JP2016207869A - エピタキシャルウェーハ及び発光ダイオード - Google Patents
エピタキシャルウェーハ及び発光ダイオード Download PDFInfo
- Publication number
- JP2016207869A JP2016207869A JP2015088780A JP2015088780A JP2016207869A JP 2016207869 A JP2016207869 A JP 2016207869A JP 2015088780 A JP2015088780 A JP 2015088780A JP 2015088780 A JP2015088780 A JP 2015088780A JP 2016207869 A JP2016207869 A JP 2016207869A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light emitting
- epitaxial wafer
- emitting diode
- conductivity type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 claims abstract description 30
- 230000004888 barrier function Effects 0.000 claims abstract description 28
- 239000004065 semiconductor Substances 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 238000005253 cladding Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 abstract description 15
- 235000012431 wafers Nutrition 0.000 description 28
- 239000000758 substrate Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 20
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 14
- 238000005530 etching Methods 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 10
- 238000003892 spreading Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000005424 photoluminescence Methods 0.000 description 9
- YIWGJFPJRAEKMK-UHFFFAOYSA-N 1-(2H-benzotriazol-5-yl)-3-methyl-8-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carbonyl]-1,3,8-triazaspiro[4.5]decane-2,4-dione Chemical compound CN1C(=O)N(c2ccc3n[nH]nc3c2)C2(CCN(CC2)C(=O)c2cnc(NCc3cccc(OC(F)(F)F)c3)nc2)C1=O YIWGJFPJRAEKMK-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 230000029553 photosynthesis Effects 0.000 description 3
- 238000010672 photosynthesis Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 2
- YMUZFVVKDBZHGP-UHFFFAOYSA-N dimethyl telluride Chemical compound C[Te]C YMUZFVVKDBZHGP-UHFFFAOYSA-N 0.000 description 2
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 description 2
- ILXWFJOFKUNZJA-UHFFFAOYSA-N ethyltellanylethane Chemical compound CC[Te]CC ILXWFJOFKUNZJA-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- RGGPNXQUMRMPRA-UHFFFAOYSA-N triethylgallium Chemical compound CC[Ga](CC)CC RGGPNXQUMRMPRA-UHFFFAOYSA-N 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 241001464837 Viridiplantae Species 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000012364 cultivation method Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- QBJCZLXULXFYCK-UHFFFAOYSA-N magnesium;cyclopenta-1,3-diene Chemical compound [Mg+2].C1C=CC=[C-]1.C1C=CC=[C-]1 QBJCZLXULXFYCK-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 230000008635 plant growth Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015088780A JP2016207869A (ja) | 2015-04-23 | 2015-04-23 | エピタキシャルウェーハ及び発光ダイオード |
CN201610130003.6A CN106067494A (zh) | 2015-04-23 | 2016-03-08 | 磊晶晶圆以及发光二极管 |
TW105107503A TWI672827B (zh) | 2015-04-23 | 2016-03-11 | 磊晶晶圓以及發光二極體 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015088780A JP2016207869A (ja) | 2015-04-23 | 2015-04-23 | エピタキシャルウェーハ及び発光ダイオード |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2016207869A true JP2016207869A (ja) | 2016-12-08 |
Family
ID=57419058
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015088780A Pending JP2016207869A (ja) | 2015-04-23 | 2015-04-23 | エピタキシャルウェーハ及び発光ダイオード |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2016207869A (zh) |
CN (1) | CN106067494A (zh) |
