JP2016527169A5 - - Google Patents

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Publication number
JP2016527169A5
JP2016527169A5 JP2016523684A JP2016523684A JP2016527169A5 JP 2016527169 A5 JP2016527169 A5 JP 2016527169A5 JP 2016523684 A JP2016523684 A JP 2016523684A JP 2016523684 A JP2016523684 A JP 2016523684A JP 2016527169 A5 JP2016527169 A5 JP 2016527169A5
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JP
Japan
Prior art keywords
mbar
substrate tube
deposited
silica layer
glassy silica
Prior art date
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Application number
JP2016523684A
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English (en)
Japanese (ja)
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JP6214766B2 (ja
JP2016527169A (ja
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Publication date
Priority claimed from NL2011075A external-priority patent/NL2011075C2/en
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Publication of JP2016527169A publication Critical patent/JP2016527169A/ja
Publication of JP2016527169A5 publication Critical patent/JP2016527169A5/ja
Application granted granted Critical
Publication of JP6214766B2 publication Critical patent/JP6214766B2/ja
Active legal-status Critical Current
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JP2016523684A 2013-07-01 2014-06-05 基材管の除去を伴うプラズマ蒸着工程 Active JP6214766B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL2011075A NL2011075C2 (en) 2013-07-01 2013-07-01 Pcvd process with removal of substrate tube.
NL2011075 2013-07-01
PCT/NL2014/050357 WO2015002530A1 (en) 2013-07-01 2014-06-05 Plasma deposition process with removal of substrate tube

Publications (3)

Publication Number Publication Date
JP2016527169A JP2016527169A (ja) 2016-09-08
JP2016527169A5 true JP2016527169A5 (enExample) 2017-02-09
JP6214766B2 JP6214766B2 (ja) 2017-10-18

Family

ID=50983083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016523684A Active JP6214766B2 (ja) 2013-07-01 2014-06-05 基材管の除去を伴うプラズマ蒸着工程

Country Status (11)

Country Link
US (2) US9816178B2 (enExample)
EP (1) EP3016915B1 (enExample)
JP (1) JP6214766B2 (enExample)
KR (1) KR102235333B1 (enExample)
CN (1) CN105358496B (enExample)
BR (1) BR112015032407B1 (enExample)
DK (1) DK3016915T3 (enExample)
ES (1) ES2646945T3 (enExample)
NL (1) NL2011075C2 (enExample)
RU (1) RU2652215C2 (enExample)
WO (1) WO2015002530A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2011075C2 (en) 2013-07-01 2015-01-05 Draka Comteq Bv Pcvd process with removal of substrate tube.
NL2011077C2 (en) * 2013-07-01 2015-01-05 Draka Comteq Bv A method for manufacturing a precursor for a primary preform for optical fibres by means of an internal plasma chemical vapour deposition (pcvd) process.
NL1041529B1 (en) 2015-10-16 2017-05-02 Draka Comteq Bv A method for etching a primary preform and the etched primary preform thus obtained.
CN118908559A (zh) 2016-03-03 2024-11-08 普睿司曼股份公司 光纤用预制件的制造方法

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