JP2020095244A5 - - Google Patents

Download PDF

Info

Publication number
JP2020095244A5
JP2020095244A5 JP2019137785A JP2019137785A JP2020095244A5 JP 2020095244 A5 JP2020095244 A5 JP 2020095244A5 JP 2019137785 A JP2019137785 A JP 2019137785A JP 2019137785 A JP2019137785 A JP 2019137785A JP 2020095244 A5 JP2020095244 A5 JP 2020095244A5
Authority
JP
Japan
Prior art keywords
original plate
mark
held
original
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2019137785A
Other languages
English (en)
Japanese (ja)
Other versions
JP7353846B2 (ja
JP2020095244A (ja
Filing date
Publication date
Application filed filed Critical
Priority to TW108138343A priority Critical patent/TWI821436B/zh
Priority to EP19209488.6A priority patent/EP3667423B1/en
Priority to KR1020190148416A priority patent/KR102605876B1/ko
Priority to US16/691,334 priority patent/US11275319B2/en
Priority to CN201911169433.9A priority patent/CN111258183B/zh
Publication of JP2020095244A publication Critical patent/JP2020095244A/ja
Publication of JP2020095244A5 publication Critical patent/JP2020095244A5/ja
Application granted granted Critical
Publication of JP7353846B2 publication Critical patent/JP7353846B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2019137785A 2018-11-30 2019-07-26 リソグラフィ装置、判定方法、および物品の製造方法 Active JP7353846B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
TW108138343A TWI821436B (zh) 2018-11-30 2019-10-24 微影裝置、確定方法及製造物品的方法
EP19209488.6A EP3667423B1 (en) 2018-11-30 2019-11-15 Lithography apparatus, determination method, and method of manufacturing an article
KR1020190148416A KR102605876B1 (ko) 2018-11-30 2019-11-19 리소그래피 장치, 판정 방법, 및 물품 제조 방법
US16/691,334 US11275319B2 (en) 2018-11-30 2019-11-21 Lithography apparatus, determination method, and method of manufacturing an article
CN201911169433.9A CN111258183B (zh) 2018-11-30 2019-11-26 光刻设备、确定方法和制造物品的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018225476 2018-11-30
JP2018225476 2018-11-30

Publications (3)

Publication Number Publication Date
JP2020095244A JP2020095244A (ja) 2020-06-18
JP2020095244A5 true JP2020095244A5 (zh) 2022-07-20
JP7353846B2 JP7353846B2 (ja) 2023-10-02

Family

ID=71084083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019137785A Active JP7353846B2 (ja) 2018-11-30 2019-07-26 リソグラフィ装置、判定方法、および物品の製造方法

Country Status (2)

Country Link
JP (1) JP7353846B2 (zh)
TW (1) TWI821436B (zh)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1027743A (ja) * 1996-07-11 1998-01-27 Canon Inc 投影露光装置、デバイス製造方法及び収差補正光学系
JP2003084189A (ja) 2001-09-07 2003-03-19 Canon Inc オートフォーカス検出方法および投影露光装置
TWI396225B (zh) * 2004-07-23 2013-05-11 尼康股份有限公司 成像面測量方法、曝光方法、元件製造方法以及曝光裝置
US20140340663A1 (en) 2011-09-16 2014-11-20 Asml Netherlands B.V. Apparatus for Monitoring a Lithographic Patterning Device
JP6818501B2 (ja) * 2016-10-19 2021-01-20 キヤノン株式会社 リソグラフィ装置、および物品製造方法

Similar Documents

Publication Publication Date Title
JP6381184B2 (ja) 校正方法、測定装置、露光装置および物品の製造方法
TW201712447A (zh) 微影裝置及元件製造方法
JP2015017844A5 (zh)
CN105093845B (zh) 光刻装置、确定方法和产品的制造方法
JP2016201423A5 (zh)
JP2015154008A (ja) 検出装置、インプリント装置、および物品の製造方法
TWI638240B (zh) 曝光裝置、曝光方法，及設備製造方法
US9996916B2 (en) Evaluation method, storage medium, exposure apparatus, exposure method, and method of manufacturing article
TW201604646A (zh) 用於控制來自光刻成像系統之紫外光之焦點的方法和控制器以及利用其形成積體電路之裝置
JP2021009230A5 (zh)
TWI695233B (zh) 計算方法、曝光方法、儲存媒體、曝光裝置以及製造物品之方法
JP2016129212A (ja) 計測装置、リソグラフィ装置及び物品の製造方法
JP2023550904A (ja) メトロロジ方法並びに関連付けられたメトロロジ及びリソグラフィ装置
JP6386732B2 (ja) 検出装置、検出方法、及びリソグラフィ装置
JP2020095244A5 (zh)
JP2018022114A5 (zh)
US20200218169A1 (en) Methods and apparatus for use in a device manufacturing method
JP2016090444A (ja) 計測装置、リソグラフィ装置、及び物品の製造方法
JP2016058452A5 (zh)
JP2022074800A5 (zh)
JP7041489B2 (ja) 評価方法、決定方法、リソグラフィ装置、およびプログラム
JP2017003617A5 (zh)
US9366637B2 (en) Method for establishing distortion properties of an optical system in a microlithographic measurement system
TWI678726B (zh) 圖案化方法、微影蝕刻裝置及物品製造方法
JP7114370B2 (ja) 露光装置および物品の製造方法