JP2016522988A - ダイヤモンド基板にショットキーダイオードを製造する方法 - Google Patents
ダイヤモンド基板にショットキーダイオードを製造する方法 Download PDFInfo
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- 239000010432 diamond Substances 0.000 title claims abstract description 78
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 77
- 238000000034 method Methods 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000000758 substrate Substances 0.000 title description 8
- 239000004065 semiconductor Substances 0.000 claims abstract description 39
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 19
- 239000013078 crystal Substances 0.000 claims abstract description 14
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000001257 hydrogen Substances 0.000 claims abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 3
- 238000000137 annealing Methods 0.000 claims description 14
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 11
- 239000010931 gold Substances 0.000 claims description 11
- 229910052737 gold Inorganic materials 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 238000001953 recrystallisation Methods 0.000 claims description 4
- 238000000407 epitaxy Methods 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract description 36
- 229910052726 zirconium Inorganic materials 0.000 abstract description 34
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 230000008569 process Effects 0.000 description 13
- 230000015556 catabolic process Effects 0.000 description 11
- 229910052697 platinum Inorganic materials 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000259 microwave plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
ジルコニウム層を成膜した後にアニールが行われない場合、1mAの電流及び12.74 A/cm2 の電流密度に関しておよそ2.35Vの閾値電圧として解釈される1.97eV程度であり、
ジルコニウム層を成膜した後に350 ℃程度の温度でのアニールが行われる場合、1mAの電流及び12.74 A/cm2の電流密度に関しておよそ1.95Vの閾値電圧として解釈される1.4 eV程度であり、
ジルコニウム層を成膜した後に450 ℃程度の温度でのアニールが行われる場合、1mAの電流及び12.74 A/cm2の電流密度に関しておよそ1.1 Vの閾値電圧として解釈される1eV程度である
ことを更に決定した。
Claims (11)
- ショットキーダイオードを製造する方法であって、
a)単結晶ダイヤモンドの半導体層(105) の表面を酸素で処理して、前記半導体層(105) の水素表面終端を酸素表面終端に置換する工程、及び
b)前記半導体層(105) の表面に酸化インジウムスズの第1の導電層を物理蒸着によって形成する工程
を有することを特徴とする方法。 - a)の工程では、大気圧より低い圧力で酸素を含む筐体に前記半導体層(105) を置いて、前記半導体層(105) に紫外線を照射することを特徴とする請求項1に記載の方法。
- 前記第1の導電層を、b)の工程で酸化インジウムスズ対象のスパッタリングによって形成することを特徴とする請求項1又は2に記載の方法。
- b)の工程で、前記半導体層(105) 及び前記酸化インジウムスズ対象をアルゴンプラズマを含む筐体に置くことを特徴とする請求項3に記載の方法。
- b)の工程の後、100 〜300 ℃の範囲内の温度で酸化インジウムスズの前記第1の導電層の再結晶のアニールを行う工程を更に有することを特徴とする請求項3又は4に記載の方法。
- b)の工程の後、前記第1の導電層の表面に少なくとも第2の導電層を成膜する工程を更に有し、
前記第1の導電層及び前記第2の導電層は共に前記ショットキーダイオードの電極(109) を形成することを特徴とする請求項1乃至5のいずれかに記載の方法。 - 少なくとも1つの前記第2の導電層は金層を有していることを特徴とする請求項6に記載の方法。
- 前記半導体層(105) をP型ドープすることを特徴とする請求項1乃至7のいずれかに記載の方法。
- 同一の導電型であるが更に高濃度にドープされた単結晶ダイヤモンドの半導体層(103) 上に前記半導体層(105) をエピタキシーによって形成することを特徴とする請求項1乃至8のいずれかに記載の方法。
- 更に高濃度にドープされた前記半導体層(103) とのオーミックコンタクトを構成する電極(107) を形成する工程を更に有することを特徴とする請求項9に記載の方法。
- b)の工程で形成された前記第1の導電層の厚さは20〜30nmの範囲内であることを特徴とする請求項1乃至10のいずれかに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1353647A FR3004853B1 (fr) | 2013-04-22 | 2013-04-22 | Procede de fabrication d'une diode schottky sur un substrat en diamant |
