KR102235333B1 - 기재 튜브의 제거를 포함한 플라즈마 침착 공정 - Google Patents
기재 튜브의 제거를 포함한 플라즈마 침착 공정 Download PDFInfo
- Publication number
- KR102235333B1 KR102235333B1 KR1020157036888A KR20157036888A KR102235333B1 KR 102235333 B1 KR102235333 B1 KR 102235333B1 KR 1020157036888 A KR1020157036888 A KR 1020157036888A KR 20157036888 A KR20157036888 A KR 20157036888A KR 102235333 B1 KR102235333 B1 KR 102235333B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate tube
- tube
- deposited
- vitrified silica
- vitrified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 197
- 238000005137 deposition process Methods 0.000 title claims description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 145
- 238000006243 chemical reaction Methods 0.000 claims abstract description 78
- 238000000034 method Methods 0.000 claims abstract description 54
- 230000008021 deposition Effects 0.000 claims abstract description 45
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 31
- 230000000694 effects Effects 0.000 claims abstract description 25
- 239000011521 glass Substances 0.000 claims description 69
- 239000002243 precursor Substances 0.000 claims description 31
- 239000013307 optical fiber Substances 0.000 claims description 28
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 239000010453 quartz Substances 0.000 claims description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 123
- 239000007789 gas Substances 0.000 description 53
- 238000000151 deposition Methods 0.000 description 42
- 239000000377 silicon dioxide Substances 0.000 description 19
- 239000004071 soot Substances 0.000 description 19
- 239000002019 doping agent Substances 0.000 description 17
- 238000007496 glass forming Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 15
- 239000007787 solid Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000005253 cladding Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- QHGIKMVOLGCZIP-UHFFFAOYSA-N germanium dichloride Chemical compound Cl[Ge]Cl QHGIKMVOLGCZIP-UHFFFAOYSA-N 0.000 description 2
- 239000011796 hollow space material Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- -1 F 2 Chemical compound 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
- C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2011075A NL2011075C2 (en) | 2013-07-01 | 2013-07-01 | Pcvd process with removal of substrate tube. |
| NL2011075 | 2013-07-01 | ||
| PCT/NL2014/050357 WO2015002530A1 (en) | 2013-07-01 | 2014-06-05 | Plasma deposition process with removal of substrate tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160025526A KR20160025526A (ko) | 2016-03-08 |
| KR102235333B1 true KR102235333B1 (ko) | 2021-04-05 |
Family
ID=50983083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020157036888A Active KR102235333B1 (ko) | 2013-07-01 | 2014-06-05 | 기재 튜브의 제거를 포함한 플라즈마 침착 공정 |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US9816178B2 (enExample) |
| EP (1) | EP3016915B1 (enExample) |
| JP (1) | JP6214766B2 (enExample) |
| KR (1) | KR102235333B1 (enExample) |
| CN (1) | CN105358496B (enExample) |
| BR (1) | BR112015032407B1 (enExample) |
| DK (1) | DK3016915T3 (enExample) |
| ES (1) | ES2646945T3 (enExample) |
| NL (1) | NL2011075C2 (enExample) |
| RU (1) | RU2652215C2 (enExample) |
| WO (1) | WO2015002530A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2011075C2 (en) | 2013-07-01 | 2015-01-05 | Draka Comteq Bv | Pcvd process with removal of substrate tube. |
| NL2011077C2 (en) * | 2013-07-01 | 2015-01-05 | Draka Comteq Bv | A method for manufacturing a precursor for a primary preform for optical fibres by means of an internal plasma chemical vapour deposition (pcvd) process. |
| NL1041529B1 (en) | 2015-10-16 | 2017-05-02 | Draka Comteq Bv | A method for etching a primary preform and the etched primary preform thus obtained. |
| CN118908559A (zh) | 2016-03-03 | 2024-11-08 | 普睿司曼股份公司 | 光纤用预制件的制造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020002949A1 (en) | 1997-12-31 | 2002-01-10 | Breuls Antonius Henricus Elisabeth | PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
| US20090126408A1 (en) | 2007-11-16 | 2009-05-21 | Dana Craig Bookbinder | Methods for making optical fiber preforms and microstructured optical fibers |
| US20090272716A1 (en) | 2008-04-30 | 2009-11-05 | Dana Craig Bookbinder | Process for Preparing an Optical Preform |
