JP7353846B2 - リソグラフィ装置、判定方法、および物品の製造方法 - Google Patents

リソグラフィ装置、判定方法、および物品の製造方法 Download PDF

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JP7353846B2
JP7353846B2 JP2019137785A JP2019137785A JP7353846B2 JP 7353846 B2 JP7353846 B2 JP 7353846B2 JP 2019137785 A JP2019137785 A JP 2019137785A JP 2019137785 A JP2019137785 A JP 2019137785A JP 7353846 B2 JP7353846 B2 JP 7353846B2
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JP2020095244A5 (zh
JP2020095244A (ja
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幸士郎 荒原
一将 田中
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Canon Inc
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Canon Inc
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Priority to TW108138343A priority Critical patent/TWI821436B/zh
Priority to EP19209488.6A priority patent/EP3667423B1/en
Priority to KR1020190148416A priority patent/KR102605876B1/ko
Priority to US16/691,334 priority patent/US11275319B2/en
Priority to CN201911169433.9A priority patent/CN111258183B/zh
Publication of JP2020095244A publication Critical patent/JP2020095244A/ja
Publication of JP2020095244A5 publication Critical patent/JP2020095244A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2019137785A 2018-11-30 2019-07-26 リソグラフィ装置、判定方法、および物品の製造方法 Active JP7353846B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
TW108138343A TWI821436B (zh) 2018-11-30 2019-10-24 微影裝置、確定方法及製造物品的方法
EP19209488.6A EP3667423B1 (en) 2018-11-30 2019-11-15 Lithography apparatus, determination method, and method of manufacturing an article
KR1020190148416A KR102605876B1 (ko) 2018-11-30 2019-11-19 리소그래피 장치, 판정 방법, 및 물품 제조 방법
US16/691,334 US11275319B2 (en) 2018-11-30 2019-11-21 Lithography apparatus, determination method, and method of manufacturing an article
CN201911169433.9A CN111258183B (zh) 2018-11-30 2019-11-26 光刻设备、确定方法和制造物品的方法

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JP2018225476 2018-11-30
JP2018225476 2018-11-30

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JP2020095244A JP2020095244A (ja) 2020-06-18
JP2020095244A5 JP2020095244A5 (zh) 2022-07-20
JP7353846B2 true JP7353846B2 (ja) 2023-10-02

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TW (1) TWI821436B (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003084189A (ja) 2001-09-07 2003-03-19 Canon Inc オートフォーカス検出方法および投影露光装置
JP2014527312A (ja) 2011-09-16 2014-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィパターニングデバイスを監視する装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1027743A (ja) * 1996-07-11 1998-01-27 Canon Inc 投影露光装置、デバイス製造方法及び収差補正光学系
TWI396225B (zh) * 2004-07-23 2013-05-11 尼康股份有限公司 成像面測量方法、曝光方法、元件製造方法以及曝光裝置
JP6818501B2 (ja) * 2016-10-19 2021-01-20 キヤノン株式会社 リソグラフィ装置、および物品製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003084189A (ja) 2001-09-07 2003-03-19 Canon Inc オートフォーカス検出方法および投影露光装置
JP2014527312A (ja) 2011-09-16 2014-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィパターニングデバイスを監視する装置

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TWI821436B (zh) 2023-11-11
JP2020095244A (ja) 2020-06-18
TW202036170A (zh) 2020-10-01

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