JP2016508232A5 - - Google Patents
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- JP2016508232A5 JP2016508232A5 JP2015548447A JP2015548447A JP2016508232A5 JP 2016508232 A5 JP2016508232 A5 JP 2016508232A5 JP 2015548447 A JP2015548447 A JP 2015548447A JP 2015548447 A JP2015548447 A JP 2015548447A JP 2016508232 A5 JP2016508232 A5 JP 2016508232A5
- Authority
- JP
- Japan
- Prior art keywords
- pixels
- exposure field
- motif
- projector
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012224005.5 | 2012-12-20 | ||
| DE102012224005.5A DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
| PCT/EP2013/076902 WO2014095864A1 (de) | 2012-12-20 | 2013-12-17 | Verfahren zur herstellung einer homogenen lichtverteilung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016508232A JP2016508232A (ja) | 2016-03-17 |
| JP2016508232A5 true JP2016508232A5 (https=) | 2017-11-09 |
| JP6436912B2 JP6436912B2 (ja) | 2018-12-12 |
Family
ID=49885232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015548447A Active JP6436912B2 (ja) | 2012-12-20 | 2013-12-17 | 均一な光分布を形成する方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9914265B2 (https=) |
| EP (1) | EP2934858B1 (https=) |
| JP (1) | JP6436912B2 (https=) |
| KR (1) | KR101860617B1 (https=) |
| CN (1) | CN104853902A (https=) |
| AU (1) | AU2013361779B2 (https=) |
| BR (1) | BR112015012368A2 (https=) |
| CA (1) | CA2888844A1 (https=) |
| DE (1) | DE102012224005B4 (https=) |
| WO (1) | WO2014095864A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SI3040778T1 (sl) * | 2014-12-30 | 2021-03-31 | Visitech As | Postopek za zagotavljanje enakomerne svetlosti iz svetlobnega projektorja na območju slike |
| DE102015104394B4 (de) | 2015-03-24 | 2020-06-04 | Kulzer Gmbh | Verfahren zur Herstellung einer Teil- oder Totalprothese sowie Prothese erhältlich nach diesem Verfahren |
| US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
| FR3041560B1 (fr) * | 2015-09-29 | 2017-10-20 | Prodways | Procede de fabrication d'un produit par empilement de couche de matiere |
| WO2017103115A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| TWI794149B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃粉粒、不透明成型體及彼等之製備方法 |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| EP3390290B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
| JP6523194B2 (ja) * | 2016-03-14 | 2019-05-29 | 東京エレクトロン株式会社 | 補助露光装置 |
| CN106182772B (zh) * | 2016-07-25 | 2018-06-26 | 哈尔滨工业大学 | 多种材料快速原型成型装置及方法 |
| US11014302B2 (en) * | 2017-05-11 | 2021-05-25 | Seurat Technologies, Inc. | Switchyard beam routing of patterned light for additive manufacturing |
| US11390017B2 (en) * | 2017-06-21 | 2022-07-19 | Essilor International | Method of manufacturing optical article and optical shaping apparatus |
| CN107891596A (zh) * | 2017-12-15 | 2018-04-10 | 博纳云智（天津）科技有限公司 | 一种dlp光固化3d打印机的光强均匀校正方法 |
| CN110394980A (zh) * | 2018-04-24 | 2019-11-01 | 三纬国际立体列印科技股份有限公司 | 立体打印系统 |
| US10503076B1 (en) * | 2018-08-29 | 2019-12-10 | Applied Materials, Inc. | Reserving spatial light modulator sections to address field non-uniformities |
| NO20190617A1 (en) * | 2019-05-16 | 2020-11-17 | Visitech As | System and method for exposing a material with images |
| FR3119562B1 (fr) * | 2021-02-09 | 2024-08-30 | Univ Claude Bernard Lyon | Procédé d'impression d'un objet à imprimer, et imprimante adaptée pour la mise en oeuvre du procédé. |