TW (1) | TWI672827B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI742714B (zh) * | 2019-06-11 | 2021-10-11 | 全新光電科技股份有限公司 | 半導體雷射二極體 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10154844A (ja) * | 1996-11-26 | 1998-06-09 | Fujitsu Ltd | 半導体レーザ |
JP2001044556A (ja) * | 1999-07-29 | 2001-02-16 | Hitachi Ltd | 半導体レーザ及びその製造方法 |
JP2002027831A (ja) * | 2000-05-11 | 2002-01-29 | Kansai Tlo Kk | 植物育成用led光源 |
US20040021142A1 (en) * | 2002-07-30 | 2004-02-05 | Li-Hsin Kuo | Light emitting diode device |
JP2009177058A (ja) * | 2008-01-28 | 2009-08-06 | Hitachi Ltd | 半導体レーザ装置 |
JP2012018986A (ja) * | 2010-07-06 | 2012-01-26 | Showa Denko Kk | 発光ダイオード用エピタキシャルウェーハ |
JP2012043943A (ja) * | 2010-08-18 | 2012-03-01 | Showa Denko Kk | 発光ダイオード及び発光ダイオードランプ |
JP2015002683A (ja) * | 2013-06-19 | 2015-01-08 | 日本電信電話株式会社 | 微細藻類または代謝生成物の濃度決定方法およびシステム |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002111053A (ja) * | 2000-10-02 | 2002-04-12 | Sharp Corp | 半導体発光素子 |
-
2015
- 2015-04-23 JP JP2015088780A patent/JP2016207869A/ja active Pending
-
2016
- 2016-03-08 CN CN201610130003.6A patent/CN106067494A/zh active Pending
- 2016-03-11 TW TW105107503A patent/TWI672827B/zh active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10154844A (ja) * | 1996-11-26 | 1998-06-09 | Fujitsu Ltd | 半導体レーザ |
JP2001044556A (ja) * | 1999-07-29 | 2001-02-16 | Hitachi Ltd | 半導体レーザ及びその製造方法 |
JP2002027831A (ja) * | 2000-05-11 | 2002-01-29 | Kansai Tlo Kk | 植物育成用led光源 |
US20040021142A1 (en) * | 2002-07-30 | 2004-02-05 | Li-Hsin Kuo | Light emitting diode device |
JP2009177058A (ja) * | 2008-01-28 | 2009-08-06 | Hitachi Ltd | 半導体レーザ装置 |
JP2012018986A (ja) * | 2010-07-06 | 2012-01-26 | Showa Denko Kk | 発光ダイオード用エピタキシャルウェーハ |
JP2012043943A (ja) * | 2010-08-18 | 2012-03-01 | Showa Denko Kk | 発光ダイオード及び発光ダイオードランプ |
JP2015002683A (ja) * | 2013-06-19 | 2015-01-08 | 日本電信電話株式会社 | 微細藻類または代謝生成物の濃度決定方法およびシステム |
Also Published As
Publication number | Publication date |
---|---|
CN106067494A (zh) | 2016-11-02 |
TW201639188A (zh) | 2016-11-01 |
TWI672827B (zh) | 2019-09-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5549338B2 (ja) | 紫外光放射用窒素化合物半導体ledおよびその製造方法 | |
US7646027B2 (en) | Group III nitride semiconductor stacked structure | |
JP2008288248A (ja) | 半導体発光素子 | |
JP2011009524A (ja) | 発光素子及び発光素子の製造方法 | |
JP2011082233A (ja) | 発光素子 | |
WO2014167773A1 (ja) | 半導体発光素子及びその製造方法 | |
JP5906001B2 (ja) | 発光ダイオード用エピタキシャルウェーハ | |
JP2011054862A (ja) | エピタキシャルウエハ、発光素子、エピタキシャルウエハの製造方法、及び発光素子の製造方法 | |
KR20130102210A (ko) | 질화물 반도체 발광소자 및 그 제조방법 | |
KR20130022815A (ko) | 질화물 반도체 발광소자 및 그 제조방법 | |
JP2021019075A (ja) | 発光装置の製造方法及び発光装置 | |
US20180287015A1 (en) | Semiconductor device | |
JP4781028B2 (ja) | Iii族窒化物半導体積層体及びiii族窒化物半導体発光素子の製造方法 | |
JP6153351B2 (ja) | 半導体発光装置 | |
JP5684501B2 (ja) | 発光ダイオード用エピタキシャルウェーハ | |
JP2016143771A (ja) | エピタキシャルウエハ、半導体発光素子、発光装置及びエピタキシャルウエハの製造方法 | |
TWI672827B (zh) | 磊晶晶圓以及發光二極體 | |
JP2006013463A (ja) | Iii族窒化物半導体発光素子 | |
JP2011176001A (ja) | 発光素子及び発光素子の製造方法 | |
WO2016098632A1 (ja) | 発光素子 | |
WO2016056171A1 (ja) | 半導体発光素子 | |
JP2015043468A (ja) | 紫外半導体発光素子 | |
KR100730755B1 (ko) | 수직형 발광소자 제조 방법 및 그 수직형 발광소자 | |
JP2004281825A (ja) | 発光ダイオードの製造方法 | |
JP2013042082A (ja) | 半導体発光素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170327 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20180129 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180206 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180402 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180918 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20190205 |