JP2016530728A5 - - Google Patents

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Publication number
JP2016530728A5
JP2016530728A5 JP2016539575A JP2016539575A JP2016530728A5 JP 2016530728 A5 JP2016530728 A5 JP 2016530728A5 JP 2016539575 A JP2016539575 A JP 2016539575A JP 2016539575 A JP2016539575 A JP 2016539575A JP 2016530728 A5 JP2016530728 A5 JP 2016530728A5
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JP
Japan
Prior art keywords
conduit
lens assembly
projection lens
parallel
processing unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016539575A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016530728A (ja
JP6224252B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2014/069116 external-priority patent/WO2015032955A1/en
Publication of JP2016530728A publication Critical patent/JP2016530728A/ja
Publication of JP2016530728A5 publication Critical patent/JP2016530728A5/ja
Application granted granted Critical
Publication of JP6224252B2 publication Critical patent/JP6224252B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016539575A 2013-09-07 2014-09-08 標的処理ユニット Active JP6224252B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361875016P 2013-09-07 2013-09-07
US61/875,016 2013-09-07
PCT/EP2014/069116 WO2015032955A1 (en) 2013-09-07 2014-09-08 Target processing unit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017129332A Division JP6580634B2 (ja) 2013-09-07 2017-06-30 標的処理ユニット

Publications (3)

Publication Number Publication Date
JP2016530728A JP2016530728A (ja) 2016-09-29
JP2016530728A5 true JP2016530728A5 (https=) 2017-02-09
JP6224252B2 JP6224252B2 (ja) 2017-11-01

Family

ID=51492355

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016539575A Active JP6224252B2 (ja) 2013-09-07 2014-09-08 標的処理ユニット
JP2017129332A Active JP6580634B2 (ja) 2013-09-07 2017-06-30 標的処理ユニット

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017129332A Active JP6580634B2 (ja) 2013-09-07 2017-06-30 標的処理ユニット

Country Status (6)

Country Link
US (2) US9263234B2 (https=)
JP (2) JP6224252B2 (https=)
KR (2) KR101784752B1 (https=)
CN (2) CN107272352B (https=)
NL (2) NL2013437B1 (https=)
WO (1) WO2015032955A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9703213B2 (en) * 2011-09-12 2017-07-11 Mapper Lithography Ip B.V. Substrate processing apparatus
US9349567B2 (en) * 2013-05-10 2016-05-24 Hitachi High-Technologies Corporation Charged particle beam device
DE102016217285A1 (de) * 2016-09-12 2018-03-15 Carl Zeiss Smt Gmbh Vorrichtung zur übertragung von elektrischen signalen sowie lithographieanlage
WO2018074306A1 (ja) * 2016-10-17 2018-04-26 株式会社ニコン 露光システム及びリソグラフィシステム
US10905025B1 (en) * 2019-06-12 2021-01-26 Facebook, Inc. Interconnection module and server rack
CN111239916B (zh) * 2020-02-12 2021-05-18 烽火通信科技股份有限公司 光纤背板上光纤连接器用的清洁工具及清洁方法
KR102467191B1 (ko) * 2020-03-11 2022-11-16 주식회사 포스코 광 점퍼 코드 안전 장치 및 그를 이용한 전력 계통 시스템
CN113495436B (zh) * 2021-07-13 2023-12-29 江门市和盈新材料科技有限公司 一种光电子元件智能制造的光刻机
EP4290550A1 (en) * 2022-06-10 2023-12-13 ASML Netherlands B.V. Electron-optical device
CN121816638A (zh) * 2023-09-12 2026-04-07 朗姆研究公司 在气体输送系统中暴露于大气的防止

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US5250808A (en) * 1987-05-21 1993-10-05 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal system for an environmental scanning electron microscope
US4831270A (en) * 1987-05-21 1989-05-16 Ion Implant Services Ion implantation apparatus
AU3794097A (en) 1996-06-10 1998-01-07 Holographic Lithography Systems, Inc. Holographic patterning method and tool for production environments
US6714278B2 (en) * 1996-11-25 2004-03-30 Nikon Corporation Exposure apparatus
TW591694B (en) * 2001-02-13 2004-06-11 Nikon Corp Specification determining method, making method and adjusting method of projection optical system, exposure apparatus and making method thereof, and computer system
US6756706B2 (en) 2002-01-18 2004-06-29 Nikon Corporation Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines
JP2004055933A (ja) 2002-07-22 2004-02-19 Advantest Corp 電子ビーム露光装置、及び電子ビーム計測モジュール
JP2005106166A (ja) 2003-09-30 2005-04-21 Nikon Corp アクティブ除振装置及び露光装置
JP2005209702A (ja) * 2004-01-20 2005-08-04 Fujitsu Access Ltd 電子機器用キャビネット
JP4405867B2 (ja) * 2004-06-29 2010-01-27 キヤノン株式会社 電子線露光装置、および、デバイス製造方法
JP2006079911A (ja) * 2004-09-09 2006-03-23 Hitachi High-Technologies Corp 電子ビーム電流計測方法、電子ビーム描画装置および電子ビーム検出器
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US8362441B2 (en) * 2009-10-09 2013-01-29 Mapper Lithography Ip B.V. Enhanced integrity projection lens assembly
NL2003619C2 (en) * 2009-10-09 2011-04-12 Mapper Lithography Ip Bv Projection lens assembly.
US20110261344A1 (en) * 2009-12-31 2011-10-27 Mapper Lithography Ip B.V. Exposure method
CN102834777B (zh) 2010-02-23 2016-03-09 Asml荷兰有限公司 光刻设备和器件制造方法
US20120069317A1 (en) * 2010-09-20 2012-03-22 Jerry Peijster Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
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JP6038882B2 (ja) * 2011-04-20 2016-12-07 マッパー・リソグラフィー・アイピー・ビー．ブイ． 光ファイバの構成体及びこのような構成体を形成する方法
NL2007392C2 (en) 2011-09-12 2013-03-13 Mapper Lithography Ip Bv Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly.
US9703213B2 (en) * 2011-09-12 2017-07-11 Mapper Lithography Ip B.V. Substrate processing apparatus
CN103797420A (zh) 2011-09-12 2014-05-14 迈普尔平版印刷Ip有限公司 具有基底板的真空腔室
KR101945964B1 (ko) * 2012-05-14 2019-02-11 마퍼 리쏘그라피 아이피 비.브이. 하전 입자 다중-빔렛 리소그래피 시스템 및 냉각 장치 제조 방법
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法

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