JP2017003617A5 - - Google Patents
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- JP2017003617A5 JP2017003617A5 JP2015114158A JP2015114158A JP2017003617A5 JP 2017003617 A5 JP2017003617 A5 JP 2017003617A5 JP 2015114158 A JP2015114158 A JP 2015114158A JP 2015114158 A JP2015114158 A JP 2015114158A JP 2017003617 A5 JP2017003617 A5 JP 2017003617A5
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- 239000000758 substrate Substances 0.000 claims description 35
- 230000003287 optical Effects 0.000 claims description 10
- 238000006073 displacement reaction Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015114158A JP6557515B2 (ja) | 2015-06-04 | 2015-06-04 | 走査露光装置、走査露光方法、及びデバイス製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015114158A JP6557515B2 (ja) | 2015-06-04 | 2015-06-04 | 走査露光装置、走査露光方法、及びデバイス製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2017003617A JP2017003617A (ja) | 2017-01-05 |
JP2017003617A5 true JP2017003617A5 (zh) | 2018-07-12 |
JP6557515B2 JP6557515B2 (ja) | 2019-08-07 |
Family
ID=57754665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015114158A Active JP6557515B2 (ja) | 2015-06-04 | 2015-06-04 | 走査露光装置、走査露光方法、及びデバイス製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6557515B2 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019053108A (ja) | 2017-09-13 | 2019-04-04 | 東芝メモリ株式会社 | 露光装置及び面位置制御方法 |
JP2020112605A (ja) * | 2019-01-08 | 2020-07-27 | キヤノン株式会社 | 露光装置およびその制御方法、および、物品製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08316123A (ja) * | 1995-05-19 | 1996-11-29 | Nikon Corp | 投影露光装置 |
JPH1097987A (ja) * | 1996-09-25 | 1998-04-14 | Canon Inc | 走査型露光装置および方法 |
JPH11135420A (ja) * | 1997-10-30 | 1999-05-21 | Nikon Corp | 投影露光装置 |
JP2003059817A (ja) * | 2001-08-21 | 2003-02-28 | Nikon Corp | 露光方法及び露光装置並びにマイクロデバイス製造方法 |
JP4261810B2 (ja) * | 2002-03-18 | 2009-04-30 | キヤノン株式会社 | 露光装置、デバイス製造方法 |
US6853440B1 (en) * | 2003-04-04 | 2005-02-08 | Asml Netherlands B.V. | Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination |
JP2009164296A (ja) * | 2007-12-28 | 2009-07-23 | Canon Inc | 露光装置およびデバイス製造方法 |
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2015
- 2015-06-04 JP JP2015114158A patent/JP6557515B2/ja active Active
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