| KR102443272B1 (ko) * | 2021-07-20 | 2022-09-15 | 단국대학교 산학협력단 | 특정 경로를 따른 중복 광조사를 이용하는 3d 프린터 및 3d 프린팅 방법 |
| CN118596582B (zh) * | 2024-06-24 | 2025-04-08 | 广州黑格智造信息科技有限公司 | 三维打印设备的光调制器控制方法及三维打印设备 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3326902B2 (ja) * | 1993-09-10 | 2002-09-24 | 株式会社日立製作所 | パターン検出方法及びパターン検出装置及びそれを用いた投影露光装置 |
| DE4333620A1 (de) * | 1993-10-15 | 1995-04-20 | Jenoptik Technologie Gmbh | Anordnung und Verfahren zur Erzeugung von Dosisprofilen für die Herstellung von Oberflächenprofilen |
| JPH10163300A (ja) * | 1996-12-02 | 1998-06-19 | Nikon Corp | ステージ装置 |
| JP2001255664A (ja) * | 2000-03-14 | 2001-09-21 | Fuji Photo Film Co Ltd | 画像露光方法 |
| US6605796B2 (en) * | 2000-05-25 | 2003-08-12 | Westar Photonics | Laser beam shaping device and apparatus for material machining |
| JP2004157219A (ja) * | 2002-11-05 | 2004-06-03 | Fuji Photo Film Co Ltd | 露光ヘッドおよび露光装置 |
| ATE554426T1 (de) * | 2004-05-05 | 2012-05-15 | Sign Tronic Ag | Verfahren zur ermöglichung der übertragung von im wesentlichen gleichen energiemengen |
| DE102004022961B4 (de) * | 2004-05-10 | 2008-11-20 | Envisiontec Gmbh | Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift |
| EP1744871B1 (de) | 2004-05-10 | 2008-05-07 | Envisiontec GmbH | Verfahren zur herstellung eines dreidimensionalen objekts mit auflösungsverbesserung mittels pixel-shift |
| US7893384B2 (en) * | 2004-12-07 | 2011-02-22 | Chosen Technologies, Inc. | Systems and methods for laser material manipulation |
| JP2006319098A (ja) * | 2005-05-12 | 2006-11-24 | Pentax Industrial Instruments Co Ltd | 描画装置 |
| WO2006120634A2 (en) * | 2005-05-13 | 2006-11-16 | Nxp B.V. | Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device |
| JP4679249B2 (ja) * | 2005-05-31 | 2011-04-27 | 大日本スクリーン製造株式会社 | パターン描画装置 |
| JP2007017897A (ja) * | 2005-07-11 | 2007-01-25 | Fujifilm Holdings Corp | 露光装置及び洗浄方法 |
| DE102006019963B4 (de) * | 2006-04-28 | 2023-12-07 | Envisiontec Gmbh | Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung |
| JP5280615B2 (ja) * | 2006-06-16 | 2013-09-04 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| EP1880830B1 (en) | 2006-07-19 | 2011-12-21 | Envisiontec GmbH | Method and device for producing a three-dimensional object, and computer and data carrier useful thereof |
| DE102008040742A1 (de) * | 2007-08-02 | 2009-02-05 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung |
| WO2010043275A1 (en) * | 2008-10-17 | 2010-04-22 | Huntsman Advanced Materials (Switzerland) Gmbh | Improvements for rapid prototyping apparatus |
-
2012
- 2012-12-20 DE DE102012224005.5A patent/DE102012224005B4/de active Active
-
2013
- 2013-12-17 KR KR1020157014504A patent/KR101860617B1/ko active Active
- 2013-12-17 US US14/654,184 patent/US9914265B2/en active Active
- 2013-12-17 BR BR112015012368A patent/BR112015012368A2/pt not_active IP Right Cessation
- 2013-12-17 CA CA2888844A patent/CA2888844A1/en not_active Abandoned
- 2013-12-17 EP EP13814504.0A patent/EP2934858B1/de active Active
- 2013-12-17 WO PCT/EP2013/076902 patent/WO2014095864A1/de not_active Ceased
- 2013-12-17 CN CN201380067167.3A patent/CN104853902A/zh active Pending
- 2013-12-17 AU AU2013361779A patent/AU2013361779B2/en active Active
- 2013-12-17 JP JP2015548447A patent/JP6436912B2/ja active Active
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