DE102012224005B4 - Verfahren zur Herstellung einer homogenen Lichtverteilung - Google Patents
Verfahren zur Herstellung einer homogenen Lichtverteilung Download PDFInfo
- Publication number
- DE102012224005B4 DE102012224005B4 DE102012224005.5A DE102012224005A DE102012224005B4 DE 102012224005 B4 DE102012224005 B4 DE 102012224005B4 DE 102012224005 A DE102012224005 A DE 102012224005A DE 102012224005 B4 DE102012224005 B4 DE 102012224005B4
- Authority
- DE
- Germany
- Prior art keywords
- light
- exposure field
- pixels
- illuminated
- beamer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/277—Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
- B29C64/282—Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED] of the same type, e.g. using different energy levels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/286—Optical filters, e.g. masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/386—Data acquisition or data processing for additive manufacturing
- B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Projection Apparatus (AREA)
- Micromachines (AREA)
- Transforming Electric Information Into Light Information (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012224005.5A DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
| JP2015548447A JP6436912B2 (ja) | 2012-12-20 | 2013-12-17 | 均一な光分布を形成する方法 |
| US14/654,184 US9914265B2 (en) | 2012-12-20 | 2013-12-17 | Method for producing a homogeneous light distribution |
| EP13814504.0A EP2934858B1 (de) | 2012-12-20 | 2013-12-17 | Verfahren zur herstellung einer homogenen lichtverteilung |
| CN201380067167.3A CN104853902A (zh) | 2012-12-20 | 2013-12-17 | 用于产生均匀的光分布的方法 |
| BR112015012368A BR112015012368A2 (pt) | 2012-12-20 | 2013-12-17 | processos para produção de uma distribuição de luz homogênea |
| AU2013361779A AU2013361779B2 (en) | 2012-12-20 | 2013-12-17 | Method for producing a homogeneous light distribution |
| PCT/EP2013/076902 WO2014095864A1 (de) | 2012-12-20 | 2013-12-17 | Verfahren zur herstellung einer homogenen lichtverteilung |
| CA2888844A CA2888844A1 (en) | 2012-12-20 | 2013-12-17 | Method for producing a homogeneous light distribution |
| KR1020157014504A KR101860617B1 (ko) | 2012-12-20 | 2013-12-17 | 균일한 광 분포 생성 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012224005.5A DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102012224005A1 DE102012224005A1 (de) | 2014-06-26 |
| DE102012224005B4 true DE102012224005B4 (de) | 2015-07-23 |
Family
ID=49885232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012224005.5A Active DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9914265B2 (https=) |
| EP (1) | EP2934858B1 (https=) |
| JP (1) | JP6436912B2 (https=) |
| KR (1) | KR101860617B1 (https=) |
| CN (1) | CN104853902A (https=) |
| AU (1) | AU2013361779B2 (https=) |
| BR (1) | BR112015012368A2 (https=) |
| CA (1) | CA2888844A1 (https=) |
| DE (1) | DE102012224005B4 (https=) |
| WO (1) | WO2014095864A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PT3040778T (pt) * | 2014-12-30 | 2020-12-23 | Visitech As | Método para fornecer brilho uniforme a partir de um projetor de luz sobre uma área de imagem |
| DE102015104394B4 (de) | 2015-03-24 | 2020-06-04 | Kulzer Gmbh | Verfahren zur Herstellung einer Teil- oder Totalprothese sowie Prothese erhältlich nach diesem Verfahren |
| US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
| FR3041560B1 (fr) * | 2015-09-29 | 2017-10-20 | Prodways | Procede de fabrication d'un produit par empilement de couche de matiere |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| JP6981710B2 (ja) | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| KR20180095618A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 다중-챔버 가열로에서 실리카 유리체의 제조 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| JP6523194B2 (ja) * | 2016-03-14 | 2019-05-29 | 東京エレクトロン株式会社 | 補助露光装置 |
| CN106182772B (zh) * | 2016-07-25 | 2018-06-26 | 哈尔滨工业大学 | 多种材料快速原型成型装置及方法 |
| US11014302B2 (en) * | 2017-05-11 | 2021-05-25 | Seurat Technologies, Inc. | Switchyard beam routing of patterned light for additive manufacturing |
| CN110770626B (zh) * | 2017-06-21 | 2022-04-01 | 依视路国际公司 | 光学物品的制造方法和光学成形设备 |
| CN107891596A (zh) * | 2017-12-15 | 2018-04-10 | 博纳云智(天津)科技有限公司 | 一种dlp光固化3d打印机的光强均匀校正方法 |
| CN110394980A (zh) * | 2018-04-24 | 2019-11-01 | 三纬国际立体列印科技股份有限公司 | 立体打印系统 |
| US10503076B1 (en) * | 2018-08-29 | 2019-12-10 | Applied Materials, Inc. | Reserving spatial light modulator sections to address field non-uniformities |
| NO20190617A1 (en) * | 2019-05-16 | 2020-11-17 | Visitech As | System and method for exposing a material with images |