FR1353647 | 2013-04-22 | ||
PCT/FR2014/050952 WO2014174192A1 (fr) | 2013-04-22 | 2014-04-18 | Procédé de fabrication d'une diode schottky sur un substrat en diamant |
Publications (2)
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JP2016522988A true JP2016522988A (ja) | 2016-08-04 |
JP6312810B2 JP6312810B2 (ja) | 2018-04-18 |
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JP2016509522A Active JP6312810B2 (ja) | 2013-04-22 | 2014-04-18 | ダイヤモンド基板にショットキーダイオードを製造する方法 |
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US (1) | US20160071936A1 (ja) |
EP (1) | EP2989656B1 (ja) |
JP (1) | JP6312810B2 (ja) |
ES (1) | ES2625384T3 (ja) |
FR (1) | FR3004853B1 (ja) |
WO (1) | WO2014174192A1 (ja) |
Cited By (3)
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WO2019139147A1 (ja) * | 2018-01-15 | 2019-07-18 | 国立研究開発法人産業技術総合研究所 | 単結晶ダイヤモンド基板を含む積層体 |
US11298370B2 (en) | 2017-04-24 | 2022-04-12 | Hirofumi Yamamoto | Prophylactic or therapeutic agent for inflammatory bowel disease |
US11637210B2 (en) | 2017-12-11 | 2023-04-25 | Pragmatic Printing Ltd | Schottky diode |
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JP6703683B2 (ja) * | 2017-12-20 | 2020-06-03 | 国立研究開発法人産業技術総合研究所 | 単結晶ダイヤモンドおよびそれを用いた半導体素子 |
US10497817B1 (en) * | 2018-07-09 | 2019-12-03 | Wisconsin Alumni Research Foundation | P-n diodes and p-n-p heterojunction bipolar transistors with diamond collectors and current tunneling layers |
CN113130697B (zh) * | 2019-12-31 | 2024-01-23 | 西安电子科技大学 | 一种赝竖式氢氧终端金刚石核探测器及其制备方法 |
CN112382670B (zh) * | 2020-10-10 | 2022-05-24 | 西安电子科技大学 | 一种基于高纯本征单晶金刚石的雪崩二极管及制备方法 |
CN112382669B (zh) * | 2020-10-10 | 2022-05-24 | 西安电子科技大学 | 一种赝竖式金刚石雪崩二极管及其制备方法 |
CN112967923B (zh) * | 2021-02-05 | 2022-06-10 | 中国电子科技集团公司第十三研究所 | 大尺寸晶圆上制备金刚石衬底太赫兹二极管的方法 |
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- 2014-04-18 US US14/786,130 patent/US20160071936A1/en not_active Abandoned
- 2014-04-18 JP JP2016509522A patent/JP6312810B2/ja active Active
- 2014-04-18 ES ES14722295.4T patent/ES2625384T3/es active Active
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US11298370B2 (en) | 2017-04-24 | 2022-04-12 | Hirofumi Yamamoto | Prophylactic or therapeutic agent for inflammatory bowel disease |
US11637210B2 (en) | 2017-12-11 | 2023-04-25 | Pragmatic Printing Ltd | Schottky diode |
WO2019139147A1 (ja) * | 2018-01-15 | 2019-07-18 | 国立研究開発法人産業技術総合研究所 | 単結晶ダイヤモンド基板を含む積層体 |
JP2019125639A (ja) * | 2018-01-15 | 2019-07-25 | 国立研究開発法人産業技術総合研究所 | 単結晶ダイヤモンド基板を含む積層体 |
JP7084586B2 (ja) | 2018-01-15 | 2022-06-15 | 国立研究開発法人産業技術総合研究所 | 単結晶ダイヤモンド基板を含む積層体 |
Also Published As
Publication number | Publication date |
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US20160071936A1 (en) | 2016-03-10 |
WO2014174192A1 (fr) | 2014-10-30 |
FR3004853B1 (fr) | 2016-10-21 |
JP6312810B2 (ja) | 2018-04-18 |
ES2625384T3 (es) | 2017-07-19 |
EP2989656A1 (fr) | 2016-03-02 |
FR3004853A1 (fr) | 2014-10-24 |
EP2989656B1 (fr) | 2017-02-22 |
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