JP2016530728A5 - - Google Patents

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Publication number
JP2016530728A5
JP2016530728A5 JP2016539575A JP2016539575A JP2016530728A5 JP 2016530728 A5 JP2016530728 A5 JP 2016530728A5 JP 2016539575 A JP2016539575 A JP 2016539575A JP 2016539575 A JP2016539575 A JP 2016539575A JP 2016530728 A5 JP2016530728 A5 JP 2016530728A5
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JP
Japan
Prior art keywords
conduit
lens assembly
projection lens
parallel
processing unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016539575A
Other languages
English (en)
Japanese (ja)
Other versions
JP6224252B2 (ja
JP2016530728A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2014/069116 external-priority patent/WO2015032955A1/en
Publication of JP2016530728A publication Critical patent/JP2016530728A/ja
Publication of JP2016530728A5 publication Critical patent/JP2016530728A5/ja
Application granted granted Critical
Publication of JP6224252B2 publication Critical patent/JP6224252B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2016539575A 2013-09-07 2014-09-08 標的処理ユニット Active JP6224252B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361875016P 2013-09-07 2013-09-07
US61/875,016 2013-09-07
PCT/EP2014/069116 WO2015032955A1 (en) 2013-09-07 2014-09-08 Target processing unit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017129332A Division JP6580634B2 (ja) 2013-09-07 2017-06-30 標的処理ユニット

Publications (3)

Publication Number Publication Date
JP2016530728A JP2016530728A (ja) 2016-09-29
JP2016530728A5 true JP2016530728A5 (https=) 2017-02-09
JP6224252B2 JP6224252B2 (ja) 2017-11-01

Family

ID=51492355

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016539575A Active JP6224252B2 (ja) 2013-09-07 2014-09-08 標的処理ユニット
JP2017129332A Active JP6580634B2 (ja) 2013-09-07 2017-06-30 標的処理ユニット

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017129332A Active JP6580634B2 (ja) 2013-09-07 2017-06-30 標的処理ユニット

Country Status (6)

Country Link
US (2) US9263234B2 (https=)
JP (2) JP6224252B2 (https=)
KR (2) KR101784752B1 (https=)
CN (2) CN107272352B (https=)
NL (2) NL2013438B1 (https=)
WO (1) WO2015032955A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103930829A (zh) * 2011-09-12 2014-07-16 迈普尔平版印刷Ip有限公司 基板处理装置
WO2014181685A1 (ja) * 2013-05-10 2014-11-13 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE102016217285A1 (de) 2016-09-12 2018-03-15 Carl Zeiss Smt Gmbh Vorrichtung zur übertragung von elektrischen signalen sowie lithographieanlage
WO2018074306A1 (ja) * 2016-10-17 2018-04-26 株式会社ニコン 露光システム及びリソグラフィシステム
US10905025B1 (en) * 2019-06-12 2021-01-26 Facebook, Inc. Interconnection module and server rack
CN111239916B (zh) * 2020-02-12 2021-05-18 烽火通信科技股份有限公司 光纤背板上光纤连接器用的清洁工具及清洁方法
KR102467191B1 (ko) * 2020-03-11 2022-11-16 주식회사 포스코 광 점퍼 코드 안전 장치 및 그를 이용한 전력 계통 시스템
CN113495436B (zh) * 2021-07-13 2023-12-29 江门市和盈新材料科技有限公司 一种光电子元件智能制造的光刻机
EP4290550A1 (en) * 2022-06-10 2023-12-13 ASML Netherlands B.V. Electron-optical device
WO2025058838A1 (en) * 2023-09-12 2025-03-20 Lam Research Corporation Prevention of atmosphere exposure in gas delivery system

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US5250808A (en) * 1987-05-21 1993-10-05 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal system for an environmental scanning electron microscope
US4831270A (en) * 1987-05-21 1989-05-16 Ion Implant Services Ion implantation apparatus
KR20000016498A (ko) * 1996-06-10 2000-03-25 다니엘 제이. 설리반 생산환경을 위한 홀로그래픽 패터닝방법 및 공구
US6714278B2 (en) * 1996-11-25 2004-03-30 Nikon Corporation Exposure apparatus
TWI220998B (en) * 2001-02-13 2004-09-11 Nikon Corp Exposure method, exposure apparatus and manufacture method of the same
US6756706B2 (en) 2002-01-18 2004-06-29 Nikon Corporation Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines
JP2004055933A (ja) 2002-07-22 2004-02-19 Advantest Corp 電子ビーム露光装置、及び電子ビーム計測モジュール
JP2005106166A (ja) * 2003-09-30 2005-04-21 Nikon Corp アクティブ除振装置及び露光装置
JP2005209702A (ja) * 2004-01-20 2005-08-04 Fujitsu Access Ltd 電子機器用キャビネット
JP4405867B2 (ja) * 2004-06-29 2010-01-27 キヤノン株式会社 電子線露光装置、および、デバイス製造方法
JP2006079911A (ja) * 2004-09-09 2006-03-23 Hitachi High-Technologies Corp 電子ビーム電流計測方法、電子ビーム描画装置および電子ビーム検出器
JP5408674B2 (ja) 2008-02-26 2014-02-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． 投影レンズ構成体
US8226795B2 (en) * 2009-02-03 2012-07-24 Nordson Corporation Magnetic clips and substrate holders for use in a plasma processing system
NL1036912C2 (en) 2009-04-29 2010-11-01 Mapper Lithography Ip Bv Charged particle optical system comprising an electrostatic deflector.
NL2003619C2 (en) * 2009-10-09 2011-04-12 Mapper Lithography Ip Bv Projection lens assembly.
US8362441B2 (en) * 2009-10-09 2013-01-29 Mapper Lithography Ip B.V. Enhanced integrity projection lens assembly
US8638109B2 (en) * 2009-12-31 2014-01-28 Mapper Lithography Ip B.V. Capacitive sensing system with differential pairs
CN102834777B (zh) 2010-02-23 2016-03-09 Asml荷兰有限公司 光刻设备和器件制造方法
US20120069317A1 (en) * 2010-09-20 2012-03-22 Jerry Peijster Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
JP6158091B2 (ja) * 2010-12-14 2017-07-05 マッパー・リソグラフィー・アイピー・ビー．ブイ． リソグラフィシステム及びこのようなリソグラフィシステムで基板を処理する方法
JP6038882B2 (ja) * 2011-04-20 2016-12-07 マッパー・リソグラフィー・アイピー・ビー．ブイ． 光ファイバの構成体及びこのような構成体を形成する方法
NL2007392C2 (en) 2011-09-12 2013-03-13 Mapper Lithography Ip Bv Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly.
CN103930829A (zh) * 2011-09-12 2014-07-16 迈普尔平版印刷Ip有限公司 基板处理装置
TW201337469A (zh) 2011-09-12 2013-09-16 瑪波微影Ｉｐ公司 具有基底板之真空腔室
EP2850635B1 (en) 2012-05-14 2016-04-27 Mapper Lithography IP B.V. Charged particle multi-beamlet lithography system and cooling arrangement manufacturing method
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法

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