JP2016521667A5 - - Google Patents

Download PDF

Info

Publication number
JP2016521667A5
JP2016521667A5 JP2016515680A JP2016515680A JP2016521667A5 JP 2016521667 A5 JP2016521667 A5 JP 2016521667A5 JP 2016515680 A JP2016515680 A JP 2016515680A JP 2016515680 A JP2016515680 A JP 2016515680A JP 2016521667 A5 JP2016521667 A5 JP 2016521667A5
Authority
JP
Japan
Prior art keywords
nitride
concentration
ammonia
gallium
acceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP2016515680A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016521667A (ja
Filing date
Publication date
Priority claimed from PL404149A external-priority patent/PL229568B1/pl
Application filed filed Critical
Publication of JP2016521667A publication Critical patent/JP2016521667A/ja
Publication of JP2016521667A5 publication Critical patent/JP2016521667A5/ja
Ceased legal-status Critical Current

Links

JP2016515680A 2013-05-30 2014-03-24 単結晶ガリウム含有窒化物の製法及びその方法によって得られる単結晶ガリウム含有窒化物 Ceased JP2016521667A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
PL404149A PL229568B1 (pl) 2013-05-30 2013-05-30 Sposób wytwarzania monokrystalicznego azotku zawierającego gal i monokrystaliczny azotek zawierający gal, wytworzony tym sposobem
PLP.404149 2013-05-30
PCT/EP2014/055876 WO2014191126A1 (en) 2013-05-30 2014-03-24 Method for obtaining monocrystalline gallium-containing nitride and monocrystalline gallium-containing nitride obtained by this method

Publications (2)

Publication Number Publication Date
JP2016521667A JP2016521667A (ja) 2016-07-25
JP2016521667A5 true JP2016521667A5 (enExample) 2019-02-14

Family

ID=50543016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016515680A Ceased JP2016521667A (ja) 2013-05-30 2014-03-24 単結晶ガリウム含有窒化物の製法及びその方法によって得られる単結晶ガリウム含有窒化物

Country Status (10)

Country Link
US (1) US20160108547A1 (enExample)
EP (1) EP3063315A1 (enExample)
JP (1) JP2016521667A (enExample)
KR (1) KR20160036013A (enExample)
CN (1) CN105556006A (enExample)
CA (1) CA2913720A1 (enExample)
HK (1) HK1224343A1 (enExample)
PL (1) PL229568B1 (enExample)
RU (1) RU2015152554A (enExample)
WO (1) WO2014191126A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL231548B1 (pl) 2014-09-11 2019-03-29 Ammono Spolka Akcyjna Sposób wytwarzania monokrystalicznego azotku zawierającego gal

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4116535B2 (ja) 2001-06-06 2008-07-09 アンモノ・スプウカ・ジ・オグラニチョノン・オドポヴィエドニアウノシツィオン ガリウム含有窒化物の単結晶の製造法及び装置
TWI334890B (en) 2002-12-11 2010-12-21 Ammono Sp Zoo Process for obtaining bulk mono-crystalline gallium-containing nitride, eliminating impurities from the obtained crystal and manufacturing substrates made of bulk mono-crystalline gallium-containing nitride
PL221055B1 (pl) 2002-12-11 2016-02-29 Ammono Spółka Z Ograniczoną Odpowiedzialnością Sposób wytwarzania objętościowego monokrystalicznego azotku zawierającego gal
PL219601B1 (pl) 2002-12-11 2015-06-30 Ammono Spółka Z Ograniczoną Odpowiedzialnością Sposób otrzymywania objętościowego monokrystalicznego azotku zawierającego gal
WO2004061923A1 (en) * 2002-12-27 2004-07-22 General Electric Company Gallium nitride crystal, homoepitaxial gallium-nitride-based devices and method for producing same
US8754449B2 (en) 2004-06-11 2014-06-17 Ammono Sp. Z O.O. High electron mobility transistor (HEMT) made of layers of Group XIII element nitrides and manufacturing method thereof
US20060247623A1 (en) * 2005-04-29 2006-11-02 Sdgi Holdings, Inc. Local delivery of an active agent from an orthopedic implant
CN102144052A (zh) * 2008-08-07 2011-08-03 Soraa有限公司 大规模氨热制备氮化镓晶棒的方法
US8878230B2 (en) * 2010-03-11 2014-11-04 Soraa, Inc. Semi-insulating group III metal nitride and method of manufacture
EP2267197A1 (en) 2009-06-25 2010-12-29 AMMONO Sp.z o.o. Method of obtaining bulk mono-crystalline gallium-containing nitride, bulk mono-crystalline gallium-containing nitride, substrates manufactured thereof and devices manufactured on such substrates
JP5291648B2 (ja) * 2010-03-17 2013-09-18 日本碍子株式会社 窒化物結晶の製造装置及び製造方法
WO2013062042A1 (ja) * 2011-10-28 2013-05-02 三菱化学株式会社 窒化物結晶の製造方法および窒化物結晶
WO2014129544A1 (ja) * 2013-02-22 2014-08-28 三菱化学株式会社 周期表第13族金属窒化物結晶およびその製造方法

