記第1金属層を覆う請求項1〜7のいずれか1つに記載の半導体発光装置。 - 前記第1誘電体膜を介して前記内面を覆う第3金属層をさらに備えた請求項8記載の半導体発光装置。
- 前記発光体の前記第2面側に設けられた基板と、
前記発光体と前記基板との間に設けられた導電性の接合層と、
をさらに備え、
前記基板は、前記第2金属層に前記接合層を介して電気的に接続され、
前記第1金属層は、前記基板に沿って前記発光体の外側に延びる延在部を有する請求項8または9に記載の半導体発光装置。 - 前記第2面を覆う第1誘電体膜をさらに備え、
前記第1金属層は、前記凹部の底面において前記第1半導体層に接し、
前記第2金属層は、前記第2面上において前記第2半導体層に接し、
前記第1誘電体膜は、前記第2金属層を覆う請求項1〜7のいずれか1つに記載の半導体発光装置。 - 前記発光体の前記第2面側に設けられた基板と、
前記発光体と前記基板との間に設けられた導電性の接合層と、
をさらに備え、
前記基板は、前記第1金属層に前記接合層を介して電気的に接続され、
前記第2金属層は、前記基板に沿って前記発光体の外側に延びる延在部を有する請求項11記載の半導体発光装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015120275A JP2017005191A (ja) | 2015-06-15 | 2015-06-15 | 半導体発光装置 |
US15/055,255 US9911899B2 (en) | 2015-06-15 | 2016-02-26 | Semiconductor light-emitting device |
CN201610132725.5A CN106252490B (zh) | 2015-06-15 | 2016-03-09 | 半导体发光装置 |
CN201910525848.9A CN110518103B (zh) | 2015-06-15 | 2016-03-09 | 半导体发光装置 |
TW105107255A TWI613837B (zh) | 2015-06-15 | 2016-03-09 | 半導體發光裝置 |
US15/875,887 US10128408B2 (en) | 2015-06-15 | 2018-01-19 | Semiconductor light-emitting device |
US16/153,325 US10403790B2 (en) | 2015-06-15 | 2018-10-05 | Method for manufacturing semiconductor light-emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2015120275A JP2017005191A (ja) | 2015-06-15 | 2015-06-15 | 半導体発光装置 |
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Publication Number | Publication Date |
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JP2017005191A true JP2017005191A (ja) | 2017-01-05 |
JP2017005191A5 JP2017005191A5 (ja) | 2018-07-26 |
Family
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JP2015120275A Pending JP2017005191A (ja) | 2015-06-15 | 2015-06-15 | 半導体発光装置 |
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US (3) | US9911899B2 (ja) |
JP (1) | JP2017005191A (ja) |
CN (2) | CN106252490B (ja) |
TW (1) | TWI613837B (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190079467A (ko) * | 2017-12-27 | 2019-07-05 | 엘지이노텍 주식회사 | 반도체 소자 |
KR20200018949A (ko) * | 2018-08-13 | 2020-02-21 | 엘지이노텍 주식회사 | 반도체 소자 |
KR20200021797A (ko) * | 2018-08-21 | 2020-03-02 | 엘지이노텍 주식회사 | 반도체 소자 |
KR20200021798A (ko) * | 2018-08-21 | 2020-03-02 | 엘지이노텍 주식회사 | 반도체 소자 |
JP2020047835A (ja) * | 2018-09-20 | 2020-03-26 | 日亜化学工業株式会社 | 半導体素子の製造方法 |
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KR102353570B1 (ko) * | 2015-08-24 | 2022-01-20 | 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 | 발광소자 및 이를 구비한 발광 소자 패키지 |
KR20190127218A (ko) * | 2018-05-04 | 2019-11-13 | 엘지이노텍 주식회사 | 반도체 소자 패키지 및 이를 포함하는 광조사장치 |
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Also Published As
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US10128408B2 (en) | 2018-11-13 |
CN106252490A (zh) | 2016-12-21 |
US20160365481A1 (en) | 2016-12-15 |
US20190051795A1 (en) | 2019-02-14 |
US20180145215A1 (en) | 2018-05-24 |
CN106252490B (zh) | 2019-07-09 |
TW201644067A (zh) | 2016-12-16 |
US9911899B2 (en) | 2018-03-06 |
TWI613837B (zh) | 2018-02-01 |
CN110518103B (zh) | 2022-10-21 |
CN110518103A (zh) | 2019-11-29 |
US10403790B2 (en) | 2019-09-03 |
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