| FR3119562B1 (fr) * | 2021-02-09 | 2024-08-30 | Univ Claude Bernard Lyon | Procédé d'impression d'un objet à imprimer, et imprimante adaptée pour la mise en oeuvre du procédé. |
| KR102443272B1 (ko) * | 2021-07-20 | 2022-09-15 | 단국대학교 산학협력단 | 특정 경로를 따른 중복 광조사를 이용하는 3d 프린터 및 3d 프린팅 방법 |
| CN118596582B (zh) * | 2024-06-24 | 2025-04-08 | 广州黑格智造信息科技有限公司 | 三维打印设备的光调制器控制方法及三维打印设备 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5620814A (en) * | 1993-10-15 | 1997-04-15 | Leica Lithographie Systeme Jena Gmbh | Process and arrangement for producing dose profiles for the fabrication of structured surfaces |
| US20020008091A1 (en) * | 2000-05-25 | 2002-01-24 | Brandinger Jay J. | Laser beam shaping device and apparatus for material machining |
| US20060119743A1 (en) * | 2004-12-07 | 2006-06-08 | Chosen Technologies, Inc. | Systems and methods for laser material manipulation |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3326902B2 (ja) * | 1993-09-10 | 2002-09-24 | 株式会社日立製作所 | パターン検出方法及びパターン検出装置及びそれを用いた投影露光装置 |
| JPH10163300A (ja) * | 1996-12-02 | 1998-06-19 | Nikon Corp | ステージ装置 |
| JP2001255664A (ja) | 2000-03-14 | 2001-09-21 | Fuji Photo Film Co Ltd | 画像露光方法 |
| JP2004157219A (ja) * | 2002-11-05 | 2004-06-03 | Fuji Photo Film Co Ltd | 露光ヘッドおよび露光装置 |
| ES2385984T3 (es) * | 2004-05-05 | 2012-08-06 | Sign-Tronic Ag | Método para habilitar la transmisión de cantidades de energía prácticamente idénticas |
| EP1744871B1 (de) * | 2004-05-10 | 2008-05-07 | Envisiontec GmbH | Verfahren zur herstellung eines dreidimensionalen objekts mit auflösungsverbesserung mittels pixel-shift |
| DE102004022961B4 (de) * | 2004-05-10 | 2008-11-20 | Envisiontec Gmbh | Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift |
| JP2006319098A (ja) * | 2005-05-12 | 2006-11-24 | Pentax Industrial Instruments Co Ltd | 描画装置 |
| US7800811B2 (en) * | 2005-05-13 | 2010-09-21 | Nxp B.V. | Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device |
| JP4679249B2 (ja) * | 2005-05-31 | 2011-04-27 | 大日本スクリーン製造株式会社 | パターン描画装置 |
| JP2007017897A (ja) * | 2005-07-11 | 2007-01-25 | Fujifilm Holdings Corp | 露光装置及び洗浄方法 |
| DE102006019963B4 (de) | 2006-04-28 | 2023-12-07 | Envisiontec Gmbh | Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung |
| JP5280615B2 (ja) * | 2006-06-16 | 2013-09-04 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| EP1880830B1 (en) | 2006-07-19 | 2011-12-21 | Envisiontec GmbH | Method and device for producing a three-dimensional object, and computer and data carrier useful thereof |
| DE102008040742A1 (de) * | 2007-08-02 | 2009-02-05 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung |
| WO2010043275A1 (en) * | 2008-10-17 | 2010-04-22 | Huntsman Advanced Materials (Switzerland) Gmbh | Improvements for rapid prototyping apparatus |
-
2012
- 2012-12-20 DE DE102012224005.5A patent/DE102012224005B4/de active Active
-
2013
- 2013-12-17 US US14/654,184 patent/US9914265B2/en active Active
- 2013-12-17 WO PCT/EP2013/076902 patent/WO2014095864A1/de not_active Ceased
- 2013-12-17 BR BR112015012368A patent/BR112015012368A2/pt not_active IP Right Cessation
- 2013-12-17 CA CA2888844A patent/CA2888844A1/en not_active Abandoned
- 2013-12-17 KR KR1020157014504A patent/KR101860617B1/ko active Active
- 2013-12-17 AU AU2013361779A patent/AU2013361779B2/en active Active
- 2013-12-17 JP JP2015548447A patent/JP6436912B2/ja active Active
- 2013-12-17 CN CN201380067167.3A patent/CN104853902A/zh active Pending
- 2013-12-17 EP EP13814504.0A patent/EP2934858B1/de active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5620814A (en) * | 1993-10-15 | 1997-04-15 | Leica Lithographie Systeme Jena Gmbh | Process and arrangement for producing dose profiles for the fabrication of structured surfaces |
| US20020008091A1 (en) * | 2000-05-25 | 2002-01-24 | Brandinger Jay J. | Laser beam shaping device and apparatus for material machining |
| US20060119743A1 (en) * | 2004-12-07 | 2006-06-08 | Chosen Technologies, Inc. | Systems and methods for laser material manipulation |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2934858A1 (de) | 2015-10-28 |
| WO2014095864A1 (de) | 2014-06-26 |
| JP2016508232A (ja) | 2016-03-17 |
| US9914265B2 (en) | 2018-03-13 |
| AU2013361779B2 (en) | 2017-01-19 |
| AU2013361779A1 (en) | 2015-06-04 |
| US20150328834A1 (en) | 2015-11-19 |
| CN104853902A (zh) | 2015-08-19 |
| EP2934858B1 (de) | 2023-02-08 |
| KR20150096386A (ko) | 2015-08-24 |
| BR112015012368A2 (pt) | 2017-07-11 |
| WO2014095864A9 (de) | 2014-08-14 |
| KR101860617B1 (ko) | 2018-05-23 |
| CA2888844A1 (en) | 2014-06-26 |
| JP6436912B2 (ja) | 2018-12-12 |
| DE102012224005A1 (de) | 2014-06-26 |
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