| US20120324958A1 (en) | 2010-07-13 | 2012-12-27 | Chen Yang | Methods for manufacturing optical fiber preform and methods for manufacturing optical fiber |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2929166A1 (de) * | 1979-07-19 | 1981-01-29 | Philips Patentverwaltung | Verfahren zur herstellung von lichtleitfasern |
| JPS56100148A (en) * | 1980-01-17 | 1981-08-11 | Fujitsu Ltd | Manufacture of glass fiber for optical transmission |
| US4417911A (en) * | 1981-02-27 | 1983-11-29 | Associated Electrical Industries Limited | Manufacture of optical fibre preforms |
| US4838643A (en) | 1988-03-23 | 1989-06-13 | Alcatel Na, Inc. | Single mode bend insensitive fiber for use in fiber optic guidance applications |
| AU640996B2 (en) * | 1990-03-29 | 1993-09-09 | Societe Anonyme Dite Alcatel Alsthom Compagnie Generale D'electricite | A method of fabricating preforms for making optical fibers by drawing |
| DE4203369C2 (de) | 1992-02-06 | 1994-08-11 | Ceramoptec Gmbh | Verfahren und Vorrichtung zur Herstellung von Vorformen für Lichtwellenleiter |
| JP3986842B2 (ja) * | 2001-07-26 | 2007-10-03 | 株式会社フジクラ | ノンゼロ分散シフト光ファイバ用光ファイバ母材の製法 |
| US6988380B2 (en) | 2002-08-15 | 2006-01-24 | Ceramoptec Industries, Inc. | Method of silica optical fiber preform production |
| US20040159124A1 (en) | 2003-02-14 | 2004-08-19 | Atkins Robert M. | Optical fiber manufacture |
| DE10316487B4 (de) | 2003-04-09 | 2005-03-31 | Heraeus Tenevo Ag | Verfahren zur Herstellung einer Vorform für optische Fasern |
| NL1024480C2 (nl) * | 2003-10-08 | 2005-04-11 | Draka Fibre Technology Bv | Werkwijze ter vervaardiging van een voorvorm voor optische vezels, alsmede werkwijze ter vervaardiging van optische vezels. |
| NL1025155C2 (nl) * | 2003-12-30 | 2005-07-04 | Draka Fibre Technology Bv | Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm. |
| JP4383377B2 (ja) * | 2005-03-22 | 2009-12-16 | 古河電気工業株式会社 | 微細構造光ファイバの作製方法 |
| DE102005043289B3 (de) | 2005-09-09 | 2006-09-14 | Heraeus Tenevo Gmbh | Verfahren zur Herstellung eines Halbzeugs für ein optisches Bauteil hoher Homogenität, zur Durchführung des Verfahrens geeigneter Rohling sowie Verwendung des Rohlings und des Halbzeugs |
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| FR2899693B1 (fr) | 2006-04-10 | 2008-08-22 | Draka Comteq France | Fibre optique monomode. |
| FR2900739B1 (fr) | 2006-05-03 | 2008-07-04 | Draka Comteq France | Fibre de compensation de la dispersion chromatique |
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| FR2908250B1 (fr) | 2006-11-03 | 2009-01-09 | Draka Comteq France Sa Sa | Fibre de compensation de la dispersion chromatique |
| DK1930753T3 (en) | 2006-12-04 | 2015-03-30 | Draka Comteq Bv | Optical fiber having a high Brillouin threshold strength and low bending |
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| FR2930997B1 (fr) | 2008-05-06 | 2010-08-13 | Draka Comteq France Sa | Fibre optique monomode |
| FR2932932B1 (fr) | 2008-06-23 | 2010-08-13 | Draka Comteq France Sa | Systeme optique multiplexe en longueur d'ondes avec fibres optiques multimodes |
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| FR2949870B1 (fr) | 2009-09-09 | 2011-12-16 | Draka Compteq France | Fibre optique multimode presentant des pertes en courbure ameliorees |
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2013
- 2013-07-01 NL NL2011075A patent/NL2011075C2/en active
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- 2014-06-05 CN CN201480037856.4A patent/CN105358496B/zh active Active
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| US20020002949A1 (en) | 1997-12-31 | 2002-01-10 | Breuls Antonius Henricus Elisabeth | PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith |
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|---|---|
| NL2011075C2 (en) | 2015-01-05 |
| US9816179B2 (en) | 2017-11-14 |
| CN105358496B (zh) | 2018-05-01 |
| ES2646945T3 (es) | 2017-12-18 |
| US9816178B2 (en) | 2017-11-14 |
| JP6214766B2 (ja) | 2017-10-18 |
| RU2016102888A (ru) | 2017-08-07 |
| KR20160025526A (ko) | 2016-03-08 |
| JP2016527169A (ja) | 2016-09-08 |
| RU2652215C2 (ru) | 2018-04-25 |
| US20160152509A1 (en) | 2016-06-02 |
| CN105358496A (zh) | 2016-02-24 |
| WO2015002530A1 (en) | 2015-01-08 |
| BR112015032407A2 (pt) | 2017-07-25 |
| EP3016915B1 (en) | 2017-08-09 |
| BR112015032407B1 (pt) | 2022-01-25 |
| EP3016915A1 (en) | 2016-05-11 |
| RU2016102888A3 (enExample) | 2018-03-29 |
| DK3016915T3 (en) | 2017-10-30 |
| US20160186316A1 (en) | 2016-06-30 |
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