Similar Documents

Publication Publication Date Title
Wang et al. Petrogenesis of ca. 1.95 Ga meta-leucogranites from the Jining Complex in the Khondalite Belt, North China Craton: Water-fluxed melting of metasedimentary rocks
Ashchepkov et al. Pyroxenites and megacrysts from Vitim picrite-basalts (Russia): Polybaric fractionation of rising melts in the mantle?
Slack et al. Some crystallography, chemistry, physics, and thermodynamics of B12O2, B12P2, B12As2, and related alpha-boron type crystals
JP2015517451A5 (enExample)
JPWO2015072136A1 (ja) SiC単結晶の製造方法
JP2008160077A (ja) Mg金属間化合物及びそれを応用したデバイス
CN109056053A (zh) Ga2O3系单晶基板
JP2017533172A (ja) 単結晶ガリウム含有窒化物の製造方法及びこの方法により製造された単結晶ガリウム含有窒化物
WO2017115466A1 (ja) 単結晶SiCの製造方法及び収容容器
RU2015152554A (ru) Способ получения монокристаллического галлийсодержащего нитрида и монокристаллический галлийсодержащий нитрид, полученный указанным способом
Tamadon et al. Reactions of Xenon with Iridiumand Osmiumhexafluoride
Duchesne et al. Source constraints on the genesis of Danubian granites in the South Carpathians Alpine Belt (Romania)
RU2157020C2 (ru) СПОСОБ ПОЛУЧЕНИЯ ТЕРМОЭЛЕКТРИЧЕСКИХ МАТЕРИАЛОВ НА ОСНОВЕ ТВЕРДЫХ РАСТВОРОВ Bi2(TeSe)3 ЭЛЕКТРОННОГО ТИПА ПРОВОДИМОСТИ
Chen et al. Phase diagrams and thermodynamic descriptions for Na–Te and K–Te binary systems
Jeong et al. Effect of thermal annealing on the characteristics of phosphorus-implanted ZnO crystals
CN103541016B (zh) 一种用于n型低阻砷化镓单晶生长的掺杂工艺及其设备
US3652421A (en) N-type lead telluride
Askarov et al. Impurity State of Transition Group Elements in the Silicon Lattice in the Process of Their Interaction with Sulfur
RU2484189C2 (ru) Способ получения алмазов с полупроводниковыми свойствами
Bagiyeva et al. Effect of annealing on the electrical properties of Pb1− x Mn x Te single crystals with excess tellurium
Liu et al. Effects of phosphorus implantation on the activation of magnesium doped in GaN
Jaakko et al. Comparison of Chemical, Electronic, and Optical Properties of Mg-Doped AlGaN
Sengün et al. U-Pb Zircon Geochronology of Meta-Gabbros from Meta-Ophiolitic Rocks in the Kazdağ Massif, NW Anatolia
UA19930U (en) Process for preparation of alloyed cdte:mn of n- and p-type of conductivity
Atuchin MICROSTRUCTURE AND CHEMICAL COMPOSITION OF CENTAUR CRYSTAL GaSe: AgGaS2